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25. Lin, Mou-Shiung, Top layers of metal for high performance IC's.

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26. Lin, Mou-Shiung, Top layers of metal for high performance IC's.

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27. Lin, Mou-Shiung, Top layers of metal for high performance IC's.

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28. Lin, Mou-Shiung, Top layers of metal for high performance IC's.

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29. Lin, Mou-Shiung, Top layers of metal for high performance IC's.

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30. Lin, Mou-Shiung, Top layers of metal for high performance IC's.

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31. Lin,Mou Shiung, Top layers of metal for high performance IC's.

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32. Lin,Mou Shiung, Top layers of metal for high performance IC's.

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33. Lin,Mou Shiung, Top layers of metal for high performance IC's.

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34. Lin,Mou Shiung, Top layers of metal for high performance IC's.

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35. Zhao Ji ; Teng Chih Sieh, VLSI capacitors and high Q VLSI inductors using metal-filled via plugs.

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