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Exposure apparatus 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G03B-027/34
출원번호 US-0380447 (1995-01-30)
우선권정보 JP-0046519 (1993-03-08); JP-0046520 (1993-03-08)
발명자 / 주소
  • Miyaji Akira (Tokyo JPX) Ikeda Masatoshi (Tokyo JPX)
출원인 / 주소
  • Nikon Corporation (Tokyo JPX 03)
인용정보 피인용 횟수 : 178  인용 특허 : 0

초록 ▼

An exposure apparatus is for illuminating a pattern on a mask by an illumination optical system to transfer the pattern on the mask onto a photosensitive substrate set on a stage through a projection optical system. The exposure apparatus comprises a first supply device for supplying an inert gas to

대표청구항 ▼

A projection exposure method for exposing a pattern of a mask onto a photosensitive substrate through a projection optical system, the method comprising the steps of: providing an ArF excimer laser emitting an ultraviolet radiation which has a spectral band narrowed so as to avoid absorption spectru

이 특허를 인용한 특허 (178)

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