$\require{mediawiki-texvc}$

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

Integrated sputtering target assembly 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23C-014/34
출원번호 US-0236715 (1994-04-29)
발명자 / 주소
  • Demaray Richard E. (Portola Valley CA) Berkstresser David E. (Los Gatos CA) Herrera Manuel J. (San Mateo CA)
출원인 / 주소
  • Applied Materials, Inc. (Santa Clara CA 02)
인용정보 피인용 횟수 : 46  인용 특허 : 0

초록

A target plate assembly completely covers and seals against a top opening of a sputtering processing chamber. Cooling liquid connections are provided only from the perimeter of the target assembly. When a top vacuum chamber seals the side opposite the pressure chamber, the pressure on both sides of

대표청구항

A sputtering target assembly comprising: a sputtering target in intimate contact with a first side of a backing plate forming part of a target backing plate assembly; said target backing plate assembly configured to cover an opening of a sputtering chamber so as to seal the opening, said backing pla

이 특허를 인용한 특허 (46)

  1. Lee, Young Jong; Choi, Jun Young; Jo, Saeng Hyun; Yoon, Byung-Oh; Kim, Gyeong-Hoon; Jeong, Hong-Gi, Apparatus for manufacturing flat-panel display.
  2. Anthony F. Beier ; Janine K. Kardokus ; Susan D. Strothers, Diffusion bonded sputtering target assembly with precipitation hardened backing plate and method of making same.
  3. Beier Anthony F. ; Kardokus Janine K. ; Strothers Susan D., Diffusion bonded sputtering target assembly with precipitation hardened backing plate and method of making same.
  4. Subramani,Anantha K.; Vesci,Anthony; Dickerson,Scott, Electroformed sputtering target.
  5. Abney, Stephen; Vesci, Anthony; Sommers, Joseph F.; Schweitzer, Marc O'Donnell; Dickerson, Scott; Tiller, Jennifer Watia, Flow-formed chamber component having a textured surface.
  6. Ivanov,Eugene Y.; Conard,Harry W., Friction fit target assembly for high power sputtering operation.
  7. Kumar, Sanjay; Vyas, Dhiraj, Gel processing and transfer device.
  8. Black, Russell; Turner, Norman L.; Demaray, Ernest, Heated and cooled vacuum chamber shield.
  9. Russell Black ; Norman L. Turner ; Ernest Demaray, Heated and cooled vacuum chamber shield.
  10. Moslehi Mehrdad M. ; Heimanson Dorian ; Davis Cecil J. ; Omstead Thomas R., High magnetic flux cathode apparatus and method for high productivity physical-vapor deposition.
  11. Hartsough Larry D. ; Harra David J. ; Cochran Ronald R. ; Jiang Mingwei, Internally cooled target assembly for magnetron sputtering.
  12. Nakao Shuji,JPX, Ionized PVD device and method of manufacturing semiconductor device.
  13. Bhatnagar, Ashish; Murugesh, Laxman; Gopalakrishnan, Padma, Localized surface annealing of components for substrate processing chambers.
  14. Buchberger, Hans; Geiss, Andreas; Krempel-Hesse, Jörg; Haas, Dieter, Machine for coating a substrate, and module.
  15. Krempel-Hesse, Jörg; Jischke, Andreas; Schüssler, Uwe; Wolf, Hans, Magnetron sputter cathode.
  16. Manuel J. Herrera ; Philip G. Pitcher, Magnetron sputtering apparatus with an integral cooling and pressure relieving cathode.
  17. Ivo J. Raaijmakers ; Robert S. Busacca ; John Lane, Method and apparatus for enhancing a sputtering target's lifetime.
  18. Koenigsmann, Holger J.; Perry, Andrew C.; Hunt, Thomas J.; Gilman, Paul S., Method for forming sputter target assemblies.
  19. Koenigsmann, Holger J.; Perry, Andrew C.; Hunt, Thomas J.; Gilman, Paul S., Method for forming sputter target assemblies.
  20. Gilman Paul S. ; Kulkarni Shailesh ; Blanchet Jean Pierre,FRX, Method of bonding a sputtering target to a backing plate.
  21. Wickersham, Jr., Charles E., Method of bonding sputtering target materials.
  22. Demaray, Richard Ernest; Herrera, Manuel J.; Eline, David F.; Deshpandey, Chandra, Method of forming an electrically insulating sealing structure for use in a semiconductor manufacturing apparatus.
  23. Ivanov, Eugene Y., Method of manufacturing sputter targets with internal cooling channels.
  24. Ivanov, Eugene Y., Method of manufacturing sputter targets with internal cooling channels.
  25. Shah, Ritesh P.; Steele, David E.; Turner, William R.; Beier, Anthony F.; Kardokus, Janine K.; Strothers, Susan D., Ni-plated target diffusion bonded to a backing plate and method of making same.
  26. Inagawa, Makoto; Stimson, Bradley O.; Hosokawa, Akihiro; Le, Hienminh Huu; Chen, Jrjyan Jerry, PVD target.
  27. Adams Bret W. ; Raaijmakers Ivo, Particle trap in a magnetron sputtering chamber.
  28. Riker, Martin Lee; Pai, Uday; Fruchterman, William; Miller, Keith A.; Rasheed, Muhammad M.; Nguyen, Thanh X.; Savandaiah, Kirankumar, Physical vapor deposition (PVD) target having low friction pads.
  29. Moslehi Mehrdad M. ; Heimanson Dorian ; Davis Cecil J. ; Omstead Thomas R., Physical vapor deposition system having reduced thickness backing plate.
  30. Demaray Richard Ernest ; Hosokawa Akihiro ; Herrera Manuel J., Preparation and bonding of workpieces to form sputtering targets and other assemblies.
  31. Scheible, Kathleen; Flanigan, Michael Allen; Yoshidome, Goichi; Allen, Adolph Miller; Pavloff, Cristopher M., Process kit and target for substrate processing chamber.
  32. Young, Donny; Ritchie, Alan Alexander; Hong, Ilyoung (Richard); Scheible, Kathleen A., Process kit components for titanium sputtering chamber.
  33. Pavloff, Cristopher Mark; Hong, Ilyoung, Process kit for substrate processing chamber.
  34. Harris, Todd M.; Swanstrom, Frederick Marvin; Miller, Melinda Dae; Blanch, Jeffrey David, Ribbed caul plate for attaching a strip to a panel structure and method for use.
  35. Parikh, Pradip Girish; Koppelman, Henry John; Harris, Todd Matthew; Swanstrom, Frederick M., Skin panel joint for improved airflow.
  36. Nishihara Munekazu,JPX ; Kimura Teiichi,JPX ; Aokura Isamu,JPX, Sputtering apparatus.
  37. Plaisted, Dean T.; Asbas, Michael; Ferrin, Lawrence C.; Carter, Paul G.; Laverriere, Guy P., Sputtering target.
  38. Manuel J. Herrera ; Philip G. Pitcher, Sputtering target assembly.
  39. Allen, Adolph Miller; Yoon, Ki Hwan; Guo, Ted; Yang, Hong S.; Yu, Sang-Ho, Sputtering target having increased life and sputtering uniformity.
  40. Ono, Kazuyuki, Stage base, stage apparatus, exposure apparatus, and device manufacturing method.
  41. Riker, Martin; Wang, Wei W., Substrate cleaning chamber and components.
  42. Miller, Keith A.; Lavitsky, Ilya, Support ring assembly.
  43. Bhatnagar, Ashish; Murugesh, Laxman; Gopalakrishnan, Padma, Surface annealing of components for substrate processing chambers.
  44. Stowell, Jr.,Michael W., System and apparatus for control of sputter deposition process.
  45. Hort, Werner H.; Sayles, Scott R.; Speziale, Vince; Ferrasse, Stephane; Detlaff, Harold A.; Wright, Stuart D.; Alford, Frank; Wragg, Andrew N. A., Target assemblies, targets, backing plates, and methods of target cooling.
  46. Ritchie, Alan Alexander; Young, Donny; Hong, Ilyoung (Richard); Scheible, Kathleen A.; Kelkar, Umesh, Target for sputtering chamber.
섹션별 컨텐츠 바로가기

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

AI-Helper 아이콘
AI-Helper
안녕하세요, AI-Helper입니다. 좌측 "선택된 텍스트"에서 텍스트를 선택하여 요약, 번역, 용어설명을 실행하세요.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.

선택된 텍스트

맨위로