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Method and apparatus for the deposition of parylene AF4 onto semiconductor wafers 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23C-016/00
출원번호 US-0549087 (1995-10-27)
발명자 / 주소
  • Beach William F. (Bridgewater NJ) Olson Roger A. (Amery WI) Wary John (Noblesville IN)
출원인 / 주소
  • Specialty Coating Systems, Inc. (Indianapolis IN 02)
인용정보 피인용 횟수 : 79  인용 특허 : 0

초록

Chemical vapor deposition apparatus is provided for the quick and efficient deposition of Parylene AF4 onto silicon wafers in the production of semiconductor chips. A method of depositing parylene AF4 onto the surface of a semiconductor wafer includes cooling the semiconductor chip wafer to a temper

대표청구항

A method for the deposition of a parylene polymer onto a substrate comprising the steps of: cooling the substrate to a temperature below 0°C.; creating sub-atmospheric pressure conditions around said substrate; depositing a predetermined thickness of said parylene polymer onto said substrate; and he

이 특허를 인용한 특허 (79)

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