Vinyl ether compounds having additional functional groups other than vinyl ether groups and the use thereof in the formu
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
C08G-059/00
C08G-065/00
C08F-016/12
C08F-002/50
출원번호
US-0304464
(1994-09-12)
우선권정보
CH-0002786 (1993-09-16); CH-0000684 (1994-03-08)
발명자
/ 주소
Steinmann Bettina (Les Russilles 1724 Praroman CHX) Schulthess Adrian (Uff em Barg 22 1734 Tentlingen CHX) Hunziker Max (Chasseralstrasse 8 3186 Dudingen CHX)
인용정보
피인용 횟수 :
30인용 특허 :
0
초록▼
The invention relates to compounds having at least one vinyl ether group which also contain in the molecule at least one further functional group selected from acrylate, methacrylate, epoxy, alkenyl, cycloalkenyl and vinylaryl groups, to compositions, especially for stereolithography, comprising tho
The invention relates to compounds having at least one vinyl ether group which also contain in the molecule at least one further functional group selected from acrylate, methacrylate, epoxy, alkenyl, cycloalkenyl and vinylaryl groups, to compositions, especially for stereolithography, comprising those vinyl ether compounds, and to a method of producing three-dimensional objects using those compositions.
대표청구항▼
A radiation polymerizable composition comprising: a compound having at least one vinyl ether group which also contains in the molecule at least one further functional group, which compound is represented by the formula [Figure] wherein the symbols used in the above formula and in the formulae below
A radiation polymerizable composition comprising: a compound having at least one vinyl ether group which also contains in the molecule at least one further functional group, which compound is represented by the formula [Figure] wherein the symbols used in the above formula and in the formulae below have the following definitions: A is a z-valent radical selected from the radicals of the following formulae (1), (2), (3) and (4) [Figure] (1) [Figure] (2) [Figure] (3) [Figure] (4) [D]is a group of the formula [Figure] (5) [E]is a C1- or a C2-alkylene group; R0 is a hydrogen atom or a methyl group; R1 is a z-valent radical selected from aliphatic, cycloaliphatic, aromatic, aliphatic-aromatic and aliphatic-cycloaliphatic radicals and polyoxyalkylene radicals and is unsubstituted or may have one or more substituents which in the case of an aliphatic radical R1 are selected from C1-C4alkoxy and halogen substituents; and in the case of other types of radical Rl are selected from C1-C4alkyl, C1-C4alkoxy and halogen substituents; R2 is a radical selected from the radicals of the formulae [Figure] [Figure] R4 is a group selected from the groups of the formulae [Figure] [Figure] R5 is a group selected from the groups of the formulae [Figure] [Figure] [Figure] [Figure] [Figure] [Figure] R6 is a (2ㆍz)-valent organic group which, together with the carbon atoms Cab2), forms a cycloaliphatic ring having at least 5 carbon atoms; R14 and R15 are each a hydrogen atom or, when [E]is a C2alkylene group, are each a hydrogen atom or together form a methylene group; i is an integer from 0 to 20; m is an integer from 1 to 20; s is an integer from 2 to 10; t is an integer from 0 to 10; u in the individual units of the formula [Figure] in formula (5) are independently of one another an integer from 1 to 20; v is an integer from 0 to 4; x and y are independently of one another an integer from 2 to 20, and z is the number 1 or 2; at least one radically or cationically polymerisable compound that is different therefrom selected from the group consisting of mono-, di-, and poly(meth)acrylates, vinyl compounds, and di- and polyfunctional epoxy compounds; and at least one photoinitiator for the cross-linking of the compounds.
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