$\require{mediawiki-texvc}$

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

Laser-plasma arc metal cutting apparatus 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B23K-010/00
  • B23K-026/00
출원번호 US-0541956 (1995-10-10)
발명자 / 주소
  • Warren
  • Jr. Joseph V. (Florence SC) Stanley Chester E. (Florence SC)
출원인 / 주소
  • The Esab Group, Inc. (Florence SC 02)
인용정보 피인용 횟수 : 136  인용 특허 : 0

초록 ▼

A metal cutting apparatus which comprises a longitudinally moveable gantry and a transversely moveable carriage which is mounted on the gantry. The carriage in turn mounts a laser cutting head and a plasma arc cutting head mounted in a parallel, side-by-side arrangement. The apparatus may thus be pr

대표청구항 ▼

An apparatus for cutting metal workpieces comprising at least one table for supporting a workpiece in a fixed location, a gantry mounted for back and forth movement across the one table in a longitudinal direction, said gantry comprising a pair of transversely separated housings and a support beam e

이 특허를 인용한 특허 (136)

  1. Nemani, Srinivas D.; Koshizawa, Takehito, Air gap process.
    상세보기
  2. Purayath, Vinod R.; Ingle, Nitin K., Air gaps between copper lines.
    상세보기
  3. Kang, Sean; Ko, Jungmin; Luere, Oliver, Airgap formation with damage-free copper.
    상세보기
  4. Wang, Xikun; Wang, Anchuan; Ingle, Nitin K., Aluminum oxide selective etch.
    상세보기
  5. Wang, Xikun; Wang, Anchuan; Ingle, Nitin K., Aluminum selective etch.
    상세보기
  6. Xue, Jun; Hsu, Ching-Mei; Li, Zihui; Godet, Ludovic; Wang, Anchuan; Ingle, Nitin K., Anisotropic gap etch.
    상세보기
  7. Lundberg,John D., Automated laser engraver.
    상세보기
  8. Benjaminson, David; Lubomirsky, Dmitry; Math, Ananda Seelavanth; Natarajan, Saravanakumar; Chourey, Shubham, Bolted wafer chuck thermal management systems and methods for wafer processing systems.
    상세보기
  9. Benjaminson, David; Lubomirsky, Dmitry; Math, Ananda Seelavanth; Natarajan, Saravanakumar; Chourey, Shubham, Bolted wafer chuck thermal management systems and methods for wafer processing systems.
    상세보기
  10. Lubomirsky, Dmitry, Chamber with flow-through source.
    상세보기
  11. Lubomirsky, Dmitry, Chamber with flow-through source.
    상세보기
  12. Liang, Qiwei; Chen, Xinglong; Chuc, Kien; Lubomirsky, Dmitry; Park, Soonam; Yang, Jang-Gyoo; Venkataraman, Shankar; Tran, Toan; Hinckley, Kimberly; Garg, Saurabh, Chemical control features in wafer process equipment.
    상세보기
  13. Liang, Qiwei; Chen, Xinglong; Chuc, Kien; Lubomirsky, Dmitry; Park, Soonam; Yang, Jang-Gyoo; Venkataraman, Shankar; Tran, Toan; Hinckley, Kimberly; Garg, Saurabh, Chemical control features in wafer process equipment.
    상세보기
  14. Wang, Xikun; Pandit, Mandar; Cui, Zhenjiang; Korolik, Mikhail; Wang, Anchuan; Ingle, Nitin K.; Liu, Jie, Chlorine-based hardmask removal.
    상세보기
  15. Wang, Xikun; Cui, Zhenjiang; Park, Soonam; Ingle, Nitin K., Cobalt-containing material removal.
    상세보기
  16. Delzenne Michel,FRX, Combined process and automatic installation for plasma-jet marking and cutting or welding, in particular of metals.
    상세보기
  17. Lubomirsky, Dmitry; Kim, Sung Je, Conditioned semiconductor system parts.
    상세보기
  18. Wang, Anchuan; Zhang, Jingchun; Ingle, Nitin K.; Lee, Young S., Conformal oxide dry etch.
    상세보기
  19. Hoinkis, Mark; Yan, Chun; Miyazoe, Hiroyuki; Joseph, Eric, Copper residue chamber clean.
    상세보기
  20. Schlough, Michael P.; Snartland, Phillip A.; Zulkosky, Aaron J., Corner saw.
    상세보기
  21. Schlough, Michael P.; Snartland, Phillip A.; Zulkosky, Aaron J., Corner saw.
    상세보기
  22. Schlough, Michael P.; Snartland, Phillip A.; Zulkosky, Aaron J., Corner saw.
    상세보기
  23. Blackmon Joseph B. ; Segroves James L., Cutting apparatus with thermal and nonthermal cutters, and associated methods.
    상세보기
  24. Zhu, Lina; Kang, Sean S.; Nemani, Srinivas D.; Kao, Chia-Ling, Delicate dry clean.
    상세보기
  25. Park, Seung H.; Wang, Yunyu; Zhang, Jingchun; Wang, Anchuan; Ingle, Nitin K., Differential silicon oxide etch.
    상세보기
  26. Purayath, Vinod R.; Wang, Anchuan; Ingle, Nitin K., Dopant etch selectivity control.
    상세보기
  27. Wang, Xikun; Hsu, Ching-Mei; Ingle, Nitin K.; Li, Zihui; Wang, Anchuan, Dry-etch for selective tungsten removal.
    상세보기
  28. Zhang, Jingchun; Wang, Anchuan; Ingle, Nitin K.; Wang, Yunyu; Lee, Young, Dry-etch for silicon-and-carbon-containing films.
    상세보기
  29. Ren, He; Yang, Jang-Gyoo; Baek, Jonghoon; Wang, Anchuan; Park, Soonam; Garg, Saurabh; Chen, Xinglong; Ingle, Nitin K., Dry-etch selectivity.
    상세보기
  30. Cho, Tae Seung; Sen, Yi-Heng; Park, Soonam; Lubomirsky, Dmitry, Dual discharge modes operation for remote plasma.
    상세보기
  31. Ingle, Nitin K.; Lubomirsky, Dmitry; Chen, Xinglong; Venkataraman, Shankar, Enhanced etching processes using remote plasma sources.
    상세보기
  32. Korolik, Mikhail; Ingle, Nitin K.; Zhang, Jingchun; Wang, Anchuan; Liu, Jie, Etch suppression with germanium.
    상세보기
  33. Wang, Xikun; Liu, Jie; Wang, Anchuan; Ingle, Nitin K., Even tungsten etch for high aspect ratio trenches.
    상세보기
  34. Purayath, Vinod R.; Ingle, Nitin K., Flash gate air gap.
    상세보기
  35. Pandit, Mandar; Wang, Xikun; Cui, Zhenjiang; Korolik, Mikhail; Wang, Anchuan; Ingle, Nitin K., Fluorine-based hardmask removal.
    상세보기
  36. Sawatzky Brian D,CAX ; Andrews Randall G.,CAX ; Want Chris,CAX, Gantry-mounted laser nozzle and method for controlling laser positioning.
    상세보기
  37. Park, Seung; Wang, Xikun; Liu, Jie; Wang, Anchuan; Kim, Sang-jin, Gas-phase tungsten etch.
    상세보기
  38. Kim, Sung Je; Kalita, Laksheswar; Pareek, Yogita; Kadam, Ankur; Goradia, Prerna Sonthalia; Thakur, Bipin; Lubomirsky, Dmitry, Generation of compact alumina passivation layers on aluminum plasma equipment components.
    상세보기
  39. Korolik, Mikhail; Ingle, Nitin; Kioussis, Dimitri, Germanium etching systems and methods.
    상세보기
  40. Cho, Tae; Kang, Sang Won; Yang, Dongqing; Lu, Raymond W.; Hillman, Peter; Celeste, Nicholas; Tan, Tien Fak; Park, Soonam; Lubomirsky, Dmitry, Grooved insulator to reduce leakage current.
    상세보기
  41. Tran, Toan Q.; Malik, Sultan; Lubomirsky, Dmitry; Roy, Shambhu N.; Kobayashi, Satoru; Cho, Tae Seung; Park, Soonam; Venkataraman, Shankar, High temperature chuck for plasma processing systems.
    상세보기
  42. Chen, Zhijun; Li, Zihui; Ingle, Nitin K.; Wang, Anchuan; Venkataraman, Shankar, Highly selective doped oxide removal method.
    상세보기
  43. Siman-Tov, Alon; Chayet, Haim, Hybrid optical head for direct engraving of flexographic printing plates.
    상세보기
  44. Chen, Xinglong; Lubomirsky, Dmitry; Venkataraman, Shankar, Insulated semiconductor faceplate designs.
    상세보기
  45. Purayath, Vinod R.; Thakur, Randhir; Venkataraman, Shankar; Ingle, Nitin K., Integrated bit-line airgap formation and gate stack post clean.
    상세보기
  46. Purayath, Vinod R.; Thakur, Randhir; Venkataraman, Shankar; Ingle, Nitin K., Integrated bit-line airgap formation and gate stack post clean.
    상세보기
  47. Purayath, Vinod R.; Thakur, Randhir; Ingle, Nitin K., Integrated oxide and nitride recess for better channel contact in 3D architectures.
    상세보기
  48. Purayath, Vinod R.; Thakur, Randhir; Venkataraman, Shankar; Ingle, Nitin K., Integrated oxide recess and floating gate fin trimming.
    상세보기
  49. Sapre, Kedar; Ingle, Nitin; Tang, Jing, Intrench profile.
    상세보기
  50. Sapre, Kedar; Ingle, Nitin; Tang, Jing, Intrench profile.
    상세보기
  51. Gilbert Remue BE; Frank Heyerick BE; Johannes Ulrich DE, Laser cutting system.
    상세보기
  52. Heyerick Frank,BEX ; Ulrich Johannes,DEX, Laser cutting system.
    상세보기
  53. Heyerick, Frank; Ulrich, Johannes, Laser cutting system.
    상세보기
  54. Sukuvaara, Jorma; Remue, Gilbert; Heyerick, Frank; Ulrich, Johannes, Laser cutting system.
    상세보기
  55. Ulrich Johannes,DEX ; Remue Gilbert,BEX ; Heikilla Ilkka,BEX ; Heyerick Frank,BEX ; Sukuvaara Jorma,BEX, Laser cutting system.
    상세보기
  56. Virtanen Mikka,FIX ; Heyerick Frank,BEX ; Ulrich Johannes,DEX ; Taijonlahti Jorma,FIX, Laser cutting system.
    상세보기
  57. Nguyen, Son T.; Lubomirsky, Dmitry, Layered thin film heater and method of fabrication.
    상세보기
  58. Hsu, Ching-Mei; Ingle, Nitin K.; Hamana, Hiroshi; Wang, Anchuan, Low temperature gas-phase carbon removal.
    상세보기
  59. Schlough, Michael; Matz, Kevin, Material loading apparatus.
    상세보기
  60. Purayath, Vinod R.; Thakur, Randhir; Ingle, Nitin K., Metal air gap.
    상세보기
  61. Basista Thomas A. ; Bockbrader Scott, Method and apparatus for a cutting system for avoiding pre-cut features.
    상세보기
  62. Basista, Thomas A.; Bockbrader, Scott, Method and apparatus for a cutting system for avoiding pre-cut features.
    상세보기
  63. Herren, Peter, Method for machining workpieces and machine tool.
    상세보기
  64. Schlough, Michael P.; Snartland, Phillip A.; Zulkosky, Aaron J., Method of cutting a corner out of a workpiece.
    상세보기
  65. Ko, Jungmin, Method of fin patterning.
    상세보기
  66. Li, Zihui; Kao, Chia-Ling; Wang, Anchuan; Ingle, Nitin K., Methods for anisotropic control of selective silicon removal.
    상세보기
  67. Zhang, Jingchun; Wang, Anchuan; Ingle, Nitin, Methods for etch of SiN films.
    상세보기
  68. Zhang, Jingchun; Wang, Anchuan; Ingle, Nitin K., Methods for etch of metal and metal-oxide films.
    상세보기
  69. Chen, Zhijun; Park, Seung; Korolik, Mikhail; Wang, Anchuan; Ingle, Nitin K., Non-local plasma oxide etch.
    상세보기
  70. Wang, Xikun; Liu, Jie; Wang, Anchuan; Ingle, Nitin K.; Anthis, Jeffrey W.; Schmiege, Benjamin, Oxide and metal removal.
    상세보기
  71. Chen, Zhijun; Wang, Anchuan; Ingle, Nitin K., Oxide etch selectivity enhancement.
    상세보기
  72. Chen, Zhijun; Wang, Anchuan; Ingle, Nitin K., Oxide etch selectivity enhancement.
    상세보기
  73. Xu, Lin; Chen, Zhijun; Wang, Anchuan; Nguyen, Son T., Oxide etch selectivity systems and methods.
    상세보기
  74. Lubomirsky, Dmitry, Oxygen compatible plasma source.
    상세보기
  75. Chen, Xinglong; Yang, Jang-Gyoo; Tam, Alexander; Tam, Elisha, Pedestal with multi-zone temperature control and multiple purge capabilities.
    상세보기
  76. Lubomirsky, Dmitry, Plasma processing system with direct outlet toroidal plasma source.
    상세보기
  77. Ingle, Nitin K.; Kachian, Jessica Sevanne; Xu, Lin; Park, Soonam; Wang, Xikun; Anthis, Jeffrey W., Plasma-free metal etch.
    상세보기
  78. Cho, Tae Seung; Sen, Yi-Heng; Park, Soonam; Lubomirsky, Dmitry, Polarity control for remote plasma.
    상세보기
  79. Choi, Tom; Ko, Jungmin; Kang, Sean, Poly directional etch by oxidation.
    상세보기
  80. Zhang, Jingchun; Zhang, Hanshen, Procedure for etch rate consistency.
    상세보기
  81. Zhang, Jingchun; Zhang, Hanshen, Procedure for etch rate consistency.
    상세보기
  82. Wang, Anchuan; Chen, Xinglong; Li, Zihui; Hamana, Hiroshi; Chen, Zhijun; Hsu, Ching-Mei; Huang, Jiayin; Ingle, Nitin K.; Lubomirsky, Dmitry; Venkataraman, Shankar; Thakur, Randhir, Processing systems and methods for halide scavenging.
    상세보기
  83. Wang, Anchuan; Chen, Xinglong; Li, Zihui; Hamana, Hiroshi; Chen, Zhijun; Hsu, Ching-Mei; Huang, Jiayin; Ingle, Nitin K.; Lubomirsky, Dmitry; Venkataraman, Shankar; Thakur, Randhir, Processing systems and methods for halide scavenging.
    상세보기
  84. Wang, Anchuan; Chen, Xinglong; Li, Zihui; Hamana, Hiroshi; Chen, Zhijun; Hsu, Ching-Mei; Huang, Jiayin; Ingle, Nitin K.; Lubomirsky, Dmitry; Venkataraman, Shankar; Thakur, Randhir, Processing systems and methods for halide scavenging.
    상세보기
  85. Wang, Anchuan; Chen, Xinglong; Li, Zihui; Hamana, Hiroshi; Chen, Zhijun; Hsu, Ching-Mei; Huang, Jiayin; Ingle, Nitin K.; Lubomirsky, Dmitry; Venkataraman, Shankar; Thakur, Randhir, Processing systems and methods for halide scavenging.
    상세보기
  86. Wang, Anchuan; Chen, Xinglong; Li, Zihui; Hamana, Hiroshi; Chen, Zhijun; Hsu, Ching-Mei; Huang, Jiayin; Ingle, Nitin K.; Lubomirsky, Dmitry; Venkataraman, Shankar; Thakur, Randhir, Processing systems and methods for halide scavenging.
    상세보기
  87. Wang, Anchuan; Chen, Xinglong; Li, Zihui; Hamana, Hiroshi; Chen, Zhijun; Hsu, Ching-Mei; Huang, Jiayin; Ingle, Nitin K.; Lubomirsky, Dmitry; Venkataraman, Shankar; Thakur, Randhir, Processing systems and methods for halide scavenging.
    상세보기
  88. Wang, Anchuan; Chen, Xinglong; Li, Zihui; Hamana, Hiroshi; Chen, Zhijun; Hsu, Ching-Mei; Huang, Jiayin; Ingle, Nitin K.; Lubomirsky, Dmitry; Venkataraman, Shankar; Thakur, Randhir, Processing systems and methods for halide scavenging.
    상세보기
  89. Wang, Anchuan; Chen, Xinglong; Li, Zihui; Hamana, Hiroshi; Chen, Zhijun; Hsu, Ching-Mei; Huang, Jiayin; Ingle, Nitin K.; Lubomirsky, Dmitry; Venkataraman, Shankar; Thakur, Randhir, Processing systems and methods for halide scavenging.
    상세보기
  90. Naik, Mehul; Ma, Paul F.; Nemani, Srinivas D., Protective via cap for improved interconnect performance.
    상세보기
  91. Kobayashi, Satoru; Park, Soonam; Lubomirsky, Dmitry, Radial waveguide systems and methods for post-match control of microwaves.
    상세보기
  92. Kobayashi, Satoru; Park, Soonam; Lubomirsky, Dmitry; Sugai, Hideo, Radial waveguide systems and methods for post-match control of microwaves.
    상세보기
  93. Kobayashi, Satoru; Park, Soonam; Lubomirsky, Dmitry; Sugai, Hideo, Radial waveguide systems and methods for post-match control of microwaves.
    상세보기
  94. Kobayashi, Satoru; Park, Soonam; Lubomirsky, Dmitry; Sugai, Hideo, Radial waveguide systems and methods for post-match control of microwaves.
    상세보기
  95. Chen, Zhijun; Zhang, Jingchun; Hsu, Ching-Mei; Park, Seung; Wang, Anchuan; Ingle, Nitin K., Radical-component oxide etch.
    상세보기
  96. Xu, Lin; Chen, Zhijun; Huang, Jiayin; Wang, Anchuan, Removal methods for high aspect ratio structures.
    상세보기
  97. Xu, Lin; Chen, Zhijun; Huang, Jiayin; Wang, Anchuan, Removal methods for high aspect ratio structures.
    상세보기
  98. Yang, Dongqing; Zhu, Lala; Wang, Fei; Ingle, Nitin K., Saving ion-damaged spacers.
    상세보기
  99. Chen, Zhijun; Huang, Jiayin; Wang, Anchuan; Ingle, Nitin, Selective SiN lateral recess.
    상세보기
  100. Wang, Xikun; Lei, Jianxin; Ingle, Nitin; Shaviv, Roey, Selective cobalt removal for bottom up gapfill.
    상세보기
  101. Ingle, Nitin K.; Kachian, Jessica Sevanne; Xu, Lin; Park, Soonam; Wang, Xikun; Anthis, Jeffrey W., Selective etch for metal-containing materials.
    상세보기
  102. Ingle, Nitin K.; Kachian, Jessica Sevanne; Xu, Lin; Park, Soonam; Wang, Xikun; Anthis, Jeffrey W., Selective etch for metal-containing materials.
    상세보기
  103. Zhang, Jingchun; Wang, Anchuan; Ingle, Nitin K., Selective etch for silicon films.
    상세보기
  104. Zhang, Jingchun; Wang, Anchuan; Ingle, Nitin K., Selective etch for silicon films.
    상세보기
  105. Wang, Anchuan; Zhang, Jingchun; Ingle, Nitin K.; Lee, Young S., Selective etch of silicon by way of metastable hydrogen termination.
    상세보기
  106. Chen, Zhijun; Li, Zihui; Wang, Anchuan; Ingle, Nitin K.; Venkataraman, Shankar, Selective etch of silicon nitride.
    상세보기
  107. Chen, Zhijun; Li, Zihui; Wang, Anchuan; Ingle, Nitin K.; Venkataraman, Shankar, Selective etch of silicon nitride.
    상세보기
  108. Citla, Bhargav; Ying, Chentsau; Nemani, Srinivas; Babayan, Viachslav; Stowell, Michael, Selective etch using material modification and RF pulsing.
    상세보기
  109. Wang, Xikun; Ingle, Nitin, Selective in situ cobalt residue removal.
    상세보기
  110. Hoinkis, Mark; Miyazoe, Hiroyuki; Joseph, Eric, Selective sputtering for pattern transfer.
    상세보기
  111. Liu, Jie; Zhang, Jingchun; Wang, Anchuan; Ingle, Nitin K.; Park, Seung; Chen, Zhijun; Hsu, Ching-Mei, Selective titanium nitride etching.
    상세보기
  112. Wang, Xikun; Wang, Anchuan; Ingle, Nitin K.; Lubomirsky, Dmitry, Selective titanium nitride removal.
    상세보기
  113. Wang, Xikun; Ingle, Nitin, Selective tungsten removal.
    상세보기
  114. Pandit, Mandar B.; Wang, Anchuan; Ingle, Nitin K., Self-aligned process.
    상세보기
  115. Arnepalli, Ranga Rao; Goradia, Prerna Sonthalia; Visser, Robert Jan; Ingle, Nitin; Korolik, Mikhail; Biswas, Jayeeta; Lodha, Saurabh, Self-limiting atomic thermal etching systems and methods.
    상세보기
  116. Yang, Jang-Gyoo; Chen, Xinglong; Park, Soonam; Baek, Jonghoon; Garg, Saurabh; Venkataraman, Shankar, Semiconductor processing with DC assisted RF power for improved control.
    상세보기
  117. Yang, Jang-Gyoo; Chen, Xinglong; Park, Soonam; Baek, Jonghoon; Garg, Saurabh; Venkataraman, Shankar, Semiconductor processing with DC assisted RF power for improved control.
    상세보기
  118. Nguyen, Andrew; Ramaswamy, Kartik; Nemani, Srinivas; Howard, Bradley; Vishwanath, Yogananda Sarode, Semiconductor system assemblies and methods of operation.
    상세보기
  119. Ko, Jungmin; Choi, Tom; Ingle, Nitin; Kim, Kwang-Soo; Wou, Theodore, SiN spacer profile patterning.
    상세보기
  120. Park, Seung; Wang, Anchuan, Silicon etch process with tunable selectivity to SiO2 and other materials.
    상세보기
  121. Korolik, Mikhail; Ingle, Nitin K.; Wang, Anchuan; Xu, Jingjing, Silicon germanium processing.
    상세보기
  122. Chen, Zhijun; Wang, Anchuan; Ingle, Nitin K., Silicon oxide selective removal.
    상세보기
  123. Huang, Jiayin; Chen, Zhijun; Wang, Anchuan; Ingle, Nitin, Silicon pretreatment for nitride removal.
    상세보기
  124. Li, Zihui; Hsu, Ching-Mei; Zhang, Hanshen; Zhang, Jingchun, Silicon selective removal.
    상세보기
  125. Chen, Zhijun; Zhang, Jingchun; Wang, Anchuan; Ingle, Nitin K., Silicon-carbon-nitride selective etch.
    상세보기
  126. Kim, Hun Sang; Choi, Jinhan; Koseki, Shinichi, Simplified litho-etch-litho-etch process.
    상세보기
  127. Luere, Olivier; Kang, Sean S.; Nemani, Srinivas D., Spacer formation.
    상세보기
  128. Krink, Volker; Bach, Friedrich-Wilhelm; Laurisch, Frank; Ruemenapp, Thomas, System for the thermal processing of workpieces by a plasma jet or a laser beam.
    상세보기
  129. Benjaminson, David; Lubomirsky, Dmitry, Thermal management systems and methods for wafer processing systems.
    상세보기
  130. Wang, Xikun; Pandit, Mandar; Wang, Anchuan; Ingle, Nitin K., Titanium nitride removal.
    상세보기
  131. Wang, Xikun; Xu, Lin; Wang, Anchuan; Ingle, Nitin K., Titanium oxide etch.
    상세보기
  132. Campana, Livio, Tool machine for laser cutting of sheet and pipe materials.
    상세보기
  133. Liu, Jie; Wang, Xikun; Park, Seung; Korolik, Mikhail; Wang, Anchuan; Ingle, Nitin K., Tungsten oxide processing.
    상세보기
  134. Wang, Xikun; Liu, Jie; Wang, Anchuan; Ingle, Nitin K., Tungsten separation.
    상세보기
  135. Wang, Xikun; Wang, Anchuan; Ingle, Nitin K., V trench dry etch.
    상세보기
  136. Liu, Jie; Purayath, Vinod R.; Wang, Xikun; Wang, Anchuan; Ingle, Nitin K., Vertical gate separation.
    상세보기

관련 콘텐츠

섹션별 컨텐츠 바로가기

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

AI-Helper 아이콘
AI-Helper
안녕하세요, AI-Helper입니다. 좌측 "선택된 텍스트"에서 텍스트를 선택하여 요약, 번역, 용어설명을 실행하세요.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.

선택된 텍스트

맨위로