초록 ▼

High purity argon is produced by subjecting a two-phase liquid-vapor mixture containing up to 3 volume % of nitrogen and/or up to 5 volume % oxygen to cryogenic temperature swing adsorption in an adsorption bed containing one or more adsorbents selective for nitrogen and/or oxygen at a temperature b

High purity argon is produced by subjecting a two-phase liquid-vapor mixture containing up to 3 volume % of nitrogen and/or up to 5 volume % oxygen to cryogenic temperature swing adsorption in an adsorption bed containing one or more adsorbents selective for nitrogen and/or oxygen at a temperature between the bubble point and the dew point of the two-phase mixture.

대표청구항 ▼

A process for purifying a mixture of a specific fluid component and at least one impurity comprising subjecting said mixture to a temperature swing adsorption process having an adsorption step which comprises passing a liquid-vapor blend of said mixture or of said mixture in vapor form and substanti

A process for purifying a mixture of a specific fluid component and at least one impurity comprising subjecting said mixture to a temperature swing adsorption process having an adsorption step which comprises passing a liquid-vapor blend of said mixture or of said mixture in vapor form and substantially impurity-free specific fluid component in liquid form upwardly through at least one bed of adsorbent which adsorbs said at least one impurity more strongly than said specific fluid component, and passing purified specific fluid component out through the top of said bed of adsorbent, the temperature of said at least one bed of adsorbent at the beginning of said adsorption step being between the bubble point and the dew point of said mixture, said adsorption process being conducted under conditions such that substantially no impurity-containing specific fluid component liquid passes out through the top of said bed of adsorbent with said purified specific fluid.