초록 ▼

The disclosure where the hydrogen peroxide vapor 4a is supplied to a treatment vessel, and a subject 1 to be treated in the treatment vessel 2 is subjected to a sterilization treatment by contact with the hydrogen peroxide vapor 4a, the concentration of the hydrogen peroxide vapor 4a in the treatmen

The disclosure where the hydrogen peroxide vapor 4a is supplied to a treatment vessel, and a subject 1 to be treated in the treatment vessel 2 is subjected to a sterilization treatment by contact with the hydrogen peroxide vapor 4a, the concentration of the hydrogen peroxide vapor 4a in the treatment vessel 2 is detected directly and accurately on a real-time basis by a semiconductor gas sensor 8.

대표청구항 ▼

A method for detecting a concentration of hydrogen peroxide vapor in a treatment vessel for sterilization treatment of an object with hydrogen peroxide vapor, comprising the steps of: arranging a semiconductor gas sensor sensitive to hydrogen peroxide inside the treatment vessel with an output propo

A method for detecting a concentration of hydrogen peroxide vapor in a treatment vessel for sterilization treatment of an object with hydrogen peroxide vapor, comprising the steps of: arranging a semiconductor gas sensor sensitive to hydrogen peroxide inside the treatment vessel with an output proportional to the hydrogen peroxide vapor concentration therein; arranging a concentration indicator outside the treatment vessel; supplying hydrogen peroxide vapor to said vessel in a flow regulated amount that is controlled according to the concentration measured by said sensor; indicating the concentration of hydrogen peroxide vapor with said indicator using an output of said sensor.