이 특허를 인용한 특허 (40)

1. Goudie Chad ; Natalicio John ; Olsen Greg ; Shurtliff Eric, Apparatus for rinsing wafers in the context of a combined cleaning rinsing and drying system.

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2. Bowman Mike L. ; Hempel Gene ; Karlsrud Chris ; Root Franklin D., Arrangements for wafer polishing.

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3. La Tho Le ; Venkatkrishnan Subramanian ; Ramsbey Mark T. ; Thomas Jack F. ; Early Kathleen, Backside wafer polishing for improved photolithography.

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4. Leach Michael A. (345 Sheridan #204 Palo Alto CA 94306), Block for polishing a wafer during manufacture of integrated circuits.

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5. Gockel Thomas R. ; Olson Lorin ; Ryle Lynn ; Whitelaw Brett A., Brush assembly apparatus.

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6. Gockel Thomas R. ; Olson Lorin ; Ryle Lynn ; Whitelaw Brett A. ; Ravkin Michael, Brush assembly apparatus.

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7. Vail Jim ; Wallis Mike, Brush interflow distributor.

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8. Lebel Richard J. ; Maurer Frederic ; Nadeau Rock ; Smith ; Jr. Paul H. ; Wickramasinghe Hemantha K. ; van Kessel Theodore G., Chemical-mechanical polishing system and method for integrated spin dry-film thickness measurement.

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9. Jose R. Gonzalez-Martin ; Chris Karlsrud, Cleaning station integral with polishing machine for semiconductor wafers.

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10. Jose R. Gonzalez-Martin ; Chris Karlsrud ; Robert Allen ; Toby Jordan ; Craig Howard ; Arthur Hamer ; Jeff Cunnane ; Periya Gopalan ; Bill Thornton ; Jon MacErnie ; Fernando Calderon, Combined CMP and wafer cleaning apparatus and associated methods.

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11. La Tho Le ; Venkatkrishnan Subramanian N. ; Ramsbey Mark T. ; Thomas Jack F. ; Early Kathleen Regina, Doubled-sided wafer scrubbing for improved photolithography.

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12. Gonzalez-Martin Jose R. ; Karlsrud Chris ; Allen Robert ; Jordan Toby ; Howard Craig ; Hamer Arthur ; Cunnane Jeff ; Gopalan Periya ; Thornton Bill ; MacErnie Jon ; Calderon Fernando, Integral machine for polishing, cleaning, rinsing and drying workpieces.

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13. Gonzalez-Martin, Jose R.; Karlsrud, Chris, Load and unload station for semiconductor wafers.

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14. Jose R. Gonzalez-Martin ; Chris Karlsrud ; Robert Allen ; Toby Jordan ; Craig Howard ; Arthur Hamer ; Jeff Cunnane ; Periya Gopalan ; Bill Thornton ; Jon MacErnie ; Fernando Calderon, Mapping system for semiconductor wafer cassettes.

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15. Krusell Wilbur C. ; Thrasher David L. ; Ryle Lynn S., Megasonic bath.

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16. Leach Michael A., Method and structure for polishing a wafer during manufacture of integrated circuits.

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17. Leach Michael A. (345 Sheridan #204 Palo Alto CA 94306), Method and structure for polishing a wafer during manufacture of integrated circuits.

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18. Nakano Masami (Fukushima-ken JPX) Uchiyama Isao (Fukushima-ken JPX) Takamatsu Hiroyuki (Shirakawa JPX), Method of cleaning semiconductor wafers.

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19. Stephens Donald Edgar ; Jones Oliver David ; Miller ; III Hugo John, Method of cleaning semiconductor wafers and other substrates.

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20. Ngo Minh Van ; Wang Fei, Method of forming copper interconnects with reduced in-line diffusion.

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21. Spina John A. ; DePoint ; Jr. John ; Juskiewicz Marion T., Method of storing and dispensing thin, flimsy objects.

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22. Peterson Glenn E. ; Shurtliff Eric, Methods and apparatus for cleaning and drying wafers.

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23. Jim Vail ; Mike Wallis, Methods for applying fluid through a brush interflow distributor.

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24. Na'im, Nazman; Boo, Yeong Yih, Post polish disk cleaning process.

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25. Huang Ying-Shih,TWX, Post-CMP cleaner apparatus and method.

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26. Huang Ying-Shih,TWX, Post-CMP cleaner apparatus and method.

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27. Gupta Anand ; Karlsrud Chris ; Gopalan Periya ; Trojan Daniel R. ; Cunnane Jeffrey B. ; MacErnie Jon R., Post-CMP wet-HF cleaning station.

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28. Bonsdorf, Grit; Dickenscheid, Wolfgang, Process and device for cleaning a semiconductor wafer.

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29. Simmons Mark A. (San Jose CA) Krusell Wilbur C. (San Jose CA), Process for brush cleaning.

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30. Gonzalez-Martin Jose R. ; Karlsrud Chris, Robot assisted method of polishing, cleaning and drying workpieces.

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31. Gonzalez-Martin, Jose R.; Karlsrud, Chris, Robotic method of transferring workpieces to and from workstations.

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32. Simmons Mark A. ; McGrath Martin J. ; Thrasher David L., Scrubber control system.

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33. Mokuo, Shori, Substrate processing apparatus and substrate processing method.

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34. Thrasher David L. ; Ryle Lynn S. ; Ruppell Robert M. ; Hearne John S. ; Krussell Wilbur C. ; Youre Gary D., Substrate processing system.

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35. Andreas Michael T. ; Walker Michael A., Surface cleaning apparatus.

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36. Andreas Michael T. ; Walker Michael A., Surface cleaning apparatus and method.

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37. Hessburg Merilly Ann ; Lindsley Timothy John ; Darrow David Craig ; Sheffield John Edgar, System and method for hydrodynamic loading and unloading of objects into and out of substantially touchless hydrodynamic transport systems.

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38. Liu, Zhi (Lewis); Kashkoush, Ismail; Lee, Hanjoo, Systems and methods for drying a rotating substrate.

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39. Donald Edgar Stephens ; Oliver David Jones ; Hugo John Miller, III, Wafer cleaning apparatus.

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40. Jones Oliver David ; Vail Jim, Wafer cleaning apparatus.

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