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Ion beam process for deposition of highly abrasion-resistant coatings

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B05D-003/14
  • C23C-014/02
  • C23C-014/14
  • H05H-001/24
출원번호 US-0205898 (1994-03-03)
발명자 / 주소
  • Knapp Bradley J. (Kutztown PA) Kimock Fred M. (Macungie PA) Petrmichl Rudolph H. (Center Valley PA) Galvin Norman D. (Easton PA)
출원인 / 주소
  • Diamonex, Incorporated (Allentown PA 02)
인용정보 피인용 횟수 : 179  인용 특허 : 0

초록

An ion beam deposition method is provided for manufacturing a coated substrate with improved abrasion resistance, and improved lifetime. According to the method, the substrate is first chemically cleaned to remove contaminants. In the second step, the substrate is inserted into a vacuum chamber, and

대표청구항

A method for producing an optically transparent coating on the surface of a substrate comprising: (a) chemically cleaning the surface of said substrate to remove residual hydrocarbons and other contaminants; (b) mounting said substrate in a deposition vacuum chamber and evacuating the air from said

이 특허를 인용한 특허 (179)

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