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Apparatus for application of coatings in vacuum 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23C-014/22
  • H01L-021/00
출원번호 US-0145571 (1993-11-04)
우선권정보 UA-0020179 (1992-11-04)
발명자 / 주소
  • Gorokhovsky Vladimir I. (10 Stonedene Blvd. Willowdale
  • Ontario CAX M2R 3C7)
인용정보 피인용 횟수 : 51  인용 특허 : 0

초록 ▼

An apparatus for the production of coatings in a vacuum provides a plasma guide in the shape of a parallelepiped having a substrate holder and plasma source on adjacent planes. A magnetic deflecting system is formed by linear conductors arranged along the edges of the parallelepiped, comprising 1, 2

대표청구항 ▼

An apparatus for the application of coatings in a vacuum comprising a plasma guide surrounded by a magnetic deflecting system communicating with a first plasma source contained within the plasma guide and a main chamber adjoining the plasma guide in which a substrate holder is arranged off of an opt

이 특허를 인용한 특허 (51)

  1. Druz, Boris; Aksenov, Ivan I.; Luchaninov, Olexandr A.; Strelnytskiy, Volodymyr E.; Vasylyev, Volodymyr V.; Zaritskiy, Isaak; Sferlazzo, Piero, Apparatus for cathodic vacuum-arc coating deposition.
    상세보기
  2. Boardman,William John; Mercado,Raul Donate; Tudhope,Andrew William, Apparatus for directing plasma flow to coat internal passageways.
    상세보기
  3. Welty,Richard P., Bi-directional filtered arc plasma source.
    상세보기
  4. Khominich Viktor N., Cathode arc vapor deposition method and apparatus.
    상세보기
  5. Veerasamy Vijayen S. ; Petrmichl Rudolph Hugo ; Thomsen Scott V., Coated article including a DLC inclusive layer(s) and a layer(s) deposited using siloxane gas, and corresponding method.
    상세보기
  6. Shi,Xu; Tay,Beng Kang; Tan,Hong Siang, Enhanced macroparticle filter and cathode arc source.
    상세보기
  7. Gorokhovsky, Vladimir; Champagne, Victor K., Erosion and corrosion resistant protective coating for turbomachinery methods of making the same and applications thereof.
    상세보기
  8. Gorokhovsky, Vladimir, Erosion and corrosion resistant protective coatings for turbomachinery.
    상세보기
  9. Surinphong, Surasak, Filter apparatus for arc ion evaporator used in cathodic arc plasma deposition system.
    상세보기
  10. Jilek, Sr., Mojmir; Jilek, Jr., Mojmir; Coddet, Olivier, Filtered cathodic arc deposition apparatus and method.
    상세보기
  11. Krauss Alan R., Filtered cathodic arc deposition apparatus and method.
    상세보기
  12. Gorokhovsky, Vladimir, Filtered cathodic arc deposition method and apparatus.
    상세보기
  13. Gorokhovsky, Vladimir, Filtered cathodic arc deposition method and apparatus.
    상세보기
  14. Gorokhovsky, Vladimir I., Filtered cathodic arc deposition method and apparatus.
    상세보기
  15. Gorokhovsky,Vladimir I., Filtered cathodic arc deposition method and apparatus.
    상세보기
  16. Gorokhovsky,Vladimir I., Filtered cathodic arc deposition method and apparatus.
    상세보기
  17. Gorokhovsky, Vladimir, Filtered cathodic arc method, apparatus and applications thereof.
    상세보기
  18. Aksenov,Ivan I.; Strelnytskiy,Volodymyr E.; Vasylyev,Volodymyr V.; Voevodin,Andrey A.; Jones,John G.; Zabinski,Jeffrey S., Filtered cathodic-arc plasma source.
    상세보기
  19. Veerasamy Vijayen S., Highly tetrahedral amorphous carbon coating on glass.
    상세보기
  20. Veerasamy Vijayen S., Highly tetrahedral amorphous carbon coating on glass.
    상세보기
  21. Veerasamy, Vijayen S., Highly tetrahedral amorphous carbon coating on glass.
    상세보기
  22. Veerasamy Vijayen S. ; Petrmichl Rudolph Hugo ; Thomsen Scott V., Hydrophobic coating including DLC and/or FAS on substrate.
    상세보기
  23. Vijayen S. Veerasamy, Hydrophobic coating including DLC on substrate.
    상세보기
  24. Veerasamy Vijayen S. ; Petrmichl Rudolph Hugo, Hydrophobic coating with DLC & FAS on substrate.
    상세보기
  25. Vijayen S. Veerasamy ; Rudolph Hugo Petrmichl ; Scott V. Thomsen, Low-E coating system including protective DLC.
    상세보기
  26. Leu Ming-Sheng,TWX ; Lih Wei-Cheng,TWX ; Lee Yuh-Wen,TWX ; Chen Shau-Yi,TWX ; Chang Wei-Jieh,TWX ; Huang Shinn-Cherng,TWX ; Liou Mau-Shen,TWX, Magnetic apparatus for arc ion plating.
    상세보기
  27. Boardman, William John; Mercado, Raul Donate; Tudhope, Andrew William, Method for directing plasma flow to coat internal passageways.
    상세보기
  28. Kaihara Toshio,JPX, Method for forming a field emission cold cathode.
    상세보기
  29. Vijayen S. Veerasamy ; Rudolph Hugo Petrmichl, Method of depositing DLC inclusive coating on substrate.
    상세보기
  30. Vijayen S. Veerasamy ; Rudolph Hugo Petrmichl ; Scott V. Thomsen, Method of deposition DLC inclusive layer(s) using hydrocarbon and/or siloxane gas(es).
    상세보기
  31. Veerasamy, Vijayen S.; Petrmichl, Rudolph Hugo, Method of ion beam milling a glass substrate prior to depositing a coating system thereon, and corresponding system for carrying out the same.
    상세보기
  32. Vijayen S. Veerasamy ; Rudolph Hugo Petrmichl, Method of ion beam milling substrate prior to depositing diamond like carbon layer thereon.
    상세보기
  33. Veerasamy, Vijayen S.; Petrmichl, Rudolph Hugo, Method of making a coated article including DLC and FAS.
    상세보기
  34. Veerasamy, Vijayen S.; Petrmichl, Rudolph Hugo; Thomsen, Scott V., Method of making coated article including DLC inclusive layer over low-E coating.
    상세보기
  35. Vijayen S. Veerasamy ; Rudolph Hugo Petrmichl ; Scott V. Thomsen, Method of making coated article including diamond-like carbon (DLC) and FAS.
    상세보기
  36. Veerasamy, Vijayen S., Method of making coated article including layer(s) of diamond-like carbon which may be hydrophobic.
    상세보기
  37. Veerasamy, Vijayen S., Method of making coating article including carbon coating on glass.
    상세보기
  38. Veerasamy,Vijayen S., Method of making heat treatable coated article with diamond-like carbon (DLC) inclusive layer.
    상세보기
  39. Veerasamy, Vijayen S., Method of making heat treatable coated article with protective layer.
    상세보기
  40. Kubo, Hiroyuki; Hashimoto, Shigeru; Hirabayashi, Keiji; Teranishi, Koji; Owaki, Yusuke, Method of producing optical element forming mold and optical element forming mold.
    상세보기
  41. Zhehui Wang ; Cris W. Barnes, Plasma accelerator.
    상세보기
  42. Lee Sang-yeoul,KRX, Plasma etching chamber for manufacturing semiconductor devices.
    상세보기
  43. Gorokhovsky, Vladimir I., Rectangular cathodic arc source and method of steering an arc spot.
    상세보기
  44. Gorokhovsky, Vladimir I., Rectangular cathodic arc source and method of steering an arc spot.
    상세보기
  45. Welty Richard P., Rectangular filtered arc plasma source.
    상세보기
  46. Gorokhovsky, Vladimir, Rectangular filtered vapor plasma source and method of controlling vapor plasma flow.
    상세보기
  47. Veerasamy, Vijayen S.; Petrmichl, Rudolph Hugo; Thomsen, Scott V., Solar management coating system including protective DLC.
    상세보기
  48. Vijayen S. Veerasamy ; Rudolph Hugo Petrmichl ; Scott V. Thomsen, Solar management coating system including protective DLC.
    상세보기
  49. Kishida Shigeaki,JPX ; Mikami Takashi,JPX ; Kirimura Hiroya,JPX ; Ogata Kiyoshi,JPX, Thin film forming apparatus.
    상세보기
  50. Murakami,Yasuo; Mikami,Takashi; Ogata,Kiyoshi; Murakami,Hiroshi, Vacuum arc vapor deposition process and apparatus.
    상세보기
  51. Gorokhovsky, Vladimir; Heckerman, Brad B.; Cheng, Yuhang, Wear resistant vapor deposited coating, method of coating deposition and applications therefor.
    상세보기

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