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Process for barrier coating of plastic objects 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B05D-003/06
출원번호 US-0265164 (1994-06-24)
발명자 / 주소
  • Williams Joel L. (Cary NC) Burkett Susan L. (Hillsborough NC) McGuire Shel (Omaha NE)
출원인 / 주소
  • Becton, Dickinson and Company (Franklin Lakes NJ 02)
인용정보 피인용 횟수 : 62  인용 특허 : 0

초록

A method for sequentially depositing a silicon oxide based film as a barrier on a substrate. The film is useful for providing an effective barrier against gas permeability in containers and for extending shelf-life of containers, especially plastic evacuated blood collection devices.

대표청구항

A method of sequentially depositing a silicon oxide based film on a plastic substrate in a previously evacuated chamber by glow discharge comprising: (a) introducing a first reactive gas comprising a hydrogen silicide into a first chamber; (b) introducing a second reactive gas comprising at least on

이 특허를 인용한 특허 (62)

  1. Felts, John T.; Fisk, Thomas E.; Abrams, Robert S.; Ferguson, John; Freedman, Jonathan R.; Pangborn, Robert J.; Sagona, Peter J., Apparatus and method for transporting a vessel to and from a PECVD processing station.
  2. Plester, George; Ehrich, Horst, Barrier coated plastic containers and coating methods therefor.
  3. Hichem M'Saad ; Seon Mee Cho ; Dana Tribula, Barrier layer deposition using HDP-CVD.
  4. M'Saad, Hichem; Cho, Seon Mee; Tribula, Dana, Barrier layer deposition using HDP-CVD.
  5. Cheung David ; Yau Wai-Fan ; Mandal Robert R., CVD plasma assisted low dielectric constant films.
  6. Cheung, David; Yau, Wai-Fan; Mandal, Robert R., CVD plasma assisted low dielectric constant films.
  7. Shi,Yu; Mucha,Lawrence S., Coating composition containing an epoxide additive and structures coated therewith.
  8. Fisk, Thomas E., Coating inspection method.
  9. Cheung, David; Yau, Wai-Fan; Mandal, Robert R., Computer readable medium for holding a program for performing plasma-assisted CVD of low dielectric constant films formed from organosilane compounds.
  10. Lam, Kin-Sang; Swartz, Dennis C.; Sorum, Roger, Controlled gas supply line apparatus and process for infilm and onfilm defect reduction.
  11. Weikart, Christopher; Clark, Becky L.; Stevenson, Adam; Abrams, Robert S.; Belfance, John, Controlling the uniformity of PECVD deposition.
  12. Weikart, Christopher; Clark, Becky L.; Stevenson, Adam; Abrams, Robert S.; Belfance, John; Jones, Joseph A.; Fisk, Thomas E., Controlling the uniformity of PECVD deposition on medical syringes, cartridges, and the like.
  13. Felts, John T.; Fisk, Thomas E.; Abrams, Robert S.; Ferguson, John; Freedman, Jonathan R.; Pangborn, Robert J.; Sagona, Peter J., Cyclic olefin polymer vessels and vessel coating methods.
  14. Cerny, Glenn Allen; Hwang, Byung Keun; Loboda, Mark Jon, H:SiOC coated substrates.
  15. Yau, Wai-Fan; Cheung, David; Jeng, Shin-Puu; Liu, Kuowei; Yu, Yung-Cheng, Low dielectric constant film produced from silicon compounds comprising silicon-carbon bond.
  16. Fisk, Thomas E.; Sagona, Peter J.; Jones, Joseph A., Method and apparatus for detecting rapid barrier coating integrity characteristics.
  17. Keiichiro Sano JP; Masaya Nomura JP; Hiroaki Tamamaki JP; Yoshinori Hatanaka JP, Method and apparatus for forming SiC thin film on high polymer base material by plasma CVD.
  18. Kuehnle Manfred R. (New London NH) Hagenlocher Arno (Santa Rosa CA) Schuegraf Klaus (Torrance CA) Statz Hermann (Wayland CA), Method and apparatus for producing gas impermeable, chemically inert container structures for food and volatile substanc.
  19. Plester, George; Ehrich, Horst; Rule, Mark, Method for coating a plastic container with vacuum vapor deposition.
  20. Felts John T., Method for plasma deposition of a thin film onto a surface of a container.
  21. Loboda, Mark Jon; Seifferly, Jeffrey Alan, Method for producing hydrogenated silicon oxycarbide films having low dielectric constant.
  22. Gaillard, Frederic; Xia, Li-Qun; Lim, Tian-Hoe; Yieh, Ellie; Yau, Wai-Fan; Jeng, Shin-Puu; Liu, Kuowei; Lu, Yung-Cheng, Method of decreasing the K value in SIOC layer deposited by chemical vapor deposition.
  23. Gaillard,Frederic; Xia,Li Qun; Lim,Tian Hoe; Yieh,Ellie; Yau,Wai Fan; Jeng,Shin Puu; Liu,Kuowei; Lu,Yung Cheng, Method of decreasing the k value in sioc layer deposited by chemical vapor deposition.
  24. Yau, Wai-Fan; Cheung, David; Jeng, Shin-Puu; Liu, Kuowei; Yu, Yung-Cheng, Method of depositing a low K dielectric with organo silane.
  25. Yau Wai-Fan ; Cheung David ; Jeng Shin-Puu ; Liu Kuowei ; Yu Yung-Cheng, Method of depositing a low k dielectric with organo silane.
  26. Yau, Wai-Fan; Cheung, David; Jeng, Shin-Puu; Liu, Kuowei; Yu, Yung-Cheng, Method of depositing a low k dielectric with organo silane.
  27. Huang, Tzu-Fang; Lu, Yung-Cheng; Xia, Li-Qun; Yieh, Ellie; Yau, Wai-Fan; Cheung, David W.; Willecke, Ralf B.; Liu, Kuowei; Lee, Ju-Hyung; Moghadam, Farhad K.; Ma, Yeming Jim, Method of depositing low k films using an oxidizing plasma.
  28. Rule, Mark; Shi, Yu; Liu, Linda Hsiaohua; Standish, John V., Method to decrease aldehyde content in polyolefin products.
  29. Rule Mark ; Shi Yu ; Huang Xiaoyan, Method to decrease the acetaldehyde content of melt-processed polyesters.
  30. Rule, Mark; Shi, Yu, Method to decrease the acetaldehyde content of melt-processed polyesters.
  31. George Plester BE; Horst Ehrich DE, Methods for measuring the degree of ionization and the rate of evaporation in a vapor deposition coating system.
  32. Rule, Mark; Shi, Yu; Gebele, Thomas; Grimm, Helmut; Budke, Elisabeth, Multilayer polymeric/inorganic oxide structure with top coat for enhanced gas or vapor barrier and method for making same.
  33. Rule, Mark; Shi, Yu; Gebele, Thomas; Grimm, Helmut; Budke, Elisabeth, Multilayer polymeric/inorganic oxide structure with top coat for enhanced gas or vapor barrier and method for making same.
  34. Rule, Mark; Shi, Yu; Ehrich, Horst, Multilayer polymeric/zero valent material structure for enhanced gas or vapor barrier and UV barrier and method for making same.
  35. Rule, Mark; Shi, Yu; Ehrich, Horst, Multilayer polymeric/zero valent material structure for enhanced gas or vapor barrier and uv barrier and method for making same.
  36. Felts, John T.; Fisk, Thomas E.; Kinney, Shawn; Weikart, Christopher; Hunt, Benjamin; Raiche, Adrian; Fitzpatrick, Brian; Sagona, Peter J.; Stevenson, Adam, PECVD coating methods for capped syringes, cartridges and other articles.
  37. Jones, Joseph A.; Felts, John T.; Gresham, James Troy; Lilly, Brian Russell; Fisk, Thomas E., PECVD lubricity vessel coating, coating process and apparatus providing different power levels in two phases.
  38. Felts, John T.; Fisk, Thomas E.; Abrams, Robert S.; Ferguson, John; Freedman, Jonathan R.; Pangborn, Robert J.; Sagona, Peter J.; Weikart, Christopher, Passivation, pH protective or lubricity coating for pharmaceutical package, coating process and apparatus.
  39. Jones, Joseph A.; Weikart, Christopher; Martin, Steven J., Plasma or CVD pre-treatment for lubricated pharmaceutical package, coating process and apparatus.
  40. Cheung David ; Yau Wai-Fan ; Mandal Robert P. ; Jeng Shin-Puu ; Liu Kuo-Wei ; Lu Yung-Cheng ; Barnes Michael ; Willecke Ralf B. ; Moghadam Farhad ; Ishikawa Tetsuya ; Poon Tze Wing, Plasma processes for depositing low dielectric constant films.
  41. Cheung, David; Yau, Wai Fan; Mandal, Robert P.; Jeng, Shin Puu; Liu, Kuo Wei; Lu, Yung Cheng; Barnes, Michael; Willecke, Ralf B.; Moghadam, Farhad; Ishikawa, Tetsuya; Poon, Tze Wing, Plasma processes for depositing low dielectric constant films.
  42. Cheung, David; Yau, Wai-Fan; Mandal, Robert P.; Jeng, Shin-Puu; Liu, Kuo-Wei; Lu, Yung-Cheng; Barnes, Michael; Willecke, Ralf B.; Moghadam, Farhad; Ishikawa, Tetsuya; Poon, Tze Wing, Plasma processes for depositing low dielectric constant films.
  43. Cheung, David; Yau, Wai-Fan; Mandal, Robert P.; Jeng, Shin-Puu; Liu, Kuo-Wei; Lu, Yung-Cheng; Barnes, Michael; Willecke, Ralf B.; Moghadam, Farhad; Ishikawa, Tetsuya; Poon, Tze Wing, Plasma processes for depositing low dielectric constant films.
  44. Cheung, David; Yau, Wai-Fan; Mandal, Robert P.; Jeng, Shin-Puu; Liu, Kuo-Wei; Lu, Yung-Cheng; Barnes, Michael; Willecke, Ralf B.; Moghadam, Farhad; Ishikawa, Tetsuya; Poon, Tze Wing, Plasma processes for depositing low dielectric constant films.
  45. Cheung, David; Yau, Wai-Fan; Mandal, Robert P.; Jeng, Shin-Puu; Liu, Kuo-Wei; Lu, Yung-Cheng; Barnes, Michael; Willecke, Ralf B.; Moghadam, Farhad; Ishikawa, Tetsuya; Poon, Tze Wing, Plasma processes for depositing low dielectric constant films.
  46. David Cheung ; Wai-Fan Yau ; Robert P. Mandal ; Shin-Puu Jeng TW; Kuo-Wei Liu ; Yung-Cheng Lu ; Michael Barnes ; Ralf B. Willecke ; Farhad Moghadam ; Tetsuya Ishikawa ; Tze Wing Poon, Plasma processes for depositing low dielectric constant films.
  47. Plester George,BEX ; Ehrich Horst,DEX, Plasma-enhanced vacuum vapor deposition system including systems for evaporation of a solid, producing an electric arc discharge and measuring ionization and evaporation.
  48. Plester George,BEX ; Ehrich Horst,DEX ; Rule Mark ; Pickel Herbert,DEX ; Humele Heinz,DEX, Plastic containers with an external gas barrier coating.
  49. Humele, Heinz; Pickel, Herbert; Plester, George; Ehrich, Horst; Rule, Mark, Plastic containers with an external gas barrier coating, method and system for coating containers using vapor deposition, method for recycling coated containers, and method for packaging a beverage.
  50. Rule,Mark; Shi,Yu, Polyester composition and articles with reduced acetaldehyde content and method using hydrogenation catalyst.
  51. Frisk Peter, Polyolefin material integrated with nanophase particles.
  52. Rule, Mark, Process for reduction of acetaldehyde and oxygen in beverages contained in polyester-based packaging.
  53. Rocha-Alvarez, Juan Carlos; Chen, Chen-An; Yieh, Ellie; Venkataraman, Shankar, Purge heater design and process development for the improvement of low k film properties.
  54. Felts, John T.; Fisk, Thomas E.; Abrams, Robert S.; Ferguson, John; Freedman, Jonathan R.; Pangborn, Robert J.; Sagona, Peter; Weikart, Christopher; Israelachvili, Jacob, Saccharide protective coating for pharmaceutical package.
  55. Cho, Seon-Mee; M'Saad, Hichem; Moghadam, Farhad, Silicon carbide deposited by high density plasma chemical-vapor deposition with bias.
  56. Weikart, Christopher; Clark, Becky L.; Stevenson, Adam; Felts, John T., Trilayer coated pharmaceutical packaging.
  57. Weikart, Christopher; Clark, Becky L.; Stevenson, Adam; Felts, John T., Trilayer coated pharmaceutical packaging.
  58. Weikart, Christopher; Clark, Becky L.; Stevenson, Adam; Felts, John T., Trilayer coated pharmaceutical packaging with low oxygen transmission rate.
  59. Felts, John T.; Fisk, Thomas E.; Abrams, Robert S.; Ferguson, John; Freedman, Jonathan R.; Pangborn, Robert J.; Sagona, Peter J., Vessel inspection apparatus and methods.
  60. Felts, John T.; Fisk, Thomas E.; Abrams, Robert S.; Ferguson, John; Freedman, Jonathan R.; Pangborn, Robert J.; Sagona, Peter J., Vessel inspection apparatus and methods.
  61. Felts, John T.; Fisk, Thomas E.; Abrams, Robert S.; Ferguson, John; Freedman, Johathan R.; Pangborn, Robert J.; Sagona, Peter J., Vessel, coating, inspection and processing apparatus.
  62. Felts, John T.; Fisk, Thomas E.; Abrams, Robert; Ferguson, John; Freedman, Jonathan; Pangborn, Robert; Sagona, Peter, Vessels, contact surfaces, and coating and inspection apparatus and methods.
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