이 특허를 인용한 특허 (51)

1. Chinn,Joseph Andrew; Casanova,R. Michael, Antibiotic treated implantable medical devices.

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2. Bohnert,George W.; Hand,Thomas E.; DeLaurentiis,Gary M., Apparatus and method for removing solvent from carbon dioxide in resin recycling system.

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3. Mary C. Marshall ; John G. Franjione ; Christopher J. Freitas, Apparatus for contaminant removal using natural convection flow and changes in solubility concentration by temperature.

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4. Marshall, Mary C.; Franjione, John G.; Freitas, Christopher J.; Roberds, William T.; Pollard, Gordon D.; Blake, Jill, Apparatus for contaminant removal using natural convection flow and changes in solubility concentrations by temperature.

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5. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Apparatus for supercritical processing of a workpiece.

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6. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Apparatus for supercritical processing of multiple workpieces.

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7. Jones,William Dale, Control of fluid flow in the processing of an object with a fluid.

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8. Sheydayi,Alexei; Sutton,Thomas, Gate valve for plus-atmospheric pressure semiconductor process vessels.

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9. Sutton, Thomas R.; Biberger, Maximilan A., High pressure compatible vacuum chuck for semiconductor wafer including lift mechanism.

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10. Jones, William D., High pressure fourier transform infrared cell.

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11. Biberger, Maximilian A.; Layman, Frederick Paul; Sutton, Thomas Robert, High pressure processing chamber for semiconductor substrate.

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12. Biberger,Maximilian A.; Layman,Frederick Paul; Sutton,Thomas Robert, High pressure processing chamber for semiconductor substrate.

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13. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.

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14. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.

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15. Sheydayi,Alexei, Method and apparatus for clamping a substrate in a high pressure processing system.

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16. Goshi,Gentaro, Method and apparatus for cooling motor bearings of a high pressure pump.

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17. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method and apparatus for supercritical processing of multiple workpieces.

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18. Parent,Wayne M.; Goshi,Gentaro, Method and system for cooling a pump.

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19. Parent,Wayne M., Method and system for determining flow conditions in a high pressure processing system.

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20. Parent, Wayne M.; Geshell, Dan R., Method and system for passivating a processing chamber.

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21. Hansen,Brandon; Lowe,Marie, Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid.

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22. Marshall Mary C. ; Franjione John G. ; Freitas Christopher J., Method for contaminant removal using natural convection flow and changes in solubility concentration by temperature.

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23. McDermott,Wayne Thomas; Parris,Gene Everad; Roth,Dean Van John; Subawalla,Hoshang, Method for removal of flux and other residue in dense fluid systems.

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24. Bohnert,George W.; Hand,Thomas E.; DeLaurentiis,Gary M., Method for removing contaminants from plastic resin.

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25. Bohnert,George W.; Hand,Thomas E.; DeLaurentiis,Gary M., Method for removing contaminants from plastic resin.

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26. Kawamura,Kohei; Asano,Akira; Miyatani,Koutarou; Hillman,Joseph T.; Palmer,Bentley, Method for supercritical carbon dioxide processing of fluoro-carbon films.

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27. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method for supercritical processing of multiple workpieces.

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28. Biberger, Maximilian A.; Schilling, Paul E., Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module.

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29. Biberger,Maximilian A.; Schilling,Paul E., Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module.

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30. Bohnert,George W.; Hand,Thomas E.; Delaurentiis,Gary M., Method of removing contaminants from plastic resins.

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31. Biberger,Maximilian Albert; Layman,Frederick Paul; Sutton,Thomas Robert, Method of supercritical processing of a workpiece.

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32. Sheydayi,Alexei, Non-contact shuttle valve for flow diversion in high pressure systems.

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33. Sheydayi,Alexei, Pressure energized pressure vessel opening and closing device and method of providing therefor.

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34. Wuester,Christopher D., Process flow thermocouple.

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35. McDermott,Wayne Thomas; Subawalla,Hoshang; Johnson,Andrew David; Schwarz,Alexander, Processing of semiconductor components with dense processing fluids and ultrasonic energy.

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36. Subawalla,Hoshang; Parris,Gene Everad; Rao,Madhukar Bhaskara; Kretz,Christine Peck, Processing of substrates with dense fluids comprising acetylenic diols and/or alcohols.

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37. Mullee, William H.; de Leeuwe, Marc; Roberson, Jr., Glenn A., Removal of CMP residue from semiconductor substrate using supercritical carbon dioxide process.

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38. Mullee William H. ; de Leeuwe Marc ; Roberson ; Jr. Glenn A., Removal of CMP residue from semiconductors using supercritical carbon dioxide process.

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39. Summerfield John W. ; Markiewicz John P. ; Moses John M. ; Barcus Randall L., Removal of contaminants from materials.

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40. Mullee, William H., Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process.

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41. Mullee, William H., Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process.

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42. William H. Mullee ; Maximilian A. Biberger ; Paul E. Schilling, Removal of photoresist and residue from substrate using supercritical carbon dioxide process.

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43. Koch Robert, Removal of polishing residue from substrate using supercritical fluid process.

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44. Mullee William H., Removal of resist or residue from semiconductors using supercritical carbon dioxide.

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45. Bohnert,George W.; Hand,Thomas E.; DeLaurentiis,Gary M., Solvent cleaning system and method for removing contaminants from solvent used in resin recycling.

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46. Joyce, Patrick C.; Tipton, Adrianne; Shrinivasan, Krishnan; Hess, Dennis W.; Myneni, Satyanarayana; Levitin, Galit, Supercritical solutions for cleaning photoresist and post-etch residue from low-k materials.

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47. Gale,Glenn; Hillman,Joseph T.; Jacobson,Gunilla; Palmer,Bentley, System and method for processing a substrate using supercritical carbon dioxide processing.

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48. Bohnert, George W.; Hand, Thomas E.; DeLaurentiis, Gary M., System for removing contaminants from plastic resin.

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49. Jacobson,Gunilla; Yellowaga,Deborah, Treatment of a dielectric layer using supercritical CO.

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50. Kevwitch, Robert, Treatment of substrate using functionalizing agent in supercritical carbon dioxide.

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51. Sheydayi,Alexei, Vacuum chuck utilizing sintered material and method of providing thereof.

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