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Method of positioning an electrooptic probe of an apparatus for the measurement of voltage 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01R-029/12
출원번호 US-0213005 (1994-03-14)
우선권정보 JP-0054225 (1993-03-15)
발명자 / 주소
  • Takahashi Hironori (Hamamatsu JPX) Aoshima Shinichiro (Hamamatsu JPX) Hirano Isuke (Hamamatsu JPX) Tsuchiya Yutaka (Hamamatsu JPX)
출원인 / 주소
  • Hamamatsu Photonics K.K. (Hamamatsu JPX 03)
인용정보 피인용 횟수 : 49  인용 특허 : 0

초록

An method of positioning an E-O probe applied to an apparatus for the measurement of voltage. In the first step, the relative position of the E-O probe against the magnifying optical system in the first condition of being focused the magnifying optical system on the base of the E-O probe, and the fo

대표청구항

A method of positioning an electrooptic (E-O) probe applied to an apparatus for the measurement of voltage, the probe and the apparatus including a magnifying optical system for observing a surface of a device to be measured in focus, an E-O probe, means for producing a laser beam for the measuremen

이 특허를 인용한 특허 (49)

  1. Dunklee, John, Chuck for holding a device under test.
  2. Dunklee, John, Chuck for holding a device under test.
  3. Dunklee, John, Chuck for holding a device under test.
  4. Dunklee,John, Chuck for holding a device under test.
  5. Dunklee,John, Chuck for holding a device under test.
  6. Dunklee,John, Chuck for holding a device under test.
  7. Stewart, Craig; Lord, Anthony; Spencer, Jeff; Burcham, Terry; McCann, Peter; Jones, Rod; Dunklee, John; Lesher, Tim; Newton, David, Chuck for holding a device under test.
  8. Stewart,Craig; Lord,Anthony; Spencer,Jeff; Burcham,Terry; McCann,Peter; Jones,Rod; Dunklee,John; Lesher,Tim; Newton,David, Chuck for holding a device under test.
  9. Andrews, Peter; Froemke, Brad; Dunklee, John, Chuck with integrated wafer support.
  10. Andrews,Peter; Froemke,Brad; Dunklee,John, Chuck with integrated wafer support.
  11. Andrews,Peter; Froemke,Brad; Dunklee,John, Chuck with integrated wafer support.
  12. Davidson, James R.; Seifert, Gary D., Electro-optic high voltage sensor.
  13. James R. Davidson ; Gary D. Seifert, Electro-optic high voltage sensor.
  14. Dunklee, John; Norgden, Greg; Cowan, C. Eugene, Guarded tub enclosure.
  15. Dunklee,John; Norgden,Greg; Cowan,C. Eugene, Guarded tub enclosure.
  16. Andrews, Peter; Hess, David; New, Robert, Interface for testing semiconductors.
  17. McFadden,Bruce, Localizing a temperature of a device for testing.
  18. Bawolek Edward J., Microscope with infrared imaging.
  19. Harris,Daniel L.; McCann,Peter R., Optical testing device.
  20. Nordgren, Greg; Dunklee, John, Probe station.
  21. Nordgren, Greg; Dunklee, John, Probe station.
  22. Peters, Ron A.; Hayden, Leonard A.; Hawkins, Jeffrey A.; Dougherty, R. Mark, Probe station having multiple enclosures.
  23. Peters,Ron A.; Hayden,Leonard A.; Hawkins,Jeffrey A.; Dougherty,R. Mark, Probe station having multiple enclosures.
  24. Peters,Ron A.; Hayden,Leonard A.; Hawkins,Jeffrey A.; Dougherty,R. Mark, Probe station having multiple enclosures.
  25. Cowan, Clarence E.; Tervo, Paul A.; Dunklee, John L., Probe station thermal chuck with shielding for capacitive current.
  26. Cowan,Clarence E.; Tervo,Paul A.; Dunklee,John L., Probe station thermal chuck with shielding for capacitive current.
  27. Cowan,Clarence E.; Tervo,Paul A.; Dunklee,John L., Probe station thermal chuck with shielding for capacitive current.
  28. Dunklee,John; Cowan,Clarence E., Probe station with low inductance path.
  29. Dunklee,John; Cowan,Clarence E., Probe station with low inductance path.
  30. Lesher, Timothy; Miller, Brad; Cowan, Clarence E.; Simmons, Michael; Gray, Frank; McDonald, Cynthia L., Probe station with low noise characteristics.
  31. Lesher,Timothy; Miller,Brad; Cowan,Clarence E.; Simmons,Michael; Gray,Frank; McDonald,Cynthia L., Probe station with low noise characteristics.
  32. Lesher,Timothy; Miller,Brad; Cowan,Clarence E.; Simmons,Michael; Gray,Frank; McDonald,Cynthia L., Probe station with low noise characteristics.
  33. Navratil,Peter; Froemke,Brad; Stewart,Craig; Lord,Anthony; Spencer,Jeff; Runbaugh,Scott; Fisher,Gavin; McCann,Pete; Jones,Rod, Probe station with two platens.
  34. Lesher, Timothy E., Probe testing structure.
  35. Lesher,Timothy E., Probe testing structure.
  36. Xia, William; Villafana, Martin; Tappan, Jonathan; Watson, Tim; Campbell, Michael, Reliability of vias and diagnosis by e-beam probing.
  37. Dunklee,John, Switched suspended conductor and connection.
  38. Dunklee,John, Switched suspended conductor and connection.
  39. Strid,Eric W.; Schappacher,Jerry B.; Carlton,Dale E.; Gleason,K. Reed, System for evaluating probing networks.
  40. Strid,Eric W.; Schappacher,Jerry B.; Carlton,Dale E.; Gleason,K. Reed, System for evaluating probing networks.
  41. Andrews, Peter; Hess, David, System for testing semiconductors.
  42. Negishi, Kazuki; Hansen, Mark, Test apparatus for measuring a characteristic of a device under test.
  43. Rumbaugh,Scott, Thermal optical chuck.
  44. Rumbaugh,Scott, Thermal optical chuck.
  45. Schwindt, Randy J.; Harwood, Warren K.; Tervo, Paul A.; Smith, Kenneth R.; Warner, Richard H., Wafer probe station having a skirting component.
  46. Schwindt,Randy J.; Harwood,Warren K.; Tervo,Paul A.; Smith,Kenneth R.; Warner,Richard H., Wafer probe station having a skirting component.
  47. Schwindt,Randy J.; Harwood,Warren K.; Tervo,Paul A.; Smith,Kenneth R.; Warner,Richard H., Wafer probe station having a skirting component.
  48. Harwood, Warren K.; Tervo, Paul A.; Koxxy, Martin J., Wafer probe station having environment control enclosure.
  49. Harwood,Warren K.; Tervo,Paul A.; Koxxy,Martin J., Wafer probe station having environment control enclosure.
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