초록 ▼

A reactive membrane for removing impurities, such as water, oxygen and organic compounds, from a gas is provided. The reactive membrane includes a porous inorganic substrate having exposed surfaces and at least one carbon layer, which is modified to present active sites, deposited on the exposed sur

A reactive membrane for removing impurities, such as water, oxygen and organic compounds, from a gas is provided. The reactive membrane includes a porous inorganic substrate having exposed surfaces and at least one carbon layer, which is modified to present active sites, deposited on the exposed surfaces. The active sites include metal species which are at least partially deoxygenated and are chemically bonded to the carbon layer. Methods of forming the reactive membrane and of removing impurities from a gas with the membrane are also provided.

대표청구항 ▼

A reactive membrane for removing impurities from a gas comprising: (a) a porous inorganic substrate; and (b) at least one carbon layer deposited on substantially all of the porous inorganic substrate, the carbon layer being modified to present active sites which include at least partially deoxygenat

A reactive membrane for removing impurities from a gas comprising: (a) a porous inorganic substrate; and (b) at least one carbon layer deposited on substantially all of the porous inorganic substrate, the carbon layer being modified to present active sites which include at least partially deoxygenated metal species selected from the group consisting of manganese, magnesium, the alkali metals and mixtures thereof, wherein the metal species is chemically bonded to the carbon layer and serves as a scavenger, interacting with impurities and removing them from the gas.