이 특허를 인용한 특허 (33)

1. Warren ; Jr. Waite R. ; Cox John T. ; Nicholls Louis W., Apparatus and method for detecting an error in the placement of a lead frame on a surface of a die mold.

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2. Svensson, Stefan P; Demaree, John D, Apparatus for growth of dilute-nitride materials using an isotope for enhancing the sensitivity of resonant nuclear reaction analysis.

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4. Camm,David Malcolm; Bumbulovic,Mladen; Cibere,Joseph; Elliott,J. Kiefer; McCoy,Steve; Stuart,Greg, Apparatuses and methods for suppressing thermally-induced motion of a workpiece.

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5. Barlett, Darryl; Wissman, Barry D.; Taylor, II, Charles A., Blackbody fitting for temperature determination.

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6. Kuroiwa, Toru, Heat treatment apparatus and heat treatment method for heating substrate by irradiating substrate with flashes of light.

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7. Hashimoto, Kazuyuki; Kusuda, Tatsufumi, Heat treatment method and heat treatment apparatus for heating substrate by irradiating substrate with light.

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8. Christopher Pickering GB; Roger T Carline GB, In-situ monitoring of electrical properties by ellipsometry.

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9. Whipple ; III Walter ; Alley Robert Philbrick ; Bonissone Piero Patrone ; Dausch Mark Edward ; Badami Vivek Venugopal, Infrared non-contact temperature measurement for household appliances.

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10. Muckenhirm,Sylvain G., Integrated measuring instrument.

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11. Maurer Michael,DEX ; Lerch Wilfried,DEX ; Gschwandtner Alexander,DEX, Method and apparatus for determining emissivity of semiconductor material.

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12. Yamashita,Masatsugu; Kawase,Kodo; Tonouchi,Masayoshi; Kiwa,Toshihiro; Nikawa,Kiyoshi, Method and apparatus for diagnosing fault in semiconductor device.

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13. Zettler,J철rg Thomas, Method and apparatus for the determination of characteristic layer parameters at high temperatures.

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14. Timans, Paul Janis, Method and system for determining optical properties of semiconductor wafers.

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15. Timans, Paul Janis, Method and system for determining optical properties of semiconductor wafers.

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16. Hauenstein, Henning M., Method for determining temperatures on semiconductor components.

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17. Curran William J. ; Moore Gary M., Method for measuring substrate temperature in radiant heated reactors.

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18. Yuko Nambu JP; Satoshi Shibata JP, Method of measuring temperature, method of taking samples for temperature measurement and method for fabricating semiconductor device.

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19. Feichtinger, Heinrich; Rohner, Gottfried; Jussel, Rudolf, Method of optically monitoring the progression of a physical and/or chemical process taking place on a surface of a body.

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20. Beaglehole,David, Method of performing optical measurement on a sample.

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21. Chism, II,William W., Method of photo-reflectance characterization of strain and active dopant in semiconductor structures.

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22. Camm, David Malcolm; Sempere, Guillaume; Kaludjercic, Ljubomir; Stuart, Gregory; Bumbulovic, Mladen; Tran, Tim; Dets, Sergiy; Komasa, Tony; Rudolph, Marc; Cibere, Joseph, Methods and systems for supporting a workpiece and for heat-treating the workpiece.

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23. Camm, David Malcolm; Sempere, Guillaume; Kaludjercic, Ljubomir; Stuart, Gregory; Bumbulovic, Mladen; Tran, Tim; Dets, Sergiy; Komasa, Tony; Rudolph, Marc; Cibere, Joseph, Methods and systems for supporting a workpiece and for heat-treating the workpiece.

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24. Chen Jyh-Chen,TWX ; Hu Chieh,TWX ; Lee Yeou-Chang,TWX, Non-contact method for measuring the surface temperature distribution of a melt during growth of ionic crystals.

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25. Chism, II,William W., Polarization modulation photoreflectance characterization of semiconductor electronic interfaces.

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26. Chism, II, William W., Polarization modulation photoreflectance characterization of semiconductor quantum confined structures.

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27. Celii Francis G., Semiconductor surface measurement system and method.

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28. Camm, David Malcolm; Cibere, Joseph; Bumbulovic, Mladen, Systems and methods for supporting a workpiece during heat-treating.

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29. Camm,David M.; Kervin,Shawna; Lefrancois,Marcel Edmond; Stuart,Greg, Temperature measurement and heat-treating methods and system.

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30. Camm, David M.; Kervin, Shawna; Lefrancois, Marcel Edmond; Stuart, Greg, Temperature measurement and heat-treating methods and systems.

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31. Rosenthal,Peter A.; Xu,Jiazhan; Charpenay,Sylvie; Cosgrove,Joseph E., Thermal imaging for semiconductor process monitoring.

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32. Jellison ; Jr. Gerald E. ; Modine Frank A., Two modulator generalized ellipsometer for complete mueller matrix measurement.

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33. Camm, David Malcolm; Cibere, Joseph; Stuart, Greg; McCoy, Steve, Workpiece breakage prevention method and apparatus.

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