초록 ▼

Liquid radiation-curable formulation, in particular for stereolithography, based on at least one compound that contains radically polymerizable groups, and at least one photoinitiator suitable for the polymerization, which formulation additionally contains a polyoxyalkylene-polysiloxane block copoly

Liquid radiation-curable formulation, in particular for stereolithography, based on at least one compound that contains radically polymerizable groups, and at least one photoinitiator suitable for the polymerization, which formulation additionally contains a polyoxyalkylene-polysiloxane block copolymer that is selected from copolymers of the chemical formulae [Figure] [Figure] and [Figure] wherein: R1 is a hydrogen atom or a C1-C8alkyl group; R2 is a methyl or phenyl group; [T]is a polysiloxane group [PS]terminated as described in the specification in more detail; [PS]is the group of formula [Figure] and [Alk]is an alkylene group of 3 to 10 carbon atoms, as well as novel block copolymers of formulae (I) and (II). The cured formulations have, inter alia, superior impact strength.

대표청구항 ▼

A process for the production of three-dimensional objects from a formulation comprising at least one compound that contains free radically polymerisable groups, and at least one photoinitiator suitable for the polymerisation, which formulation additionally comprises a polyoxyalkylene-polysiloxane bl

A process for the production of three-dimensional objects from a formulation comprising at least one compound that contains free radically polymerisable groups, and at least one photoinitiator suitable for the polymerisation, which formulation additionally comprises a polyoxyalkylene-polysiloxane block copolymer which is selected from copolymers of the chemical formulae [Figure] [Figure] and [Figure] in which formulae the individual symbols have the following meanings: R1 is a member selected from hydrogen and C1-C8alkyl; c is a number from 1 to 8 corresponding to the average number of carbon atoms of an akylene unit in a polyoxyalkylene group (CcH2cO)d; d is an integer from 1 to 100; g is an integer from 1 to 4; [T]is a group selected from the groups of formulae T1 to T12: T1:O[PS]O, [Figure] T3:O-[Alk]-[PS]-[Alk]-O [Figure] [Figure] [Figure] [Figure] [Figure] T9:O[G]O[PS]O[G]O [Figure] T11:O[G]O-[Alk]-[PS]-[Alk]-O[G]O [Figure] [PS]is a polysiloxane of formula [Figure] R2 is a group selected from methyl and phenyl; b is an integer from 1 to 100; [Alk]is an alkylene group of 3 to 10 carbon atoms; [Alk1]is an alkylene group of 1 to 20 carbon atoms; m is a number from 1 to 8 corresponding to the average number of carbon atoms of an alkylene unit in a polyoxyalkylene group (CmH2mO)n; n is an integer from 1 to 50; [G]is a group of formula [Figure] X is an atom selected from oxygen and sulfur; [D]is a divalent hydrocarbon radical containing at least 2 carbon atoms; e is an integer from 1 to 100, and f is an integer from 1 to 50 by stereolithography, which comprises irradiating a layer of said formulation over the entire surface or in a predetermined pattern with actinic light from an ultraviolet/visible light source, such that within the irradiated areas a layer solidifies in a desired layer thickness, then a new layer of the formulation is formed on the solidified layer, which layer is likewise irradiated over the entire surface or in a predetermined pattern, and such that three-dimensional objects are formed from a plurality of solidified layers which adhere to one another by repeated coating and irradiation.