[특허]Method of cleaning workpiece with solvent and then with liquid carbon dioxide

Method of cleaning workpiece with solvent and then with liquid carbon dioxide 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	B08B-003/08 B08B-003/12
출원번호	US-0167403 (1993-12-14)
발명자 / 주소	Smith Jr. Charles W. (Fairview PA) Rosio Larry R. (Fairview PA) Shore Stephen H. (Erie PA)
출원인 / 주소	Autoclave Engineers, Inc. (Erie PA 02)
인용정보	피인용 횟수 : 111 인용 특허 : 0

초록 ▼

A method for precision cleaning of a workpiece with a cleaning fluid comprising liquid and/or supercritical fluid carbon dioxide and a primary solvent which is liquid at ambient temperatures and pressures comprises first placing the workpiece in a pressurizable vessel with a removable lid and within an inner tank open at the top; supplying the primary solvent to the inner tank; flushing the primary solvent through the pressure vessel; draining the inner tank to remove the primary solvent; and then supplying liquid and/or supercritical fluid carbon dioxide to the pressure vessel and flushing it through the vessel by withdrawing it from near the bottom of the inner tank.

대표청구항 ▼

A method for precision cleaning of a workpiece comprising the steps of: placing the workpiece in a pressurizable vessel with a removable lid and within an inner tank open at the top supplying a primary solvent to the inner tank which is liquid at ambient temperatures and pressures and which can be rinsed away by carbon dioxide pressurized to at least liquefying pressures without contaminating the interior walls of the pressurizable vessel; flushing the primary solvent through the pressure vessel without contaminating the interior walls of the pressure vessel; draining the inner tank to remove the primary solvent; supplying carbon dioxide to the pressure vessel pressurized to at least liquefying pressures and flushing it through the vessel by withdrawing it from near the bottom of the inner tank; recycling the carbon dioxide by passing it through a let-down valve to a liquid/vapor separator and then passing the vaporized carbon dioxide through an adsorption media filter prior to recondensing to a liquid; and simultaneously withdrawing carbon dioxide from the tank and from a location in the vessel outside of the tank.

이 특허를 인용한 특허 (111)

Mount, David J., Adding energy to a cleaning process fluid for removing photo resist, residues and particles from semiconductor substrates, photo masks, reticles, disks and flat-panel displays.
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Freer, Erik M.; de Larios, John M.; Mikhaylichenko, Katrina; Ravkin, Michael; Korolik, Mikhail; Redeker, Fred C.; Thomas, Clint; Parks, John, Apparatus and system for cleaning a substrate.
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Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Apparatus for supercritical processing of a workpiece.
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Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Apparatus for supercritical processing of multiple workpieces.
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Damaso, Gene R.; Schulte, James E.; Racette, Timothy L., Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent.
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Damaso,Gene R.; Schulte,James E.; Racette,Timothy L., Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent.
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Schulte, James E.; Racette, Timothy L.; Damaso, Gene R., Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent.
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Schulte, James E.; Racette, Timothy L.; Damaso, Gene R., Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent.
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Schulte, James E.; Racette, Timothy L.; Damaso, Gene R., Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent.
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Schulte, James E.; Racette, Timothy L.; Damaso, Gene R., Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent.
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Schulte,James E.; Racette,Timothy L.; Damaso,Gene R., Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent.
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Freer, Erik M.; de Larios, John M.; Mikhaylichenko, Katrina; Ravkin, Michael; Korolik, Mikhail; Redeker, Fred C.; Thomas, Clint; Parks, John, Method and apparatus for removing contamination from substrate.
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IPC	Description
A	생활필수품
A62	인명구조; 소방(사다리 E06C)
A62B	인명구조용의 기구, 장치 또는 방법(특히 의료용에 사용되는 밸브 A61M 39/00; 특히 물에서 쓰이는 인명구조 장치 또는 방법 B63C 9/00; 잠수장비 B63C 11/00; 특히 항공기에 쓰는 것, 예. 낙하산, 투출좌석 B64D; 특히 광산에서 쓰이는 구조장치 E21F 11/00)
A62B-1/08	.. 윈치 또는 풀리에 제동기구가 있는 것

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Method of cleaning workpiece with solvent and then with liquid carbon dioxide 원문보기

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Method of cleaning workpiece with solvent and then with liquid carbon dioxide 원문보기

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