IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0508044
(1995-07-27)
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우선권정보 |
DE-4033193 (1990-10-19); DE-4037636 (1990-11-27) |
발명자
/ 주소 |
- Kast Juergen (Boehl-Iggelheim DEX) Meyer Norbert (Ladenburg DEX) Misslitz Ulf (Neustadt DEX) Harreus Albrecht (Ludwigshafen DEX) Rang Harald (Ludwigshafen DEX) Gerber Matthias (Mutterstadt DEX) Walte
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출원인 / 주소 |
- BASF Aktiengesellschaft (Ludwigshafen DEX 03)
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인용정보 |
피인용 횟수 :
30 인용 특허 :
0 |
초록
▼
Unsaturated cyclohexenone oxime ethers I [Figure] I (Q〓H, alkylcarbonyl, benzoyl, alkali metal or alkaline earth metal ion, substituted or unsubstituted ammonium ion, phosphonium ion, sulfonium ion, sulfoxonium ion, an equivalent of a transition metal cation; W=-C≡C-or -CH〓CH-; R1=substituted or uns
Unsaturated cyclohexenone oxime ethers I [Figure] I (Q〓H, alkylcarbonyl, benzoyl, alkali metal or alkaline earth metal ion, substituted or unsubstituted ammonium ion, phosphonium ion, sulfonium ion, sulfoxonium ion, an equivalent of a transition metal cation; W=-C≡C-or -CH〓CH-; R1=substituted or unsubstituted cycloalkyl, cycloalkenyl or 6-membered heterocyclic group which has 1-2 oxygen and/or sulfur atoms and can be saturated or partially unsaturated; substituted or unsubstituted 5-membered saturated heterocycle with 1-2 oxygen and/or sulfur atoms; substituted or unsubstituted 5-membered heteroaromatic group with 1-2 nitrogen atoms and/or 1 oxygen or sulfur atom; substituted or unsubstituted phenyl, pyridyl or R9-X-substituted alkyl with X=O, S, -SO-, -SO2-and R9=alkyl, phenyl, 5/6-membered hetaryl with 1-3 hetero atoms; R2=alkyl; R3=H, alkyl; R4=H, halogen, alkyl; R5=H, alkyl; or R3+R4, R3+R5 or R4+R5 together form C2-C4-alkylene or C2-C4-alkenylene; R6=H, alkyl, unsubstituted or phenyl-substituted haloalkyl, alkenyl, alkoxyalkyl, alkylthioalkyl, substituted or unsubstituted cycloalkyl or cycloalkenyl; substituted or unsubstituted phenyl or pyridyl) are suitable as herbicides.
대표청구항
▼
A phthalimide of the formula IX [Figure] IX where R3 is hydrogen or C1-C6-alkyl; R4 is hydrogen, halogen or C1-C6-alkyl; R5 is hydrogen or C1-C6-alkyl; or R3 and R4, R3 and R5 or R4 and R5 together may form C2-C4-alkylene or C2-C4-alkenylene; R6 is hydrogen, C1-C6-alkyl, partially or completely halo
A phthalimide of the formula IX [Figure] IX where R3 is hydrogen or C1-C6-alkyl; R4 is hydrogen, halogen or C1-C6-alkyl; R5 is hydrogen or C1-C6-alkyl; or R3 and R4, R3 and R5 or R4 and R5 together may form C2-C4-alkylene or C2-C4-alkenylene; R6 is hydrogen, C1-C6-alkyl, partially or completely halogenated C1-C4-alkyl which may be optionally substituted by a phenyl radical, or C2-C6-alkenyl, C1-C4-alkoxy-C1-C4-alkyl, C1-C4-alkylthio-C1-C4-alkyl, C3-C7-cycloalkyl or C5-C7-cycloalkenyl, wherein the C3-C7-cycloalkyl and C5-C7-cycloalkenyl may be optionally substituted by one to three of the following: hydroxyl, C1-C4-alkyl, partially or completely halogenated C1-C4-alkyl, C1-C4-alkoxy, C1-C4-alkoxy-C1-C4-alkyl or C1-C4-alkylthio-C1-C4-alkyl; phenyl or pyridyl, both of which may be optionally substituted by one to three of the-following: nitro, cyano, hydroxyl, halogen, C1-C4-alkyl, partially or completely halogenated C1-C4-alkyl, C1-C4-alkoxy, partially or completely halogenated C1-C4-alkoxy, C1-C4-alkylthio, C1-C4-alkoxy-C1-C4-alkyl or C1-C4-alkylthio-C1-C4-alkyl.
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