초록 ▼

A lithographic printing plate precursor for use on a printing press, with minimal or no additional processing after exposure to actinic radiation, comprises a printing plate substrate, a polymeric resist layer capable of imagewise photodegradation or photohardening, and a plurality of microencapsula

A lithographic printing plate precursor for use on a printing press, with minimal or no additional processing after exposure to actinic radiation, comprises a printing plate substrate, a polymeric resist layer capable of imagewise photodegradation or photohardening, and a plurality of microencapsulated developers capable of blanket-wise promoting the washing out of either exposed or unexposed areas of the polymeric resist. The microencapsulated developers may be integrated into the polymeric resist layer, or may form a separate layer deposited atop the polymeric resist layer, or may be coated onto a separate sheet support capable of being brought into face-to-face contact with conventional printing plates.

대표청구항 ▼

A lithographic printing plate precursor comprising a substrate having either a negative affinity or positive affinity to printing ink; a polymeric photoresist deposited over said substrate having an affinity to said ink substantially converse to the affinity of the substrate to said printing ink; th

A lithographic printing plate precursor comprising a substrate having either a negative affinity or positive affinity to printing ink; a polymeric photoresist deposited over said substrate having an affinity to said ink substantially converse to the affinity of the substrate to said printing ink; the polymeric photoresist capable of imagewise photodegradation or photohardening upon imagewise exposure to actinic radiation; and a plurality of microcapsules, each microcapsule comprising an external shell phase and a non-photopolymerizable internal encapsulant phase, the internal encapsulant phase comprising a developer component capable of promoting the imagewise removal of either exposed or unexposed areas of the polymeric photoresist when the internal encapsulant phase is blanketwise released by the blanketwise rupturing of the microcapsules.