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Apparatus for applying ceramic coatings 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23C-016/00
출원번호 US-0389216 (1989-08-03)
발명자 / 주소
  • Mullin Richard S. (Pomfret CT) Riendeau Leo A. (Springfield MA) Ulion Nicholas E. (Marlborough CT)
출원인 / 주소
  • United Technologies Corporation (Hartford CT 02)
인용정보 피인용 횟수 : 35  인용 특허 : 21

초록 ▼

An apparatus for applying ceramic coatings using an electron beam-physical vapor deposition apparatus is described. The apparatus includes means for introducing the anionic constitutent of the ceramic into a coating chamber and means for confining the anionic constituent about the component to be co

대표청구항 ▼

In an electron beam physical vapor deposition apparatus for applying a coating to the surface of a component, said apparatus comprising a coating chamber defining a first volume, means for supporting a ceramic target within said coating chamber, means for evacuating said coating chamber, and means f

이 특허에 인용된 특허 (21)

  1. Demaray Richard E. (Oakland CA), Adherent ceramic coatings.
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  2. Beucherie Pierre (Biandronno (Varese) IT), Apparatus for depositing thin layers of materials by reactive spraying in a high-frequency inductive plasma.
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  3. Nath Prem (Rochester MI), Apparatus for plasma assisted evaporation of thin films and corresponding method of deposition.
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  4. Strangman Thomas E. (Phoenix AZ), Columnar grain ceramic thermal barrier coatings.
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  5. Elam ; Richard C. ; Ulion ; Nicholas E., Fabrication of Co-Cr-Al-y feed stock.
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  6. Komatsu Shoichi (Suwa JPX) Iwamatsu Seiichi (Suwa JPX), High pressure chemical vapor deposition.
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  7. Murayama Yoichi (Tosimaku Mejiro 3 tyome ; 17 ban 23 go Mejiro Daiichi Kopo Tokyo JA), High vacuum ion plating device.
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  8. Inokuti Yukio (Chiba JPX) Ohkubo Osamu (Takaza JPX), Hollow cathode gun and deposition device for ion plating process.
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  9. Cann Gordon L. (P.O. Box 279 Laguna Beach CA 92652), Magnetoplasmadynamic apparatus and process for the separation and deposition of materials.
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  10. Feuerstein Albert (Neuberg DEX), Method and apparatus for reactive vapor deposition of metal compounds.
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  11. Miyamoto Hidekazu (Sagamihara JPX) Shioya Yoshimi (Yokohama JPX) Maeda Mamoru (Tama JPX) Takagi Mikio (Kawasaki JPX), Method for coating a semiconductor device with a phosphosilicate glass.
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  12. Heimbach Klaus-Jrgen (Hattersheim DEX) Zltzke Walter (Hanau DEX), Method for regulating the evaporation rate of oxidizable substances in reactive vacuum deposition.
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  13. Wiesmann Harold J. (Vactronic Lab. Equipment ; Inc. ; 65 Brightside Ave. E. Northport NY 11731), Method for the indirect deposition of amorphous silicon and polycrystalline silicone and alloys thereof.
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  14. Ura ; Mitsuru ; Ogawa ; Takuzo ; Suzuki ; Takaya ; Inoue ; Yosuke ; Nomur a ; Masayoshi, Method of doping inpurities.
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  15. Pulker Hans K. (Tiesen LIX) Daxinger Helmut (Wangs CHX), Method of producing gold-color coatings.
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  16. Akira Shuhara (Amagasaki JPX) Kenichiro Yamanishi (Amagasaki JPX) Yoshibumi Minowa (Amagasaki JPX), Method of producing silicon dioxide films.
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  17. Engle ; Jr. George M. (San Jose CA), Plasma enhanced chemical vapor processing of semiconductive wafers.
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  18. Goward George W. (North Haven CT) Grey Delton A. (Vernon CT) Krutenat Richard C. (Richland WA), Thermal barrier coating for nickel and cobalt base super alloys.
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  19. Kawagoe Yasuyuki (Amagasaki JPX) Yamanishi Kenichiro (Amagasaki JPX) Yasunaga Seiji (Amagasaki JPX), Thin film deposition apparatus.
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  20. Mertens Horst M. (Munich DEX) Bgl Leonhard (Buchbach DEX), Vacuum vapor-deposition system.
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  21. Axenov, Ivan I.; Bren, Viktor G.; Padalka, Valentin G.; Sablev, Leonid P.; Stupak, Rimma I.; Khoroshikh, Vladimir M., Vacuum-arc plasma apparatus.
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  1. Jenson, Mark L.; Klaassen, Jody J.; Sullivan, Jim, Active wireless tagging system on peel and stick substrate.
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  2. Shakespeare,Stuart, Apparatus and method for depositing material onto a substrate using a roll-to-roll mask.
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  3. Jacobs, Harlan T.; Jenson, Mark L.; Klaassen, Jody J.; Yan, Jenn-Feng, Battery-operated wireless-communication apparatus and method.
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  4. Jacobs, Harlan T.; Jenson, Mark L.; Klassen, Jody J.; Yan, Jenn-Feng, Battery-operated wireless-communication apparatus and method.
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  5. Jacobs,Harlan Theodore; Jenson,Mark Lynn; Klaassen,Jody Jon; Yan,Jenn Feng, Battery-operated wireless-communication apparatus and method.
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  6. Ridgeway, Neil B., Coated article and coating process therefor.
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  7. Strock, Christopher W., Composite article having metal-containing layer with phase-specific seed particles and method therefor.
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  8. Uribe, Francisco A.; Wilson, Mahlon S.; Garzon, Fernando H., Composite materials and method of making.
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  9. Jenson,Mark Lynn, Continuous processing of thin-film batteries and like devices.
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  10. Jenson,Mark Lynn; Klaassen,Jody Jon; Weiss,Victor Henry; Yan,Jenn Feng, Device enclosures and devices with integrated battery.
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  11. Neal, James W., Electron beam vapor deposition apparatus and method of coating.
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  12. Neal, James W.; Schlichting, Kevin W.; Gero, Peter F., High pressure pre-oxidation for deposition of thermal barrier coating with hood.
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  13. Tarnowski,Dave J.; Jenson,Mark L., Layered barrier structure having one or more definable layers and method.
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  14. Klaassen,Jody J., Lithium/air batteries with LiPON as separator and protective barrier and method.
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  15. Klaassen,Jody J., Lithium/air batteries with LiPON as separator and protective barrier and method.
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  16. Jenson, Mark L., Low-temperature fabrication of thin-film energy-storage devices.
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  17. Jenson, Mark L.; Klaassen, Jody J., Method and apparatus for integrated-circuit battery devices.
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  18. Jenson, Mark L.; Klaassen, Jody J., Method and apparatus for integrated-circuit battery devices.
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  19. Jenson,Mark L.; Weiss,Victor H., Method and apparatus for thin-film battery having ultra-thin electrolyte.
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  20. Quinn, Daniel E.; Hiskes, David J.; Mercier, Carl W.; Minor, Michael; Pellet, Paul M.; Miller, Michael L., Method and assembly for gas turbine engine airfoils with protective coating.
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  21. Jenson, Mark Lynn, Method of continuous processing of thin-film batteries and like devices.
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  22. Callaway Martin A. ; Adair Robert D. ; Murphy Kenneth S. ; Maniurski Theodore J., Method of controlling vapor deposition substrate temperature.
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  23. Steven M. Burns, Preheat method for EBPVD coating.
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  24. Fandrei, II, Theodore William, Process of fabricating a shield and process of preparing a component.
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  25. Read, John B.; Sweeney, Daniel C., Rugged, gel-free, lithium-free, high energy density solid-state electrochemical energy storage devices.
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  26. Sweeney, Daniel C.; Read, John B., Rugged, gel-free, lithium-free, high energy density solid-state electrochemical energy storage devices.
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  27. Murphy, Kenneth S., Solid oxide fuel cell electrolyte and method.
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  28. Jenson,Mark L.; Klaassen,Jody J.; Sullivan,Jim; Lemaire,Charles A.; Billion,Richard E., Solid state MEMS activity-activated battery device and method.
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  29. Jenson, Mark L.; Klaassen, Jody J.; Sullivan, Jim; Lemaire, Charles A.; Billion, Richard E., Solid state activity-activated battery device and method.
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  30. Schlichting, Kevin W.; Broadhurst, Donald G.; Hyde, John H.; Blondin, John F., Systems and methods for forming components with thermal barrier coatings.
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  31. Klaassen, Jody J., Thin-film batteries with polymer and LiPON electrolyte layers and method.
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  32. Jenson,Mark L., Thin-film battery devices and apparatus for making the same.
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  33. Jenson,Mark Lynn; Weiss,Victor Henry, Thin-film battery having ultra-thin electrolyte.
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  34. Jenson,Mark Lynn; Weiss,Victor Henry, Thin-film battery having ultra-thin electrolyte and associated method.
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  35. Callaway, Martin A.; Adair, Robert D.; Murphy, Kenneth S.; Maniurski, Theodore J., Vapor deposition temperature control apparatus and method.
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