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Semiconductor device having transistors with different orientations of crystal channel growth with respect to current ca 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-029/04
  • H01L-031/036
출원번호 US-0294740 (1994-08-23)
우선권정보 JP-0235461 (1993-08-27)
발명자 / 주소
  • Takemura Yasuhiko (Kanagawa JPX)
출원인 / 주소
  • Semiconductor Energy Laboratory Co., Ltd. (Kanagawa-ken JPX 03)
인용정보 피인용 횟수 : 264  인용 특허 : 0

초록 ▼

A silicon film is crystallized in a predetermined direction by selectively adding a metal element having a catalytic action for crystallizing an amorphous silicon and annealing. In manufacturing TFT using the crystallized silicon film, TFT provided such that the crystallization direction is roughly

대표청구항 ▼

A semiconductor device comprising: a substrate; and a plurality of thin film transistors formed on the substrate, wherein the thin film transistors each have a crystalline silicon region crystal-grown in a crystal growth direction parallel to the substrate and a silicon oxide layer covering the crys

이 특허를 인용한 특허 (264)

  1. Guo, Jian; Liu, Jiantao, Array substrate having spacer, method for manufacturing the same, and display panel.
    상세보기
  2. Sandhu, Gurtej Singh; Westmoreland, Donald L., Chemical vapor deposition of titanium.
    상세보기
  3. Sandhu, Gurtej Singh; Westmoreland, Donald L., Chemical vapor deposition of titanium.
    상세보기
  4. Sandhu, Gurtej Singh; Westmoreland, Donald L., Chemical vapor deposition of titanium.
    상세보기
  5. Sandhu, Gurtej Singh; Westmoreland, Donald L., Chemical vapor deposition of titanium.
    상세보기
  6. Sandhu, Gurtej Singh; Westmoreland, Donald L., Chemical vapor deposition of titanium.
    상세보기
  7. Yamazaki, Shunpei; Ohtani, Hisashi, Display device having thin film transistors.
    상세보기
  8. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Hayakawa Masahiko,JPX ; Osame Mitsuaki,JPX, Display switch with double layered gate insulation and resinous interlayer dielectric.
    상세보기
  9. Ohtani Hisashi,JPX ; Koyama Jun,JPX ; Yamazaki Shunpei,JPX, Electro-optical device and semiconductor circuit.
    상세보기
  10. Ohtani,Hisashi; Koyama,Jun; Yamazaki,Shunpei, Electro-optical device and semiconductor circuit.
    상세보기
  11. Ohtani,Hisashi; Koyama,Jun; Yamazaki,Shunpei, Electro-optical device and semiconductor circuit.
    상세보기
  12. Ohtani, Hisashi; Koyama, Jun; Yamazaki, Shunpei, Electro-optical device and semiconductor device.
    상세보기
  13. Im, James S., Enhancing the width of polycrystalline grains with mask.
    상세보기
  14. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki, Fabrication method of semiconductor device.
    상세보기
  15. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki, Fabrication method of semiconductor device.
    상세보기
  16. Koo,Jae Bon; Park,Ji Yong; Park,Sang Il; Kim,Deuk Jong; Lee,Ul Ho; Kim,Jin Soo; Jung,Jin Woung; Lee,Chang Gyu, Flat panel display with improved white balance.
    상세보기
  17. Koo, Jae-Bon; Park, Ji-Yong; Lee, Ul-Ho; Kim, Jin-Soo; Jung, Jin-Woung; Lee, Chang-Gyu, Flat panel display with thin film transistor.
    상세보기
  18. Koo,Jae Bon; Park,Ji Yong; Lee,Ul Ho; Kim,Jin Soo; Jung,Jin Woung; Lee,Chang Gyu, Flat panel display with thin film transistor.
    상세보기
  19. Yamazaki, Shunpei; Fukunaga, Takeshi; Koyama, Jun; Inukai, Kazutaka, Light emitting device and manufacturing method thereof.
    상세보기
  20. Yamazaki, Shunpei; Fukunaga, Takeshi; Koyama, Jun; Inukai, Kazutaka, Light emitting device and manufacturing method thereof.
    상세보기
  21. Takei, Michiko; Mishima, Yasuyoshi; Chida, Mitsuru; Yoshikawa, Kohta, Liquid crystal display substrate having TFTS in both an image display area and in a peripheral circuit area.
    상세보기
  22. Yamazaki, Shunpei; Arai, Yasuyuki, Manufacturing method for top-gate type and bottom-gate type thin film transistors.
    상세보기
  23. Kimura, Mutsumi; Kiguchi, Hiroshi, Matrix type display device and manufacturing method thereof.
    상세보기
  24. Kimura, Mutsumi; Kiguchi, Hiroshi, Matrix type display device with optical material at predetermined positions and manufacturing method thereof.
    상세보기
  25. Sandhu,Gurtej Singh; Westmoreland,Donald L., Memory device with chemical vapor deposition of titanium for titanium silicide contacts.
    상세보기
  26. Ohtani, Hisashi, Metal-gettering method used in the manufacture of crystalline-Si TFT.
    상세보기
  27. Im, James S., Method and system for facilitating bi-directional growth.
    상세보기
  28. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Hayakawa Masahiko,JPX ; Osame Mitsuaki,JPX, Method for fabricating a semiconductor device.
    상세보기
  29. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki, Method for fabricating a semiconductor device.
    상세보기
  30. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki, Method for fabricating a semiconductor device.
    상세보기
  31. Shunpei Yamazaki JP; Satoshi Teramoto JP; Jun Koyama JP; Yasushi Ogata JP; Masahiko Hayakawa JP; Mitsuaki Osame JP, Method for fabricating a semiconductor device using a metal catalyst and high temperature crystallization.
    상세보기
  32. Choi, Duck-Kyun, Method for fabricating a thin film transistor.
    상세보기
  33. Maekawa,Shinji; Akimoto,Kengo, Method for fabricating thin film transistor.
    상세보기
  34. So,Woo Young, Method for fabricating thin film transistor with multiple gates using metal induced lateral crystallization.
    상세보기
  35. Funai Takashi,JPX ; Makita Naoki,JPX ; Yamamoto Yoshitaka,JPX ; Miyamoto Tadayoshi,JPX ; Kousai Takamasa,JPX ; Maekawa Masashi,JPX, Method for fabricating thin film transistors.
    상세보기
  36. Zhang Hongyong,JPX ; Uochi Hideki,JPX ; Takayama Toru,JPX ; Fukunaga Takeshi,JPX ; Takemura Yasuhiko,JPX, Method for forming a semiconductor device.
    상세보기
  37. Yamazaki Shunpei,JPX ; Komaya Jun,JPX ; Miyanaga Akiharu,JPX ; Fukunaga Takeshi,JPX, Method for forming semiconductor thin film.
    상세보기
  38. Koo,Jae Bon; Park,Ji Yong; Park,Sang Il; Kim,Deuk Jong; Lee,Ul Ho; Kim,Jin Soo; Jung,Jin Woung; Lee,Chang Gyu, Method for manufacturing a flat panel display with improved white balance.
    상세보기
  39. Hisashi Ohtani JP; Hiroki Adachi JP; Akiharu Miyanaga JP; Toru Takayama JP, Method for manufacturing a semiconductor device.
    상세보기
  40. Ohtani,Hisashi; Adachi,Hiroki; Miyanaga,Akiharu; Takayama,Toru, Method for manufacturing a semiconductor device.
    상세보기
  41. Yamazaki Shunpei,JPX ; Takemura Yasuhiko,JPX, Method for manufacturing a semiconductor device.
    상세보기
  42. Yamazaki,Shunpei; Yamaguchi,Naoaki; Nakajima,Setsuo, Method for manufacturing a semiconductor device.
    상세보기
  43. Yasuhiko Takemura JP, Method for manufacturing a semiconductor device.
    상세보기
  44. Zhang, Hongyong; Uochi, Hideki; Takayama, Toru; Fukunaga, Takeshi; Takemura, Yasuhiko, Method for manufacturing a thin film transistor device.
    상세보기
  45. Yamazaki, Shunpei; Takemura, Yasuhiko, Method for manufacturing a thin film transistor using a high pressure oxidation step.
    상세보기
  46. Ohtani Hisashi,JPX ; Takano Tamae,JPX ; Asami Taketomi,JPX ; Fujimoto Etsuko,JPX, Method for manufacturing semiconductor and method for manufacturing semiconductor device.
    상세보기
  47. Ohtani, Hisashi; Takano, Tamae; Asami, Taketomi; Fujimoto, Etsuko, Method for manufacturing semiconductor and method for manufacturing semiconductor device.
    상세보기
  48. Ohtani, Hisashi; Miyanaga, Akiharu; Teramoto, Satoshi; Yamazaki, Shunpei, Method for manufacturing semiconductor device.
    상세보기
  49. Ohtani, Hisashi; Miyanaga, Akiharu; Teramoto, Satoshi; Yamazaki, Shunpei, Method for manufacturing semiconductor device.
    상세보기
  50. Tanaka, Koichiro; Ohnuma, Hideto, Method for manufacturing transistor semiconductor devices with step of annealing to getter metal with phosphorous.
    상세보기
  51. Ohtani Hisashi,JPX, Method for producing a semiconductor device.
    상세보기
  52. Zhang Hongyong,JPX ; Takayama Toru,JPX, Method for producing a semiconductor device including doping with a catalyst that is a group IV element.
    상세보기
  53. Hongyong Zhang JP; Yasuhiko Takemura JP; Toru Takayama JP, Method for producing semiconductor device.
    상세보기
  54. Ohtani Hisashi,JPX ; Fukunaga Takeshi,JPX ; Miyanaga Akiharu,JPX, Method for producing semiconductor device.
    상세보기
  55. Yamazaki Shunpei,JPX ; Ohtani Hisashi,JPX ; Ohnuma Hideto,JPX, Method for producing semiconductor device.
    상세보기
  56. Yamazaki, Shunpei; Ohtani, Hisashi; Ohnuma, Hideto, Method for producing semiconductor device.
    상세보기
  57. Zhang Hongyong,JPX ; Takayama Toru,JPX ; Takemura Yasuhiko,JPX, Method for producing semiconductor device.
    상세보기
  58. Zhang, Hongyong; Takemura, Yasuhiko; Takayama, Toru, Method for producing semiconductor device.
    상세보기
  59. Im, James S., Method for providing a continuous motion sequential lateral solidification for reducing or eliminating artifacts in edge regions, and a mask for facilitating such artifact reduction/elimination.
    상세보기
  60. Jang, Jin; Yoon, Soo-Young; Oh, Jae-Young; Shon, Woo-Sung; Park, Seong-Jin, Method of crystallizing amorphous silicon layer and crystallizing apparatus thereof.
    상세보기
  61. Choi, Duck-Kyun, Method of crystallizing amorphous silicon thin film and method of fabricating polysilicon thin film transistor using the crystallization method.
    상세보기
  62. Jang Jin,KRX ; Yoon Soo-Young,KRX ; Oh Jae-Young,KRX, Method of crystallizing an amorphous film.
    상세보기
  63. Jang Jin,KRX ; Yoon Soo Young,KRX ; Kim Hyun Churl,KRX, Method of crystallizing an amorphous silicon layer.
    상세보기
  64. Yasuhiko Takemura JP, Method of fabricating a semiconductor device.
    상세보기
  65. Fukunaga,Takeshi; Ohtani,Hisashi; Miyanaga,Akiharu, Method of fabricating a semiconductor device utilizing a catalyst material solution.
    상세보기
  66. Weimer,Ronald A.; DeBoer,Scott J.; Gealy,Dan; Al Shareef,Husam N., Method of fabricating a semiconductor device with a dielectric film using a wet oxidation with steam process.
    상세보기
  67. Makita Naoki,JPX ; Funai Takashi,JPX ; Takayama Toru,JPX, Method of fabricating a thin film transistor.
    상세보기
  68. So,Woo Young, Method of fabricating a thin film transistor with multiple gates using metal induced lateral crystallization.
    상세보기
  69. Seo, Hyun-Sik; Kim, Binn; Bae, Jong-Uk, Method of fabricating polysilicon thin film transistor.
    상세보기
  70. Seo, Hyun-Sik; Kim, Binn; Bae, Jong-Uk; Kim, Hae-Yeol, Method of fabricating polysilicon thin film transistor.
    상세보기
  71. Kim,Binn; Bae,Jong Uk; Kim,Hae Yeol, Method of fabricating polysilicon thin film transistor with catalyst.
    상세보기
  72. Nakajima,Setsuo; Ohtani,Hisashi, Method of fabricating semiconductor device.
    상세보기
  73. Yamazaki Shunpei,JPX ; Kusumoto Naoto,JPX ; Teramoto Satoshi,JPX, Method of fabricating semiconductor device.
    상세보기
  74. Adachi Hiroki,JPX ; Goto Yuugo,JPX ; Zhang Hongyong,JPX ; Takayama Toru,JPX, Method of fabricating semiconductor device and method of processing substrate.
    상세보기
  75. So,Woo Young, Method of fabricating thin film transistor with multiple gates using super grain silicon crystallization.
    상세보기
  76. Yamazaki, Shunpei; Ohtani, Hisashi; Suzawa, Hideomi; Takayama, Toru, Method of forming a semiconductor device.
    상세보기
  77. Nakajima, Setsuo; Ohtani, Hisashi, Method of forming a semiconductor device using a group XV element for gettering by means of infrared light.
    상세보기
  78. Ohtani, Hisashi, Method of forming crystalline silicon film.
    상세보기
  79. Lee,Seok Woo, Method of forming polysilicon thin film transistor.
    상세보기
  80. Shunpei Yamazaki JP; Hisashi Ohtani JP, Method of gettering a metal element for accelerating crystallization of silicon by phosphorous.
    상세보기
  81. Shunpei Yamazaki JP; Mitsunori Sakama JP; Yasuhiko Takemura JP, Method of making crystal silicon semiconductor and thin film transistor.
    상세보기
  82. Wu Meng-Yueh (Taipei TWX) Weng Tzung-Szu (Taipei TWX), Method of making thin film transistor with light-absorbing layer.
    상세보기
  83. Hisashi Ohtani JP; Akiharu Miyanaga JP; Junichi Takeyama JP, Method of manufacturing a semiconductor device.
    상세보기
  84. Isobe,Atsuo; Arao,Tatsuya, Method of manufacturing a semiconductor device.
    상세보기
  85. Ohnuma, Hideto; Yamazaki, Shunpei; Nakajima, Setsuo; Ohtani, Hisashi, Method of manufacturing a semiconductor device.
    상세보기
  86. Yamazaki Shunpei,JPX, Method of manufacturing a semiconductor device.
    상세보기
  87. Yamazaki Shunpei,JPX ; Ohtani Hisashi,JPX ; Hamatani Toshiji,JPX, Method of manufacturing a semiconductor device.
    상세보기
  88. Yamazaki, Shunpei; Nakamura, Osama; Kajiwara, Masayuki; Koezuka, Junichi; Dairiki, Koji; Mitsuki, Toru; Takayama, Toru; Ohnuma, Hideto; Asami, Taketomi; Ichijo, Mitsuhiro, Method of manufacturing a semiconductor device.
    상세보기
  89. Yamazaki, Shunpei; Nakamura, Osamu; Kajiwara, Masayuki; Koezuka, Junichi; Dairiki, Koji; Mitsuki, Toru; Takayama, Toru; Ohnuma, Hideto; Asami, Taketomi; Ichijo, Mitsuhiro, Method of manufacturing a semiconductor device.
    상세보기
  90. Yamazaki,Shunpei; Nakamura,Osamu; Kajiwara,Masayuki; Koezuka,Junichi; Dairiki,Koji; Mitsuki,Toru; Takayama,Toru; Ohnuma,Hideto; Asami,Taketomi; Ichijo,Mitsuhiro, Method of manufacturing a semiconductor device.
    상세보기
  91. Yamazaki,Shunpei; Nakamura,Osamu; Kajiwara,Masayuki; Koezuka,Junichi; Dairiki,Koji; Mitsuki,Toru; Takayama,Toru; Ohnuma,Hideto; Asami,Taketomi; Ichijo,Mitsuhiro, Method of manufacturing a semiconductor device.
    상세보기
  92. Yamazaki,Shunpei; Ohnuma,Hideto; Dairiki,Koji; Mitsuki,Toru; Takayama,Toru; Akimoto,Kengo, Method of manufacturing a semiconductor device.
    상세보기
  93. Yamazaki,Shunpei; Ohtani,Hisashi; Hamatani,Toshiji, Method of manufacturing a semiconductor device.
    상세보기
  94. Yoshikawa, Kohta, Method of manufacturing a semiconductor device.
    상세보기
  95. Hamada,Takashi; Murakami,Satoshi; Yamazaki,Shunpei; Nakamura,Osamu; Kajiwara,Masayuki; Koezuka,Junichi; Takayama,Toru, Method of manufacturing a semiconductor device comprising doping steps using gate electrodes and resists as masks.
    상세보기
  96. Ohtani,Hisashi; Koyama,Jun; Ogata,Yasushi; Yamazaki,Shunpei, Method of manufacturing a semiconductor device having TFTs with uniform characteristics.
    상세보기
  97. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Hayakawa Masahiko,JPX ; Osame Mitsuaki,JPX, Method of manufacturing a semiconductor device including reduction of a catalyst.
    상세보기
  98. Isobe, Atsuo; Arao, Tatsuya, Method of manufacturing a semiconductor device, utilizing a laser beam for crystallization.
    상세보기
  99. Shunpei Yamazaki JP, Method of manufacturing a semiconductor film and method of manufacturing a semiconductor device.
    상세보기
  100. Yamazaki, Shunpei, Method of manufacturing a semiconductor film and method of manufacturing a semiconductor device.
    상세보기
  101. Yamazaki,Shunpei, Method of manufacturing a semiconductor film and method of manufacturing a semiconductor device by transferring crystallization promoting material in the first semiconductor film to the second semico.
    상세보기
  102. Zhang, Hongyong; Uochi, Hideki; Takayama, Toru; Fukunaga, Takeshi; Takemura, Yasuhiko, Method of manufacturing a thin film transistor device.
    상세보기
  103. Ohtani Hisashi,JPX, Method of manufacturing a thin film transistor involving laser treatment.
    상세보기
  104. Miyashita, Satoru; Kiguchi, Hiroshi; Shimoda, Tatsuya; Kanbe, Sadao, Method of manufacturing organic EL element, organic EL element and organic EL display device.
    상세보기
  105. Miyashita, Satoru; Kiguchi, Hiroshi; Shimoda, Tatsuya; Kanbe, Sadao, Method of manufacturing organic EL element, organic EL element, and organic EL display device.
    상세보기
  106. Miyashita, Satoru; Kiguchi, Hiroshi; Shimoda, Tatsuya; Kanbe, Sadao, Method of manufacturing organic EL element, organic EL element, and organic EL display device.
    상세보기
  107. Miyashita, Satoru; Kiguchi, Hiroshi; Shimoda, Tatsuya; Kanbe, Sadao, Method of manufacturing organic EL element, organic EL element, and organic EL display device.
    상세보기
  108. Nakamura, Osamu; Yamazaki, Shunpei; Dairiki, Koji; Kajiwara, Masayuki; Koezuka, Junichi; Murakami, Satoshi, Method of manufacturing semiconductor device.
    상세보기
  109. Nakamura, Osamu; Yamazaki, Shunpei; Dairiki, Koji; Kajiwara, Masayuki; Koezuka, Junichi; Murakami, Satoshi, Method of manufacturing semiconductor device.
    상세보기
  110. Nakamura,Osamu; Yamazaki,Shunpei; Dairiki,Koji; Kajiwara,Masayuki; Koezuka,Junichi; Murakami,Satoshi, Method of manufacturing semiconductor device.
    상세보기
  111. Ohtani Hisashi,JPX, Method of manufacturing semiconductor device.
    상세보기
  112. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Miyanaga Akiharu,JPX, Method of manufacturing semiconductor device.
    상세보기
  113. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Miyanaga Akiharu,JPX, Method of manufacturing semiconductor device.
    상세보기
  114. Yamazaki, Shunpei; Ohtani, Hisashi, Method of manufacturing semiconductor device.
    상세보기
  115. Yamazaki,Shunpei; Mitsuki,Toru, Method of manufacturing semiconductor device.
    상세보기
  116. Yamazaki,Shunpei; Ohtani,Hisashi, Method of manufacturing semiconductor device.
    상세보기
  117. Yamazaki, Shunpei; Nakamura, Osamu; Kajiwara, Masayuki; Koezuka, Junichi, Method of manufacturing semiconductor device and semiconductor device.
    상세보기
  118. Yamazaki,Shunpei; Nakamura,Osamu; Kajiwara,Masayuki; Koezuka,Junichi, Method of manufacturing semiconductor device that includes selectively adding a noble gas element.
    상세보기
  119. Yamazaki Shunpei,JPX, Method of manufacturing semiconductor devices using a crystallization promoting material.
    상세보기
  120. Yamazaki,Shunpei; Ohtani,Hisashi, Method of manufacturing transistors.
    상세보기
  121. Yamazaki Shunpei,JPX ; Arai Yasuyuki,JPX, Microcrystal silicon film and its manufacturing method, and photoelectric conversion device and its manufacturing method.
    상세보기
  122. Miyashita, Satoru; Kiguchi, Hiroshi; Shimoda, Tatsuya; Kanbe, Sadao, Organic EL display device having a bank formed to fill spaces between pixel electrodes.
    상세보기
  123. Yamazaki Shunpei,JPX, Photoelectric conversion device and method manufacturing same.
    상세보기
  124. Im,James; Van Der Wilt,Paul Christiaan, Polycrystalline TFT uniformity through microstructure mis-alignment.
    상세보기
  125. Seong Moh Seo KR, Polysilicon thin film transistor and method of manufacturing the same.
    상세보기
  126. Takeuchi, Toshihiko; Takahashi, Minoru; Osada, Takeshi; Oguni, Teppei; Tanemura, Kazuki, Power storage device.
    상세보기
  127. Im, James S., Process and system for laser crystallization processing of film regions on a substrate to minimize edge areas, and structure of such film regions.
    상세보기
  128. Zhang Hongyong,JPX ; Uochi Hideki,JPX ; Takayama Toru,JPX ; Yamazaki Shunpei,JPX ; Takemura Yasuhiko,JPX, Process for fabricating a thin film transistor semiconductor device.
    상세보기
  129. Yamazaki,Shunpei; Ohtani,Hisashi; Mitsuki,Toru; Ohnuma,Hideto; Takano,Tamae; Kasahara,Kenji; Dairiki,Koji, Process for manufacturing a semiconductor device.
    상세보기
  130. Yamazaki,Shunpei; Ohtani,Hisashi; Mitsuki,Toru; Ohnuma,Hideto; Takano,Tamae; Kasahara,Kenji; Dairiki,Koji, Process for manufacturing a semiconductor device.
    상세보기
  131. Bromberger,Christoph, Process for manufacturing a semiconductor device, a semiconductor device and a high-frequency circuit.
    상세보기
  132. Yamazaki,Shunpei; Arai,Yasuyuki, Process for producing a photoelectric conversion device that includes using a gettering process.
    상세보기
  133. Im, James S.; van der Wilt, Paul Christiaan, Processes and systems for laser crystallization processing of film regions on a substrate utilizing a line-type beam, and structures of such film regions.
    상세보기
  134. Im, James S.; van der Wilt, Paul Christiaan, Processes and systems for laser crystallization processing of film regions on a substrate utilizing a line-type beam, and structures of such film regions.
    상세보기
  135. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki; Ohtani, Hisashi; Hamatani, Toshiji, Semiconductor active region of TFTs having radial crystal grains through the whole area of the region.
    상세보기
  136. Hongyong Zhang JP; Hideki Uochi JP; Toru Takayama JP; Shunpei Yamazaki JP; Yasuhiko Takemura JP, Semiconductor and process for fabricating the same.
    상세보기
  137. Zhang Hongyong,JPX ; Uochi Hideki,JPX ; Takayama Toru,JPX ; Yamazaki Shunpei,JPX ; Takemura Yasuhiko,JPX, Semiconductor and process for fabricating the same.
    상세보기
  138. Zhang, Hongyong; Takayama, Toru; Takemura, Yasuhiko, Semiconductor circuit and method of fabricating the same.
    상세보기
  139. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX, Semiconductor circuit for electro-optical device and method of manufacturing the same.
    상세보기
  140. Yamazaki, Shunpei; Yamaguchi, Naoaki; Nakajima, Setsuo, Semiconductor device.
    상세보기
  141. Yamazaki Shunpei,JPX ; Miyanaga Akiharu,JPX ; Teramoto Satoshi,JPX, Semiconductor device and a method of manufacturing the same.
    상세보기
  142. Hisashi Ohtani JP; Tamae Takano JP; Chiho Kokubo JP, Semiconductor device and fabricating method thereof.
    상세보기
  143. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Hayakawa Masahiko,JPX ; Osame Mitsuaki,JPX, Semiconductor device and fabrication method thereof.
    상세보기
  144. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Hayakawa Masahiko,JPX ; Osame Mitsuaki,JPX, Semiconductor device and fabrication method thereof.
    상세보기
  145. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki, Semiconductor device and fabrication method thereof.
    상세보기
  146. Shunpei Yamazaki JP, Semiconductor device and its manufacturing method.
    상세보기
  147. Shunpei Yamazaki JP; Satoshi Teramoto JP; Jun Koyama JP; Yasushi Ogata JP; Masahiko Hayakawa JP; Mitsuaki Osame JP; Hisashi Ohtani JP; Toshiji Hamatani JP, Semiconductor device and its manufacturing method.
    상세보기
  148. Yamazaki Shunpei,JPX, Semiconductor device and its manufacturing method.
    상세보기
  149. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki; Ohtani, Hisashi; Hamatani, Toshiji, Semiconductor device and its manufacturing method.
    상세보기
  150. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki; Ohtani, Hisashi; Hamatani, Toshiji, Semiconductor device and its manufacturing method.
    상세보기
  151. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki; Ohtani,Hisashi; Hamatani,Toshiji, Semiconductor device and its manufacturing method.
    상세보기
  152. Nakamura, Osamu; Kajiwara, Masayuki; Yamazaki, Shunpei; Ohnuma, Hideto, Semiconductor device and manufacturing method of the same.
    상세보기
  153. Nakamura,Osamu; Kajiwara,Masayuki; Yamazaki,Shunpei; Ohnuma,Hideto, Semiconductor device and manufacturing method of the same.
    상세보기
  154. Shunpei Yamazaki JP; Hisashi Ohtani JP; Hideto Ohnuma JP; Satoshi Teramoto JP, Semiconductor device and manufacturing method thereof.
    상세보기
  155. Tanaka, Koichiro; Ohnuma, Hideto, Semiconductor device and manufacturing method thereof.
    상세보기
  156. Zhang, Hongyong, Semiconductor device and manufacturing method thereof.
    상세보기
  157. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Hayakawa Masahiko,JPX ; Osame Mitsuaki,JPX ; Ohtani Hisashi,JPX ; Hamatani Toshiji,JPX, Semiconductor device and method for fabricating the same.
    상세보기
  158. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki; Ohtani, Hisashi; Hamatani, Toshiji, Semiconductor device and method for fabricating the same.
    상세보기
  159. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki; Ohtani, Hisashi; Hamatani, Toshiji, Semiconductor device and method for fabricating the same.
    상세보기
  160. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki; Ohtani,Hisashi; Hamatani,Toshiji, Semiconductor device and method for fabricating the same.
    상세보기
  161. Yamazaki Shunpei,JPX ; Zhang Hongyong,JPX, Semiconductor device and method for forming the same.
    상세보기
  162. Yamazaki,Shunpei; Zhang,Hongyong, Semiconductor device and method for forming the same.
    상세보기
  163. Yamazaki,Shunpei; Zhang,Hongyong, Semiconductor device and method for forming the same.
    상세보기
  164. Adachi Hiroki,JPX ; Takenouchi Akira,JPX ; Fukada Takeshi,JPX ; Uehara Hiroshi,JPX ; Takemura Yasuhiko,JPX, Semiconductor device and method for manufacturing the same.
    상세보기
  165. Adachi Hiroki,JPX ; Takenouchi Akira,JPX ; Fukada Takeshi,JPX ; Uehara Hiroshi,JPX ; Takemura Yasuhiko,JPX, Semiconductor device and method for manufacturing the same.
    상세보기
  166. Hiroki Adachi JP; Akira Takenouchi JP; Takeshi Fukada JP; Hiroshi Uehara JP; Yasuhiko Takemura JP, Semiconductor device and method for manufacturing the same.
    상세보기
  167. Hongyong Zhang JP; Hideki Uochi JP; Toru Takayama JP; Takeshi Fukunaga JP; Yasuhiko Takemura JP, Semiconductor device and method for manufacturing the same.
    상세보기
  168. Miyanaga, Akiharu; Ohtani, Hisashi; Takemura, Yasuhiko, Semiconductor device and method for manufacturing the same.
    상세보기
  169. Miyanaga, Akiharu; Ohtani, Hisashi; Takemura, Yasuhiko, Semiconductor device and method for manufacturing the same.
    상세보기
  170. Miyanaga,Akiharu; Ohtani,Hisashi; Takemura,Yasuhiko, Semiconductor device and method for manufacturing the same.
    상세보기
  171. Nakamura,Osamu; Kajiwara,Masayuki; Koezuka,Junichi; Yamazaki,Shunpei; Kuwabara,Hideaki, Semiconductor device and method for manufacturing the same.
    상세보기
  172. Takemura Yasuhiko,JPX, Semiconductor device and method for manufacturing the same.
    상세보기
  173. Takemura, Yasuhiko, Semiconductor device and method for manufacturing the same.
    상세보기
  174. Takemura, Yasuhiko, Semiconductor device and method for manufacturing the same.
    상세보기
  175. Takemura,Yasuhiko, Semiconductor device and method for manufacturing the same.
    상세보기
  176. Takemura,Yasuhiro, Semiconductor device and method for manufacturing the same.
    상세보기
  177. Zhang Hongyong,JPX ; Uochi Hideki,JPX ; Takayama Toru,JPX ; Fukunaga Takeshi,JPX ; Takemura Yasuhiko,JPX, Semiconductor device and method for manufacturing the same.
    상세보기
  178. Zhang, Hongyong; Uochi, Hideki; Takayama, Toru; Fukunaga, Takeshi; Takemura, Yasuhiko, Semiconductor device and method for manufacturing the same.
    상세보기
  179. Zhang, Hongyong; Uochi, Hideki; Takayama, Toru; Fukunaga, Takeshi; Takemura, Yasuhiko, Semiconductor device and method for manufacturing the same.
    상세보기
  180. Yamazaki, Shunpei; Yamaguchi, Naoaki; Nakajima, Setsuo, Semiconductor device and method for producing it.
    상세보기
  181. Yamazaki Shunpei,JPX ; Ohtani Hisashi,JPX ; Miyanaga Akiharu,JPX ; Teramoto Satoshi,JPX, Semiconductor device and method for producing the same.
    상세보기
  182. Yamazaki Shunpei,JPX ; Ohtani Hisashi,JPX ; Miyanaga Akiharu,JPX ; Teramoto Satoshi,JPX, Semiconductor device and method for producing the same.
    상세보기
  183. Yamazaki Shunpei,JPX, Semiconductor device and method of fabricating same.
    상세보기
  184. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki; Ohtani, Hisashi; Hamatani, Toshiji, Semiconductor device and method of fabricating same.
    상세보기
  185. Yamazaki,Shunpei, Semiconductor device and method of fabricating same.
    상세보기
  186. Yamazaki,Shunpei, Semiconductor device and method of fabricating same.
    상세보기
  187. Yamazaki,Shunpei, Semiconductor device and method of fabricating same.
    상세보기
  188. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki; Ohtani,Hisashi; Hamatani,Toshiji, Semiconductor device and method of fabricating same.
    상세보기
  189. Takemura, Yasuhiko, Semiconductor device and method of fabricating the same.
    상세보기
  190. Takemura,Yasuhiko, Semiconductor device and method of fabricating the same.
    상세보기
  191. Yamazaki,Shunpei; Ohtani,Hisashi; Suzawa,Hideomi; Takayama,Toru, Semiconductor device and method of fabricating the same.
    상세보기
  192. Hamada, Takashi; Murakami, Satoshi; Yamazaki, Shunpei; Nakamura, Osamu; Kajiwara, Masayuki; Koezuka, Junichi; Takayama, Toru, Semiconductor device and method of manufacturing the same.
    상세보기
  193. Hamada,Takashi; Murakami,Satoshi; Yamazaki,Shunpei; Nakamura,Osamu; Kajiwara,Masayuki; Koezuka,Junichi; Takayama,Toru, Semiconductor device and method of manufacturing the same.
    상세보기
  194. Miyanaga, Akiharu; Ohtani, Hisashi; Takemura, Yasuhiko, Semiconductor device and method of manufacturing the same.
    상세보기
  195. Shunpei Yamazaki JP, Semiconductor device and method of manufacturing the same.
    상세보기
  196. Yamazaki, Shunpei, Semiconductor device and method of manufacturing the same.
    상세보기
  197. Yamazaki, Shunpei; Ohtani, Hisashi; Koyama, Jun; Fukunaga, Takeshi, Semiconductor device and method of manufacturing the same.
    상세보기
  198. Yamazaki,Shunpei; Ohtani,Hisashi; Koyama,Jun; Fukunaga,Takeshi, Semiconductor device and method of manufacturing the same.
    상세보기
  199. Zhang Hongyong,JPX, Semiconductor device and method of manufacturing the same.
    상세보기
  200. Zhang Hongyong,JPX, Semiconductor device and method of manufacturing the same.
    상세보기
  201. Zhang, Hongyong, Semiconductor device and method of manufacturing the same.
    상세보기
  202. Zhang,Hongyong, Semiconductor device and method of manufacturing the same.
    상세보기
  203. Shunpei Yamazaki JP; Naoaki Yamaguchi JP; Setsuo Nakajima JP, Semiconductor device comprising a bottom gate type thin film transistor.
    상세보기
  204. Ohtani, Hisashi; Adachi, Hiroki; Miyanaga, Akiharu; Takayama, Toru, Semiconductor device comprising first insulating film, second insulating film comprising organic resin on the first insulating film, and pixel electrode over the second insulating film.
    상세보기
  205. Hongyong Zhang JP; Toru Takayama JP; Yasuhiko Takemura JP; Akiharu Miyanaga JP; Hisashi Ohtani JP, Semiconductor device forming method.
    상세보기
  206. Zhang Hongyong,JPX ; Takayama Toru,JPX ; Takemura Yasuhiko,JPX ; Miyanaga Akiharu,JPX ; Ohtani Hisashi,JPX, Semiconductor device forming method.
    상세보기
  207. Zhang,Hongyong; Takayama,Toru; Takemura,Yasuhiko; Miyanaga,Akiharu; Ohtani,Hisashi, Semiconductor device forming method.
    상세보기
  208. Yamazaki Shunpei,JPX ; Takemura Yasuhiko,JPX ; Zhang Hongyong,JPX ; Takayama Toru,JPX ; Uochi Hideki,JPX, Semiconductor device having a catalyst enhanced crystallized layer.
    상세보기
  209. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki; Ohtani,Hisashi; Hamatani,Toshiji, Semiconductor device having a crystalline semiconductor film.
    상세보기
  210. Zhang, Hongyong; Takayama, Toru, Semiconductor device having channel formation region comprising silicon and containing a group IV element.
    상세보기
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    상세보기
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    상세보기
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    상세보기
  214. Ohtani, Hisashi; Takano, Tamae; Kokubo, Chiho, Semiconductor device method of manufacturing.
    상세보기
  215. Zhang,Hongyong; Takayama,Toru; Takemura,Yasuhiko; Miyanaga,Akiharu; Ohtani,Hisashi, Semiconductor device structure.
    상세보기
  216. Yamazaki, Shunpei, Semiconductor device with channel having plural impurity regions.
    상세보기
  217. Yamazaki, Shunpei, Semiconductor device with heat-resistant gate.
    상세보기
  218. Ohnuma, Hideto, Semiconductor display device and manufacturing method thereof.
    상세보기
  219. Yamazaki, Shunpei; Koyama, Jun; Miyanaga, Akiharu; Fukunaga, Takeshi, Semiconductor thin film and method of manufacturing the same and semiconductor device and method of manufacturing the same.
    상세보기
  220. Yamazaki, Shunpei; Koyama, Jun; Miyanaga, Akiharu; Fukunaga, Takeshi, Semiconductor thin film and method of manufacturing the same and semiconductor device and method of manufacturing the same.
    상세보기
  221. Yamazaki,Shunpei; Koyama,Jun; Miyanaga,Akiharu; Fukunaga,Takeshi, Semiconductor thin film and method of manufacturing the same and semiconductor device and method of manufacturing the same.
    상세보기
  222. Ohtani Hisashi,JPX ; Yamazaki Shunpei,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Miyanaga Akiharu,JPX, Semiconductor thin film and semiconductor device.
    상세보기
  223. Shunpei Yamazaki JP; Hisashi Ohtani JP; Toru Mitsuki JP; Akiharu Miyanaga JP; Yasushi Ogata JP, Semiconductor thin film and semiconductor device.
    상세보기
  224. Yamazaki Shunpei,JPX ; Ohtani Hisashi,JPX ; Mitsuki Toru,JPX ; Miyanaga Akiharu,JPX ; Ogata Yasushi,JPX, Semiconductor thin film and semiconductor device.
    상세보기
  225. Yamazaki, Shunpei; Ohtani, Hisashi; Mitsuki, Toru; Miyanaga, Akiharu; Ogata, Yasushi, Semiconductor thin film and semiconductor device.
    상세보기
  226. Yamazaki, Shunpei; Ohtani, Hisashi; Mitsuki, Toru; Miyanaga, Akiharu; Ogata, Yasushi, Semiconductor thin film and semiconductor device.
    상세보기
  227. Yamazaki, Shunpei; Ohtani, Hisashi; Mitsuki, Toru; Miyanaga, Akiharu; Ogata, Yasushi, Semiconductor thin film and semiconductor device.
    상세보기
  228. Yamazaki,Shunpei; Ohtani,Hisashi; Mitsuki,Toru; Miyanaga,Akiharu; Ogata,Yasushi, Semiconductor thin film and semiconductor device.
    상세보기
  229. Yamazaki Shunpei,JPX ; Koyama Jun,JPX ; Miyanaga Akiharu,JPX ; Fukunaga Takeshi,JPX, Semiconductor thin film, semiconductor device and manufacturing method thereof.
    상세보기
  230. Yamazaki,Shunpei; Koyama,Jun; Miyanaga,Akiharu; Fukunaga,Takeshi, Semiconductor thin film, semiconductor device and manufacturing method thereof.
    상세보기
  231. Yamazaki,Shunpei; Koyama,Jun; Miyanaga,Akiharu; Fukunaga,Takeshi, Semiconductor thin film, semiconductor device and manufacturing method thereof.
    상세보기
  232. Yamazaki Shunpei,JPX ; Takemura Yasuhiko,JPX ; Zhang Hongyong,JPX ; Takayama Toru,JPX ; Uochi Hideki,JPX, Semiconductor, semiconductor device, and method for fabricating the same.
    상세보기
  233. Yamazaki Shunpei,JPX ; Takemura Yasuhiko,JPX ; Zhang Hongyong,JPX ; Takayama Toru,JPX ; Uochi Hideki,JPX, Semiconductor, semiconductor device, and method for fabricating the same.
    상세보기
  234. Yamazaki,Shunpei; Takemura,Yasuhiko; Zhang,Hongyong; Takayama,Toru; Uochi,Hideki, Semiconductor, semiconductor device, and method for fabricating the same.
    상세보기
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    상세보기
  236. Im, James S., Single-shot semiconductor processing system and method having various irradiation patterns.
    상세보기
  237. Yudasaka Ichio,JPX ; Shimoda Tatsuya,JPX ; Kanbe Sadao,JPX ; Miyazawa Wakao,JPX, Thin film device provided with coating film, liquid crystal panel and electronic device, and method for making the thin.
    상세보기
  238. Yudasaka,Ichio; Shimoda,Tatsuya; Kanbe,Sadao; Miyazawa,Wakao, Thin film device provided with coating film, liquid crystal panel and electronic device, and method for making the thin film device.
    상세보기
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    상세보기
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    상세보기
  241. Yamazaki, Shunpei; Miyanaga, Akiharu; Koyama, Jun; Fukunaga, Takeshi, Thin film semiconductor device and its manufacturing method.
    상세보기
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    상세보기
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    상세보기
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    상세보기
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    상세보기
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    상세보기
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    상세보기
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    상세보기
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    상세보기
  250. Takei, Michiko; Mishima, Yasuyoshi; Chida, Mitsuru; Yoshikawa, Kohta, Thin film transistor, liquid crystal display substrate, and their manufacture methods.
    상세보기
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    상세보기
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    상세보기
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    상세보기
  254. Zhang Hongyong,JPX ; Takayama Toru,JPX ; Takemura Yasuhiko,JPX, Thin-film transistor and fabrication method for same.
    상세보기
  255. Ohnuma Hideto,JPX ; Yamazaki Shunpei,JPX, Thin-film transistor and semiconductor device using thin-film transistors.
    상세보기
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    상세보기
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    상세보기
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    상세보기
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    상세보기
  260. Hideki Uochi JP; Yasuhiko Takemura JP, Transistor device and method of forming the same.
    상세보기
  261. Im, James S.; Sposili, Robert S.; Crowder, Mark A., Uniform large-grained and gain boundary location manipulated polycrystalline thin film semiconductors formed using sequential lateral solidification and devices formed thereon.
    상세보기
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    상세보기
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    상세보기
  264. Nanba Norihiro,JPX, Zoom lens and optical apparatus having the same.
    상세보기

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