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Polishing pads and methods for their use 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B24B-001/00
출원번호 US-0224768 (1994-04-08)
발명자 / 주소
  • Cook Lee M. (Steelville PA) Roberts John V. H. (Newark DE) Jenkins Charles W. (Newark DE) Pillai Raj R. (Newark DE)
출원인 / 주소
  • Rodel, Inc. (Newark DE 02)
인용정보 피인용 횟수 : 273  인용 특허 : 0

초록 ▼

An improved polishing pad is provided comprising a solid uniform polymer sheet having no intrinsic ability to absorb or transport slurry particles having during use a surface texture or pattern which has both large and small flow channels present simultaneously which permit the transport of slurry a

대표청구항 ▼

An improved polishing pad comprising a solid uniform polymer sheet with no intrinsic ability to absorb or transport slurry particles, said sheet in use having a surface texture or pattern comprising both large and smell flow channels which together permit the transport of polishing slurry containing

이 특허를 인용한 특허 (273)

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