이 특허를 인용한 특허 (49)

1. Christian, Paul; Howdle, Steven Melvyn; Irvine, Derek John, Addition polymerization in a homogeneous reaction mixture.

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2. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Apparatus for supercritical processing of multiple workpieces.

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3. Beckman, Eric J.; Sarbu, Traian; Styranec, Thomas J., Carbon dioxide-philic compounds and methods of synthesis thereof.

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4. DeSimone, Joseph M.; Birnbaum, Eva; Carbonell, Ruben G.; Crette, Stephanie; McClain, James B.; McCleskey, T. Mark; Powell, Kimberly R.; Romack, Timothy J.; Tumas, William, Carbon dioxide-soluble polymers and swellable polymers for carbon dioxide applications.

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5. Wai, Chien M.; Ohde, Hiroyuki; Kramer, Stephen J., Compositions comprising supercritical carbon dioxide and metallic compounds.

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6. Jones,William Dale, Control of fluid flow in the processing of an object with a fluid.

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7. Arena Foster,Chantal J.; Awtrey,Allan Wendell; Ryza,Nicholas Alan; Schilling,Paul, Developing photoresist with supercritical fluid and developer.

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8. Arena-Foster, Chantal J.; Awtrey, Allan Wendell; Ryza, Nicholas Alan; Schilling, Paul, Developing photoresist with supercritical fluid and developer.

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9. Arena-Foster, Chantal J.; Awtrey, Allan Wendell; Ryza, Nicholas Alan; Schilling, Paul, Drying resist with a solvent bath and supercritical CO2.

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10. Gleason, Karen K.; Ober, Christopher; Herr, Daniel, Electrical device including dielectric layer formed by direct patterning process.

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11. Joseph M. Desimone ; Terri Johnson Carson ; John F. Miller ; Sharon Wells, Fluorinated copolymer surfactants and use thereof in aerosol compositions.

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12. Gupta, D. V. Satyanarayana, Liquid CO2/hydrocarbon oil emulsion fracturing system.

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13. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method and apparatus for supercritical processing of multiple workpieces.

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14. Parent,Wayne M.; Goshi,Gentaro, Method and system for cooling a pump.

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15. Hansen,Brandon; Lowe,Marie, Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid.

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16. Adams, Lea; Fisher, Edward C.; Malone, Josh; Miller, Seth; Smith, Jack C.; Dennis, William Kevin; Marsh, Jeffrey W., Method for lubricating MEMS components.

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17. Malone, Joshua, Method for stripping sacrificial layer in MEMS assembly.

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18. Malone,Joshua, Method for stripping sacrificial layer in MEMS assembly.

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19. Kawamura,Kohei; Asano,Akira; Miyatani,Koutarou; Hillman,Joseph T.; Palmer,Bentley, Method for supercritical carbon dioxide processing of fluoro-carbon films.

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20. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method for supercritical processing of multiple workpieces.

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21. Biberger, Maximilian A.; Schilling, Paul E., Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module.

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22. Biberger,Maximilian A.; Schilling,Paul E., Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module.

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23. Hillman,Joseph, Method of inhibiting copper corrosion during supercritical COcleaning.

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24. Joseph M. DeSimone ; Saad A. Khan ; Joseph R. Royer ; Richard J. Spontak ; Teri Anne Walker, Method of making foamed materials using surfactants and carbon dioxide.

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25. Toma,Dorel Ioan; Schilling,Paul, Method of passivating of low dielectric materials in wafer processing.

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26. Biberger,Maximilian Albert; Layman,Frederick Paul; Sutton,Thomas Robert, Method of supercritical processing of a workpiece.

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27. Schilling,Paul, Method of treating a composite spin-on glass/anti-reflective material prior to cleaning.

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28. Schilling,Paul, Method of treatment of porous dielectric films to reduce damage during cleaning.

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29. Miller, Seth Andrian, Method of undercutting micro-mechanical device with super-critical carbon dioxide.

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30. DeSimone, Joseph M.; Paisner, Sara Naomi, Methods of forming polymeric structures using carbon dioxide and polymeric structures formed therapy.

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31. Wai, Chien M.; Ohde, Hiroyuki; Kramer, Stephen J., Methods of increasing the solubility of materials in supercritical carbon dioxide.

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32. DeSimone, Joseph M.; Khan, Saad A.; Royer, Joseph R.; Spontak, Richard J.; Walker, Teri Anne; Gay, Yvon J.; Siripurapu, Srinivas, Methods of making foamed materials of blended thermoplastic polymers using carbon dioxide.

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33. DeSimone, Joseph M.; Siripurapu, Srinivas; Khan, Saad A.; Spontak, Richard J.; Royer, Joseph, Nano-and micro-cellular foamed thin-walled material, and processes and apparatuses for making the same.

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34. Mullee,William H.; de Leeuwe,Marc; Roberson, Jr.,Glenn A.; Palmer,Bentley J., Removal of CMP and post-CMP residue from semiconductors using supercritical carbon dioxide process.

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35. Mullee, William H.; de Leeuwe, Marc; Roberson, Jr., Glenn A., Removal of CMP residue from semiconductor substrate using supercritical carbon dioxide process.

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36. Mullee William H. ; de Leeuwe Marc ; Roberson ; Jr. Glenn A., Removal of CMP residue from semiconductors using supercritical carbon dioxide process.

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37. Bertram, Ronald Thomas; Scott, Douglas Michael, Removal of contaminants from a fluid.

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38. Mullee, William H., Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process.

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39. Mullee, William H., Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process.

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40. William H. Mullee ; Maximilian A. Biberger ; Paul E. Schilling, Removal of photoresist and residue from substrate using supercritical carbon dioxide process.

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41. Koch Robert, Removal of polishing residue from substrate using supercritical fluid process.

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42. Mullee William H., Removal of resist or residue from semiconductors using supercritical carbon dioxide.

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43. Gleason, Karen K.; Ober, Christopher; Herr, Daniel, Solventless, resistless direct dielectric patterning.

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44. Dickinson, C. John; Jansen, Frank; Murphy, Daimhin P., Substrate processing apparatus and related systems and methods.

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45. Gale,Glenn; Hillman,Joseph T.; Jacobson,Gunilla; Palmer,Bentley, System and method for processing a substrate using supercritical carbon dioxide processing.

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46. Charles W. Manke ; Esin Gulari ; Deborah Frances Mielewski ; Ellen Cheng-chi Lee, System and method of delaminating a layered silicate material by supercritical fluid treatment.

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47. Mielewski, Deborah Frances; Lee, Ellen Cheng-chi; Manke, Charles W; Gulari, Esin, System and method of preparing a reinforced polymer by supercritical fluid treatment.

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48. Jacobson,Gunilla; Yellowaga,Deborah, Treatment of a dielectric layer using supercritical CO.

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49. Kevwitch, Robert, Treatment of substrate using functionalizing agent in supercritical carbon dioxide.

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