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Method of fabricating semiconductor device and method of processing substrate 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-021/84
  • H01L-021/324
출원번호 US-0282598 (1994-07-29)
우선권정보 JP-0209053 (1993-07-31); JP-0209055 (1993-07-31); JP-0256569 (1993-09-20)
발명자 / 주소
  • Adachi Hiroki (Kanagawa JPX) Goto Yuugo (Kanagawa JPX) Zhang Hongyong (Kanagawa JPX) Takayama Toru (Kanagawa JPX)
출원인 / 주소
  • Semiconductor Energy Laboratory Co., Ltd. (Kanagawa JPX 03)
인용정보 피인용 횟수 : 278  인용 특허 : 0

초록 ▼

Method of fabricating a semiconductor device. A glass substrate such as Corning 7059 is used as a substrate. A bottom film is formed. Then, the substrate is annealed above the strain point of the glass substrate. The substrate is then slowly cooled below the strain point. Thereafter, a silicon film

대표청구항 ▼

A method of fabricating a semiconductor device, comprising the steps of: forming a bottom film on a glass substrate having a strain point; thermally annealing said glass substrate at a first temperature higher than said strain point of said glass substrate after said bottom film forming step; coolin

이 특허를 인용한 특허 (278)

  1. Ohtani Hisashi,JPX ; Miyanaga Akiharu,JPX ; Fukunaga Takeshi,JPX ; Zhang Hongyong,JPX, Active Matry Display.
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  2. Yamazaki,Shunpei, Active matrix EL device with sealing structure housing the device.
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  3. Yamazaki, Shunpei, Active matrix EL device with sealing structure housing the device and the peripheral driving circuits.
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  4. Yamazaki, Shunpei, Active matrix electroluminescent device within resin sealed housing.
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  5. Yamazaki, Shunpei, Active matrix electroluminescent device within resin sealed housing.
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  6. Yamazaki,Shunpei; Ohtani,Hisashi; Takano,Tamae, Crystalline semiconductor thin film, method of fabricating the same, semiconductor device and method of fabricating the same.
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  7. Yamazaki, Shunpei; Ohtani, Hisashi; Takano, Tamae, Crystalline semiconductor thin film, method of fabricating the same, semiconductor device, and method of fabricating the same.
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  8. Yamazaki, Shunpei; Ohtani, Hisashi; Takano, Tamae, Crystalline semiconductor thin film, method of fabricating the same, semiconductor device, and method of fabricating the same.
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  9. Yamazaki, Shunpei; Ohtani, Hisashi; Takano, Tamae, Crystalline semiconductor thin film, method of fabricating the same, semiconductor device, and method of fabricating the same.
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  10. Yamazaki, Shunpei; Ohtani, Hisashi; Takano, Tamae, Crystalline semiconductor thin film, method of fabricating the same, semiconductor device, and method of fabricating the same.
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  11. Yamazaki, Shunpei; Ohtani, Hisashi; Takano, Tamae, Crystalline semiconductor thin film, method of fabricating the same, semiconductor device, and method of fabricating the same.
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  12. Yamazaki, Shunpei; Ohtani, Hisashi; Takano, Tamae, Crystalline semiconductor thin film, method of fabricating the same, semiconductor device, and method of fabricating the same.
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  13. Yamazaki,Shunpei; Ohtani,Hisashi; Takano,Tamae, Crystalline semiconductor thin film, method of fabricating the same, semiconductor device, and method of fabricating the same.
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  14. Yamazaki,Shunpei; Ohtani,Hisashi; Takano,Tamae, Crystalline semiconductor thin film, method of fabricating the same, semiconductor device, and method of fabricating the same.
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  15. Yamazaki,Shunpei; Ohtani,Hisashi; Takano,Tamae, Crystalline semiconductor thin film, method of fabricating the same, semiconductor device, and method of fabricating the same.
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  16. Yamazaki,Shunpei; Ohtani,Hisashi; Takano,Tamae, Crystalline semiconductor thin film, method of fabricating the same, semiconductor device, and method of fabricating the same.
    상세보기
  17. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Hayakawa Masahiko,JPX ; Osame Mitsuaki,JPX, Display switch with double layered gate insulation and resinous interlayer dielectric.
    상세보기
  18. Koyama, Jun; Kawasaki, Yuji, Driver circuit for an active matrix display device.
    상세보기
  19. Ohtani Hisashi,JPX ; Koyama Jun,JPX ; Yamazaki Shunpei,JPX, Electro-optical device and semiconductor circuit.
    상세보기
  20. Ohtani,Hisashi; Koyama,Jun; Yamazaki,Shunpei, Electro-optical device and semiconductor circuit.
    상세보기
  21. Ohtani,Hisashi; Koyama,Jun; Yamazaki,Shunpei, Electro-optical device and semiconductor circuit.
    상세보기
  22. Ohtani, Hisashi; Koyama, Jun; Yamazaki, Shunpei, Electro-optical device and semiconductor device.
    상세보기
  23. Ono, Koji; Suzawa, Hideomi; Arao, Tatsuya, Electroluminescence display device.
    상세보기
  24. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki, Fabrication method of semiconductor device.
    상세보기
  25. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki, Fabrication method of semiconductor device.
    상세보기
  26. Fukada Takeshi,JPX ; Sakama Mitsunori,JPX ; Teramoto Satoshi,JPX, Glass substrate assembly, semiconductor device and method of heat-treating glass substrate.
    상세보기
  27. Fukada Takeshi,JPX ; Sakama Mitsunori,JPX ; Teramoto Satoshi,JPX, Glass substrate assembly, semiconductor device and method of heat-treating glass substrate.
    상세보기
  28. Fukada, Takeshi; Sakama, Mitsunori; Teramoto, Satoshi, Glass substrate assembly, semiconductor device and method of heat-treating glass substrate.
    상세보기
  29. Fukada,Takeshi; Sakama,Mitsunori; Teramoto,Satoshi, Glass substrate assembly, semiconductor device and method of heat-treating glass substrate.
    상세보기
  30. Satoshi Teramoto JP; Hisashi Ohtani JP; Akiharu Miyanaga JP; Toshiji Hamatani JP; Shunpei Yamazaki JP, Laser processing method.
    상세보기
  31. Satoshi Teramoto JP; Hisashi Ohtani JP; Akiharu Miyanaga JP; Toshiji Hamatani JP; Shunpei Yamazaki JP, Laser processing method.
    상세보기
  32. Teramoto Satoshi,JPX ; Ohtani Hisashi,JPX ; Miyanaga Akiharu,JPX ; Hamatani Toshiji,JPX ; Yamazaki Shunpei,JPX, Laser processing method.
    상세보기
  33. Teramoto, Satoshi; Ohtani, Hisashi; Miyanaga, Akiharu; Hamatani, Toshiji; Yamazaki, Shunpei, Laser processing method.
    상세보기
  34. Terakado, Masatomo; Kaneko, Toshiki; Takahashi, Takuya; Chahara, Kenichi; Onisawa, Kenichi, Liquid crystal display with nitrided insulating substrate for TFT.
    상세보기
  35. Yamazaki, Shunpei; Arai, Yasuyuki, Manufacturing method for top-gate type and bottom-gate type thin film transistors.
    상세보기
  36. Yamazaki, Shunpei, Manufacturing method of semiconductor substrate and manufacturing method of semiconductor device.
    상세보기
  37. Ikeda, Hisao; Ibe, Takahiro; Koezuka, Junichi; Kato, Kaoru, Memory device and semiconductor device.
    상세보기
  38. Ohtani, Hisashi, Metal-gettering method used in the manufacture of crystalline-Si TFT.
    상세보기
  39. Yamazaki, Shunpei; Tanaka, Koichiro, Method and apparatus for producing semiconductor device.
    상세보기
  40. Yamazaki, Shunpei; Tanaka, Koichiro, Method and apparatus for producing semiconductor device.
    상세보기
  41. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Miyanaga Akiharu,JPX, Method and manufacturing semiconductor device.
    상세보기
  42. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Hayakawa Masahiko,JPX ; Osame Mitsuaki,JPX, Method for fabricating a semiconductor device.
    상세보기
  43. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki, Method for fabricating a semiconductor device.
    상세보기
  44. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki, Method for fabricating a semiconductor device.
    상세보기
  45. Shunpei Yamazaki JP; Satoshi Teramoto JP; Jun Koyama JP; Yasushi Ogata JP; Masahiko Hayakawa JP; Mitsuaki Osame JP, Method for fabricating a semiconductor device using a metal catalyst and high temperature crystallization.
    상세보기
  46. Choi, Duck-Kyun, Method for fabricating a thin film transistor.
    상세보기
  47. Kim, Hoon, Method for fabricating a thin film transistor.
    상세보기
  48. Maekawa,Shinji; Akimoto,Kengo, Method for fabricating thin film transistor.
    상세보기
  49. Funai Takashi,JPX ; Makita Naoki,JPX ; Yamamoto Yoshitaka,JPX ; Miyamoto Tadayoshi,JPX ; Kousai Takamasa,JPX ; Maekawa Masashi,JPX, Method for fabricating thin film transistors.
    상세보기
  50. Zhang Hongyong,JPX ; Uochi Hideki,JPX ; Takayama Toru,JPX ; Fukunaga Takeshi,JPX ; Takemura Yasuhiko,JPX, Method for forming a semiconductor device.
    상세보기
  51. Tanabe,Hiroshi, Method for forming semiconductor films at desired positions on a substrate.
    상세보기
  52. Yamazaki Shunpei,JPX ; Komaya Jun,JPX ; Miyanaga Akiharu,JPX ; Fukunaga Takeshi,JPX, Method for forming semiconductor thin film.
    상세보기
  53. Hisashi Ohtani JP; Hiroki Adachi JP; Akiharu Miyanaga JP; Toru Takayama JP, Method for manufacturing a semiconductor device.
    상세보기
  54. Ohtani Hisashi,JPX ; Miyanaga Akiharu,JPX ; Fukunaga Takeshi,JPX ; Zhang Hongyong,JPX, Method for manufacturing a semiconductor device.
    상세보기
  55. Ohtani, Hisashi; Miyanaga, Akiharu; Fukunaga, Takeshi; Zhang, Hongyong, Method for manufacturing a semiconductor device.
    상세보기
  56. Ohtani,Hisashi; Adachi,Hiroki; Miyanaga,Akiharu; Takayama,Toru, Method for manufacturing a semiconductor device.
    상세보기
  57. Ohtani,Hisashi; Miyanaga,Akiharu; Fukunaga,Takeshi; Zhang,Hongyong, Method for manufacturing a semiconductor device.
    상세보기
  58. Yamazaki,Shunpei; Yamaguchi,Naoaki; Nakajima,Setsuo, Method for manufacturing a semiconductor device.
    상세보기
  59. Yasuhiko Takemura JP, Method for manufacturing a semiconductor device.
    상세보기
  60. Zhang, Hongyong; Uochi, Hideki; Takayama, Toru; Fukunaga, Takeshi; Takemura, Yasuhiko, Method for manufacturing a thin film transistor device.
    상세보기
  61. Yamazaki, Shunpei; Koyama, Jun; Yamamoto, Kunitaka; Konuma, Toshimitsu, Method for manufacturing an electro-optical device.
    상세보기
  62. Yamazaki, Shunpei; Koyama, Jun; Yamamoto, Kunitaka; Konuma, Toshimitsu, Method for manufacturing an electro-optical device.
    상세보기
  63. Ikeda, Hisao; Ibe, Takahiro; Koezuka, Junichi; Kato, Kaoru, Method for manufacturing memory device.
    상세보기
  64. Ohtani, Hisashi; Miyanaga, Akiharu; Teramoto, Satoshi; Yamazaki, Shunpei, Method for manufacturing semiconductor device.
    상세보기
  65. Ohtani, Hisashi; Miyanaga, Akiharu; Teramoto, Satoshi; Yamazaki, Shunpei, Method for manufacturing semiconductor device.
    상세보기
  66. Yamaguchi Naoaki,JPX, Method for manufacturing semiconductor device.
    상세보기
  67. Yamamoto Mutsuo,JPX, Method for manufacturing thin film transistor.
    상세보기
  68. Tanaka, Koichiro; Ohnuma, Hideto, Method for manufacturing transistor semiconductor devices with step of annealing to getter metal with phosphorous.
    상세보기
  69. Ohtani Hisashi,JPX, Method for producing a semiconductor device.
    상세보기
  70. Lissotschenko, Vitalij, Method for producing a solar cell, in particular a silicon thin-film solar cell.
    상세보기
  71. Hongyong Zhang JP; Yasuhiko Takemura JP; Toru Takayama JP, Method for producing semiconductor device.
    상세보기
  72. Ohtani Hisashi,JPX ; Fukunaga Takeshi,JPX ; Miyanaga Akiharu,JPX, Method for producing semiconductor device.
    상세보기
  73. Ohtani, Hisashi; Takemura, Yasuhiko; Miyanaga, Akiharu; Yamazaki, Shunpei, Method for producing semiconductor device.
    상세보기
  74. Yamazaki Shunpei,JPX ; Ohtani Hisashi,JPX ; Ohnuma Hideto,JPX, Method for producing semiconductor device.
    상세보기
  75. Yamazaki Shunpei,JPX ; Tanaka Koichiro,JPX, Method for producing semiconductor device.
    상세보기
  76. Yamazaki, Shunpei; Ohtani, Hisashi; Ohnuma, Hideto, Method for producing semiconductor device.
    상세보기
  77. Zhang Hongyong,JPX ; Takayama Toru,JPX ; Takemura Yasuhiko,JPX, Method for producing semiconductor device.
    상세보기
  78. Zhang, Hongyong; Takemura, Yasuhiko; Takayama, Toru, Method for producing semiconductor device.
    상세보기
  79. Tsai Chuang-Chuang ; Takehara Takako ; Qiu Regina ; LeGrice Yvonne ; Harshbarger William Reid ; Robertson Robert McCormick, Method of annealing large area glass substrates.
    상세보기
  80. Ohtani Hisashi,JPX ; Takemura Yasuhiko,JPX ; Miyanaga Akiharu,JPX ; Yamazaki Shunpei,JPX, Method of crystallizing a silicon film.
    상세보기
  81. Jang, Jin; Yoon, Soo-Young; Oh, Jae-Young; Shon, Woo-Sung; Park, Seong-Jin, Method of crystallizing amorphous silicon layer and crystallizing apparatus thereof.
    상세보기
  82. Jang Jin,KRX ; Yoon Soo-Young,KRX ; Oh Jae-Young,KRX, Method of crystallizing an amorphous film.
    상세보기
  83. Jang Jin,KRX ; Yoon Soo Young,KRX ; Kim Hyun Churl,KRX, Method of crystallizing an amorphous silicon layer.
    상세보기
  84. Fetter, Linus Albert; Pastalan, John Z., Method of deposition of films.
    상세보기
  85. Yasuhiko Takemura JP, Method of fabricating a semiconductor device.
    상세보기
  86. Fukunaga,Takeshi; Ohtani,Hisashi; Miyanaga,Akiharu, Method of fabricating a semiconductor device utilizing a catalyst material solution.
    상세보기
  87. Zhang Hongyong,JPX ; Teramoto Satoshi,JPX, Method of fabricating a thin film transistor.
    상세보기
  88. Zhang, Hongyong; Teramoto, Satoshi, Method of fabricating a thin film transistor.
    상세보기
  89. Nakajima,Setsuo; Ohtani,Hisashi, Method of fabricating semiconductor device.
    상세보기
  90. Yamazaki Shunpei,JPX ; Kusumoto Naoto,JPX ; Teramoto Satoshi,JPX, Method of fabricating semiconductor device.
    상세보기
  91. Zhang, Hongyong, Method of fabricating semiconductor device.
    상세보기
  92. Zhang, Hongyong, Method of fabricating semiconductor device.
    상세보기
  93. Zhang, Hongyong, Method of fabricating semiconductor device.
    상세보기
  94. Zhang, Hongyong, Method of fabricating semiconductor device.
    상세보기
  95. Nakajima, Setsuo; Ohtani, Hisashi, Method of forming a semiconductor device using a group XV element for gettering by means of infrared light.
    상세보기
  96. Ohtani, Hisashi, Method of forming crystalline silicon film.
    상세보기
  97. Fukada Takeshi (Kanagawa JPX) Sakama Mitsunori (Kanagawa JPX) Teramoto Satoshi (Kanagawa JPX), Method of heat-treating a glass substrate.
    상세보기
  98. Shunpei Yamazaki JP; Mitsunori Sakama JP; Yasuhiko Takemura JP, Method of making crystal silicon semiconductor and thin film transistor.
    상세보기
  99. Zhang,Hongyong; Ohnuma,Hideto; Yamaguchi,Naoaki; Takemura,Yasuhiko, Method of manufacturing a TFT with laser irradiation.
    상세보기
  100. Hisashi Ohtani JP; Akiharu Miyanaga JP; Junichi Takeyama JP, Method of manufacturing a semiconductor device.
    상세보기
  101. Isobe,Atsuo; Arao,Tatsuya, Method of manufacturing a semiconductor device.
    상세보기
  102. Ohnuma, Hideto; Yamazaki, Shunpei; Nakajima, Setsuo; Ohtani, Hisashi, Method of manufacturing a semiconductor device.
    상세보기
  103. Yamazaki Shunpei,JPX ; Ohtani Hisashi,JPX ; Hamatani Toshiji,JPX, Method of manufacturing a semiconductor device.
    상세보기
  104. Yamazaki, Shunpei; Nakamura, Osama; Kajiwara, Masayuki; Koezuka, Junichi; Dairiki, Koji; Mitsuki, Toru; Takayama, Toru; Ohnuma, Hideto; Asami, Taketomi; Ichijo, Mitsuhiro, Method of manufacturing a semiconductor device.
    상세보기
  105. Yamazaki, Shunpei; Nakamura, Osamu; Kajiwara, Masayuki; Koezuka, Junichi; Dairiki, Koji; Mitsuki, Toru; Takayama, Toru; Ohnuma, Hideto; Asami, Taketomi; Ichijo, Mitsuhiro, Method of manufacturing a semiconductor device.
    상세보기
  106. Yamazaki,Shunpei; Nakamura,Osamu; Kajiwara,Masayuki; Koezuka,Junichi; Dairiki,Koji; Mitsuki,Toru; Takayama,Toru; Ohnuma,Hideto; Asami,Taketomi; Ichijo,Mitsuhiro, Method of manufacturing a semiconductor device.
    상세보기
  107. Yamazaki,Shunpei; Nakamura,Osamu; Kajiwara,Masayuki; Koezuka,Junichi; Dairiki,Koji; Mitsuki,Toru; Takayama,Toru; Ohnuma,Hideto; Asami,Taketomi; Ichijo,Mitsuhiro, Method of manufacturing a semiconductor device.
    상세보기
  108. Yamazaki,Shunpei; Ohnuma,Hideto; Dairiki,Koji; Mitsuki,Toru; Takayama,Toru; Akimoto,Kengo, Method of manufacturing a semiconductor device.
    상세보기
  109. Yamazaki,Shunpei; Ohtani,Hisashi; Hamatani,Toshiji, Method of manufacturing a semiconductor device.
    상세보기
  110. Hamada,Takashi; Murakami,Satoshi; Yamazaki,Shunpei; Nakamura,Osamu; Kajiwara,Masayuki; Koezuka,Junichi; Takayama,Toru, Method of manufacturing a semiconductor device comprising doping steps using gate electrodes and resists as masks.
    상세보기
  111. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Hayakawa Masahiko,JPX ; Osame Mitsuaki,JPX, Method of manufacturing a semiconductor device including reduction of a catalyst.
    상세보기
  112. Maekawa,Shinji, Method of manufacturing a semiconductor device that includes forming a material with a high tensile stress in contact with a semiconductor film to getter impurities from the semiconductor film.
    상세보기
  113. Isobe, Atsuo; Arao, Tatsuya, Method of manufacturing a semiconductor device, utilizing a laser beam for crystallization.
    상세보기
  114. Shunpei Yamazaki JP, Method of manufacturing a semiconductor film and method of manufacturing a semiconductor device.
    상세보기
  115. Yamazaki, Shunpei, Method of manufacturing a semiconductor film and method of manufacturing a semiconductor device.
    상세보기
  116. Yamazaki,Shunpei, Method of manufacturing a semiconductor film and method of manufacturing a semiconductor device by transferring crystallization promoting material in the first semiconductor film to the second semico.
    상세보기
  117. Zhang, Hongyong; Uochi, Hideki; Takayama, Toru; Fukunaga, Takeshi; Takemura, Yasuhiko, Method of manufacturing a thin film transistor device.
    상세보기
  118. Ohtani Hisashi,JPX, Method of manufacturing a thin film transistor involving laser treatment.
    상세보기
  119. Nakamura, Osamu; Yamazaki, Shunpei; Dairiki, Koji; Kajiwara, Masayuki; Koezuka, Junichi; Murakami, Satoshi, Method of manufacturing semiconductor device.
    상세보기
  120. Nakamura, Osamu; Yamazaki, Shunpei; Dairiki, Koji; Kajiwara, Masayuki; Koezuka, Junichi; Murakami, Satoshi, Method of manufacturing semiconductor device.
    상세보기
  121. Nakamura,Osamu; Yamazaki,Shunpei; Dairiki,Koji; Kajiwara,Masayuki; Koezuka,Junichi; Murakami,Satoshi, Method of manufacturing semiconductor device.
    상세보기
  122. Ohtani Hisashi,JPX, Method of manufacturing semiconductor device.
    상세보기
  123. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Miyanaga Akiharu,JPX, Method of manufacturing semiconductor device.
    상세보기
  124. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Miyanaga Akiharu,JPX, Method of manufacturing semiconductor device.
    상세보기
  125. Yamazaki,Shunpei; Mitsuki,Toru, Method of manufacturing semiconductor device.
    상세보기
  126. Yamazaki, Shunpei; Nakamura, Osamu; Kajiwara, Masayuki; Koezuka, Junichi, Method of manufacturing semiconductor device and semiconductor device.
    상세보기
  127. Yamazaki,Shunpei; Nakamura,Osamu; Kajiwara,Masayuki; Koezuka,Junichi, Method of manufacturing semiconductor device that includes selectively adding a noble gas element.
    상세보기
  128. Koyanagi Ken-Ichi,JPX ; Kishimoto Koji,JPX, Method of manufacturing semiconductor devices having multi-level wiring structure.
    상세보기
  129. Yamazaki Shunpei,JPX, Method of manufacturing semiconductor devices using a crystallization promoting material.
    상세보기
  130. Shunpei Yamazaki JP; Hisashi Ohtani JP, Method of producing crystalline semiconductor.
    상세보기
  131. Yamazaki Shunpei,JPX ; Arai Yasuyuki,JPX, Microcrystal silicon film and its manufacturing method, and photoelectric conversion device and its manufacturing method.
    상세보기
  132. Yamazaki Shunpei,JPX, Optical processing apparatus and optical processing method.
    상세보기
  133. Yamazaki Shunpei,JPX, Photoelectric conversion device and method manufacturing same.
    상세보기
  134. Seong Moh Seo KR, Polysilicon thin film transistor and method of manufacturing the same.
    상세보기
  135. Zhang Hongyong,JPX ; Uochi Hideki,JPX ; Takayama Toru,JPX ; Yamazaki Shunpei,JPX ; Takemura Yasuhiko,JPX, Process for fabricating a thin film transistor semiconductor device.
    상세보기
  136. Yamazaki,Shunpei; Ohtani,Hisashi; Mitsuki,Toru; Ohnuma,Hideto; Takano,Tamae; Kasahara,Kenji; Dairiki,Koji, Process for manufacturing a semiconductor device.
    상세보기
  137. Yamazaki,Shunpei; Ohtani,Hisashi; Mitsuki,Toru; Ohnuma,Hideto; Takano,Tamae; Kasahara,Kenji; Dairiki,Koji, Process for manufacturing a semiconductor device.
    상세보기
  138. Yamazaki,Shunpei; Arai,Yasuyuki, Process for producing a photoelectric conversion device that includes using a gettering process.
    상세보기
  139. Koyama, Jun; Kawasaki, Yuji, Redundancy shift register circuit for driver circuit in active matrix type liquid crystal display device.
    상세보기
  140. Koyama, Jun; Kawasaki, Yuji, Redundancy shift register circuit for driver circuit in active matrix type liquid crystal display device.
    상세보기
  141. Koyama, Jun; Kawasaki, Yuji, Redundancy shift register circuit for driver circuit in active matrix type liquid crystal display device.
    상세보기
  142. Koyama,Jun; Kawasaki,Yuji, Redundancy shift register circuit for driver circuit in active matrix type liquid crystal display device.
    상세보기
  143. Kakehata, Tetsuya; Ohnuma, Hideto; Yamamoto, Yoshiaki; Makino, Kenichiro, SOI substrate and manufacturing method thereof.
    상세보기
  144. Kakehata, Tetsuya; Ohnuma, Hideto; Yamamoto, Yoshiaki; Makino, Kenichiro, SOI substrate and manufacturing method thereof.
    상세보기
  145. Kakehata, Tetsuya; Ohnuma, Hideto; Yamamoto, Yoshiaki; Makino, Kenichiro, SOI substrate and manufacturing method thereof.
    상세보기
  146. Koyama Jun,JPX ; Takemura Yasuhiko,JPX ; Hayakawa Masahiko,JPX ; Yamazaki Shunpei,JPX ; Miyanaga Akiharu,JPX ; Ohtani Hisashi,JPX, Semiconductor active matrix circuit.
    상세보기
  147. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki; Ohtani, Hisashi; Hamatani, Toshiji, Semiconductor active region of TFTs having radial crystal grains through the whole area of the region.
    상세보기
  148. Hongyong Zhang JP; Hideki Uochi JP; Toru Takayama JP; Shunpei Yamazaki JP; Yasuhiko Takemura JP, Semiconductor and process for fabricating the same.
    상세보기
  149. Zhang Hongyong,JPX ; Uochi Hideki,JPX ; Takayama Toru,JPX ; Yamazaki Shunpei,JPX ; Takemura Yasuhiko,JPX, Semiconductor and process for fabricating the same.
    상세보기
  150. Zhang, Hongyong; Takayama, Toru; Takemura, Yasuhiko, Semiconductor circuit and method of fabricating the same.
    상세보기
  151. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX, Semiconductor circuit for electro-optical device and method of manufacturing the same.
    상세보기
  152. Yamazaki, Shunpei; Yamaguchi, Naoaki; Nakajima, Setsuo, Semiconductor device.
    상세보기
  153. Yamazaki Shunpei,JPX ; Miyanaga Akiharu,JPX ; Teramoto Satoshi,JPX, Semiconductor device and a method of manufacturing the same.
    상세보기
  154. Hisashi Ohtani JP; Tamae Takano JP; Chiho Kokubo JP, Semiconductor device and fabricating method thereof.
    상세보기
  155. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Hayakawa Masahiko,JPX ; Osame Mitsuaki,JPX, Semiconductor device and fabrication method thereof.
    상세보기
  156. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Hayakawa Masahiko,JPX ; Osame Mitsuaki,JPX, Semiconductor device and fabrication method thereof.
    상세보기
  157. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki, Semiconductor device and fabrication method thereof.
    상세보기
  158. Shunpei Yamazaki JP, Semiconductor device and its manufacturing method.
    상세보기
  159. Shunpei Yamazaki JP; Satoshi Teramoto JP; Jun Koyama JP; Yasushi Ogata JP; Masahiko Hayakawa JP; Mitsuaki Osame JP; Hisashi Ohtani JP; Toshiji Hamatani JP, Semiconductor device and its manufacturing method.
    상세보기
  160. Yamazaki Shunpei,JPX, Semiconductor device and its manufacturing method.
    상세보기
  161. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki; Ohtani, Hisashi; Hamatani, Toshiji, Semiconductor device and its manufacturing method.
    상세보기
  162. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki; Ohtani, Hisashi; Hamatani, Toshiji, Semiconductor device and its manufacturing method.
    상세보기
  163. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki; Ohtani,Hisashi; Hamatani,Toshiji, Semiconductor device and its manufacturing method.
    상세보기
  164. Nakamura, Osamu; Kajiwara, Masayuki; Yamazaki, Shunpei; Ohnuma, Hideto, Semiconductor device and manufacturing method of the same.
    상세보기
  165. Nakamura,Osamu; Kajiwara,Masayuki; Yamazaki,Shunpei; Ohnuma,Hideto, Semiconductor device and manufacturing method of the same.
    상세보기
  166. Shunpei Yamazaki JP; Hisashi Ohtani JP; Hideto Ohnuma JP; Satoshi Teramoto JP, Semiconductor device and manufacturing method thereof.
    상세보기
  167. Tanaka, Koichiro; Ohnuma, Hideto, Semiconductor device and manufacturing method thereof.
    상세보기
  168. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Hayakawa Masahiko,JPX ; Osame Mitsuaki,JPX ; Ohtani Hisashi,JPX ; Hamatani Toshiji,JPX, Semiconductor device and method for fabricating the same.
    상세보기
  169. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki; Ohtani, Hisashi; Hamatani, Toshiji, Semiconductor device and method for fabricating the same.
    상세보기
  170. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki; Ohtani, Hisashi; Hamatani, Toshiji, Semiconductor device and method for fabricating the same.
    상세보기
  171. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki; Ohtani,Hisashi; Hamatani,Toshiji, Semiconductor device and method for fabricating the same.
    상세보기
  172. Zhang Hongyong,JPX ; Ohnuma Hideto,JPX ; Yamaguchi Naoaki,JPX ; Takemura Yasuhiko,JPX, Semiconductor device and method for fabricating the same.
    상세보기
  173. Zhang, Hongyong; Ohnuma, Hideto; Yamaguchi, Naoaki; Takemura, Yasuhiko, Semiconductor device and method for fabricating the same.
    상세보기
  174. Yamazaki Shunpei,JPX ; Zhang Hongyong,JPX, Semiconductor device and method for forming the same.
    상세보기
  175. Yamazaki,Shunpei; Zhang,Hongyong, Semiconductor device and method for forming the same.
    상세보기
  176. Yamazaki,Shunpei; Zhang,Hongyong, Semiconductor device and method for forming the same.
    상세보기
  177. Adachi Hiroki,JPX ; Takenouchi Akira,JPX ; Fukada Takeshi,JPX ; Uehara Hiroshi,JPX ; Takemura Yasuhiko,JPX, Semiconductor device and method for manufacturing the same.
    상세보기
  178. Adachi Hiroki,JPX ; Takenouchi Akira,JPX ; Fukada Takeshi,JPX ; Uehara Hiroshi,JPX ; Takemura Yasuhiko,JPX, Semiconductor device and method for manufacturing the same.
    상세보기
  179. Hiroki Adachi JP; Akira Takenouchi JP; Takeshi Fukada JP; Hiroshi Uehara JP; Yasuhiko Takemura JP, Semiconductor device and method for manufacturing the same.
    상세보기
  180. Hongyong Zhang JP; Hideki Uochi JP; Toru Takayama JP; Takeshi Fukunaga JP; Yasuhiko Takemura JP, Semiconductor device and method for manufacturing the same.
    상세보기
  181. Konuma Toshimitsu,JPX ; Sugawara Akira,JPX ; Uehara Yukiko,JPX ; Zhang Hongyong,JPX ; Suzuki Atsunori,JPX ; Ohnuma Hideto,JPX ; Yamaguchi Naoaki,JPX ; Suzawa Hideomi,JPX ; Uochi Hideki,JPX ; Takemura, Semiconductor device and method for manufacturing the same.
    상세보기
  182. Konuma, Toshimitsu; Sugawara, Akira; Uehara, Yukiko; Zhang, Hongyong; Suzuki, Atsunori; Ohnuma, Hideto; Yamaguchi, Naoaki; Suzawa, Hideomi; Uochi, Hideki; Takemura, Yasuhiko, Semiconductor device and method for manufacturing the same.
    상세보기
  183. Konuma, Toshimitsu; Sugawara, Akira; Uehara, Yukiko; Zhang, Hongyong; Suzuki, Atsunori; Ohnuma, Hideto; Yamaguchi, Naoaki; Suzawa, Hideomi; Uochi, Hideki; Takemura, Yasuhiko, Semiconductor device and method for manufacturing the same.
    상세보기
  184. Konuma,Toshimitsu; Sugawara,Akira; Uehara,Yukiko; Zhang,Hongyong; Suzuki,Atsunori; Ohnuma,Hideto; Yamaguchi,Naoaki; Suzawa,Hideomi; Uochi,Hideki; Takemura,Yasuhiko, Semiconductor device and method for manufacturing the same.
    상세보기
  185. Miyanaga, Akiharu; Ohtani, Hisashi; Takemura, Yasuhiko, Semiconductor device and method for manufacturing the same.
    상세보기
  186. Miyanaga, Akiharu; Ohtani, Hisashi; Takemura, Yasuhiko, Semiconductor device and method for manufacturing the same.
    상세보기
  187. Miyanaga,Akiharu; Ohtani,Hisashi; Takemura,Yasuhiko, Semiconductor device and method for manufacturing the same.
    상세보기
  188. Nakamura,Osamu; Kajiwara,Masayuki; Koezuka,Junichi; Yamazaki,Shunpei; Kuwabara,Hideaki, Semiconductor device and method for manufacturing the same.
    상세보기
  189. Takemura Yasuhiko,JPX, Semiconductor device and method for manufacturing the same.
    상세보기
  190. Takemura, Yasuhiko, Semiconductor device and method for manufacturing the same.
    상세보기
  191. Takemura, Yasuhiko, Semiconductor device and method for manufacturing the same.
    상세보기
  192. Takemura,Yasuhiko, Semiconductor device and method for manufacturing the same.
    상세보기
  193. Takemura,Yasuhiro, Semiconductor device and method for manufacturing the same.
    상세보기
  194. Zhang Hongyong,JPX ; Uochi Hideki,JPX ; Takayama Toru,JPX ; Fukunaga Takeshi,JPX ; Takemura Yasuhiko,JPX, Semiconductor device and method for manufacturing the same.
    상세보기
  195. Zhang, Hongyong; Uochi, Hideki; Takayama, Toru; Fukunaga, Takeshi; Takemura, Yasuhiko, Semiconductor device and method for manufacturing the same.
    상세보기
  196. Zhang, Hongyong; Uochi, Hideki; Takayama, Toru; Fukunaga, Takeshi; Takemura, Yasuhiko, Semiconductor device and method for manufacturing the same.
    상세보기
  197. Yamazaki, Shunpei; Yamaguchi, Naoaki; Nakajima, Setsuo, Semiconductor device and method for producing it.
    상세보기
  198. Ohtani Hisashi,JPX ; Takemura Yasuhiko,JPX ; Miyanaga Akiharu,JPX ; Yamazaki Shunpei,JPX, Semiconductor device and method for producing the same.
    상세보기
  199. Yamazaki Shunpei,JPX ; Ohtani Hisashi,JPX ; Miyanaga Akiharu,JPX ; Teramoto Satoshi,JPX, Semiconductor device and method for producing the same.
    상세보기
  200. Yamazaki Shunpei,JPX ; Ohtani Hisashi,JPX ; Miyanaga Akiharu,JPX ; Teramoto Satoshi,JPX, Semiconductor device and method for producing the same.
    상세보기
  201. Yamazaki Shunpei,JPX, Semiconductor device and method of fabricating same.
    상세보기
  202. Yamazaki, Shunpei; Fukunaga, Takeshi, Semiconductor device and method of fabricating same.
    상세보기
  203. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki; Ohtani, Hisashi; Hamatani, Toshiji, Semiconductor device and method of fabricating same.
    상세보기
  204. Yamazaki,Shunpei, Semiconductor device and method of fabricating same.
    상세보기
  205. Yamazaki,Shunpei, Semiconductor device and method of fabricating same.
    상세보기
  206. Yamazaki,Shunpei, Semiconductor device and method of fabricating same.
    상세보기
  207. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki; Ohtani,Hisashi; Hamatani,Toshiji, Semiconductor device and method of fabricating same.
    상세보기
  208. Shunpei Yamazaki JP; Yasuhiko Takemura JP; Hongyong Zhang JP, Semiconductor device and method of fabricating the same.
    상세보기
  209. Takemura, Yasuhiko, Semiconductor device and method of fabricating the same.
    상세보기
  210. Takemura,Yasuhiko, Semiconductor device and method of fabricating the same.
    상세보기
  211. Yamazaki Shunpei,JPX ; Takemura Yasuhiko,JPX ; Zhang Hongyong,JPX, Semiconductor device and method of fabricating the same.
    상세보기
  212. Hamada, Takashi; Murakami, Satoshi; Yamazaki, Shunpei; Nakamura, Osamu; Kajiwara, Masayuki; Koezuka, Junichi; Takayama, Toru, Semiconductor device and method of manufacturing the same.
    상세보기
  213. Hamada,Takashi; Murakami,Satoshi; Yamazaki,Shunpei; Nakamura,Osamu; Kajiwara,Masayuki; Koezuka,Junichi; Takayama,Toru, Semiconductor device and method of manufacturing the same.
    상세보기
  214. Miyanaga, Akiharu; Ohtani, Hisashi; Takemura, Yasuhiko, Semiconductor device and method of manufacturing the same.
    상세보기
  215. Ohtani, Hisashi; Takano, Tamae; Yamazaki, Shunpei, Semiconductor device and method of manufacturing the same.
    상세보기
  216. Ohtani, Hisashi; Takano, Tamae; Yamazaki, Shunpei, Semiconductor device and method of manufacturing the same.
    상세보기
  217. Ohtani,Hisashi; Takano,Tamae; Yamazaki,Shunpei, Semiconductor device and method of manufacturing the same.
    상세보기
  218. Shunpei Yamazaki JP, Semiconductor device and method of manufacturing the same.
    상세보기
  219. Yamazaki, Shunpei, Semiconductor device and method of manufacturing the same.
    상세보기
  220. Zhang Hongyong,JPX, Semiconductor device and method of manufacturing the same.
    상세보기
  221. Zhang Hongyong,JPX, Semiconductor device and method of manufacturing the same.
    상세보기
  222. Zhang, Hongyong, Semiconductor device and method of manufacturing the same.
    상세보기
  223. Zhang,Hongyong, Semiconductor device and method of manufacturing the same.
    상세보기
  224. Shunpei Yamazaki JP; Naoaki Yamaguchi JP; Setsuo Nakajima JP, Semiconductor device comprising a bottom gate type thin film transistor.
    상세보기
  225. Ohtani, Hisashi; Adachi, Hiroki; Miyanaga, Akiharu; Takayama, Toru, Semiconductor device comprising first insulating film, second insulating film comprising organic resin on the first insulating film, and pixel electrode over the second insulating film.
    상세보기
  226. Hongyong Zhang JP; Toru Takayama JP; Yasuhiko Takemura JP; Akiharu Miyanaga JP; Hisashi Ohtani JP, Semiconductor device forming method.
    상세보기
  227. Zhang Hongyong,JPX ; Takayama Toru,JPX ; Takemura Yasuhiko,JPX ; Miyanaga Akiharu,JPX ; Ohtani Hisashi,JPX, Semiconductor device forming method.
    상세보기
  228. Zhang,Hongyong; Takayama,Toru; Takemura,Yasuhiko; Miyanaga,Akiharu; Ohtani,Hisashi, Semiconductor device forming method.
    상세보기
  229. Yamazaki,Shunpei, Semiconductor device having El layer and sealing material.
    상세보기
  230. Yamazaki,Shunpei; Takemura,Yasuhiko, Semiconductor device having N-channel thin film transistor with LDD regions and P-channel thin film transistor with LDD region.
    상세보기
  231. Yamazaki Shunpei,JPX ; Takemura Yasuhiko,JPX ; Zhang Hongyong,JPX ; Takayama Toru,JPX ; Uochi Hideki,JPX, Semiconductor device having a catalyst enhanced crystallized layer.
    상세보기
  232. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki; Ohtani,Hisashi; Hamatani,Toshiji, Semiconductor device having a crystalline semiconductor film.
    상세보기
  233. Shunpei Yamazaki JP; Yasuhiko Takemura JP, Semiconductor device having a gate oxide film.
    상세보기
  234. Yamazaki,Shunpei; Takemura,Yasuhiko, Semiconductor device having a gate oxide film with some NTFTS with LDD regions and no PTFTS with LDD regions.
    상세보기
  235. Zhang, Hongyong; Takayama, Toru, Semiconductor device having channel formation region comprising silicon and containing a group IV element.
    상세보기
  236. Konuma, Toshimitsu; Sugawara, Akira; Uehara, Yukiko; Zhang, Hongyong; Suzuki, Atsunori; Ohnuma, Hideto; Yamaguchi, Naoaki; Suzawa, Hideomi; Uochi, Hideki; Takemura, Yasuhiko, Semiconductor device having pixel electrode and peripheral circuit.
    상세보기
  237. Yamazaki, Shunpei, Semiconductor device including semiconductor circuit made from semiconductor element and manufacturing method thereof.
    상세보기
  238. Konuma, Toshimitsu; Sugawara, Akira; Uehara, Yukiko; Zhang, Hongyong; Suzuki, Atsunori; Ohnuma, Hideto; Yamaguchi, Naoaki; Suzawa, Hideomi; Uochi, Hideki; Takemura, Yasuhiko, Semiconductor device including transistors with silicided impurity regions.
    상세보기
  239. Konuma, Toshimitsu; Sugawara, Akira; Uehara, Yukiko; Zhang, Hongyong; Suzuki, Atsunori; Ohnuma, Hideto; Yamaguchi, Naoaki; Suzawa, Hideomi; Uochi, Hideki; Takemura, Yasuhiko, Semiconductor device including transistors with silicided impurity regions.
    상세보기
  240. Ohtani, Hisashi; Takano, Tamae; Kokubo, Chiho, Semiconductor device method of manufacturing.
    상세보기
  241. Zhang,Hongyong; Takayama,Toru; Takemura,Yasuhiko; Miyanaga,Akiharu; Ohtani,Hisashi, Semiconductor device structure.
    상세보기
  242. Yamazaki, Shunpei, Semiconductor device with heat-resistant gate.
    상세보기
  243. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Miyanaga, Akiharu, Semiconductor film having a single-crystal like region with no grain boundary.
    상세보기
  244. Kimura,Mutsumi, Semiconductor film transistor.
    상세보기
  245. Koyama, Jun; Kawasaki, Yuji, Semiconductor integrated circuit.
    상세보기
  246. Koyama,Jun; Kawasaki,Yuji, Semiconductor integrated circuit.
    상세보기
  247. Koyama,Jun; Kawasaki,Yuji, Semiconductor integrated circuit.
    상세보기
  248. Jun Koyama JP; Yuji Kawasaki JP, Semiconductor integrated system.
    상세보기
  249. Yamazaki, Shunpei; Koyama, Jun; Miyanaga, Akiharu; Fukunaga, Takeshi, Semiconductor thin film and method of manufacturing the same and semiconductor device and method of manufacturing the same.
    상세보기
  250. Yamazaki, Shunpei; Koyama, Jun; Miyanaga, Akiharu; Fukunaga, Takeshi, Semiconductor thin film and method of manufacturing the same and semiconductor device and method of manufacturing the same.
    상세보기
  251. Yamazaki,Shunpei; Koyama,Jun; Miyanaga,Akiharu; Fukunaga,Takeshi, Semiconductor thin film and method of manufacturing the same and semiconductor device and method of manufacturing the same.
    상세보기
  252. Ohtani Hisashi,JPX ; Yamazaki Shunpei,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Miyanaga Akiharu,JPX, Semiconductor thin film and semiconductor device.
    상세보기
  253. Shunpei Yamazaki JP; Hisashi Ohtani JP; Toru Mitsuki JP; Akiharu Miyanaga JP; Yasushi Ogata JP, Semiconductor thin film and semiconductor device.
    상세보기
  254. Yamazaki Shunpei,JPX ; Ohtani Hisashi,JPX ; Mitsuki Toru,JPX ; Miyanaga Akiharu,JPX ; Ogata Yasushi,JPX, Semiconductor thin film and semiconductor device.
    상세보기
  255. Yamazaki, Shunpei; Ohtani, Hisashi; Mitsuki, Toru; Miyanaga, Akiharu; Ogata, Yasushi, Semiconductor thin film and semiconductor device.
    상세보기
  256. Yamazaki, Shunpei; Ohtani, Hisashi; Mitsuki, Toru; Miyanaga, Akiharu; Ogata, Yasushi, Semiconductor thin film and semiconductor device.
    상세보기
  257. Yamazaki, Shunpei; Ohtani, Hisashi; Mitsuki, Toru; Miyanaga, Akiharu; Ogata, Yasushi, Semiconductor thin film and semiconductor device.
    상세보기
  258. Yamazaki,Shunpei; Ohtani,Hisashi; Mitsuki,Toru; Miyanaga,Akiharu; Ogata,Yasushi, Semiconductor thin film and semiconductor device.
    상세보기
  259. Hisashi Ohtani JP; Akiharu Miyanaga JP; Takeshi Fukunaga JP; Hongyong Zhang JP, Semiconductor thin film transistor with crystal orientation.
    상세보기
  260. Yamazaki Shunpei,JPX ; Koyama Jun,JPX ; Miyanaga Akiharu,JPX ; Fukunaga Takeshi,JPX, Semiconductor thin film, semiconductor device and manufacturing method thereof.
    상세보기
  261. Yamazaki,Shunpei; Koyama,Jun; Miyanaga,Akiharu; Fukunaga,Takeshi, Semiconductor thin film, semiconductor device and manufacturing method thereof.
    상세보기
  262. Yamazaki,Shunpei; Koyama,Jun; Miyanaga,Akiharu; Fukunaga,Takeshi, Semiconductor thin film, semiconductor device and manufacturing method thereof.
    상세보기
  263. Yamazaki Shunpei,JPX ; Takemura Yasuhiko,JPX ; Zhang Hongyong,JPX ; Takayama Toru,JPX ; Uochi Hideki,JPX, Semiconductor, semiconductor device, and method for fabricating the same.
    상세보기
  264. Yamazaki Shunpei,JPX ; Takemura Yasuhiko,JPX ; Zhang Hongyong,JPX ; Takayama Toru,JPX ; Uochi Hideki,JPX, Semiconductor, semiconductor device, and method for fabricating the same.
    상세보기
  265. Yamazaki,Shunpei; Takemura,Yasuhiko; Zhang,Hongyong; Takayama,Toru; Uochi,Hideki, Semiconductor, semiconductor device, and method for fabricating the same.
    상세보기
  266. Yamazaki,Shunpei; Miyanaga,Akiharu; Koyama,Jun; Fukunaga,Takeshi, Static random access memory using thin film transistors.
    상세보기
  267. Yamazaki, Shunpei; Miyanaga, Akiharu; Koyama, Jun; Fukunaga, Takeshi, Thin film semiconductor device and its manufacturing method.
    상세보기
  268. Kim,Hoon, Thin film transistor and method for fabricating the same with step formed at certain layer.
    상세보기
  269. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Hayakawa Masahiko,JPX ; Osame Mitsuaki,JPX ; Ohtani Hisashi,JPX ; Hamatani Toshiji,JPX, Thin film transistor having grain boundaries with segregated oxygen and halogen elements.
    상세보기
  270. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX, Thin film type monolithic semiconductor device.
    상세보기
  271. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX, Thin film type monolithic semiconductor device.
    상세보기
  272. Yamazaki, Shunpei; Teramoto, Satoshi, Thin film type monolithic semiconductor device.
    상세보기
  273. Zhang Hongyong,JPX ; Takayama Toru,JPX ; Takemura Yasuhiko,JPX, Thin-film transistor and fabrication method for same.
    상세보기
  274. Ohnuma Hideto,JPX ; Yamazaki Shunpei,JPX, Thin-film transistor and semiconductor device using thin-film transistors.
    상세보기
  275. Ohnuma, Hideto; Yamazaki, Shunpei, Thin-film transistor and semiconductor device using thin-film transistors.
    상세보기
  276. Zhang Hongyong,JPX ; Takayama Toru,JPX ; Takemura Yasuhiko,JPX ; Miyanaga Akiharu,JPX ; Ohtani Hisashi,JPX, Transistor and semiconductor device having columnar crystals.
    상세보기
  277. Zhang, Hongyong; Takayama, Toru; Takemura, Yasuhiko; Miyanaga, Akiharu; Ohtani, Hisashi, Transistor and semiconductor device having columnar crystals.
    상세보기
  278. Nanba Norihiro,JPX, Zoom lens and optical apparatus having the same.
    상세보기

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