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Inspection method and apparatus for inspecting a particle, if any, on a substrate having a pattern 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01B-009/02
출원번호 US-0076951 (1993-06-15)
우선권정보 JP-0107678 (1992-04-27); JP-0136982 (1992-05-28); JP-0156842 (1992-06-16); JP-0305422 (1992-11-16); JP-0305433 (1992-11-16); JP-0022675 (1993-02-10); JP-0048064 (1993-03-09); JP-0099541 (1993-04-26)
발명자 / 주소
  • Tsuji Toshihiko (Ayase JPX) Takeuchi Seiji (Kawasaki JPX) Miyazaki Kyoichi (Mitaka JPX) Yoshii Minoru (Tokyo JPX) Nose Noriyuki (Atsugi JPX) Mori Tetsuzo (Atsugi JPX)
출원인 / 주소
  • Canon Kabushiki Kaisha (Tokyo JPX 03)
인용정보 피인용 횟수 : 87  인용 특허 : 0

초록 ▼

Disclosed is an inspection method and apparatus: wherein (i) first light having a first state of polarization and a first wavelength, and (ii) second light having a second state of polarization, different from the first state of polarization, and a second wavelength, different from the first wavelen

대표청구항 ▼

An inspection apparatus for inspecting a particle, if any, on a substrate having a pattern, said apparatus comprising: light producing means for producing (i) first light having a first state of polarization and a first wavelength, and (ii) second light having a second state of polarization, differe

이 특허를 인용한 특허 (87)

  1. Noguchi, Minori; Ohshima, Yoshimasa; Nishiyama, Hidetoshi; Matsumoto, Shunichi; Kembo, Yukio; Matsunaga, Ryouji; Sakai, Keiji; Ninomiya, Takanori; Watanabe, Tetsuya; Nakamura, Hisato; Jingu, Takahiro; Morishige, Yoshio; Chikamatsu, Shuichi, Apparatus and method for testing defects.
    상세보기
  2. Noguchi, Minori; Ohshima, Yoshimasa; Nishiyama, Hidetoshi; Matsumoto, Shunichi; Kembo, Yukio; Matsunaga, Ryouji; Sakai, Keiji; Ninomiya, Takanori; Watanabe, Tetsuya; Nakamura, Hisato; Jingu, Takahiro; Morishige, Yoshio; Chikamatsu, Shuichi, Apparatus and method for testing defects.
    상세보기
  3. Noguchi,Minori; Ohshima,Yoshimasa; Nishiyama,Hidetoshi; Matsumoto,Shunichi; Kembo,Yukio; Matsunaga,Ryouji; Sakai,Keiji; Ninomiya,Takanori; Watanabe,Tetsuya; Nakamura,Hisato; Jingu,Takahiro; Morishige, Apparatus and method for testing defects.
    상세보기
  4. Noguchi,Minori; Ohshima,Yoshimasa; Nishiyama,Hidetoshi; Matsumoto,Shunichi; Kembo,Yukio; Matsunaga,Ryouji; Sakai,Keiji; Ninomiya,Takanori; Watanabe,Tetsuya; Nakamura,Hisato; Jingu,Takahiro; Morishige, Apparatus and method for testing defects.
    상세보기
  5. Noguchi,Minori; Ohshima,Yoshimasa; Nishiyama,Hidetoshi; Matsumoto,Shunichi; Kembo,Yukio; Matsunaga,Ryouji; Sakai,Keiji; Ninomiya,Takanori; Watanabe,Tetsuya; Nakamura,Hisato; Jingu,Takahiro; Morishige,Yoshio; Chikamatsu,Shuichi, Apparatus and method for testing defects.
    상세보기
  6. Moriya,Tsuyoshi, Apparatus for inspecting a surface of an object to be processed.
    상세보기
  7. Tatarczyk, Christina; Tatarczyk, Joachim, Apparatus for measuring a spectral distribution of a printed product produced with a printing device.
    상세보기
  8. Nakao, Toshiyuki; Maruyama, Shigenobu; Hamamatsu, Akira; Urano, Yuta, Defect inspecting method and defect inspecting apparatus.
    상세보기
  9. Nakao, Toshiyuki; Maruyama, Shigenobu; Hamamatsu, Akira; Urano, Yuta, Defect inspecting method and defect inspecting apparatus.
    상세보기
  10. Urano, Yuta; Ueno, Taketo; Hamamatsu, Akira; Honda, Toshifumi, Defect inspection apparatus and defect inspection method.
    상세보기
  11. La Fontaine, Bruno M.; Levinson, Harry J.; Schefske, Jeffrey A., Differential wavelength inspection system.
    상세보기
  12. Takeuchi, Seiji; Yoshii, Minoru; Maehara, Hiroshi, Exposure apparatus.
    상세보기
  13. Yoshii Minoru,JPX ; Hasegawa Masanobu,JPX ; Miyazaki Kyoichi,JPX ; Takeuchi Seiji,JPX, Exposure state detecting system and exposure apparatus using the same.
    상세보기
  14. Maeda, Kohei, Foreign particle inspection apparatus, exposure apparatus, and method of manufacturing device.
    상세보기
  15. Sawatari Takeo ; Gaubis Philip A. ; Klooster Alex ; Marks James M., Heterodyne scatterometer for detecting and analyzing wafer surface defects.
    상세보기
  16. Klooster, Alex; Marks, James M.; Sawatari, Takeo, Holographic scatterometer for detection and analysis of wafer surface deposits.
    상세보기
  17. Tamada, Hitoshi; Imai, Yutaka; Taguchi, Ayumu; Wada, Hiroyuki, Inspection apparatus and method.
    상세보기
  18. Sommargren Gary E., Inspection of lithographic mask blanks for defects.
    상세보기
  19. La Fontaine, Bruno M., Inspection system with enhanced contrast.
    상세보기
  20. Reinhron, Silviu; Almogy, Gilad, Inspection systems performing two-dimensional imaging with line light spot.
    상세보기
  21. Ranalli,Eliseo Romolo, Interferometric optical assemblies and systems including interferometric optical assemblies.
    상세보기
  22. Perkins, Thomas T; King, Gavin M; Carter, Ashley R, Laser guided tip approach with 3D registration to a surface.
    상세보기
  23. Mori Tetsuya,JPX ; Shima Shinichi,JPX, Light source device and illumination system.
    상세보기
  24. Mori Tetsuya,JPX ; Shima Shinichi,JPX, Light source device and illumination system.
    상세보기
  25. Engelhardt, Johann; Hoffmann, Juergen, Light source for illumination in scanning microscopy, and scanning microscope.
    상세보기
  26. Jeffrey A. Brigante ; Glenn W. Gale ; Maurice R. Hevey ; Frederick W. Kern, Jr. ; Ben Kim ; Joel M. Sharrow ; William A. Syverson, Method and apparatus for combined particle location and removal.
    상세보기
  27. Ohshima, Yoshimasa; Uto, Sachio; Shibata, Yukihiro, Method and apparatus for detecting defects on a wafer.
    상세보기
  28. Eremin Yuri A.,RUX ; Stover John C. ; Scheer Craig A., Method and apparatus for distinguishing particles from subsurface defects on a substrate using polarized light.
    상세보기
  29. Hunter, Reginald, Method and apparatus for embedded substrate and system status monitoring.
    상세보기
  30. Hunter, Reginald, Method and apparatus for enhanced embedded substrate inspection through process data collection and substrate imaging techniques.
    상세보기
  31. Yoshida Haruo,JPX, Method and apparatus for inspecting foreign matter by examining frequency differences between probing light beam and reference light beam.
    상세보기
  32. Batson, Don T.; Hunter, Reginald, Method and apparatus for substrate imaging.
    상세보기
  33. Hunter, Reginald, Method and apparatus for substrate surface inspection using spectral profiling techniques.
    상세보기
  34. McCarthy, Matthew, Method and apparatus for variable polarization control in a lithography system.
    상세보기
  35. McCarthy,Matthew, Method and apparatus for variable polarization control in a lithography system.
    상세보기
  36. Hunter, Reginald, Method and apparatus to provide embedded substrate process monitoring through consolidation of multiple process inspection techniques.
    상세보기
  37. Hunter,Reginald, Method and apparatus to provide for automated process verification and hierarchical substrate examination.
    상세보기
  38. Shishido, Hiroaki; Yoshitake, Yasuhiro; Nakata, Toshihiko; Maeda, Shunji; Yoshida, Minoru; Uto, Sachio, Method and equipment for detecting pattern defect.
    상세보기
  39. Shishido, Hiroaki; Yoshitake, Yasuhiro; Nakata, Toshihiko; Maeda, Shunji; Yoshida, Minoru; Uto, Sachio, Method and equipment for detecting pattern defect.
    상세보기
  40. Shishido,Hiroaki; Yoshitake,Yasuhiro; Nakata,Toshihiko; Maeda,Shunji; Yoshida,Minoru; Uto,Sachio, Method and equipment for detecting pattern defect.
    상세보기
  41. Togashi, Takahiro; Matsui, Shigeru, Method for detecting particles and defects and inspection equipment thereof.
    상세보기
  42. Togashi, Takahiro; Matsui, Shigeru, Method for detecting particles and defects and inspection equipment thereof.
    상세보기
  43. Togashi, Takahiro; Matsui, Shigeru, Method for detecting particles and defects and inspection equipment thereof.
    상세보기
  44. Togashi, Takahiro; Matsui, Shigeru, Method for detecting particles and defects and inspection equipment thereof.
    상세보기
  45. Togashi,Takahiro; Matsui,Shigeru, Method for detecting particles and defects and inspection equipment thereof.
    상세보기
  46. John C. Stover ; Yuri A. Eremin RU, Method for discriminating between holes in and particles on a film covering a substrate.
    상세보기
  47. Germer Thomas A. ; Asmail Clara C., Microroughness-blind optical scattering instrument.
    상세보기
  48. Mengu.cedilla., M. Pinar; Manickavasagam, Sivakumar, Non-intrusive method and apparatus for characterizing particles based on scattering matrix elements measurements using elliptically polarized radiation.
    상세보기
  49. Zhang, Shiyu; Wang, Charles N.; Churin, Yevgeniy; Moon, Yong-Mo; Yang, Hyoseok Daniel; Wang, Mark S., Oblique illuminator for inspecting manufactured substrates.
    상세보기
  50. Minori Noguchi JP; Yoshimasa Ohshima JP; Hidetoshi Nishiyama JP; Shunichi Matsumoto JP; Yukio Kembo JP; Ryouji Matsunaga JP; Keiji Sakai JP; Takanori Ninomiya JP; Tetsuya Watanabe JP; Hisato, Optical apparatus for defect and particle size inspection.
    상세보기
  51. Nakahira, Kenji; Honda, Toshifumi, Optical inspection apparatus and method thereof.
    상세보기
  52. Hunter, Reginald, Optical signal routing method and apparatus providing multiple inspection collection points on semiconductor manufacturing systems.
    상세보기
  53. Tsuji, Toshihiko, Optical unit and optical instrument having the same.
    상세보기
  54. Kempf, Bernd; Wiehl, Gunther; Roth, Werner; Koch, Andreas; Braumann, Peter; Niederreuther, Ralf, Oxidation method.
    상세보기
  55. Morinaga Shirou,JPX, Particle detecting apparatus using two light beams.
    상세보기
  56. Hunter, Reginald, Particle detection and embedded vision system to enhance substrate yield and throughput.
    상세보기
  57. Hunter, Reginald; Tsadka, Sagie, Particle detection and embedded vision system to enhance substrate yield and throughput.
    상세보기
  58. Chou,Chien, Phase demodulator, phase difference detector, and interferometric system using the phase difference detector.
    상세보기
  59. Saito, Kenji; Tsuji, Toshihiko; Sugita, Mitsuro, Position detection device, apparatus using the same, exposure apparatus, and device manufacturing method using the same.
    상세보기
  60. Saito, Kenji; Tsuji, Toshihiko; Sugita, Mitsuro, Position detection device, apparatus using the same, exposure apparatus, and device manufacturing method using the same.
    상세보기
  61. Yoshii Minoru,JPX ; Hasegawa Masanobu,JPX ; Miyazaki Kyoichi,JPX, Position sensor having a reflective projecting system and device fabrication method using the sensor.
    상세보기
  62. Mori Tetsuya,JPX, Positioning method and projection exposure apparatus using the method.
    상세보기
  63. Marxer,Norbert; Gross,Kenneth P.; Altendorfer,Hubert; Kren,George, Process and assembly for non-destructive surface inspections.
    상세보기
  64. Vaez Iravani,Mehdi; Stokowski,Stanley; Zhao,Guoheng, Sample inspection system.
    상세보기
  65. Vaez Iravani,Mehdi; Stokowski,Stanley; Zhao,Guoheng, Sample inspection system.
    상세보기
  66. Vaez Iravani,Mehdi; Stokowski,Stanley; Zhao,Guoheng, Sample inspection system.
    상세보기
  67. Vaez-Iravani, Mehdi; Stokowski, Stanley; Zhao, Guoheng, Sample inspection system.
    상세보기
  68. Vaez-Iravani, Mehdi; Stokowski, Stanley; Zhao, Guoheng, Sample inspection system.
    상세보기
  69. Oguri Shigehisa,JPX ; Inuzuka Eiji,JPX ; Suzuki Kouji,JPX ; Nagata Wataru,JPX ; Hiruma Yasushi,JPX, Semiconductor device inspection system.
    상세보기
  70. Eah,Sang Kee; Lin,Xiao Min; Wiederrecht,Gary, Single metal nanoparticle scattering interferometer.
    상세보기
  71. McAlexander, William Ian; VanWiggeren, Gregory Douglas, Single sweep phase shift method and apparatus for measuring chromatic and polarization dependent dispersion.
    상세보기
  72. Xu, Yiping; Abdulhalm, Ibrahim, Spectroscopic scatterometer system.
    상세보기
  73. Sekine Akihiko,JPX ; Iwa Yoichiro,JPX ; Soma Hiroaki,JPX ; Miki Naoto,JPX ; Isozaki Hisashi,JPX ; Yoshino Hisakazu,JPX, Surface inspection apparatus.
    상세보기
  74. Ishimaru, Ichiro; Noguchi, Minori; Moriyama, Ichiro; Tanabe, Yoshikazu; Yatsugake, Yasuo; Kenbou, Yukio; Watanabe, Kenji; Tsuchiyama, Hirofumi, Surface inspection apparatus and method thereof.
    상세보기
  75. Ishimaru, Ichiro; Noguchi, Minori; Moriyama, Ichiro; Tanabe, Yoshikazu; Yatsugake, Yasuo; Kenbou, Yukio; Watanabe, Kenji; Tsuchiyama, Hirofumi, Surface inspection apparatus and method thereof.
    상세보기
  76. Ishimaru,Ichiro; Noguchi,Minori; Moriyama,Ichiro; Tanabe,Yoshikazu; Yatsugake,Yasuo; Kenbou,Yukio; Watanabe,Kenji; Tsuchiyama,Hirofumi, Surface inspection apparatus and method thereof.
    상세보기
  77. Hasegawa Masanobu,JPX ; Yoshii Minoru,JPX ; Ohsaki Yoshinori,JPX, Surface position detecting system and device manufacturing method using the same.
    상세보기
  78. Yoshii Minoru,JPX ; Hasegawa Masanobu,JPX ; Miyazaki Kyoichi,JPX, Surface position detecting system and exposure apparatus using the same.
    상세보기
  79. Berndt,Klaus W., System and method for detecting particles.
    상세보기
  80. Berndt,Klaus W., System and method for detecting particles.
    상세보기
  81. Marx David ; Psaltis Demetri, System and method for optically measuring a structure.
    상세보기
  82. Bareket, Noah; Wack, Daniel C.; Zhao, Guoheng, System for measuring a sample with a layer containing a periodic diffracting structure.
    상세보기
  83. Almogy, Gilad; Mazaki, Hadar; Phillip, Zvi Howard; Reinhorn, Silviu; Goldberg, Boris; Some, Daniel I., Variable angle illumination wafer inspection system.
    상세보기
  84. Aiyer, Arun Ananth, Wafer inspection apparatus with unique illumination methodology and method of operation.
    상세보기
  85. Fossey Michael E. ; Stover John C., Wafer inspection system for distinguishing pits and particles.
    상세보기
  86. Fossey Michael E. ; Stover John C. ; Clementi Lee D., Wafer inspection system for distinguishing pits and particles.
    상세보기
  87. Fossey, Michael E.; Stover, John C.; Clementi, Lee D., Wafer inspection system for distinguishing pits and particles.
    상세보기

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