$\require{mediawiki-texvc}$

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

Method of fabricating a thin film transistor using a nickel silicide layer to promote crystallization of the amorphous s 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-021/00
  • H01L-021/336
출원번호 US-0260413 (1994-06-14)
우선권정보 JP-0174736 (1993-06-22); JP-0180754 (1993-06-25)
발명자 / 주소
  • Zhang Hongyong (Kanagawa JPX) Teramoto Satoshi (Kanagawa JPX)
출원인 / 주소
  • Semiconductor Energy Laboratory Co., Ltd. (Kanagawa JPX 03)
인용정보 피인용 횟수 : 313  인용 특허 : 0

초록 ▼

Method of fabricating TFTs starts with forming a nickel film selectively on a bottom layer which is formed on a substrate. An amorphous silicon film is formed on the nickel film and heated to crystallize it. The crystallized film is irradiated with infrared light to anneal it. Thus, a crystalline si

대표청구항 ▼

A method of fabricating a semiconductor device comprising the steps of: forming a non-single crystal semiconductor film on a substrate; forming an insulating film on the semiconductor film; patterning the semiconductor film and the insulating forming a film containing a metal element for promoting c

이 특허를 인용한 특허 (313)

  1. Ohtani Hisashi,JPX ; Miyanaga Akiharu,JPX ; Fukunaga Takeshi,JPX ; Zhang Hongyong,JPX, Active Matry Display.
    상세보기
  2. Deane, Steven C., Active matrix device with photo sensor.
    상세보기
  3. Yamazaki, Shunpei, Active matrix electro-luminescent display device with an organic leveling layer.
    상세보기
  4. Yamazaki Shunpei,JPX, Active matrix electro-luminescent display thin film transistor.
    상세보기
  5. Yamazaki, Shunpei, Active matrix electro-luminescent display with an organic leveling layer.
    상세보기
  6. Yamazaki,Shunpei, Active matrix electro-luminescent display with an organic leveling layer.
    상세보기
  7. Kim Jeong-Hyun,KRX ; Park Sung-Il,KRX, Active matrix liquid crystal display and method of manufacturing same.
    상세보기
  8. Deane, Steven C., Active matrix pixel device with photo sensor.
    상세보기
  9. So, Woo-Young, CMOS thin film transistor.
    상세보기
  10. So,Woo Young, CMOS thin film transistor.
    상세보기
  11. Yamazaki, Shunpei, Device including resin film.
    상세보기
  12. Yamazaki Shunpei,JPX, Display device.
    상세보기
  13. Yamazaki, Shunpei, Display device.
    상세보기
  14. Takemura, Yasuhiko, Display device and glass member and substrate member having film comprising aluminum, nitrogen and oxygen.
    상세보기
  15. Yamazaki,Shunpei, Display device having underlying insulating film and insulating films.
    상세보기
  16. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Hayakawa Masahiko,JPX ; Osame Mitsuaki,JPX, Display switch with double layered gate insulation and resinous interlayer dielectric.
    상세보기
  17. Takemura Yasuhiko,JPX, Electro-optical device.
    상세보기
  18. Ohtani Hisashi,JPX ; Koyama Jun,JPX ; Yamazaki Shunpei,JPX, Electro-optical device and semiconductor circuit.
    상세보기
  19. Ohtani,Hisashi; Koyama,Jun; Yamazaki,Shunpei, Electro-optical device and semiconductor circuit.
    상세보기
  20. Ohtani,Hisashi; Koyama,Jun; Yamazaki,Shunpei, Electro-optical device and semiconductor circuit.
    상세보기
  21. Ohtani, Hisashi; Koyama, Jun; Yamazaki, Shunpei, Electro-optical device and semiconductor device.
    상세보기
  22. Miyasaka Mitsutoshi,JPX, Fabrication method for a thin film semiconductor device, the thin film semiconductor device itself, liquid crystal disp.
    상세보기
  23. Mitsutoshi Miyasaka JP, Fabrication method for a thin film semiconductor device, the thin film semiconductor device itself, liquid crystal display, and electronic device.
    상세보기
  24. Miyasaka Mitsutoshi,JPX, Fabrication method for a thin film semiconductor device, the thin film semiconductor device itself, liquid crystal display, and electronic device.
    상세보기
  25. Miyasaka, Mitsutoshi, Fabrication method for a thin film semiconductor device, the thin film semiconductor device itself, liquid crystal display, and electronic device.
    상세보기
  26. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki, Fabrication method of semiconductor device.
    상세보기
  27. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki, Fabrication method of semiconductor device.
    상세보기
  28. Essaian Stepan ; Naem Abdalla,BEX, Fabrication of silicides by excimer laser annealing of amorphous silicon.
    상세보기
  29. Storey, Robson F.; Morgan, David L., Functionalization of polyolefins with phenoxy derivatives.
    상세보기
  30. Storey, Robson F.; Morgan, David L., Functionalization of polyolefins with phenoxy derivatives.
    상세보기
  31. Fukada,Takeshi; Sakama,Mitsunori; Teramoto,Satoshi, Glass substrate assembly, semiconductor device and method of heat-treating glass substrate.
    상세보기
  32. Yamazaki, Shunpei; Shibata, Hiroshi; Tanaka, Koichiro; Hiroki, Masaaki; Akiba, Mai, Laser irradiation method and method of manufacturing a semiconductor device.
    상세보기
  33. Chen, Chi-wen; Chang, Meng-hsiang, Light sensor.
    상세보기
  34. Yamazaki, Shunpei; Nishi, Takeshi, Liquid crystal display and method of driving.
    상세보기
  35. Yamazaki, Shunpei; Nishi, Takeshi, Liquid crystal display and method of driving same.
    상세보기
  36. Yamazaki, Shunpei; Nishi, Takeshi, Liquid crystal display and method of driving same.
    상세보기
  37. Yamazaki, Shunpei; Nishi, Takeshi, Liquid crystal display and method of driving same.
    상세보기
  38. Yamazaki, Shunpei; Nishi, Takeshi, Liquid crystal display and method of driving same.
    상세보기
  39. Hongyong Zhang JP; Hideto Ohnuma JP; Yasuhiko Takemura JP, METHODOLOGY FOR PRODUCING THIN FILM SEMICONDUCTOR DEVICES BY CRYSTALLIZING AN AMORPHOUS FILM WITH CRYSTALLIZATION PROMOTING MATERIAL, PATTERNING THE CRYSTALLIZED FILM, AND THEN INCREASING THE CRYSTAL.
    상세보기
  40. Yamazaki, Shunpei; Shimomura, Akihisa; Ohtani, Hisashi; Hiroki, Masaaki; Tanaka, Koichiro; Shiga, Aiko; Akiba, Mai; Kasahara, Kenji, Manufacturing method for a semiconductor device using a marker on an amorphous semiconductor film to selectively crystallize a region with a laser light.
    상세보기
  41. Yamazaki,Shunpei; Shimomura,Akihisa; Ohtani,Hisashi; Hiroki,Masaaki; Tanaka,Koichiro; Shiga,Aiko; Akiba,Mai; Kasahara,Kenji, Manufacturing method for a thin film transistor that uses a pulse oscillation laser crystallize an amorphous semiconductor film.
    상세보기
  42. Yamazaki, Shunpei; Arai, Yasuyuki, Manufacturing method for top-gate type and bottom-gate type thin film transistors.
    상세보기
  43. Ohtani, Hisashi, Metal-gettering method used in the manufacture of crystalline-Si TFT.
    상세보기
  44. Paik,Woon Suh, Method for crystallizing amorphous semiconductor thin film by epitaxial growth using non-metal seed and method for fabricating poly-crystalline thin film transistor using the same.
    상세보기
  45. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Hayakawa Masahiko,JPX ; Osame Mitsuaki,JPX, Method for fabricating a semiconductor device.
    상세보기
  46. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki, Method for fabricating a semiconductor device.
    상세보기
  47. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki, Method for fabricating a semiconductor device.
    상세보기
  48. Shunpei Yamazaki JP; Satoshi Teramoto JP; Jun Koyama JP; Yasushi Ogata JP; Masahiko Hayakawa JP; Mitsuaki Osame JP, Method for fabricating a semiconductor device using a metal catalyst and high temperature crystallization.
    상세보기
  49. Choi, Duck-Kyun, Method for fabricating a thin film transistor.
    상세보기
  50. Maekawa,Shinji; Akimoto,Kengo, Method for fabricating thin film transistor.
    상세보기
  51. Lee, Seok Woon; Joo, Seung Ki, Method for fabricating thin film transistor including crystalline silicon active layer.
    상세보기
  52. So,Woo Young, Method for fabricating thin film transistor with multiple gates using metal induced lateral crystallization.
    상세보기
  53. Zhang Hongyong,JPX ; Uochi Hideki,JPX ; Takayama Toru,JPX ; Fukunaga Takeshi,JPX ; Takemura Yasuhiko,JPX, Method for forming a semiconductor device.
    상세보기
  54. Yamazaki Shunpei,JPX ; Komaya Jun,JPX ; Miyanaga Akiharu,JPX ; Fukunaga Takeshi,JPX, Method for forming semiconductor thin film.
    상세보기
  55. Hisashi Ohtani JP; Hiroki Adachi JP; Akiharu Miyanaga JP; Toru Takayama JP, Method for manufacturing a semiconductor device.
    상세보기
  56. Ohtani, Hisashi; Miyanaga, Akiharu; Fukunaga, Takeshi; Zhang, Hongyong, Method for manufacturing a semiconductor device.
    상세보기
  57. Ohtani,Hisashi; Adachi,Hiroki; Miyanaga,Akiharu; Takayama,Toru, Method for manufacturing a semiconductor device.
    상세보기
  58. Ohtani,Hisashi; Miyanaga,Akiharu; Fukunaga,Takeshi; Zhang,Hongyong, Method for manufacturing a semiconductor device.
    상세보기
  59. Yamazaki,Shunpei; Yamaguchi,Naoaki; Nakajima,Setsuo, Method for manufacturing a semiconductor device.
    상세보기
  60. Yasuhiko Takemura JP, Method for manufacturing a semiconductor device.
    상세보기
  61. Zhang, Hongyong; Uochi, Hideki; Takayama, Toru; Fukunaga, Takeshi; Takemura, Yasuhiko, Method for manufacturing a thin film transistor device.
    상세보기
  62. Azami, Munehiro; Kokubo, Chiho; Shiga, Aiko; Isobe, Atsuo; Shibata, Hiroshi; Yamazaki, Shunpei, Method for manufacturing semiconductor device.
    상세보기
  63. Azami, Munehiro; Kokubo, Chiho; Shiga, Aiko; Isobe, Atsuo; Shibata, Hiroshi; Yamazaki, Shunpei, Method for manufacturing semiconductor device.
    상세보기
  64. Azami,Munehiro; Kokubo,Chiho; Shiga,Aiko; Isobe,Atsuo; Shibata,Hiroshi; Yamazaki,Shunpei, Method for manufacturing semiconductor device.
    상세보기
  65. Ohtani, Hisashi; Miyanaga, Akiharu; Teramoto, Satoshi; Yamazaki, Shunpei, Method for manufacturing semiconductor device.
    상세보기
  66. Ohtani, Hisashi; Miyanaga, Akiharu; Teramoto, Satoshi; Yamazaki, Shunpei, Method for manufacturing semiconductor device.
    상세보기
  67. Tanaka, Koichiro; Ohnuma, Hideto, Method for manufacturing transistor semiconductor devices with step of annealing to getter metal with phosphorous.
    상세보기
  68. Stokes, Casey D.; Simison, Kelby; Storey, Robson F.; Harrison, James J., Method for preparing polyolefins containing a high percentage of exo-olefin chain ends.
    상세보기
  69. Stokes,Casey D.; Storey,Robson F., Method for preparing polyolefins containing vinylidene end groups using azole compounds.
    상세보기
  70. Stokes, Casey D.; Storey, Robson F., Method for preparing polyolefins containing vinylidine end groups using nonaromatic heterocyclic compounds.
    상세보기
  71. Stokes, Casey D., Method for preparing polyolefins containing vinylidine end groups using polymeric nitrogen compounds.
    상세보기
  72. Ohtani Hisashi,JPX, Method for producing a semiconductor device.
    상세보기
  73. Hongyong Zhang JP; Yasuhiko Takemura JP; Toru Takayama JP, Method for producing semiconductor device.
    상세보기
  74. Nakajima Setsuo,JPX ; Yamazaki Shunpei,JPX ; Kusumoto Naoto,JPX ; Teramoto Satoshi,JPX, Method for producing semiconductor device.
    상세보기
  75. Nakajima Setsuo,JPX ; Yamazaki Shunpei,JPX ; Kusumoto Naoto,JPX ; Teramoto Satoshi,JPX, Method for producing semiconductor device.
    상세보기
  76. Nakajima Setsuo,JPX ; Yamazaki Shunpei,JPX ; Kusumoto Naoto,JPX ; Teramoto Satoshi,JPX, Method for producing semiconductor device.
    상세보기
  77. Nakajima,Setsuo; Yamazaki,Shunpei; Kusumoto,Naoto; Teramoto,Satoshi, Method for producing semiconductor device.
    상세보기
  78. Ohtani Hisashi,JPX ; Fukunaga Takeshi,JPX ; Miyanaga Akiharu,JPX, Method for producing semiconductor device.
    상세보기
  79. Setsuo Nakajima JP; Shunpei Yamazaki JP; Naoto Kusumoto JP; Satoshi Teramoto JP, Method for producing semiconductor device.
    상세보기
  80. Yamazaki Shunpei,JPX ; Ohtani Hisashi,JPX ; Ohnuma Hideto,JPX, Method for producing semiconductor device.
    상세보기
  81. Yamazaki, Shunpei; Kusumoto, Naoto; Teramoto, Satoshi, Method for producing semiconductor device.
    상세보기
  82. Yamazaki, Shunpei; Ohtani, Hisashi; Ohnuma, Hideto, Method for producing semiconductor device.
    상세보기
  83. Zhang Hongyong,JPX ; Takayama Toru,JPX ; Takemura Yasuhiko,JPX, Method for producing semiconductor device.
    상세보기
  84. Zhang Hongyong,JPX ; Takayama Toru,JPX ; Takemura Yasuhiko,JPX, Method for producing semiconductor device.
    상세보기
  85. Zhang Hongyong,JPX ; Takemura Yasuhiko,JPX ; Takayama Toru,JPX, Method for producing semiconductor device.
    상세보기
  86. Zhang, Hongyong; Takemura, Yasuhiko; Takayama, Toru, Method for producing semiconductor device.
    상세보기
  87. Jang, Jin; Yoon, Soo-Young; Oh, Jae-Young; Shon, Woo-Sung; Park, Seong-Jin, Method of crystallizing amorphous silicon layer and crystallizing apparatus thereof.
    상세보기
  88. Choi, Duck-Kyun, Method of crystallizing amorphous silicon thin film and method of fabricating polysilicon thin film transistor using the crystallization method.
    상세보기
  89. Jang Jin,KRX ; Yoon Soo-Young,KRX ; Oh Jae-Young,KRX, Method of crystallizing an amorphous film.
    상세보기
  90. Jang Jin,KRX ; Yoon Soo Young,KRX ; Kim Hyun Churl,KRX, Method of crystallizing an amorphous silicon layer.
    상세보기
  91. Kim,Heon je, Method of crystallizing silicon film and method of manufacturing thin film transistor liquid crystal display.
    상세보기
  92. Zhang Hongyong,JPX ; Ohnuma Hideto,JPX ; Takemura Yasuhiko,JPX, Method of crystallizing thin films when manufacturing semiconductor devices.
    상세보기
  93. Yasuhiko Takemura JP, Method of fabricating a semiconductor device.
    상세보기
  94. Fukunaga,Takeshi; Ohtani,Hisashi; Miyanaga,Akiharu, Method of fabricating a semiconductor device utilizing a catalyst material solution.
    상세보기
  95. Kokubo,Chiho; Shiga,Aiko; Tanada,Yoshifumi; Yamazaki,Shunpei, Method of fabricating a semiconductor device utilizing crystallization of semiconductor region with laser beam.
    상세보기
  96. Zhang Hongyong,JPX ; Teramoto Satoshi,JPX, Method of fabricating a thin film transistor.
    상세보기
  97. Zhang, Hongyong; Teramoto, Satoshi, Method of fabricating a thin film transistor.
    상세보기
  98. Aya, Yoichiro; Noguchi, Yukihiro; Ide, Daisuke; Sotani, Naoya, Method of fabricating a thin film transistor using electromagnetic wave heating of an amorphous semiconductor film.
    상세보기
  99. So,Woo Young, Method of fabricating a thin film transistor with multiple gates using metal induced lateral crystallization.
    상세보기
  100. So,Woo Young, Method of fabricating a thin film transistor with multiple gates using metal induced lateral crystallization.
    상세보기
  101. Nakajima,Setsuo; Ohtani,Hisashi, Method of fabricating semiconductor device.
    상세보기
  102. Yamazaki Shunpei,JPX ; Kusumoto Naoto,JPX ; Teramoto Satoshi,JPX, Method of fabricating semiconductor device.
    상세보기
  103. Joo Seung-Ki,KRX ; Kim Tae-Kyung,KRX, Method of fabricating thin film transistor.
    상세보기
  104. Joo, Seung-Ki; Kim, Tae-Kyung, Method of fabricating thin film transistor.
    상세보기
  105. So,Woo Young, Method of fabricating thin film transistor with multiple gates using super grain silicon crystallization.
    상세보기
  106. Nakajima, Setsuo; Ohtani, Hisashi, Method of forming a semiconductor device using a group XV element for gettering by means of infrared light.
    상세보기
  107. Ohtani, Hisashi, Method of forming crystalline silicon film.
    상세보기
  108. Zhang, Hongyong; Uochi, Hideki; Miyanaga, Akira; Ohtani, Hisashi, Method of forming semiconductor device by crystallizing amorphous silicon and forming crystallization promoting material in the same chamber.
    상세보기
  109. Shunpei Yamazaki JP; Mitsunori Sakama JP; Yasuhiko Takemura JP, Method of making crystal silicon semiconductor and thin film transistor.
    상세보기
  110. Hisashi Ohtani JP; Akiharu Miyanaga JP; Junichi Takeyama JP, Method of manufacturing a semiconductor device.
    상세보기
  111. Isobe,Atsuo; Arao,Tatsuya, Method of manufacturing a semiconductor device.
    상세보기
  112. Ohnuma, Hideto; Yamazaki, Shunpei; Nakajima, Setsuo; Ohtani, Hisashi, Method of manufacturing a semiconductor device.
    상세보기
  113. Yamazaki Shunpei,JPX, Method of manufacturing a semiconductor device.
    상세보기
  114. Yamazaki Shunpei,JPX ; Ohtani Hisashi,JPX ; Hamatani Toshiji,JPX, Method of manufacturing a semiconductor device.
    상세보기
  115. Yamazaki, Shunpei; Nakamura, Osama; Kajiwara, Masayuki; Koezuka, Junichi; Dairiki, Koji; Mitsuki, Toru; Takayama, Toru; Ohnuma, Hideto; Asami, Taketomi; Ichijo, Mitsuhiro, Method of manufacturing a semiconductor device.
    상세보기
  116. Yamazaki, Shunpei; Nakamura, Osamu; Kajiwara, Masayuki; Koezuka, Junichi; Dairiki, Koji; Mitsuki, Toru; Takayama, Toru; Ohnuma, Hideto; Asami, Taketomi; Ichijo, Mitsuhiro, Method of manufacturing a semiconductor device.
    상세보기
  117. Yamazaki,Shunpei; Nakamura,Osamu; Kajiwara,Masayuki; Koezuka,Junichi; Dairiki,Koji; Mitsuki,Toru; Takayama,Toru; Ohnuma,Hideto; Asami,Taketomi; Ichijo,Mitsuhiro, Method of manufacturing a semiconductor device.
    상세보기
  118. Yamazaki,Shunpei; Nakamura,Osamu; Kajiwara,Masayuki; Koezuka,Junichi; Dairiki,Koji; Mitsuki,Toru; Takayama,Toru; Ohnuma,Hideto; Asami,Taketomi; Ichijo,Mitsuhiro, Method of manufacturing a semiconductor device.
    상세보기
  119. Yamazaki,Shunpei; Ohnuma,Hideto; Dairiki,Koji; Mitsuki,Toru; Takayama,Toru; Akimoto,Kengo, Method of manufacturing a semiconductor device.
    상세보기
  120. Yamazaki,Shunpei; Ohtani,Hisashi; Hamatani,Toshiji, Method of manufacturing a semiconductor device.
    상세보기
  121. Yamazaki, Shunpei; Teramoto, Satoshi; Kusumoto, Naoto; Ohnuma, Hideto, Method of manufacturing a semiconductor device and manufacturing system thereof.
    상세보기
  122. Yamazaki, Shunpei; Teramoto, Satoshi; Kusumoto, Naoto; Ohnuma, Hideto, Method of manufacturing a semiconductor device and manufacturing system thereof.
    상세보기
  123. Hamada,Takashi; Murakami,Satoshi; Yamazaki,Shunpei; Nakamura,Osamu; Kajiwara,Masayuki; Koezuka,Junichi; Takayama,Toru, Method of manufacturing a semiconductor device comprising doping steps using gate electrodes and resists as masks.
    상세보기
  124. Mitsuki, Toru; Shichi, Takeshi; Maekawa, Shinji; Shibata, Hiroshi; Miyanaga, Akiharu, Method of manufacturing a semiconductor device having a crystallized semiconductor film.
    상세보기
  125. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Hayakawa Masahiko,JPX ; Osame Mitsuaki,JPX, Method of manufacturing a semiconductor device including reduction of a catalyst.
    상세보기
  126. Yamazaki,Shunpei; Shibata,Hiroshi; Tanaka,Koichiro; Hiroki,Masaaki; Akiba,Mai, Method of manufacturing a semiconductor device that includes patterning sub-islands.
    상세보기
  127. Isobe, Atsuo; Arao, Tatsuya, Method of manufacturing a semiconductor device, utilizing a laser beam for crystallization.
    상세보기
  128. Shunpei Yamazaki JP, Method of manufacturing a semiconductor film and method of manufacturing a semiconductor device.
    상세보기
  129. Yamazaki, Shunpei, Method of manufacturing a semiconductor film and method of manufacturing a semiconductor device.
    상세보기
  130. Yamazaki,Shunpei, Method of manufacturing a semiconductor film and method of manufacturing a semiconductor device by transferring crystallization promoting material in the first semiconductor film to the second semico.
    상세보기
  131. Zhang, Hongyong; Uochi, Hideki; Takayama, Toru; Fukunaga, Takeshi; Takemura, Yasuhiko, Method of manufacturing a thin film transistor device.
    상세보기
  132. Ohtani Hisashi,JPX, Method of manufacturing a thin film transistor involving laser treatment.
    상세보기
  133. Ohtani, Hisashi, Method of manufacturing an El display device.
    상세보기
  134. Nakamura, Osamu; Yamazaki, Shunpei; Dairiki, Koji; Kajiwara, Masayuki; Koezuka, Junichi; Murakami, Satoshi, Method of manufacturing semiconductor device.
    상세보기
  135. Nakamura, Osamu; Yamazaki, Shunpei; Dairiki, Koji; Kajiwara, Masayuki; Koezuka, Junichi; Murakami, Satoshi, Method of manufacturing semiconductor device.
    상세보기
  136. Nakamura,Osamu; Yamazaki,Shunpei; Dairiki,Koji; Kajiwara,Masayuki; Koezuka,Junichi; Murakami,Satoshi, Method of manufacturing semiconductor device.
    상세보기
  137. Ohnuma,Hideto, Method of manufacturing semiconductor device.
    상세보기
  138. Ohnuma,Hideto, Method of manufacturing semiconductor device.
    상세보기
  139. Ohtani Hisashi,JPX, Method of manufacturing semiconductor device.
    상세보기
  140. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Miyanaga Akiharu,JPX, Method of manufacturing semiconductor device.
    상세보기
  141. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Miyanaga Akiharu,JPX, Method of manufacturing semiconductor device.
    상세보기
  142. Yamazaki,Shunpei; Mitsuki,Toru, Method of manufacturing semiconductor device.
    상세보기
  143. Yamazaki, Shunpei; Nakamura, Osamu; Kajiwara, Masayuki; Koezuka, Junichi, Method of manufacturing semiconductor device and semiconductor device.
    상세보기
  144. Yamazaki,Shunpei; Nakamura,Osamu; Kajiwara,Masayuki; Koezuka,Junichi, Method of manufacturing semiconductor device that includes selectively adding a noble gas element.
    상세보기
  145. Yamazaki Shunpei,JPX, Method of manufacturing semiconductor devices using a crystallization promoting material.
    상세보기
  146. Naoto Kusumoto JP; Toru Takayama JP; Masato Yonezawa JP, Method of manufacturing silicon thin film devices using laser annealing in a hydrogen mixture gas followed by nitride formation.
    상세보기
  147. Zhang Hongyong,JPX ; Uochi Hideki,JPX ; Miyanaga Akira,JPX ; Ohtani Hisashi,JPX, Method of promoting crystallization of an amorphous semiconductor film using organic metal CVD.
    상세보기
  148. Yamazaki Shunpei,JPX ; Arai Yasuyuki,JPX, Microcrystal silicon film and its manufacturing method, and photoelectric conversion device and its manufacturing method.
    상세보기
  149. Yamazaki Shunpei,JPX, Photoelectric conversion device and method manufacturing same.
    상세보기
  150. Tsai Hsiung-Kuang,TWX ; Chen Lee-Tyng,TWX, Polysilicon TFT having exact alignment between the source/drain and the gate electrode.
    상세보기
  151. Seong Moh Seo KR, Polysilicon thin film transistor and method of manufacturing the same.
    상세보기
  152. Kuo Yue, Polysilicon thin film transistors with laser-induced solid phase crystallized polysilicon channel.
    상세보기
  153. Storey, Robson F.; Kemp, Lisa K., Preparation of exo-olefin terminated polyolefins via quenching with alkoxysilanes or ethers.
    상세보기
  154. Zhang Hongyong,JPX ; Uochi Hideki,JPX ; Takayama Toru,JPX ; Yamazaki Shunpei,JPX ; Takemura Yasuhiko,JPX, Process for fabricating a thin film transistor semiconductor device.
    상세보기
  155. Yamazaki,Shunpei; Ohtani,Hisashi; Mitsuki,Toru; Ohnuma,Hideto; Takano,Tamae; Kasahara,Kenji; Dairiki,Koji, Process for manufacturing a semiconductor device.
    상세보기
  156. Yamazaki,Shunpei; Ohtani,Hisashi; Mitsuki,Toru; Ohnuma,Hideto; Takano,Tamae; Kasahara,Kenji; Dairiki,Koji, Process for manufacturing a semiconductor device.
    상세보기
  157. Tsai Hsiung-Kuang (Taipei TWX) Chen Lee-Tyng (Hsirn TWX), Process for polysilicon thin film transistors using backside irradiation and plasma doping.
    상세보기
  158. Yamazaki,Shunpei; Arai,Yasuyuki, Process for producing a photoelectric conversion device that includes using a gettering process.
    상세보기
  159. Stokes, Casey D., Production of vinylidene-terminated and sulfide-terminated telechelic polyolefins via quenching with disulfides.
    상세보기
  160. Stokes, Casey D., Production of vinylidene-terminated and sulfide-terminated telechelic polyolefins via quenching with disulfides.
    상세보기
  161. Stokes, Casey D., Production of vinylidene-terminated and sulfide-terminated telechelic polyolefins via quenching with disulfides.
    상세보기
  162. Stokes, Casey D., Production of vinylidene-terminated and sulfide-terminated telechelic polyolefins via quenching with disulfides.
    상세보기
  163. Stokes, Casey D., Production of vinylidene-terminated polyolefins via quenching with monosulfides.
    상세보기
  164. Miyanaga, Akiharu; Mukao, Kyouichi, Program for controlling laser apparatus and recording medium for recording program for controlling laser apparatus and capable of being read out by computer.
    상세보기
  165. Miyanaga, Akiharu; Mukao, Kyouichi, Program for controlling laser apparatus and recording medium for recording program for controlling laser apparatus and capable of being read out by computer.
    상세보기
  166. Miyanaga,Akiharu; Mukao,Kyouichi, Program for controlling laser apparatus and recording medium for recording program for controlling laser apparatus and capable of being read out by computer.
    상세보기
  167. Maekawa Masashi ; Maa Jer-shen, Rapid thermal annealing with absorptive layers for thin film transistors on transparent substrates.
    상세보기
  168. Maekawa Masashi ; Nakata Yukihiko, Selected site, metal-induced, continuous crystallization method.
    상세보기
  169. Maekawa Masashi, Selective silicide thin-film transistor and method for same.
    상세보기
  170. Maekawa Masashi, Selective silicide thin-film transistor having polysilicon active layers with crystallizing metal agent introduced only in the source/drain regions.
    상세보기
  171. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki; Ohtani, Hisashi; Hamatani, Toshiji, Semiconductor active region of TFTs having radial crystal grains through the whole area of the region.
    상세보기
  172. Hongyong Zhang JP; Hideki Uochi JP; Toru Takayama JP; Shunpei Yamazaki JP; Yasuhiko Takemura JP, Semiconductor and process for fabricating the same.
    상세보기
  173. Zhang Hongyong,JPX ; Uochi Hideki,JPX ; Takayama Toru,JPX ; Yamazaki Shunpei,JPX ; Takemura Yasuhiko,JPX, Semiconductor and process for fabricating the same.
    상세보기
  174. Zhang, Hongyong; Takayama, Toru; Takemura, Yasuhiko, Semiconductor circuit and method of fabricating the same.
    상세보기
  175. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX, Semiconductor circuit for electro-optical device and method of manufacturing the same.
    상세보기
  176. Shunpei Yamazaki JP, Semiconductor device.
    상세보기
  177. Shunpei Yamazaki JP, Semiconductor device.
    상세보기
  178. Yamazaki, Shunpei, Semiconductor device.
    상세보기
  179. Yamazaki, Shunpei; Yamaguchi, Naoaki; Nakajima, Setsuo, Semiconductor device.
    상세보기
  180. Yamazaki,Shunpei, Semiconductor device.
    상세보기
  181. Yamazaki,Shunpei, Semiconductor device.
    상세보기
  182. Yamazaki Shunpei,JPX ; Miyanaga Akiharu,JPX ; Teramoto Satoshi,JPX, Semiconductor device and a method of manufacturing the same.
    상세보기
  183. Hisashi Ohtani JP; Tamae Takano JP; Chiho Kokubo JP, Semiconductor device and fabricating method thereof.
    상세보기
  184. Hongyong Zhang JP; Hideto Ohnuma JP, Semiconductor device and fabrication method thereof.
    상세보기
  185. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Hayakawa Masahiko,JPX ; Osame Mitsuaki,JPX, Semiconductor device and fabrication method thereof.
    상세보기
  186. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Hayakawa Masahiko,JPX ; Osame Mitsuaki,JPX, Semiconductor device and fabrication method thereof.
    상세보기
  187. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki, Semiconductor device and fabrication method thereof.
    상세보기
  188. Zhang Hongyong,JPX ; Ohnuma Hideto,JPX, Semiconductor device and fabrication method thereof.
    상세보기
  189. Zhang, Hongyong; Ohnuma, Hideto, Semiconductor device and fabrication method thereof.
    상세보기
  190. Shunpei Yamazaki JP, Semiconductor device and its manufacturing method.
    상세보기
  191. Shunpei Yamazaki JP; Satoshi Teramoto JP; Jun Koyama JP; Yasushi Ogata JP; Masahiko Hayakawa JP; Mitsuaki Osame JP; Hisashi Ohtani JP; Toshiji Hamatani JP, Semiconductor device and its manufacturing method.
    상세보기
  192. Yamazaki Shunpei,JPX, Semiconductor device and its manufacturing method.
    상세보기
  193. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki; Ohtani, Hisashi; Hamatani, Toshiji, Semiconductor device and its manufacturing method.
    상세보기
  194. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki; Ohtani, Hisashi; Hamatani, Toshiji, Semiconductor device and its manufacturing method.
    상세보기
  195. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki; Ohtani,Hisashi; Hamatani,Toshiji, Semiconductor device and its manufacturing method.
    상세보기
  196. Nakamura, Osamu; Kajiwara, Masayuki; Yamazaki, Shunpei; Ohnuma, Hideto, Semiconductor device and manufacturing method of the same.
    상세보기
  197. Nakamura,Osamu; Kajiwara,Masayuki; Yamazaki,Shunpei; Ohnuma,Hideto, Semiconductor device and manufacturing method of the same.
    상세보기
  198. Kokubo, Chiho; Shiga, Aiko; Tanada, Yoshifumi; Yamazaki, Shunpei, Semiconductor device and manufacturing method therefor.
    상세보기
  199. Shunpei Yamazaki JP; Hisashi Ohtani JP; Hideto Ohnuma JP; Satoshi Teramoto JP, Semiconductor device and manufacturing method thereof.
    상세보기
  200. Suzawa, Hideomi; Kusuyama, Yoshihiro, Semiconductor device and manufacturing method thereof.
    상세보기
  201. Suzawa, Hideomi; Kusuyama, Yoshihiro, Semiconductor device and manufacturing method thereof.
    상세보기
  202. Tanaka, Koichiro; Ohnuma, Hideto, Semiconductor device and manufacturing method thereof.
    상세보기
  203. Yamazaki, Shunpei; Kusumoto, Naoto; Ohnuma, Hideto; Tanaka, Koichiro, Semiconductor device and manufacturing method thereof.
    상세보기
  204. Yamazaki, Shunpei; Kusumoto, Naoto; Ohnuma, Hideto; Tanaka, Koichiro, Semiconductor device and manufacturing method thereof.
    상세보기
  205. Yamazaki,Shunpei; Kusumoto,Naoto; Ohnuma,Hideto; Tanaka,Koichiro, Semiconductor device and manufacturing method thereof.
    상세보기
  206. Zhang, Hongyong, Semiconductor device and manufacturing method thereof.
    상세보기
  207. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Hayakawa Masahiko,JPX ; Osame Mitsuaki,JPX ; Ohtani Hisashi,JPX ; Hamatani Toshiji,JPX, Semiconductor device and method for fabricating the same.
    상세보기
  208. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki; Ohtani, Hisashi; Hamatani, Toshiji, Semiconductor device and method for fabricating the same.
    상세보기
  209. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki; Ohtani, Hisashi; Hamatani, Toshiji, Semiconductor device and method for fabricating the same.
    상세보기
  210. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki; Ohtani,Hisashi; Hamatani,Toshiji, Semiconductor device and method for fabricating the same.
    상세보기
  211. Yamazaki Shunpei,JPX ; Zhang Hongyong,JPX, Semiconductor device and method for forming the same.
    상세보기
  212. Yamazaki,Shunpei; Zhang,Hongyong, Semiconductor device and method for forming the same.
    상세보기
  213. Yamazaki,Shunpei; Zhang,Hongyong, Semiconductor device and method for forming the same.
    상세보기
  214. Adachi Hiroki,JPX ; Takenouchi Akira,JPX ; Fukada Takeshi,JPX ; Uehara Hiroshi,JPX ; Takemura Yasuhiko,JPX, Semiconductor device and method for manufacturing the same.
    상세보기
  215. Adachi Hiroki,JPX ; Takenouchi Akira,JPX ; Fukada Takeshi,JPX ; Uehara Hiroshi,JPX ; Takemura Yasuhiko,JPX, Semiconductor device and method for manufacturing the same.
    상세보기
  216. Hiroki Adachi JP; Akira Takenouchi JP; Takeshi Fukada JP; Hiroshi Uehara JP; Yasuhiko Takemura JP, Semiconductor device and method for manufacturing the same.
    상세보기
  217. Hongyong Zhang JP; Hideki Uochi JP; Toru Takayama JP; Takeshi Fukunaga JP; Yasuhiko Takemura JP, Semiconductor device and method for manufacturing the same.
    상세보기
  218. Miyanaga, Akiharu; Ohtani, Hisashi; Takemura, Yasuhiko, Semiconductor device and method for manufacturing the same.
    상세보기
  219. Miyanaga, Akiharu; Ohtani, Hisashi; Takemura, Yasuhiko, Semiconductor device and method for manufacturing the same.
    상세보기
  220. Miyanaga,Akiharu; Ohtani,Hisashi; Takemura,Yasuhiko, Semiconductor device and method for manufacturing the same.
    상세보기
  221. Nakamura,Osamu; Kajiwara,Masayuki; Koezuka,Junichi; Yamazaki,Shunpei; Kuwabara,Hideaki, Semiconductor device and method for manufacturing the same.
    상세보기
  222. Takemura Yasuhiko,JPX, Semiconductor device and method for manufacturing the same.
    상세보기
  223. Takemura, Yasuhiko, Semiconductor device and method for manufacturing the same.
    상세보기
  224. Takemura, Yasuhiko, Semiconductor device and method for manufacturing the same.
    상세보기
  225. Takemura,Yasuhiko, Semiconductor device and method for manufacturing the same.
    상세보기
  226. Takemura,Yasuhiro, Semiconductor device and method for manufacturing the same.
    상세보기
  227. Zhang Hongyong,JPX ; Uochi Hideki,JPX ; Takayama Toru,JPX ; Fukunaga Takeshi,JPX ; Takemura Yasuhiko,JPX, Semiconductor device and method for manufacturing the same.
    상세보기
  228. Zhang, Hongyong; Uochi, Hideki; Takayama, Toru; Fukunaga, Takeshi; Takemura, Yasuhiko, Semiconductor device and method for manufacturing the same.
    상세보기
  229. Zhang, Hongyong; Uochi, Hideki; Takayama, Toru; Fukunaga, Takeshi; Takemura, Yasuhiko, Semiconductor device and method for manufacturing the same.
    상세보기
  230. Yamazaki, Shunpei; Yamaguchi, Naoaki; Nakajima, Setsuo, Semiconductor device and method for producing it.
    상세보기
  231. Yamazaki Shunpei,JPX ; Ohtani Hisashi,JPX ; Miyanaga Akiharu,JPX ; Teramoto Satoshi,JPX, Semiconductor device and method for producing the same.
    상세보기
  232. Yamazaki Shunpei,JPX ; Ohtani Hisashi,JPX ; Miyanaga Akiharu,JPX ; Teramoto Satoshi,JPX, Semiconductor device and method for producing the same.
    상세보기
  233. Yamazaki, Shunpei; Kusumoto, Naoto; Tanaka, Koichiro, Semiconductor device and method for producing the same.
    상세보기
  234. Yamazaki Shunpei,JPX, Semiconductor device and method of fabricating same.
    상세보기
  235. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki; Ohtani, Hisashi; Hamatani, Toshiji, Semiconductor device and method of fabricating same.
    상세보기
  236. Yamazaki,Shunpei, Semiconductor device and method of fabricating same.
    상세보기
  237. Yamazaki,Shunpei, Semiconductor device and method of fabricating same.
    상세보기
  238. Yamazaki,Shunpei, Semiconductor device and method of fabricating same.
    상세보기
  239. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki; Ohtani,Hisashi; Hamatani,Toshiji, Semiconductor device and method of fabricating same.
    상세보기
  240. Shunpei Yamazaki JP; Yasuhiko Takemura JP; Hongyong Zhang JP, Semiconductor device and method of fabricating the same.
    상세보기
  241. Takemura, Yasuhiko, Semiconductor device and method of fabricating the same.
    상세보기
  242. Takemura,Yasuhiko, Semiconductor device and method of fabricating the same.
    상세보기
  243. Yamazaki Shunpei,JPX ; Takemura Yasuhiko,JPX ; Zhang Hongyong,JPX, Semiconductor device and method of fabricating the same.
    상세보기
  244. Yamazaki Shunpei,JPX ; Takemura Yasuhiko,JPX ; Zhang Hongyong,JPX, Semiconductor device and method of fabricating the same.
    상세보기
  245. Yamazaki Shunpei,JPX ; Zhang Hongyong,JPX ; Takemura Yasuhiko,JPX, Semiconductor device and method of fabricating the same.
    상세보기
  246. Hamada, Takashi; Murakami, Satoshi; Yamazaki, Shunpei; Nakamura, Osamu; Kajiwara, Masayuki; Koezuka, Junichi; Takayama, Toru, Semiconductor device and method of manufacturing the same.
    상세보기
  247. Hamada,Takashi; Murakami,Satoshi; Yamazaki,Shunpei; Nakamura,Osamu; Kajiwara,Masayuki; Koezuka,Junichi; Takayama,Toru, Semiconductor device and method of manufacturing the same.
    상세보기
  248. Miyanaga, Akiharu; Ohtani, Hisashi; Takemura, Yasuhiko, Semiconductor device and method of manufacturing the same.
    상세보기
  249. Shunpei Yamazaki JP, Semiconductor device and method of manufacturing the same.
    상세보기
  250. Yamazaki, Shunpei, Semiconductor device and method of manufacturing the same.
    상세보기
  251. Zhang Hongyong,JPX, Semiconductor device and method of manufacturing the same.
    상세보기
  252. Zhang Hongyong,JPX, Semiconductor device and method of manufacturing the same.
    상세보기
  253. Zhang, Hongyong, Semiconductor device and method of manufacturing the same.
    상세보기
  254. Zhang,Hongyong, Semiconductor device and method of manufacturing the same.
    상세보기
  255. Zhang, Hongyong; Ohnuma, Hideto; Takemura, Yasuhiko, Semiconductor device and process for fabricating the same.
    상세보기
  256. Zhang,Hongyong; Ohnuma,Hideto; Takemura,Yasuhiko, Semiconductor device and process for fabricating the same.
    상세보기
  257. Shunpei Yamazaki JP; Naoaki Yamaguchi JP; Setsuo Nakajima JP, Semiconductor device comprising a bottom gate type thin film transistor.
    상세보기
  258. Ohtani, Hisashi; Adachi, Hiroki; Miyanaga, Akiharu; Takayama, Toru, Semiconductor device comprising first insulating film, second insulating film comprising organic resin on the first insulating film, and pixel electrode over the second insulating film.
    상세보기
  259. Hongyong Zhang JP; Toru Takayama JP; Yasuhiko Takemura JP; Akiharu Miyanaga JP; Hisashi Ohtani JP, Semiconductor device forming method.
    상세보기
  260. Zhang Hongyong,JPX ; Takayama Toru,JPX ; Takemura Yasuhiko,JPX ; Miyanaga Akiharu,JPX ; Ohtani Hisashi,JPX, Semiconductor device forming method.
    상세보기
  261. Zhang,Hongyong; Takayama,Toru; Takemura,Yasuhiko; Miyanaga,Akiharu; Ohtani,Hisashi, Semiconductor device forming method.
    상세보기
  262. Yamazaki Shunpei,JPX ; Takemura Yasuhiko,JPX ; Zhang Hongyong,JPX ; Takayama Toru,JPX ; Uochi Hideki,JPX, Semiconductor device having a catalyst enhanced crystallized layer.
    상세보기
  263. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki; Ohtani,Hisashi; Hamatani,Toshiji, Semiconductor device having a crystalline semiconductor film.
    상세보기
  264. Takemura Yasuhiko (Kanagawa JPX), Semiconductor device having a crystallized silicon thin film in which the crystallization direction is oriented either v.
    상세보기
  265. Zhang, Hongyong; Takayama, Toru, Semiconductor device having channel formation region comprising silicon and containing a group IV element.
    상세보기
  266. Zhang Hongyong,JPX, Semiconductor device having improved crystal orientation.
    상세보기
  267. Zhang Hongyong,JPX, Semiconductor device having improved crystal orientation.
    상세보기
  268. Yamazaki, Shunpei; Adachi, Hiroki; Kuwabara, Hideaki, Semiconductor device having semiconductor circuit comprising semiconductor element, and method for manufacturing same.
    상세보기
  269. Kousai Takamasa,JPX ; Makita Naoki,JPX ; Takayama Toru,JPX, Semiconductor device method for producing the same and liquid crystal display including the same.
    상세보기
  270. Ohtani, Hisashi; Takano, Tamae; Kokubo, Chiho, Semiconductor device method of manufacturing.
    상세보기
  271. Zhang,Hongyong; Takayama,Toru; Takemura,Yasuhiko; Miyanaga,Akiharu; Ohtani,Hisashi, Semiconductor device structure.
    상세보기
  272. Yamazaki, Shunpei, Semiconductor device with heat-resistant gate.
    상세보기
  273. Yamazaki,Shunpei; Ohtani,Hisashi; Hiroki,Masaaki; Tanaka,Koichiro; Shiga,Aiko; Akiba,Mai, Semiconductor fabricating apparatus.
    상세보기
  274. Yamazaki, Shunpei; Koyama, Jun; Miyanaga, Akiharu; Fukunaga, Takeshi, Semiconductor thin film and method of manufacturing the same and semiconductor device and method of manufacturing the same.
    상세보기
  275. Yamazaki, Shunpei; Koyama, Jun; Miyanaga, Akiharu; Fukunaga, Takeshi, Semiconductor thin film and method of manufacturing the same and semiconductor device and method of manufacturing the same.
    상세보기
  276. Yamazaki,Shunpei; Koyama,Jun; Miyanaga,Akiharu; Fukunaga,Takeshi, Semiconductor thin film and method of manufacturing the same and semiconductor device and method of manufacturing the same.
    상세보기
  277. Ohtani Hisashi,JPX ; Yamazaki Shunpei,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Miyanaga Akiharu,JPX, Semiconductor thin film and semiconductor device.
    상세보기
  278. Shunpei Yamazaki JP; Hisashi Ohtani JP; Toru Mitsuki JP; Akiharu Miyanaga JP; Yasushi Ogata JP, Semiconductor thin film and semiconductor device.
    상세보기
  279. Yamazaki Shunpei,JPX ; Ohtani Hisashi,JPX ; Mitsuki Toru,JPX ; Miyanaga Akiharu,JPX ; Ogata Yasushi,JPX, Semiconductor thin film and semiconductor device.
    상세보기
  280. Yamazaki, Shunpei; Ohtani, Hisashi; Mitsuki, Toru; Miyanaga, Akiharu; Ogata, Yasushi, Semiconductor thin film and semiconductor device.
    상세보기
  281. Yamazaki, Shunpei; Ohtani, Hisashi; Mitsuki, Toru; Miyanaga, Akiharu; Ogata, Yasushi, Semiconductor thin film and semiconductor device.
    상세보기
  282. Yamazaki, Shunpei; Ohtani, Hisashi; Mitsuki, Toru; Miyanaga, Akiharu; Ogata, Yasushi, Semiconductor thin film and semiconductor device.
    상세보기
  283. Yamazaki,Shunpei; Ohtani,Hisashi; Mitsuki,Toru; Miyanaga,Akiharu; Ogata,Yasushi, Semiconductor thin film and semiconductor device.
    상세보기
  284. Hisashi Ohtani JP; Akiharu Miyanaga JP; Takeshi Fukunaga JP; Hongyong Zhang JP, Semiconductor thin film transistor with crystal orientation.
    상세보기
  285. Yamazaki Shunpei,JPX ; Koyama Jun,JPX ; Miyanaga Akiharu,JPX ; Fukunaga Takeshi,JPX, Semiconductor thin film, semiconductor device and manufacturing method thereof.
    상세보기
  286. Yamazaki,Shunpei; Koyama,Jun; Miyanaga,Akiharu; Fukunaga,Takeshi, Semiconductor thin film, semiconductor device and manufacturing method thereof.
    상세보기
  287. Yamazaki,Shunpei; Koyama,Jun; Miyanaga,Akiharu; Fukunaga,Takeshi, Semiconductor thin film, semiconductor device and manufacturing method thereof.
    상세보기
  288. Yamazaki Shunpei,JPX ; Takemura Yasuhiko,JPX ; Zhang Hongyong,JPX ; Takayama Toru,JPX ; Uochi Hideki,JPX, Semiconductor, semiconductor device, and method for fabricating the same.
    상세보기
  289. Yamazaki Shunpei,JPX ; Takemura Yasuhiko,JPX ; Zhang Hongyong,JPX ; Takayama Toru,JPX ; Uochi Hideki,JPX, Semiconductor, semiconductor device, and method for fabricating the same.
    상세보기
  290. Yamazaki,Shunpei; Takemura,Yasuhiko; Zhang,Hongyong; Takayama,Toru; Uochi,Hideki, Semiconductor, semiconductor device, and method for fabricating the same.
    상세보기
  291. Yamazaki,Shunpei; Ohtani,Hisashi; Hiroki,Masaaki; Tanaka,Koichiro; Shiga,Aiko; Akiba,Mai, Semiconductror fabricating apparatus.
    상세보기
  292. Yukihiko Nakata ; Apostolos Voutsas ; John Hartzell, Sputtered silicon target for fabrication of polysilicon thin film transistors.
    상세보기
  293. Yamazaki, Shunpei; Koyama, Jun; Ohtani, Hisashi, Thin film circuit.
    상세보기
  294. Yamazaki, Shunpei; Koyama, Jun; Ohtani, Hisashi, Thin film circuit.
    상세보기
  295. Yamazaki Shunpei,JPX ; Koyama Jun,JPX ; Ohtani Hisashi,JPX, Thin film circuit with improved carrier mobility.
    상세보기
  296. Yamazaki, Shunpei; Miyanaga, Akiharu; Koyama, Jun; Fukunaga, Takeshi, Thin film semiconductor device and its manufacturing method.
    상세보기
  297. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Hayakawa Masahiko,JPX ; Osame Mitsuaki,JPX ; Ohtani Hisashi,JPX ; Hamatani Toshiji,JPX, Thin film transistor having grain boundaries with segregated oxygen and halogen elements.
    상세보기
  298. Lee, Seok Woon; Joo, Seung Ki, Thin film transistor including polycrystalline active layer and method for fabricating the same.
    상세보기
  299. So,Woo Young, Thin film transistor with multiple gates fabricated using super grain silicon crystallization.
    상세보기
  300. So,Woo Young, Thin film transistor with multiple gates using metal induced lateral crystalization and method of fabricating the same.
    상세보기
  301. So,Woo Young, Thin film transistor with multiple gates using metal induced lateral crystallization and method of fabricating the same.
    상세보기
  302. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX, Thin film type monolithic semiconductor device.
    상세보기
  303. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX, Thin film type monolithic semiconductor device.
    상세보기
  304. Yamazaki, Shunpei; Teramoto, Satoshi, Thin film type monolithic semiconductor device.
    상세보기
  305. Zhang Hongyong,JPX ; Takayama Toru,JPX ; Takemura Yasuhiko,JPX, Thin-film transistor and fabrication method for same.
    상세보기
  306. Ohnuma Hideto,JPX ; Yamazaki Shunpei,JPX, Thin-film transistor and semiconductor device using thin-film transistors.
    상세보기
  307. Ohnuma, Hideto; Yamazaki, Shunpei, Thin-film transistor and semiconductor device using thin-film transistors.
    상세보기
  308. Zhang Hongyong,JPX ; Takayama Toru,JPX ; Takemura Yasuhiko,JPX ; Miyanaga Akiharu,JPX ; Ohtani Hisashi,JPX, Transistor and semiconductor device having columnar crystals.
    상세보기
  309. Zhang, Hongyong; Takayama, Toru; Takemura, Yasuhiko; Miyanaga, Akiharu; Ohtani, Hisashi, Transistor and semiconductor device having columnar crystals.
    상세보기
  310. Hideki Uochi JP; Yasuhiko Takemura JP, Transistor device and method of forming the same.
    상세보기
  311. Storey, Robson F.; Morgan, David L., Vinyl ether end-functionalized polyolefins.
    상세보기
  312. Storey, Robson F.; Morgan, David L., Vinyl ether end-functionalized polyolefins.
    상세보기
  313. Nanba Norihiro,JPX, Zoom lens and optical apparatus having the same.
    상세보기

관련 콘텐츠

섹션별 컨텐츠 바로가기

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

AI-Helper 아이콘
AI-Helper
안녕하세요, AI-Helper입니다. 좌측 "선택된 텍스트"에서 텍스트를 선택하여 요약, 번역, 용어설명을 실행하세요.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.

선택된 텍스트

맨위로