이 특허를 인용한 특허 (153)

1. Woodruff, Daniel J.; Hanson, Kyle M.; Eudy, Steve L.; Weber, Curtis A.; Harris, Randy, Adaptable electrochemical processing chamber.

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2. Chen,Linlin; Wilson,Gregory J.; McHugh,Paul R.; Weaver,Robert A.; Ritzdorf,Thomas L., Apparatus and method for electrochemically depositing metal on a semiconductor workpiece.

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3. Chen,Linlin; Wilson,Gregory J.; McHugh,Paul R.; Weaver,Robert A.; Ritzdorf,Thomas L., Apparatus and method for electrochemically depositing metal on a semiconductor workpiece.

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4. Hanson,Kyle M., Apparatus and methods for electrochemical processing of microelectronic workpieces.

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5. Hanson,Kyle M.; Ritzdorf,Thomas L.; Wilson,Gregory J.; McHugh,Paul R., Apparatus and methods for electrochemical processing of microelectronic workpieces.

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6. Hanson,Kyle M.; Ritzdorf,Thomas L.; Wilson,Gregory J.; McHugh,Paul R., Apparatus and methods for electrochemical processing of microelectronic workpieces.

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7. Harris,Randy; Woodruff,Daniel J., Apparatus for manually and automatically processing microelectronic workpieces.

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8. Harris,Randy A.; Hanson,Kyle M., Apparatuses and method for transferring and/or pre-processing microelectronic workpieces.

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9. Ammann, Kelly G.; Burns, Ralph E.; Hansberry, Ernest V.; Horner, Glenn A.; Jakub, Cheryl A.; Kling, John E.; Nieglos, Donald J.; Schneider, Robert E.; Smith, Robert J., Automated analyzer for performing a nucleic acid-based assay.

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10. Ochranek, Brian L.; Arnquist, David C.; Oonuma, Takehiko; Tahara, Hirotoshi; Sato, Naoto; Smith, Bradley P., Automated diagnostic analyzers having rear accessible track systems and related methods.

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11. Ochranek, Brian L.; Arnquist, David C.; Oonuma, Takehiko; Tahara, Hirotoshi; Sato, Naoto, Automated diagnostic analyzers having vertically arranged carousels and related methods.

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12. Ochranek, Brian L.; Arnquist, David C.; Oonuma, Takehiko; Tahara, Hirotoshi; Sato, Naoto, Automated diagnostic analyzers having vertically arranged carousels and related methods.

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13. Ammann, Kelly G.; Burns, Ralph E.; Hansberry, Ernest V.; Horner, Glenn A.; Jakub, Cheryl A.; Kling, John E.; Nieglos, Donald J.; Schneider, Robert E.; Smith, Robert J., Automated process for detecting the presence of a target nucleic acid in a sample.

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14. Ammann, Kelly G.; Burns, Ralph E.; Hansberry, Ernest V.; Horner, Glenn A.; Jakub, Cheryl A.; Kling, John E.; Nieglos, Donald J.; Schneider, Robert E.; Smith, Robert J., Automated process for detecting the presence of a target nucleic acid in a sample.

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15. Ammann, Kelly G.; Burns, Ralph E.; Hansberry, Ernest V.; Horner, Glenn A.; Jakub, Cheryl A.; Kling, John E.; Nieglos, Donald J.; Schneider, Robert E.; Smith, Robert J., Automated process for detecting the presence of a target nucleic acid in a sample.

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16. Ammann,Kelly G.; Burns,Ralph E.; Hansberry,Ernest V.; Horner,Glenn A.; Jakub,Cheryl A.; Kling,John E.; Nieglos,Donald J.; Schneider,Robert E.; Smith,Robert J., Automated process for detecting the presence of a target nucleic acid in a sample.

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17. Ammann, Kelly G.; Burns, Ralph E.; Hansberry, Ernest V.; Horner, Glenn A.; Jakub, Cheryl A.; Kling, John E.; Nieglos, Donald J.; Schneider, Robert E.; Smith, Robert J., Automated process for isolating and amplifying a target nucleic acid sequence.

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18. Kelly G. Ammann ; Ralph E. Burns ; Ernest V. Hansberry ; Glenn A. Horner ; Cheryl A. Jakub ; John E. Kling ; Donald J. Nieglos ; Robert E. Schneider ; Robert J. Smith, Automated process for isolating and amplifying a target nucleic acid sequence.

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19. Ammann,Kelly G.; Burns,Ralph E.; Hansberry,Ernest V.; Horner,Glenn A.; Jakub,Cheryl A.; Kling,John E.; Nieglos,Donald J.; Schneider,Robert E.; Smith,Robert J., Automated process for preparing and amplifying a target nucleic acid sequence.

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20. Davis,Jeffry A.; Nelson,Gordon Ray; Bexten,Daniel P., Automated processing system.

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21. Nelson, Gordon Ray; Bexten, Daniel P.; Davis, Jeffry A., Automated semiconductor processing system.

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22. Beer, Emanuel; White, John M., Automated substrate processing system.

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23. Ammann,Kelly G.; Burns,Ralph E.; Hansberry,Ernest V.; Horner,Glenn A.; Jakub,Cheryl A.; Kling,John E.; Nieglos,Donald J.; Schneider,Robert E.; Smith,Robert J., Automated system for isolating and amplifying a target nucleic acid sequence.

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24. Englhardt, Eric A.; Rice, Michael R.; Hudgens, Jeffrey C.; Hongkham, Steve; Pinson, Jay D.; Salek, Mohsen; Carlson, Charles; Weaver, William T; Armer, Helen R., Cartesian cluster tool configuration for lithography type processes.

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25. Rice, Mike; Hudgens, Jeffrey; Carlson, Charles; Weaver, William Tyler; Lowrance, Robert; Englhardt, Eric; Hruzek, Dean C.; Silvetti, Dave; Kuchar, Michael; Katwyk, Kirk Van; Hoskins, Van; Shah, Vinay, Cartesian robot cluster tool architecture.

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26. Hanson, Kyle M.; Klocke, John L., Chambers, systems, and methods for electrochemically processing microfeature workpieces.

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27. Klocke,John; Hanson,Kyle M, Chambers, systems, and methods for electrochemically processing microfeature workpieces.

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28. Klocke,John; Hanson,Kyle M, Chambers, systems, and methods for electrochemically processing microfeature workpieces.

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29. Ishikawa, Tetsuya; Roberts, Rick J.; Armer, Helen R.; Volfovski, Leon; Pinson, Jay D.; Rice, Michael; Quach, David H.; Salek, Mohsen S.; Lowrance, Robert; Backer, John A.; Weaver, William Tyler; Carlson, Charles; Wang, Chongyang; Hudgens, Jeffrey; Herchen, Harald; Lue, Brian, Cluster tool architecture for processing a substrate.

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30. Ishikawa, Tetsuya; Roberts, Rick J.; Armer, Helen R.; Volfovski, Leon; Pinson, Jay D.; Rice, Michael; Quach, David H.; Salek, Mohsen S.; Lowrance, Robert; Backer, John A.; Weaver, William Tyler; Carlson, Charles; Wang, Chongyang; Hudgens, Jeffrey; Herchen, Harald; Lue, Brian, Cluster tool architecture for processing a substrate.

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31. Ishikawa, Tetsuya; Roberts, Rick J.; Armer, Helen R.; Volfovski, Leon; Pinson, Jay D.; Rice, Michael; Quach, David H.; Salek, Mohsen S.; Lowrance, Robert; Backer, John A.; Weaver, William Tyler; Carlson, Charles; Wang, Chongyang; Hudgens, Jeffrey; Herchen, Harald; Lue, Brian, Cluster tool architecture for processing a substrate.

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32. Ishikawa,Tetsuya; Roberts,Rick J.; Armer,Helen R.; Volfovski,Leon; Pinson,Jay D.; Rice,Michael; Quach,David H.; Salek,Mohsen S.; Lowrance,Robert; Backer,John A.; Weaver,William Tyler; Carlson,Charles; Wang,Chongyang; Hudgens,Jeffrey; Herchen,Harald; Lue,Brian, Cluster tool architecture for processing a substrate.

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33. Volfovski, Leon; Ishikawa, Tetsuya, Cluster tool substrate throughput optimization.

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34. Lair, Gary D.; Nguyen, Thanh N.; Li, Haitao; Li, Florence; Knight, Byron J.; Heinz, Robert E.; Macioszek, Jerzy A.; Davis, Christopher B.; Scalese, Robert F., Continuous process for performing multiple nucleic acid amplification assays.

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35. Bouchelle, Steve; Pollard, Jasper, Device and method for labeling vials useful in system for dispensing prescriptions.

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36. Ammann,Kelly G.; Hansberry,Ernest V., Device for agitating the fluid contents of a container.

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37. DuMond, Jody; Guthrie, Charles H.; Moran, Jr., Joseph C.; Young, Demetris P.; Abrams, Jr., George Raymond, Device for dispensing vials useful in system and method for dispensing prescriptions.

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38. DuMond, Jody; Guthrie, Charles H.; Moran, Jr., Joseph C.; Young, Demetris P.; Abrams, Jr., George Raymond, Device for dispensing vials useful in system and method for dispensing prescriptions.

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39. Nguyen, Binh Quoc; Phillips, Alton, Device for handling wafers in microelectronic manufacturing.

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40. Shibuya Isamu,JPX, Device for treatment of a substrate.

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41. Ochranek, Brian L.; Arnquist, David C., Diagnostic analyzers with pretreatment carousels and related methods.

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42. Genov ; deceased Genco ; Todorov Alexander ; Kostov Lubo ; Petkov Peter ; Totev Valentin ; Bonev Eugene ; Sotirov Zlatko, Dual robotic arm end effectors having independent yaw motion.

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43. Woodruff,Daniel J.; Hanson,Kyle M., Electroplating apparatus with segmented anode array.

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44. Woodruff,Daniel J.; Hanson,Kyle M., Electroplating apparatus with segmented anode array.

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45. Ammann,Kelly G.; Schneider,Robert E.; Smith,Robert J., Incubator for use in an automated diagnostic analyzer.

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46. Burns,Ralph E., Instrument for detecting light emitted by the contents of a reaction receptacle.

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47. Woodruff, Daniel J.; Harris, Randy, Integrated tools with transfer devices for handling microelectronic workpieces.

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48. Harris, Randy; Woodruff, Daniel J., Lift and rotate assembly for use in a workpiece processing station and a method of attaching the same.

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49. Meulen, Peter van der, Linear semiconductor processing facilities.

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50. van der Meulen, Peter, Linear semiconductor processing facilities.

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51. Hofmeister, Christopher; Caveney, Robert T., Linear substrate transport apparatus.

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52. Holtkamp, William; Kremerman, Izya; Hofmeister, Christopher; Pickreign, Richard, Linearly distributed semiconductor workpiece processing tool.

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53. Kuit,Jan Jaap; Bartray,Petrus Rutgerus; Bijvoet,Dirk Jan; Hoogkamp,Jan Frederik, Lithographic apparatus and device manufacturing method.

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54. Ammann, Kelly G.; Burns, Ralph E.; Hansberry, Ernest V.; Horner, Glenn A.; Jakub, Cheryl A.; Kling, John E.; Nieglos, Donald J.; Schneider, Robert E.; Smith, Robert J., Method and apparatus for performing a magnetic separation purification procedure on a sample solution.

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55. Benuzzi, Piergiorgio, Method and machine for sawing panels with laterally movable pusher.

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56. Schmidt,Kilian, Method and system for determining utilization of process tools in a manufacturing environment based on characteristics of an automated material handling system.

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57. Ammann, Kelly G.; Schneider, Robert E.; Smith, Robert J., Method for agitating the contents of a reaction receptacle within a temperature-controlled environment.

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58. Ammann, Kelly G.; Hansberry, Ernest V., Method for agitating the fluid contents of a container.

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59. Ammann, Kelly G.; Hansberry, Ernest V., Method for agitating the fluid contents of a container.

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60. Macioszek, Jerzy A.; Davis, Christopher B.; Lair, Gary D.; Nguyen, Thanh N.; Li, Haitao; Li, Florence F.; Knight, Byron J.; Scalese, Robert F.; Heinz, Robert E., Method for continuous mode processing of the contents of multiple reaction receptacles in a real-time amplification assay.

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61. Ammann, Kelly G.; Burns, Ralph E.; Hansberry, Ernest V.; Horner, Glenn A.; Jakub, Cheryl A.; Kling, John E.; Nieglos, Donald J.; Schneider, Robert E.; Smith, Robert J., Method for detecting the presence of a nucleic acid in a sample.

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62. Ammann, Kelly G.; Burns, Ralph E.; Hansberry, Ernest V.; Horner, Glenn A.; Jakub, Cheryl A.; Kling, John E.; Nieglos, Donald J.; Schneider, Robert E.; Smith, Robert J., Method for detecting the presence of a nucleic acid in a sample.

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63. Ammann, Kelly G.; Burns, Ralph E.; Hansberry, Ernest V.; Horner, Glenn A.; Jakub, Cheryl A.; Kling, John E.; Nieglos, Donald J.; Schneider, Robert E.; Smith, Robert J., Method for detecting the presence of a nucleic acid in a sample.

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64. Ammann, Kelly G.; Burns, Ralph E.; Hansberry, Ernest V.; Horner, Glenn A.; Jakub, Cheryl A.; Kling, John E.; Nieglos, Donald J.; Schneider, Robert E.; Smith, Robert J., Method for detecting the presence of a nucleic acid in a sample.

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65. Light, II, James P.; Carrick, James M., Method for determining the amount of an analyte in a sample.

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66. Ammann, Kelly G.; Schneider, Robert E.; Smith, Robert J., Method for incubating the contents of a receptacle.

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67. Ammann, Kelly G.; Schneider, Robert E.; Smith, Robert J., Method for introducing a fluid into a reaction receptacle contained within a temperature-controlled environment.

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68. Ammann, Kelly G.; Burns, Ralph E.; Hansberry, Ernest V.; Horner, Glenn A.; Jakub, Cheryl A.; Kling, John E.; Nieglos, Donald J.; Schneider, Robert E.; Smith, Robert J., Method for performing an assay with a nucleic acid present in a specimen.

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69. Macioszek, Jerzy A.; Davis, Christopher B.; Lair, Gary D.; Nguyen, Thanh N.; Li, Haitao; Li, Florence F.; Knight, Byron J.; Scalese, Robert F.; Heinz, Robert E., Method for performing multi-formatted assays.

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70. Light, II, James P., Method for reducing the presence of amplification inhibitors in a reaction receptacle.

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71. Ammann, Kelly G.; Burns, Ralph E.; Hansberry, Ernest V.; Horner, Glenn A.; Jakub, Cheryl A.; Kling, John E.; Nieglos, Donald J.; Schneider, Robert E.; Smith, Robert J., Method for simultaneously performing multiple amplification reactions.

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72. Knight, Byron J.; Opalsky, David; Schroeter, Brian, Method, system and apparatus for incorporating capacitive proximity sensing in an automated fluid transfer procedure.

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73. Ritzdorf,Thomas L.; Eudy,Steve L.; Wilson,Gregory J.; McHugh,Paul R.; Weaver,Robert A.; Aegerter,Brian; Dundas,Curt; Peace,Steven L., Methods and apparatus for processing microelectronic workpieces using metrology.

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74. van der Meulen,Peter, Methods and systems for handling a workpiece in vacuum-based material handling system.

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75. Woodruff, Daniel J.; Harris, Randy, Microelectronic workpiece transfer devices and methods of using such devices in the processing of microelectronic workpieces.

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76. van der Meulen, Peter, Mid-entry load lock for semiconductor handling system.

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77. van der Meulen,Peter, Mid-entry load lock for semiconductor handling system.

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78. Berner,Robert W.; Woodruff,Daniel J.; Schmidt,Wayne J.; Coyle,Kevin W.; Zila,Vladimir; Lund,Worm, Modular semiconductor workpiece processing tool.

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79. Robert W. Berner ; Daniel J. Woodruff ; Wayne J. Schmidt ; Kevin W. Coyle ; Vladimir Zila CA; Worm Lund, Modular semiconductor workpiece processing tool.

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80. Ogura, Hiroyuki; Mitsuhashi, Tsuyoshi; Fukutomi, Yoshiteru; Morinishi, Kenya; Kawamatsu, Yasuo; Nagashima, Hiromichi, Multi-story substrate treating apparatus with flexible transport mechanisms and vertically divided treating units.

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81. Ogura, Hiroyuki; Mitsuhashi, Tsuyoshi; Fukutomi, Yoshiteru; Morinishi, Kenya; Kawamatsu, Yasuo; Nagashima, Hiromichi, Multi-story substrate treating apparatus with flexible transport mechanisms and vertically divided treating units.

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82. Bacchi Paul ; Filipski Paul S., Multiple link robot arm system implemented with offset end effectors to provide extended reach and enhanced throughput.

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83. Burns,Ralph E.; Hansberry,Ernest V., Multiple ring assembly for providing specimen to reaction receptacles within an automated analyzer.

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84. Fukutomi, Yoshiteru; Mitsuhashi, Tsuyoshi; Ogura, Hiroyuki; Morinishi, Kenya; Kawamatsu, Yasuo; Nagashima, Hiromichi, Parallel substrate treatment for a plurality of substrate treatment lines.

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85. Sakurai, Kunihiko; Togawa, Tetsuji; Takada, Nobuyuki; Wakabayashi, Satoshi; Saito, Kenichiro; Sekimoto, Masahiko; Hayama, Takuji; Koga, Daisuke, Polishing apparatus.

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86. Akimoto Masami,JPX ; Ueda Issei,JPX, Processing system.

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87. Furuya, Masaaki; Tauchi, Toyoyasu, Processing system and processing method.

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88. Hanson, Kyle M.; Eudy, Steve L.; Ritzdorf, Thomas L.; Wilson, Gregory J.; Woodruff, Daniel J.; Harris, Randy; Weber, Curtis A.; McGlenn, Tim; Anderson, Timothy A.; Bexten, Daniel P., Processing tools, components of processing tools, and method of making and using same for electrochemical processing of microelectronic workpieces.

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89. Genov Genco ; Todorov Alexander ; Kostov Lubo ; Petkov Peter ; Totev Valentin ; Bonev Eugene ; Sotirov Zlatko, Robot having multiple degrees of freedom.

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90. Genov Genco ; Todorov Alexander ; Kostov Lubo ; Petkov Peter ; Totev Valentin ; Bonev Eugene ; Sotirov Zlatko, Robot having multiple degrees of freedom.

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91. Genco Genov ; Zlatko M. Sotirov ; Eugene Bonev, Robot motion compensation system.

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92. Schmidt Wayne J. ; Oberlitner Thomas H., Robots for microelectronic workpiece handling.

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93. Schmidt Wayne J. ; Oberlitner Thomas H., Robots for microelectronic workpiece handling.

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94. van der Meulen, Peter, Semiconductor manufacturing systems.

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95. Hanson, Kyle; Dix, Mark; Woodruff, Daniel J.; Schmidt, Wayne J.; Coyle, Kevin W., Semiconductor processing apparatus having linear conveyer system.

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96. James W. Doolittle, Semiconductor processing workpiece position sensing.

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97. van der Meulen, Peter; Kiley, Christopher C; Pannese, Patrick D.; Ritter, Raymond S.; Schaefer, Thomas A., Semiconductor wafer handling and transport.

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98. van der Meulen, Peter; Kiley, Christopher C; Pannese, Patrick D.; Ritter, Raymond S.; Schaefer, Thomas A., Semiconductor wafer handling and transport.

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99. van der Meulen, Peter; Kiley, Christopher C.; Pannese, Patrick D.; Ritter, Raymond S.; Schaefer, Thomas A., Semiconductor wafer handling transport.

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100. Lair, Gary D.; Nguyen, Thanh N.; Li, Haitao; Li, Florence F.; Knight, Byron J.; Heinz, Robert E.; Macioszek, Jerzy A.; Davis, Christopher B.; Scalese, Robert F., Signal measuring system having a movable signal measuring device.

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101. Liu Yu-tsai,TWX, Stackable chamber apparatus.

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102. van der Meulen, Peter, Stacked process modules for a semiconductor handling system.

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103. van der Meulen,Peter, Stacked process modules for a semiconductor handling system.

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104. Hofmeister, Christopher; Caveney, Robert T., Substrate processing apparatus.

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105. Hofmeister, Christopher; Caveney, Robert T., Substrate processing apparatus.

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106. Hofmeister, Christopher; Caveney, Robert T., Substrate processing apparatus.

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107. Hofmeister, Christopher; Caveney, Robert T., Substrate processing apparatus.

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108. Hofmeister, Christopher; Caveney, Robert T., Substrate processing apparatus.

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109. Hofmeister, Christopher; Caveney, Robert T., Substrate processing apparatus.

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110. Hosek, Martin; Hofmeister, Christopher; Krupyshev, Alexander, Substrate processing apparatus.

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111. Nishimura, Joichi; Ohtani, Masami; Hashinoki, Kenji; Shiga, Masayoshi; Hashimoto, Koji, Substrate processing apparatus.

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112. Nishimura, Kazuhiro; Nakamura, Yasushi; Kawamatsu, Yasuo; Chikamori, Ryuichi, Substrate processing apparatus.

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113. Nishimura, Kazuhiro; Nakamura, Yasushi; Kawamatsu, Yasuo; Chikamori, Ryuichi, Substrate processing apparatus.

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114. Ohtani Masami,JPX ; Imanishi Yasuo,JPX ; Tsuji Masao,JPX ; Kawamoto Takanori,JPX ; Iwami Masaki,JPX ; Nishimura Joichi,JPX ; Morita Akihiko,JPX, Substrate processing apparatus, substrate transport apparatus and substrate transfer apparatus.

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115. Rice, Mike; Hudgens, Jeffrey; Carlson, Charles; Weaver, William Tyler; Lowrance, Robert; Englhardt, Eric; Hruzek, Dean C.; Silvetti, Dave; Kuchar, Michael; Van Katwyk, Kirk; Hoskins, Van; Shah, Vinay, Substrate processing sequence in a Cartesian robot cluster tool.

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116. Rice, Mike; Hudgens, Jeffrey; Carlson, Charles; Weaver, William Tyler; Lowrance, Robert; Englhardt, Eric; Hruzek, Dean C.; Silvetti, Dave; Kuchar, Michael; Katwyk, Kirk Van; Hoskins, Van; Shah, Vinay, Substrate processing sequence in a cartesian robot cluster tool.

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117. Rice, Mike; Hudgens, Jeffrey; Carlson, Charles; Weaver, William Tyler; Lowrance, Robert; Englhardt, Eric; Hruzek, Dean C.; Silvetti, Dave; Kuchar, Michael; Van Katwyk, Kirk; Hoskins, Van; Shah, Vinay, Substrate processing sequence in a cartesian robot cluster tool.

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118. White, John M.; Turner, Norman L.; Tiner, Robin L.; Keller, Ernst; Kurita, Shinichi; Blonigan, Wendell T.; Berkstresser, David E., Substrate transfer shuttle.

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119. White, John M.; Turner, Norman L.; Tiner, Robin L.; Keller, Ernst; Kurita, Shinichi; Blonigan, Wendell T.; Berkstresser, David E., Substrate transfer shuttle.

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120. Fukutomi, Yoshiteru; Mitsuhashi, Tsuyoshi; Ogura, Hiroyuki; Morinishi, Kenya; Kawamatsu, Yasuo; Nagashima, Hiromichi, Substrate treating apparatus.

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121. Fukutomi, Yoshiteru; Mitsuhashi, Tsuyoshi; Ogura, Hiroyuki; Morinishi, Kenya; Kawamatsu, Yasuo; Nagashima, Hiromichi, Substrate treating apparatus using horizontal treatment cell arrangements with parallel treatment lines.

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122. Ogura, Hiroyuki; Mitsuhashi, Tsuyoshi; Fukutomi, Yoshiteru; Morinishi, Kenya; Kawamatsu, Yasuo; Nagashima, Hiromichi, Substrate treating apparatus with inter-unit buffers.

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123. Ogura, Hiroyuki; Morinishi, Kenya; Mitsuhashi, Tsuyoshi; Kawamatsu, Yasuo; Fukutomi, Yoshiteru; Nagashima, Hiromichi, Substrate treating apparatus with inter-unit buffers.

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124. Ogura, Hiroyuki; Mitsuhashi, Tsuyoshi; Fukutomi, Yoshiteru; Morinishi, Kenya; Kawamatsu, Yasuo; Nagashima, Hiromichi, Substrate treating apparatus with parallel substrate treatment lines simultaneously treating a plurality of substrates.

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125. Ogura, Hiroyuki; Mitsuhashi, Tsuyoshi; Fukutomi, Yoshiteru; Morinishi, Kenya; Kawamatsu, Yasuo; Nagashima, Hiromichi, Substrate treating apparatus with substrate reordering.

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126. Fukutomi, Yoshiteru; Mitsuhashi, Tsuyoshi; Ogura, Hiroyuki; Morinishi, Kenya; Kawamatsu, Yasuo; Nagashima, Hiromichi, Substrate treating apparatus with vertical treatment arrangement including vertical blowout and exhaust units.

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127. Williams, Jeffrey P.; Michelli, Richard; Pollard, Jasper; Kelly, Simon; Newcomb, David; Eberdt, Jess; Klein, Pete, System and method for dispensing prescriptions.

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128. Ammann, Kelly G.; Schneider, Robert E.; Smith, Robert J., System and method for incubating the contents of a reaction receptacle.

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129. Ammann, Kelly G.; Hansberry, Ernest V., System for agitating the fluid contents of a container.

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130. Wilson, Gregory J.; McHugh, Paul R.; Hanson, Kyle M., System for electrochemically processing a workpiece.

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131. Ammann, Kelly G.; Schneider, Robert E.; Smith, Robert J., System for incubating the contents of a reaction receptacle.

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132. Knight, Byron J.; Li, Haitao, System for performing multi-formatted assays.

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133. Lair, Gary D.; Nguyen, Thanh N.; Li, Haitao; Li, Florence F.; Knight, Byron J.; Heinz, Robert E.; Macioszek, Jerzy A.; Davis, Christopher B.; Scalese, Robert F., System for performing multi-formatted assays.

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134. Knight, Byron J., System for processing contents of a receptacle to detect an optical signal emitted by the contents.

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135. Hayes, Matthew J.; Knight, Byron J.; Li, Haitao; Scalese, Robert F., Systems and methods for detecting multiple optical signals.

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136. Hayes, Matthew J.; Knight, Byron J.; Li, Haitao; Scalese, Robert F., Systems and methods for detecting multiple optical signals.

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137. Heinz, Robert E.; Newell, Dennis; Opalsky, David; Rhubottom, Jason, Systems and methods for distinguishing optical signals of different modulation frequencies in an optical signal detector.

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138. Heinz, Robert E.; Newell, Dennis; Opalsky, David; Rhubottom, Jason, Systems and methods for distinguishing optical signals of different modulation frequencies in an optical signal detector.

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139. Woodruff, Daniel J.; Harris, Randy, TRANSFER DEVICES FOR HANDLING MICROELECTRONIC WORKPIECES WITHIN AN ENVIRONMENT OF A PROCESSING MACHINE AND METHODS OF MANUFACTURING AND USING SUCH DEVICES IN THE PROCESSING OF MICROELECTRONIC WORKPIE.

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141. Ammann, Kelly G.; Schneider, Robert E.; Smith, Robert J., Temperature-controlled incubator having an arcuate closure panel.

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142. Ammann, Kelly G.; Schneider, Robert E.; Smith, Robert J., Temperature-controlled incubator having rotatable door.

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147. Wilson,Gregory J.; McHugh,Paul R.; Weaver,Robert A.; Ritzdorf,Thomas L., Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece.

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148. Wilson,Gregory J.; McHugh,Paul R.; Weaver,Robert A.; Ritzdorf,Thomas L., Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece.

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149. Wilson,Gregory J.; McHugh,Paul R.; Weaver,Robert A.; Ritzdorf,Thomas L., Turning electrodes used in a reactor for electrochemically processing a microelectronic workpiece.

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150. Kato Shigekazu,JPX ; Nishihata Kouji,JPX ; Tsubone Tsunehiko,JPX ; Itou Atsushi,JPX, Vacuum processing apparatus and operating method therefor.

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151. Joe Wytman ; Ivo Raaijmakers, Water lift mechanism with electrostatic pickup and method for transferring a workpiece.

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152. Lester, Paul; Meyer, Scott; Atkins, Wyland L.; Richards, Douglas; Predoaica, Constantin; Hudgens, Jeffrey; Carlson, Charles; Kankanala, Penchala; Rice, Mike; Papanu, James S.; Baiya, Evanson G.; Rosato, John J., Wet clean system design.

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153. Wilson,Gregory J.; McHugh,Paul R.; Hanson,Kyle M., Workpiece processor having processing chamber with improved processing fluid flow.

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