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Method of forming a plasma polymerized film 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C08J-007/18
출원번호 US-0341243 (1994-11-17)
발명자 / 주소
  • Hu Ing-Feng (Midland MI) Tou James C. (Midland MI)
출원인 / 주소
  • The Dow Chemical Company (Midland MI 02)
인용정보 피인용 횟수 : 132  인용 특허 : 0

초록 ▼

A method of preparing a coated substrate is disclosed. The substrate is coated with a plasma generated polymer containing Si, O, C and H in specific atom ratio wherein the polymer also contains certain functional groups. A power density of about 106 to about 108 J/Kg is employed in the plasma polyme

대표청구항 ▼

A method of forming a plasma polymerized organosilicone film on a surface of a substrate which comprises: a) providing the substrate within a a reaction zone of a reaction vessel, b) providing a vacuum within said reaction vessel ranging from about 10-3 to about 1 Torr, c) forming a plasma of reacti

이 특허를 인용한 특허 (132)

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  132. Felts, John T.; Fisk, Thomas E.; Abrams, Robert; Ferguson, John; Freedman, Jonathan; Pangborn, Robert; Sagona, Peter, Vessels, contact surfaces, and coating and inspection apparatus and methods.
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