$\require{mediawiki-texvc}$

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

Gate insulated semiconductor device 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-029/04
출원번호 US-0300944 (1994-09-06)
우선권정보 JP-0246408 (1993-09-07); JP-0308627 (1993-11-15)
발명자 / 주소
  • Takemura Yasuhiko (Kanagawa JPX)
출원인 / 주소
  • Semiconductor Energy Laboratory Co., Ltd. (Kanagawa-ken JPX 03)
인용정보 피인용 횟수 : 130  인용 특허 : 0

초록 ▼

In order to provide TFTs having a low leak current property in its reverse biased state, the active semiconductor layer of the TFTs is doped with an impurity for increasing the band gap thereof, for example, carbon, nitrogen, and oxygen. Also, in order to compensate the decrease in conductivity due

대표청구항 ▼

A semiconductor device comprising: a substrate having an insulating surface; a semiconductor layer formed on said insulating surface, said semiconductor layer comprising a first region, at least one second region and a pair of third regions, said first region functioning as a channel and said pair o

이 특허를 인용한 특허 (130)

  1. Koyama, Jun; Ohtani, Hisashi; Ogata, Yasushi; Yamazaki, Shunpei, Active matrix display device having wiring layers which are connected over multiple contact parts.
    상세보기
  2. Chimura, Hidehiko, Active matrix panel.
    상세보기
  3. Chimura, Hidehiko, Active matrix panel.
    상세보기
  4. Chimura,Hidehiko, Active matrix panel.
    상세보기
  5. Shibuya Tsukasa,JPX ; Yoshinouchi Atsushi,JPX ; Zhang Hongyong,JPX ; Takenouchi Akira,JPX, Active matrix type display device and fabrication method of the same.
    상세보기
  6. Butler, Stephanie W.; Chen, Yuanning, Annealing to improve edge roughness in semiconductor technology.
    상세보기
  7. Yamazaki, Shunpei, Device comprising EL element electrically connected to P-channel transistor.
    상세보기
  8. Yamazaki, Shunpei; Takemura, Yasuhiko, Electric device, matrix device, electro-optical display device and semiconductor memory having thin-film transistors.
    상세보기
  9. Yamazaki,Shunpei; Takemura,Yasuhiko, Electric device, matrix device, electro-optical display device, and semiconductor memory having thin-film transistors.
    상세보기
  10. Yamazaki, Shunpei, Electro-optical device and manufacturing method thereof.
    상세보기
  11. Yamazaki, Shunpei, Electro-optical device and manufacturing method thereof.
    상세보기
  12. Yamazaki,Shunpei, Electro-optical device and manufacturing method thereof.
    상세보기
  13. Yamazaki,Shunpei, Electro-optical device and manufacturing method thereof.
    상세보기
  14. Yamazaki, Shunpei; Takemura, Yasuhiko, Electro-optical device and method for manufacturing the same.
    상세보기
  15. Yamazaki, Shunpei; Takemura, Yasuhiko, Electro-optical device and method for manufacturing the same.
    상세보기
  16. Yamazaki, Shunpei; Takemura, Yasuhiko, Electro-optical device and method for manufacturing the same.
    상세보기
  17. Yamazaki, Shunpei; Takemura, Yasuhiko, Electro-optical device and method for manufacturing the same.
    상세보기
  18. Yamazaki,Shunpei; Takemura,Yasuhiko, Electro-optical device and method for manufacturing the same.
    상세보기
  19. Yamazaki, Shunpei; Koyama, Jun; Fukunaga, Takeshi, Electrooptical device and method of fabricating the same.
    상세보기
  20. Yamazaki, Shunpei; Koyama, Jun; Fukunaga, Takeshi, Electrooptical device and method of fabricating the same.
    상세보기
  21. Yamazaki,Shunpei; Koyama,Jun; Fukunaga,Takeshi, Electrooptical device and method of fabricating the same.
    상세보기
  22. Yamazaki,Shunpei; Koyama,Jun; Fukunaga,Takeshi, Electrooptical device and method of fabricating the same.
    상세보기
  23. Chau, Robert S.; Barlage, Doulgas; Jin, Been-Yih, Field effect transistor and method of fabrication.
    상세보기
  24. Chau,Robert S.; Barlage,Doulgas; Jin,Been Yih, Field effect transistor and method of fabrication.
    상세보기
  25. Chau,Robert S.; Barlage,Doulgas; Jin,Been Yih, Field effect transistor and method of fabrication.
    상세보기
  26. Yamazaki, Shunpei; Fukunaga, Takeshi; Koyama, Jun; Inukai, Kazutaka, Light emitting device and fabricating method thereof.
    상세보기
  27. Yamazaki,Shunpei; Fukunaga,Takeshi; Koyama,Jun; Inukai,Kazutaka, Light emitting device and fabrication method thereof.
    상세보기
  28. Yamazaki, Shunpei; Fukunaga, Takeshi; Koyama, Jun; Inukai, Kazutaka, Light emitting device and manufacturing method thereof.
    상세보기
  29. Yamazaki, Shunpei; Fukunaga, Takeshi; Koyama, Jun; Inukai, Kazutaka, Light emitting device and manufacturing method thereof.
    상세보기
  30. Yamazaki, Shunpei, Light-emitting device having a triple-layer wiring structure.
    상세보기
  31. Liu, Haitao; Li, Jian; Mouli, Chandra, Memory devices with a connecting region having a band gap lower than a band gap of a body region.
    상세보기
  32. Liu, Haitao; Li, Jian; Mouli, Chandra, Memory devices with a connecting region having a band gap lower than a band gap of a body region.
    상세보기
  33. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Miyanaga Akiharu,JPX, Method and manufacturing semiconductor device.
    상세보기
  34. Lee, Seok Woon; Joo, Seung Ki, Method for fabricating thin film transistor including crystalline silicon active layer.
    상세보기
  35. Kunii, Masafumi, Method for fabricating thin-film transistor.
    상세보기
  36. Shimizu Akira,JPX ; Mori Yukihiro,JPX ; Fukazawa Atsuki,JPX, Method for forming polycrystal silicon film for semiconductor elements.
    상세보기
  37. Yamazaki, Shunpei; Shimada, Hiroyuki; Takenouchi, Akira; Takemura, Yasuhiko, Method for processing semiconductor device apparatus for processing a semiconductor and apparatus for processing semiconductor device.
    상세보기
  38. Yamazaki Shunpei,JPX ; Shimada Hiroyuki,JPX ; Takenouchi Akira,JPX ; Takemura Yasuhiko,JPX, Method for processing semiconductor device, apparatus for processing a semiconductor and apparatus for processing semiconductor device.
    상세보기
  39. Yamazaki, Shunpei, Method of fabricating a semiconductor device.
    상세보기
  40. Yamazaki, Shunpei, Method of fabricating a semiconductor device.
    상세보기
  41. Yamazaki, Shunpei, Method of fabricating a semiconductor device.
    상세보기
  42. Yamazaki, Shunpei; Ohtani, Hisashi, Method of fabricating a semiconductor device.
    상세보기
  43. Yamazaki, Shunpei; Ohtani, Hisashi, Method of fabricating a semiconductor device.
    상세보기
  44. Yamazaki, Shunpei; Ohtani, Hisashi, Method of fabricating a semiconductor device.
    상세보기
  45. Yamazaki, Shunpei; Ohtani, Hisashi, Method of fabricating a semiconductor device.
    상세보기
  46. Yamazaki, Shunpei; Ohtani, Hisashi, Method of fabricating a semiconductor device.
    상세보기
  47. Yamazaki, Shunpei; Ohtani, Hisashi, Method of fabricating a semiconductor device.
    상세보기
  48. Yamazaki,Shunpei; Ohtani,Hisashi, Method of fabricating a semiconductor device.
    상세보기
  49. Yamazaki,Shunpei; Ohtani,Hisashi, Method of fabricating a semiconductor device.
    상세보기
  50. Yamazaki,Shunpei; Ohtani,Hisashi, Method of fabricating a semiconductor device.
    상세보기
  51. Kuramasu, Keizaburo; Sasaki, Atsushi; Kawakita, Tetsuo, Method of fabricating a thin film transistor.
    상세보기
  52. Lin,Kun chih, Method of fabricating polysilicon film by excimer laser crystallization process.
    상세보기
  53. Yamazaki Shunpei,JPX ; Takenouchi Akira,JPX ; Takemura Yasuhiko,JPX, Method of fabricating thin film transistor.
    상세보기
  54. Yamazaki, Shunpei; Ohtani, Hisashi; Suzawa, Hideomi; Takayama, Toru, Method of forming a semiconductor device.
    상세보기
  55. Yamazaki, Shunpei, Method of manufacturing a semiconductor device.
    상세보기
  56. Yamazaki, Shunpei, Method of manufacturing a semiconductor device.
    상세보기
  57. Yamazaki, Shunpei, Method of manufacturing a semiconductor device.
    상세보기
  58. Yamazaki, Shunpei, Method of manufacturing a semiconductor device.
    상세보기
  59. Yamazaki, Shunpei, Method of manufacturing a semiconductor device.
    상세보기
  60. Yamazaki,Shunpei, Method of manufacturing a semiconductor device.
    상세보기
  61. Yamazaki, Shunpei, Method of manufacturing a semiconductor device having a gate electrode formed over a silicon oxide insulating layer.
    상세보기
  62. Yamazaki,Shunpei, Method of manufacturing a semiconductor device having a gate electrode with a three layer structure.
    상세보기
  63. Yamazaki, Shunpei, Method of manufacturing a semiconductor device including thermal oxidation to form an insulating film.
    상세보기
  64. Ohmori, Toshiaki, Method of manufacturing a semiconductor device wiring layer having an oxide layer between the polysilicon and silicide layers.
    상세보기
  65. Ohnuma,Hideto, Method of manufacturing semiconductor device.
    상세보기
  66. Ohnuma,Hideto, Method of manufacturing semiconductor device.
    상세보기
  67. Yamazaki, Shunpei; Sato, Yuhei; Sato, Keiji; Maruyama, Tetsunori; Koezuka, Junichi, Method of manufacturing semiconductor device.
    상세보기
  68. Yamazaki, Shunpei, Method of manufacturing semiconductor device having island-like single crystal semiconductor layer.
    상세보기
  69. Gardner Mark I. ; Fulford ; Jr. H. Jim, Nitrogenated gate structure for improved transistor performance and method for making same.
    상세보기
  70. Yamazaki, Shunpei; Ohtani, Hisashi; Koyama, Jun; Fukunaga, Takeshi, Nonvolatile memory and electronic apparatus.
    상세보기
  71. Hamm, Thomas; Mueller, Beno, Optical device.
    상세보기
  72. Yoo, Soon Sung; Kwak, Dong Yeung; Kim, Hu Sung; Kim, Yong Wan; Park, Dug Jin; Jung, Yu Ho; Lee, Woo Chae, Pad structure for liquid crystal display and method of manufacturing thereof.
    상세보기
  73. Hara, Akito; Kitahara, Kuninori; Murakami, Satoshi, Polycrystalline semiconductor device and its manufacture method.
    상세보기
  74. Fukunaga, Takeshi, Process for production of SOI substrate and process for production of semiconductor device.
    상세보기
  75. Fukunaga, Takeshi, Process for production of SOI substrate and process for production of semiconductor device including the selective forming of porous layer.
    상세보기
  76. Koyama Jun,JPX ; Takemura Yasuhiko,JPX ; Hayakawa Masahiko,JPX ; Yamazaki Shunpei,JPX ; Miyanaga Akiharu,JPX ; Ohtani Hisashi,JPX, Semiconductor active matrix circuit.
    상세보기
  77. Yamazaki, Shunpei, Semiconductor device.
    상세보기
  78. Yamazaki, Shunpei, Semiconductor device.
    상세보기
  79. Takemura, Yasuhiko; Teramoto, Satoshi, Semiconductor device and a method for manufacturing the same.
    상세보기
  80. Takemura, Yasuhiko; Teramoto, Satoshi, Semiconductor device and a method for manufacturing the same.
    상세보기
  81. Takemura, Yasuhiko; Teramoto, Satoshi, Semiconductor device and a method for manufacturing the same.
    상세보기
  82. Yamazaki, Shunpei; Arai, Yasuyuki; Koyama, Jun, Semiconductor device and fabrication method thereof.
    상세보기
  83. Yamazaki, Shunpei; Arai, Yasuyuki; Koyama, Jun, Semiconductor device and fabrication method thereof.
    상세보기
  84. Yamazaki, Shunpei; Arai, Yasuyuki; Koyama, Jun, Semiconductor device and fabrication method thereof.
    상세보기
  85. Yamazaki, Shunpei; Arai, Yasuyuki; Koyama, Jun, Semiconductor device and fabrication method thereof.
    상세보기
  86. Yamazaki, Shunpei; Arai, Yasuyuki; Koyama, Jun, Semiconductor device and fabrication method thereof.
    상세보기
  87. Yamazaki, Shunpei; Teramoto, Satoshi, Semiconductor device and fabrication method thereof.
    상세보기
  88. Koyama, Jun; Ohtani, Hisashi; Ogata, Yasushi; Yamazaki, Shunpei, Semiconductor device and manufacturing method thereof.
    상세보기
  89. Koyama, Jun; Ohtani, Hisashi; Ogata, Yasushi; Yamazaki, Shunpei, Semiconductor device and manufacturing method thereof.
    상세보기
  90. Suzawa, Hideomi; Ono, Koji; Takayama, Toru; Arao, Tatsuya; Yamazaki, Shunpei, Semiconductor device and manufacturing method thereof.
    상세보기
  91. Suzawa,Hideomi; Ono,Koji; Takayama,Toru; Arao,Tatsuya; Yamazaki,Shunpei, Semiconductor device and manufacturing method thereof.
    상세보기
  92. Suzawa,Hideomi; Ono,Koji; Takayama,Toru; Arao,Tatsuya; Yamazaki,Shunpei, Semiconductor device and manufacturing method thereof.
    상세보기
  93. Yamazaki, Shunpei; Kusumoto, Naoto; Ohnuma, Hideto; Tanaka, Koichiro, Semiconductor device and manufacturing method thereof.
    상세보기
  94. Yamazaki, Shunpei; Kusumoto, Naoto; Ohnuma, Hideto; Tanaka, Koichiro, Semiconductor device and manufacturing method thereof.
    상세보기
  95. Yamazaki,Shunpei; Kusumoto,Naoto; Ohnuma,Hideto; Tanaka,Koichiro, Semiconductor device and manufacturing method thereof.
    상세보기
  96. Suzawa, Hideomi; Ono, Koji; Takayama, Toru, Semiconductor device and method for manufacturing same.
    상세보기
  97. Suzawa, Hideomi; Ono, Koji; Takayama, Toru, Semiconductor device and method for manufacturing same.
    상세보기
  98. Suzawa, Hideomi; Ono, Koji; Takayama, Toru, Semiconductor device and method for manufacturing the same.
    상세보기
  99. Shunpei Yamazaki JP; Jun Koyama JP, Semiconductor device and method of fabricating the same.
    상세보기
  100. Yamazaki, Shunpei; Koyama, Jun, Semiconductor device and method of fabricating the same.
    상세보기
  101. Yamazaki, Shunpei; Koyama, Jun, Semiconductor device and method of fabricating the same.
    상세보기
  102. Yamazaki, Shunpei; Koyama, Jun, Semiconductor device and method of fabricating the same.
    상세보기
  103. Yamazaki, Shunpei; Koyama, Jun, Semiconductor device and method of fabricating the same.
    상세보기
  104. Yamazaki, Shunpei; Koyama, Jun, Semiconductor device and method of fabricating the same.
    상세보기
  105. Yamazaki, Shunpei; Koyama, Jun, Semiconductor device and method of fabricating the same.
    상세보기
  106. Yamazaki,Shunpei; Koyama,Jun, Semiconductor device and method of fabricating the same.
    상세보기
  107. Yamazaki,Shunpei; Ohtani,Hisashi; Suzawa,Hideomi; Takayama,Toru, Semiconductor device and method of fabricating the same.
    상세보기
  108. Iwamatsu Toshiaki,JPX ; Ipposhi Takashi,JPX, Semiconductor device and method of manufacturing the same.
    상세보기
  109. Iwamatsu Toshiaki,JPX ; Ipposhi Takashi,JPX, Semiconductor device and method of manufacturing the same.
    상세보기
  110. Yamazaki, Shunpei; Arai, Yasuyuki; Koyama, Jun, Semiconductor device comprising a pixel unit including an auxiliary capacitor.
    상세보기
  111. Yamazaki,Shunpei, Semiconductor device comprising thin film transistor comprising conductive film having tapered edge.
    상세보기
  112. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX, Semiconductor device having a monocrystalline layer composed of carbon, oxygen, hydrogen and nitrogen atoms.
    상세보기
  113. Yamazaki, Shunpei; Ohtani, Hisashi; Koyama, Jun; Fukunaga, Takeshi, Semiconductor device having buried oxide film.
    상세보기
  114. Yamazaki, Shunpei; Teramoto, Satoshi, Semiconductor device having parallel thin film transistors.
    상세보기
  115. Yamazaki, Shunpei; Teramoto, Satoshi, Semiconductor device having thin film transistor.
    상세보기
  116. Takemura, Yasuhiko, Semiconductor device including gate and conductor electrodes.
    상세보기
  117. Suzawa,Hideomi; Ono,Koji; Takayama,Toru, Semiconductor device that includes a gate insulating layer with three different thicknesses.
    상세보기
  118. Yamazaki, Shunpei, Semiconductor device with tapered gates.
    상세보기
  119. Ohnuma, Hideto, Semiconductor display device and manufacturing method thereof.
    상세보기
  120. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Miyanaga, Akiharu, Semiconductor film having a single-crystal like region with no grain boundary.
    상세보기
  121. Yamazaki, Shunpei; Koyama, Jun; Miyanaga, Akiharu; Fukunaga, Takeshi, Semiconductor thin film and method of manufacturing the same and semiconductor device and method of manufacturing the same.
    상세보기
  122. Shunpei Yamazaki JP; Hisashi Ohtani JP; Toru Mitsuki JP; Akiharu Miyanaga JP; Yasushi Ogata JP, Semiconductor thin film and semiconductor device.
    상세보기
  123. Yamazaki Shunpei,JPX ; Ohtani Hisashi,JPX ; Mitsuki Toru,JPX ; Miyanaga Akiharu,JPX ; Ogata Yasushi,JPX, Semiconductor thin film and semiconductor device.
    상세보기
  124. Yamazaki, Shunpei; Ohtani, Hisashi; Mitsuki, Toru; Miyanaga, Akiharu; Ogata, Yasushi, Semiconductor thin film and semiconductor device.
    상세보기
  125. Yamazaki, Shunpei; Ohtani, Hisashi; Mitsuki, Toru; Miyanaga, Akiharu; Ogata, Yasushi, Semiconductor thin film and semiconductor device.
    상세보기
  126. Yamazaki, Shunpei; Ohtani, Hisashi; Mitsuki, Toru; Miyanaga, Akiharu; Ogata, Yasushi, Semiconductor thin film and semiconductor device.
    상세보기
  127. Yamazaki,Shunpei; Ohtani,Hisashi; Mitsuki,Toru; Miyanaga,Akiharu; Ogata,Yasushi, Semiconductor thin film and semiconductor device.
    상세보기
  128. Takizawa Yutaka,JPX, Thin film semiconductor device having a polycrystal active region and a fabrication process thereof.
    상세보기
  129. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX, Thin film semiconductor having a monocrystalline region containing carbon, nitrogen and oxygen and crystallization prom.
    상세보기
  130. Jiang, Chunsheng; Hsin, Lung Pao, Thin film transistor, manufacturing method thereof, array substrate and display apparatus.
    상세보기

관련 콘텐츠

섹션별 컨텐츠 바로가기

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

AI-Helper 아이콘
AI-Helper
안녕하세요, AI-Helper입니다. 좌측 "선택된 텍스트"에서 텍스트를 선택하여 요약, 번역, 용어설명을 실행하세요.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.

선택된 텍스트

맨위로