초록 ▼

A system is provided for batch loading semiconductor wafers into a load lock from a portable carrier used for supporting a plurality of the wafers in spaced relationship and transporting them in a particle free environment. The carrier is supported adjacent a load lock chamber which also has a parti

A system is provided for batch loading semiconductor wafers into a load lock from a portable carrier used for supporting a plurality of the wafers in spaced relationship and transporting them in a particle free environment. The carrier is supported adjacent a load lock chamber which also has a particle free environment. A multilevel end effector associated with the load lock chamber includes a plurality of spaced end effector sets, each set being adapted to support a wafer thereon and aligned with an associated wafer supported in the carrier. The plurality of wafers are engaged and simultaneously retrieved as a grouping, then held in the load lock chamber awaiting further processing. A variety of mechanisms are provided for moving the end effector sets, both elevationally and into and out of the carrier and load lock chamber, and for moving a carrier door and a load lock door between closed, sealed, positions and open positions and to a parked position remote from the region between the carrier and the load lock chamber.

대표청구항 ▼

A system for batch loading semiconductor wafers comprising: a portable carrier for supporting and transporting in a substantially particle free environment a plurality of the wafers in substantially spaced relationship, said carrier having a carrier port for providing access to the interior thereof;

A system for batch loading semiconductor wafers comprising: a portable carrier for supporting and transporting in a substantially particle free environment a plurality of the wafers in substantially spaced relationship, said carrier having a carrier port for providing access to the interior thereof; a carrier door on said carrier movable between a closed position overlying said carrier port for sealing the interior of said carrier from the surrounding environment and an open position spaced from said carrier port; a load lock defining a chamber therein having a substantially particle free environment and including a load lock port opening into the load lock chamber; a load lock door on said load lock movable between a closed position overlying said load lock port and an open position spaced therefrom; a load lock arm within the load lock chamber movable between an inactive position distant from the carrier and an active position proximate the carrier; and a multilevel end effector on said load lock arm including a plurality of spaced end effector sets, each said end effector set adapted to support a wafer thereon, each of said plurality of spaced end effector sets being aligned with an associated wafer supported in the carrier when said load lock arm is in the active position, said multilevel end effector being movable, when said load lock arm is in the active position and when said load lock door is in the open position, from a retracted position distant from the wafers to an advanced position within the carrier and extending through said load port and through said carrier port for engaging and simultaneously retrieving the wafers as a grouping, then again to the retracted position for holding the grouping of wafers in the load lock chamber.