초록 ▼

A high performance, durable sputter coated, heat-treatable glass which after heat-treatment exhibits about 76% or more visible transmittance, a hemispherical emissivity (Eh) of about 0.16 or less, and a normal emissivity (En) of about 0.12 or less is formed by sputter coating a layer system on a gla

A high performance, durable sputter coated, heat-treatable glass which after heat-treatment exhibits about 76% or more visible transmittance, a hemispherical emissivity (Eh) of about 0.16 or less, and a normal emissivity (En) of about 0.12 or less is formed by sputter coating a layer system on a glass substrate which includes an undercoat and overcoat of Si3N4, a silver layer, and two nickel or nichrome layers on opposite sides of the silver layer, and wherein the lower nickel-based layer is about three times as thick as the other nickel based layer. The increased thickness of the lower nickel-based layer allows the coated glass article to be both heat-treatable, and “low-E”after the heat-treatment. This allows matching with other known glasses in the family of layer components by way of the heat-treatment process. The layer system employed allows, even if not matchable to another glass, for the sputter coating operation to include the coating of other members of the family of coating without change of targets, efficient use of the coater targets that exist, and minimal operational changes during production.

대표청구항 ▼

A method of forming a heat-treated thin, durable, solar management layering system onto a glass substrate from the glass outwardly, the steps including: a) sputter coating in a nitrogen-containing atmosphere an undercoat layer of Si3N4; b) sputter coating in an inert gas-containing atmosphere a firs

A method of forming a heat-treated thin, durable, solar management layering system onto a glass substrate from the glass outwardly, the steps including: a) sputter coating in a nitrogen-containing atmosphere an undercoat layer of Si3N4; b) sputter coating in an inert gas-containing atmosphere a first layer of nickel or nichrome, said first nickel or nichrome layer having a thickness greater than about 20 Åthick; c) sputter coating in an inert gas-containing atmosphere a layer of silver; d) sputter coating in an inert gas-containing atmosphere a second layer of nickel or nichrome, said second layer of nickel or nichrome being about 7-15 Åthick; e) sputter coating in a nitrogen containing atmosphere an overcoat layer of Si3N4; and thereafter heat-treating said coated glass wherein said heat-treating is selected from tempering, bending or heat treating; and wherein said heat-treated, sputter coated glass has the following characteristics after said heat-treatment when said glass substrate is clear glass and has a thickness of about 2.5-3.5 mm: Transmittance (Ill. C. 10°obs.) about 76%-78% Sheet Resistance (Rs) less than about 12 ohms/sq Emissivity, normal (En) less than about 0.12 Emissivity, hemispherical (Eh) less than about 0.16.