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Wafer transfer system having rotational capability 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B65G-001/06
출원번호 US-0651715 (1996-05-22)
발명자 / 주소
  • Wiesler Mordechai (Lexington MA) Weiss Mitchell (Haverford PA)
출원인 / 주소
  • PRI Automation, Inc. (Billerica MA 02)
인용정보 피인용 횟수 : 39  인용 특허 : 14

초록

A wafer transfer system is operable with a front or side loading wafer carrier to move one or more horizontally oriented wafers out of the carrier and to rotate the wafers to a vertical orientation in which the wafers are accessible for further processing. The transfer system provides a wafer extrac

대표청구항

A semiconductor wafer transfer system for moving a wafer horizontally into and out of a wafer support device to and from a position in which the wafer is maintained in a vertical orientation accessible for further processing, the wafer support device having opposed, paired shoulders on interior wall

이 특허에 인용된 특허 (14)

  1. Prentakis Antonios E. (Cambridge MA), Apparatus and method for loading and unloading wafers.
  2. Cruz Didier (Grenoble FRX), Apparatus for placing or storing flat articles in a cassette with intermediate racks.
  3. Kimata Kazuo (Bisai JPX) Ishikawa Susumu (Aichi JPX), Carrier system for silicon wafer.
  4. Grunes Howard E. (Santa Cruz CA), Direct load/unload semiconductor wafer cassette apparatus and transfer system.
  5. Ohsawa Tetsu (Sagamihara JPX), Heat treating apparatus.
  6. Manriquez Ralph F. (Saratoga CA), Integrated circuit wafer transport mechanism.
  7. Chiba Yuji (Isehara JPX) Fujioka Hidehiko (Atsugi JPX) Mizusawa Nobutoshi (Yamato JPX) Kariya Takao (Hino JPX) Shimoda Isamu (Zama JPX), Mask cassette and mask cassette loading device.
  8. Akimoto Masami (Kumamoto JPX) Yoshioka Kazutoshi (Kumamoto JPX) Iida Naruaki (Kumamoto JPX), Method for processing wafer-shaped substrates.
  9. Akimoto Masami (Kikuyo JPX) Kimura Yoshio (Kumamoto JPX) Hirakawa Osamu (Kumamoto JPX) Anai Noriyuki (Kumamoto JPX) Tateyama Masanori (Kumamoto JPX) Sakamoto Yasuhiro (Kumamoto JPX), Resist process apparatus.
  10. Kitayama Hirofumi (Aikawa JPX) Kato Mitsuo (Sagamihara JPX) Takanabe Eiichiro (Shiroyama JPX) Kobayashi Masaru (Shiroyama JPX), Substrate transfer device.
  11. Suzuki Fujio (Kanagawa JPX), Substrate transfer method.
  12. Murata Masanao (Ise JPX) Yamashita Teppei (Ise JPX) Tanaka Tsuyoshi (Ise JPX) Hoshiko Takahide (Ise JPX) Karita Mitsuji (Ise JPX) Kawano Hitoshi (Ise JPX) Shinya Tutomu (Ise JPX), Wafer conveying system in a clean room.
  13. Mikahara Takanori (Tuchiura JPX), Wafer pick out apparatus.
  14. Takahashi Kiyoshi (17-25 Hirai 7-chome Edogawa-ku ; Tokyo JPX) Takahashi Kazuo (17-3 Higashikasai 2-chome Edogawa-ku ; Tokyo JPX), Wafer transfer device.

이 특허를 인용한 특허 (39)

  1. Cook, Gregory; Chidlow, Craig; Ow, Rodney; Nugyen, Lang Van; Gomez, J. Rafael; Reyling, Steve; Aalund, Martin P.; Remis, Steven J., Apparatus and method for using a robot to remove a substrate carrier door.
  2. Schauer, Ronald Vern; Lappen, Alan Rick, Apparatus for alignment of automated workpiece handling systems.
  3. Denker Jeffrey M., Automated door assembly for use in semiconductor wafer manufacturing.
  4. Jeffrey M. Denker, Automated door assembly for use in semiconductor wafer manufacturing.
  5. Doherty, Brian J.; Mariano, Thomas R.; Sullivan, Robert P., Automated material handling system for semiconductor manufacturing based on a combination of vertical carousels and overhead hoists.
  6. Doherty, Brian J.; Mariano, Thomas R.; Sullivan, Robert P., Automated material handling system for semiconductor manufacturing based on a combination of vertical carousels and overhead hoists.
  7. Doherty, Brian J.; Mariano, Thomas R.; Sullivan, Robert P., Automated material handling system for semiconductor manufacturing based on a combination of vertical carousels and overhead hoists.
  8. Doherty, Brian J.; Mariano, Thomas R.; Sullivan, Robert P., Automated material handling system for semiconductor manufacturing based on a combination of vertical carousels and overhead hoists.
  9. Doherty,Brian J.; Mariano,Thomas R.; Sullivan,Robert P., Automated material handling system for semiconductor manufacturing based on a combination of vertical carousels and overhead hoists.
  10. Lee,Jae Chull; Berkstresser,David, Curved slit valve door with flexible coupling.
  11. Lee, Jae-Chull; Kurita, Shinichi; White, John M.; Anwar, Suhail, Decoupled chamber body.
  12. Kurita, Shinichi; Blonigan, Wendell T., Double dual slot load lock chamber.
  13. Kurita, Shinichi; Blonigan, Wendell T.; Hosokawa, Akihiro, Dual substrate loadlock process equipment.
  14. Kurita, Shinichi; Blonigan, Wendell T.; Hosokawa, Akihiro, Dual substrate loadlock process equipment.
  15. Fosnight,William John; Bufano,Michael; Friedman,Gerald; Sullivan,Robert, Extractor/buffer.
  16. Kurita, Shinichi; Blonigan, Wendell T.; Tanase, Yoshiaki, Large area substrate transferring method for aligning with horizontal actuation of lever arm.
  17. Kurita,Shinichi; Blonigan,Wendell T.; Tanase,Yoshiaki, Load lock chamber for large area substrate processing system.
  18. Kurita,Shinichi; Blonigan,Wendell T., Load lock chamber having two dual slot regions.
  19. Lee, Jae-Chull; Anwar, Suhail; Kurita, Shinichi, Load lock chamber with decoupled slit valve door seal compartment.
  20. Schauer,Ronald Vern; Lappen,Alan Rick; Tuttle,David L., Method and apparatus for aligning a cassette.
  21. Cesna Joseph V. ; Kim Inki, Method and apparatus for improved semiconductor wafer polishing.
  22. Cesna Joseph V. ; Kim Inki, Method and apparatus for improved semiconductor wafer polishing.
  23. Flitsch, Frederick A., Method and apparatus to support process tool modules in a cleanspace fabricator.
  24. Kurita,Shinichi; Blonigan,Wendell T., Method for transferring substrates in a load lock chamber.
  25. Elliott, Martin R.; Shah, Vinay, Methods and apparatus for mapping carrier contents.
  26. Elliott,Martin R.; Rice,Michael Robert, Methods and apparatus for repositioning support for a substrate carrier.
  27. Heyder Roger V. ; Brezocsky Thomas B. ; Davenport Robert E., Multiple loadlock system.
  28. Roger V. Heyder ; Thomas B. Brezocsky ; Robert E. Davenport, Multiple loadlock system.
  29. Kurita, Shinichi; Anwar, Suhail; Lee, Jae-Chull, Multiple slot load lock chamber and method of operation.
  30. Dill Charles T., Rotatable wafer handler with retractable stops.
  31. Yoshioka, Junichiro; Katsuoka, Seiji; Sekimoto, Masahiko; Endo, Yasuhiko; Guo, Yugang, Substrate holder, plating apparatus, and plating method.
  32. Yoshioka, Junichiro; Katsuoka, Seiji; Sekimoto, Masahiko; Endo, Yasuhiko; Guo, Yugang, Substrate holder, plating apparatus, and plating method.
  33. Hashimoto, Yasuhiko, Substrate transfer robot and substrate transfer system.
  34. Mimken, Victor, Systems and methods for wafer translation.
  35. Kim, Sam Hyungsam; Lee, Jae-Chull; Sterling, William N.; Brown, Paul, Valve door with ball coupling.
  36. Balg Christian,CHX ; Strasser Bernhard,CHX ; Blattner Jakob,CHX, Wafer gripping device adapted to swivel wafers taken from a horizontal position in a storage container.
  37. Hillman Gary, Wafer handling method and apparatus.
  38. Okada Keiji,JPX ; Taniguchi Katsuhiro,JPX, Wafer transport apparatus that can transfer multiple wafers in a short period of time.
  39. Mallery, Daniel S.; Kreager, Doug; Barns, Chris E., Work piece wand and method for processing work pieces using a work piece handling wand.
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