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특허 상세정보

MyON담기
내보내기 페이스북 공유 카카오톡 공유

Point-of-use recycling of wafer cleaning substances

특허상세정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판) B01D-003/34    C01B-017/90   
미국특허분류(USC) 203/12 ; 134/10 ; 134/11 ; 134/12
출원번호 US-0180546 (1994-01-12)
발명자 / 주소
출원인 / 주소
인용정보 피인용 횟수 : 14  인용 특허 : 21
초록
▼

A method of recycling and purifying cleaning chemicals used in the production of semiconductor circuits and containing hydrofluoric acid and or hydrochloric acid. Recycling of such chemicals is accomplished using separation and reconstitution steps Hydrofluoric acid and hydrochloric acid cannot be distilled directly from a chemical solution as they form azeotropes with water. A low vapor pressure substance such as sulfuric acid or phosphoric acid is used to break the azeotrope while increasing the purity of the recovered chemicals and decreasing disposal...

대표
청구항
▼

A closed loop process involving use, purification, recovery and reuse of an acid in a wafer surface conditioning process, comprising: (a) conditioning the surface of a wafer with an acid selected from the group consisting of hydrochloric acid, hydrofluoric acid, hydrobromic acid, nitric acid, whereby the acid is contaminated with matter removed from the surface of the wafer; (b) adding a low vapor pressure liquid adjuvant to an azeotrope forming aqueous solution of the contaminated acid at a volumetric ratio of adjuvant to contaminated aqueous solution o...

이 특허에 인용된 특허 (21)

  1. Chilton Shane R. (Scottsdale AZ) Griswold Mark D. (Chandler AZ). Apparatus and method for removing metallic contamination from fluids using silicon beads. USP1992115164093.
  2. McConnell Christopher F. (Gulph Mills PA) Walter Alan E. (Exton PA). Apparatus for treating wafers with process fluids. USP1990044917123.
  3. Dobson Jesse C. (Oakland CA) McCormick Marshall (Oakland CA). Distillation method and apparatus for reprocessing sulfuric acid. USP1990124980032.
  4. Chhabra Navjot (Boise ID) Gibbons Loyal (Boise ID). Hydrofluoric acid etcher and cascade rinser. USP1992025089084.
  5. Dobson Jesse (Oakland CA) McCormick Marshall (Oakland CA). Hydrofluoric acid reprocessing for semiconductor standards. USP1990064936955.
  6. Liu Wei-Jyh (Taipei TWX) Huang Chih-Kung (Taipei TWX) Chen Chad-Yang (Taipei TWX). Hydrogen peroxide in basic solution to clean polycrystalline silicon after phosphorous diffusion. USP1993025188986.
  7. Clark R. Scot (Fallbrook CA) Baird Stephen S. (Vista CA) Hoffman Joe G. (Cardiff-By-The-Sea CA). Manufacture of high precision electronic components with ultra-high purity liquids. USP1993095242468.
  8. Clark R. Scot (Fallbrook CA) Hoffman Joe G. (Oceanside CA) Davison John B. (Mission Viejo CA) Jones Alan W. (San Clemente CA) Jones ; Jr. Allen H. (Carlsbad CA) Persichini David W. (Oceanside CA) Yua. Method and apparatus for the continuous on-site chemical reprocessing of ultrapure liquids used in semiconductor wafer c. USP1989084855023.
  9. Blomquist Seppo I. (Tornio FIX) Saarela Markku T. (Kokkokangas FIX) Pouru Hannu J. (Pori FIX) Nyman Bror G. (Vanha-Ulvila FIX) Lindroos Kaj-Henrik (Helsinki FIX) Koivunen Timo T. (Vanha-Ulvila FIX) F. Method for regenerating pickling acids. USP1985074526650.
  10. Lazar Warren G. (Tucson AZ). Method of producing elastomeric open cell structures. USP1993025185111.
  11. Cathey David A. (Boise ID). Method of reducing particulate concentration in process fluids. USP1994015277715.
  12. Schnegg Anton (Burghausen DEX) Brehm Gerhard (Emmerting DEX) Prigge Helene (Unterschleissheim DEX) Rurlnder Robert (Halsbach DEX) Ketterl Fritz (Munich DEX). Process and apparatus for etching semiconductor surfaces. USP1990114971654.
  13. McConnell Christopher F. (Gulph Mills PA) Walter Alan E. (Exton PA). Process and apparatus for treating wafers with process fluids. USP1988104778532.
  14. Stultz Jeff H. (Freeport TX) Rrup Heinz (Kutenholz DEX) Unger Siegfried (Buxtehude DEX) Nettersheim Edmund R. (Dollern DEX) Wottawa Bernd (Himmelpforten DEX). Process for purifying crude hydrochloric acid. USP1992125174865.
  15. Echigo Yoshiaki (Uji JPX) Amimoto Hirotaka (Uji JPX) Yamao Mutsunori (Uji JPX) Ishikura Tadashi (Uji JPX) Otomura Keiichiro (Kurayoshi JPX) Fujisaki Sakae (Okayama JPX) Ogura Yoshikazu (Kurayoshi JPX. Process for separately recovering uranium and hydrofluoric acid from waste liquor containing uranium and fluorine. USP1988094769180.
  16. Fleming ; Jr. Marshall J. (Underhill VT) Syverson William A. (Colchester VT) White Eric J. (Essex Junction VT). Reduction of foreign particulate matter on semiconductor wafers. USP1994035294570.
  17. Dobson Jesse C. (Oakland CA). Sulfuric acid reprocessor. USP1991075032218.
  18. McCormick Marshall W. (Oakland CA) Dobson Jesse C. (Oakland CA). Sulfuric acid reprocessor with continuous purge of second distillation vessel. USP1991105061348.
  19. Hayashida Ichiro (Kawagoe JPX) Kakizawa Masahiko (Kawagoe JPX) Umekita Kenichi (Kawagoe JPX) Nawa Hiroyoshi (Kawagoe JPX) Muraoka Hisashi (Yokohama JPX). Surface treating cleaning method. USP1994035290361.
  20. Shwartzman Stanley (Somerville NJ). Two step method of cleaning silicon wafers. USP1981044261791.
  21. Tanaka Masato (Hikone JPX) Nishizawa Hisao (Hikone JPX) Hirai Nobuyuki (Hikone JPX) Shinbara Kaoru (Hikone JPX) Yoshioka Hitoshi (Hikone JPX). Wafer cleaning method and apparatus therefore. USP1994025288333.

이 특허를 인용한 특허 피인용횟수: 14

  1. Borzio, John; Jacksier, Tracey. Apparatus for purification of electronic specialty gases by vapor phase transfilling. USP2003026517686.
  2. Grant Donald C. ; Litchy Mark R.. Cleaner composition, method for making and using same. USP2001106310017.
  3. Gerken, David. Control of fluid conditions in bulk fluid distribution systems. USP2010107810516.
  4. Edwards, David Paul. Method and apparatus for recycling process fluids. USP2010067743783.
  5. Büttner, Werner; Hostalek, Martin; Kan, Ching-Jung; Lu, Chih-Peng. Method for producing high-purity hydrochloric acid. USP2004096793905.
  6. Anilkumar C. Bhatt ; Jerome J. Wagner. Method for recovering an organic solvent from an acidic waste stream such as in integrated chip manufacturing. USP2002076423290.
  7. Rozov, Leonid A.; Kudzma, Linas; Lee, Hong-Chang; Bell, Ronald. Methods for cleaning distilling columns. USP2015089102604.
  8. Allan, Barry D.. Nitric acid production. USP2004056737034.
  9. Huang, Yuan-Sheng. Non-tubular type recycle system of wet bench tank. USP2003046551412.
  10. Feldman, Timothy R; Hughes, James Prescott; Furuhjelm, Martin R. Object-based commands and functions. USP2017039600555.
  11. Joe G. Hoffman ; R. Scot Clark. On-site generation of ultra-high-purity buffered-HF and ammonium fluoride. USP2002026350425.
  12. Hoffman Joe G. ; Clark R. Scot. On-site manufacture of ultra-high-purity hydrofluoric acid for semiconductor processing. USP2000056063356.
  13. Borzio John ; Jacksier Tracey. Purification of electronic specialty gases by vapor phase transfilling. USP2001086277246.
  14. Borzio John ; Jacksier Tracey. Purification of electronic specialty gases by vapor phase transfilling. USP1999126004433.

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