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Conveyor apparatus

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B65G-051/02
출원번호 US-0062611 (1993-05-18)
우선권정보 JP-0152808 (1992-05-20); JP-0154337 (1992-05-21)
발명자 / 주소
  • Shiraiwa Hirotsugu (Hino JPX)
출원인 / 주소
  • Tokyo Electron Kabushiki Kaisha (Tokyo JPX 03) Tokyo Electron Tohoku Kabushiki Kaisha (Iwate JPX 03)
인용정보 피인용 횟수 : 113  인용 특허 : 0

초록

A thermal processing station is provided with a first conveyor that conveys a wafer from a first conveyor access portion and a second conveyor that conveys another wafer from a second conveyor access opening portion. The wafer conveyed from the first conveyor is conveyed along a route consisting of

대표청구항

A conveyor apparatus comprising: a first conveyor access structure defining a first temporary storage location for an object to be processed; a first mounting chamber connected to said first conveyor access structure; a thermal processing structure defining a thermal processing storage location for

이 특허를 인용한 특허 (113)

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