초록 ▼

A process for producing a heat-resistant and high-purity porous silicon oxide material having excellent crystallinity and uniformity in pore size. The process includes: a first step of dispersing a substance containing silicon in an aqueous solution of a surfactant and adjusting the pH of the disper

A process for producing a heat-resistant and high-purity porous silicon oxide material having excellent crystallinity and uniformity in pore size. The process includes: a first step of dispersing a substance containing silicon in an aqueous solution of a surfactant and adjusting the pH of the dispersion to a value of 10 or higher; a second step of adjusting the pH thereof to a value lower than 10 and forming a composite of a silicon oxide and a surfactant; and a third step of removing the surfactant from the composite. A water-soluble component is preferably removed from the dispersion between the first and second steps.

대표청구항 ▼

A process for producing a porous silicon oxide material, comprising: a first step of dispersing a substance containing silicon in an aqueous solution of a surfactant, and adjusting the pH of the dispersion to a value of 10 or higher to increase the activity of the surfactant an effective amount to f

A process for producing a porous silicon oxide material, comprising: a first step of dispersing a substance containing silicon in an aqueous solution of a surfactant, and adjusting the pH of the dispersion to a value of 10 or higher to increase the activity of the surfactant an effective amount to form an aggregate of micelle-like surfactant; a second step of adjusting the pH of the dispersion to a value lower than 10, and forming a composite of a silicon oxide and the micelle-like surfactant; and a third step of removing the surfactant from the composite while leaving the structure of the silicon oxide substantially intact.