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Charged particle beam scattering system 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01J-033/00
출원번호 US-0102770 (1993-08-06)
발명자 / 주소
  • Moyers Michael F. (Redlands CA) Siebers Jeffrey V. (Grand Terrace CA)
출원인 / 주소
  • Loma Linda University Medical Center (Loma Linda CA 02)
인용정보 피인용 횟수 : 154  인용 특허 : 0

초록

A radiation treatment apparatus comprises a source of charged particles, preferably protons, for producing a particle beam, and a scattering foil for changing the diameter of the charged particle beam. The scattering foil is configured so that its thickness is both uniform and continuously adjustabl

대표청구항

A radiation treatment apparatus, comprising: a source of charged particles which provides a charged particle beam; and a scattering foil in the path of the particle beam, said scattering foil being comprised of a high z material which substantially changes the diameter of the particle beam without s

이 특허를 인용한 특허 (154)

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