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Methods for removal of contaminants from surfaces 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B08B-003/08
  • C11D-007/08
  • C23G-001/2
출원번호 US-0043435 (1993-04-05)
발명자 / 주소
  • Borah Ronald E. (Chesterton IN)
출원인 / 주소
  • EnClean Environmental Services Group, Inc. (Bellaire TX 02)
인용정보 피인용 횟수 : 28  인용 특허 : 19

초록

A cleaning process and water-based cleaning compositions effective for the removal of radionuclides, polychlorinated biphenyls, pesticides, herbicides, and heavy metals from surfaces of all types, more especially porous surfaces, surfaces that contain irregularities and microscopic voids into which

대표청구항

A method for removing contaminants from surfaces and the substrates of such surfaces, including porous surfaces and surfaces with irregularities into which the contaminants may migrate or lodge, and particulate surfaces; the method comprising: (i) precleaning the surface with an aqueous precleaning

이 특허에 인용된 특허 (19)

  1. Otrhalek Joseph V. (Dearborn MI) Gomes Gilbert S. (Southgate MI) Gansser Robert E. (Wyandotte MI), Acid cleaner and process for disposal thereof.
  2. Dollman David Y. (Doylestown PA) Blaszczyk Stanley L. (Lansdale PA), Alkaline cleaner for aluminum.
  3. Frenier Wayne W. (Tulsa County OK) Wilson David A. (Brazoria County TX), Aqueous acid composition and method of use.
  4. Doumit Carl J. (703 Hemlock St. Columbus MS 39701), Descaler composition and method.
  5. Han Shaw-Lin (East Amherst NY) Lai Kuo-Yann (Plainsboro NJ) Duliba Edward P. (Piscataway NJ), Detergent composition.
  6. Cockrell ; Jr. John R. (Greensboro NC) Thekkekandam Joseph T. (Siler City NC), Floor cleaning compositions and their use.
  7. Cockrell ; Jr. John R. (Greensboro NC) Thekkekandam Joseph T. (Siler City NC), Floor cleaning compositions and their use.
  8. Maggi Richard D. (Oyster Bay NY), Hydrotropic cleaner and deoxidizer.
  9. Anderson, James D.; Seigle, Sandra K., Inhibitor-containing acid cleaning compositions and processes.
  10. Mondshine, Thomas C., Laundering of oil base mud cuttings.
  11. Spekman ; Jr. Paul (Bloomington MN), Low temperature composition for plating pretreatment of ferrous metals.
  12. Leveskis Newton G. (Auburn CA), Metal oxide remover containing a strong mineral acid, citric acid and a basic ammonia derivative.
  13. Somers Gerardus A. (Langenboom NLX) Hendriks Jan J. M. (St. Oedenrode NLX), Metal stripping composition and process.
  14. Alexander George B. (Tulsa OK) Carpenter Norman F. (Tulsa OK), Method for cleaning and passivating a metal surface.
  15. Cortner Jay C. (600 SE. Marion St. ; No. 503 Portland OR 97202), Method for cleaning various surfaces of a single article.
  16. Hayes Michael E. (Fernandina Beach FL) Hood Craig C. (Fernandina Beach FL) Miller Ronald E. (Fernandina Beach FL) Sharpe Robert (Fernandina Beach FL), Method for printed circuit board and/or printed wiring board cleaning.
  17. Arrington Stephen T. (Duncan OK) Bradley Gary W. (Duncan OK), Method of removing iron and copper-containing scale from a metal surface.
  18. Miller Melvin N. (Bellevue WA) Rucker Thomas J. (Vancouver WA), Methods and compositions for removing polychlorinated biphenyls from a contaminated surface.
  19. Nash James E. (Dellwood MN) Heikkila Kurt E. (Circle Pines MN), Novel cleaning composition for removal of PCBs.

이 특허를 인용한 특허 (28)

  1. Wojtczak, William A.; Seijo, Ma. Fatima; Bernhard, David; Nguyen, Long, Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate.
  2. Wojtczak, William A.; Seijo, Ma. Fatima; Bernhard, David; Nguyen, Long, Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate.
  3. Wojtczak, William A.; Seijo, Ma. Fatima; Bernhard, David; Nguyen, Long, Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate.
  4. Wojtczak, William A.; Seijo, Ma. Fatimo; Bernhard, David; Nguyen, Long, Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate.
  5. Wojtczak, William A.; Seijo, Ma. Fatima; Bernhard, David; Nguyen, Long, Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrates.
  6. Leon Vincent G. ; Honda Kenji ; Rothgery Eugene F., Cleaning composition and method for removing residues.
  7. Leon Vincent G. ; Honda Kenji ; Rothgery Eugene F., Cleaning composition and method for removing residues.
  8. Jarema Chester P. ; Stuart Michael A., Cleaning compositions and processes suitable for replacing grit blasting to clean metal mold surfaces for plastics.
  9. Tucker, Mark D.; Betty, Rita G.; Tadros, Maher E., Concentrated formulations and methods for neutralizing chemical and biological toxants.
  10. Tucker,Mark D., Enhanced formulations for neutralization of chemical, biological and industrial toxants.
  11. Nunez,Luis; Kaminski,Michael Donald, Foam and gel methods for the decontamination of metallic surfaces.
  12. Tadros, Maher E.; Tucker, Mark D., Formulations for neutralization of chemical and biological toxants.
  13. Qian, Jianquo; Purdum, W. Ron, Formulations for the decontamination of toxic chemicals.
  14. Nachtman Thomas J. ; Greer Harold B. ; Hull John H., Method for containing or removing contaminants from a substrate.
  15. Borah Ronald E. ; Bonem Michael W., Method for removal of contaminants from surfaces.
  16. Swidler Ronald (Palo Alto CA) Woodhall Edward W. (Los Altos CA), Method of abarding using surface abrasion compositions.
  17. Ward Glen Douglas ; Peterson Ronald N ; Donda Kanjibhai, Method of washing a vehicle using a two-part washing composition.
  18. Basaly, Mores, Methods and compositions for acid treatment of a metal surface.
  19. Basaly, Mores, Methods and compositions for acid treatment of a metal surface.
  20. Basaly, Mores, Methods and compositions for acid treatment of a metal surface.
  21. Basaly, Mores, Methods and compositons for acid treatment of a metal surface.
  22. Fox, Robert V.; Avci, Recep; Groenewold, Gary S., Methods for removing contaminant matter from a porous material.
  23. Whitaker, Robert H.; Brann, Richard, Mineral composition.
  24. Whitaker, Robert H.; Smith, Allen E.; Puryear, David R., Mineral filler composition.
  25. Fox, Robert V.; Avci, Recep; Groenewold, Gary S., Polyphosphazine-based polymer materials.
  26. Brainard, Robert L.; Auger, Robert L.; Lachowski, Joseph F., Stripper for electronics.
  27. McDonald,Mary E., Universal cleaner that cleans tough oil, grease and rubber grime and that is compatible with many surfaces including plastics.
  28. Sato Yoshihide,JPX ; Komiya Takayuki,JPX ; Ohno Hiroki,JPX, Washing liquid for post-polishing and polishing-cleaning method in semiconductor process.
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