이 특허를 인용한 특허 (95)

1. Lin Hua-Tai,TWX ; Shiau Gwo-Yuh,TWX ; Wang Pin-Ting,TWX, Alignment pattern and algorithm for photolithographic alignment marks on semiconductor substrates.

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2. Yamazaki, Shunpei; Kawamata, Ikuko; Miyaguchi, Atsushi, Display device and method for manufacturing the same.

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3. Kang, Tae-Min; Lee, Jae-Ho; Lee, Seong-Taek; Kim, Jin-Soo, Flat panel display and method of fabricating the same.

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4. Edwin G. Haas ; Robert M. Gutowski ; Vincent S. Calia, Fluid nozzle system and method in an emitted energy system for photolithography.

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5. Haas Edwin G. ; Gutowski Robert M. ; Calia Vincent S., Fluid nozzle system and method in an emitted energy system for photolithography.

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6. Haas Edwin G. ; Peacock Michael A. ; Gutowski Robert M., Holder assembly system and method in an emitted energy system for photolithography.

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7. Ino, Masumitsu; Maekawa, Toshikazu, Laser annealing apparatus.

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8. Kusumoto, Naoto; Tanaka, Koichiro, Laser annealing method.

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9. Kusumoto, Naoto; Tanaka, Koichiro, Laser annealing method.

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10. Kusumoto, Naoto; Tanaka, Koichiro, Laser annealing method.

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11. Kusumoto,Naoto; Tanaka,Koichiro, Laser annealing method.

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12. Yamazaki,Shunpei; Ohtani,Hisashi; Tanaka,Koichiro; Kasahara,Kenji; Kawasaki,Ritsuko, Laser annealing method and manufacturing method of a semiconductor device.

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13. Yamazaki, Shunpei; Ohtani, Hisashi; Tanaka, Koichiro; Kasahara, Kenji; Kawasaki, Ritsuko, Laser apparatus, laser annealing method, and manufacturing method of a semiconductor device.

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14. Yamazaki, Shunpei; Ohtani, Hisashi; Tanaka, Koichiro; Kasahara, Kenji; Kawasaki, Ritsuko, Laser apparatus, laser annealing method, and manufacturing method of a semiconductor device.

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15. Yamazaki,Shunpei; Ohtani,Hisashi; Tanaka,Koichiro; Kasahara,Kenji; Kawasaki,Ritsuko, Laser apparatus, laser annealing method, and manufacturing method of a semiconductor device.

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16. Ogawa, Tetsuya; Tokioka, Hidetada; Sato, Yukio; Inoue, Mitsuo; Sasagawa, Tomohiro; Miyasaka, Mitsutoshi, Laser heat treatment method, laser heat treatment apparatus, and semiconductor device.

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17. Ogawa, Tetsuya; Tokioka, Hidetada; Sato, Yukio; Inoue, Mitsuo; Sasagawa, Tomohiro; Miyasaka, Mitsutoshi, Laser heat treatment method, laser heat treatment apparatus, and semiconductor device.

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18. Tanaka, Koichiro, Laser irradiation apparatus.

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19. Tanaka, Koichiro, Laser irradiation apparatus.

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20. Shunpei Yamazaki JP; Koichiro Tanaka JP; Naoto Kusumoto JP, Laser irradiation apparatus and laser irradiation method.

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21. Yamazaki, Shunpei; Tanaka, Koichiro; Kusumoto, Naoto, Laser irradiation apparatus and laser irradiation method.

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22. Tanaka, Koichiro; Yamazaki, Shunpei; Kawasaki, Ritsuko, Laser irradiation apparatus laser irradiation method, semiconductor device and method of manufacturing a semiconductor device.

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23. Yamazaki, Shunpei; Nakamura, Osamu; Shoji, Hironobu; Tanaka, Koichiro, Laser irradiation apparatus with means for applying magnetic field.

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24. Yamazaki,Shunpei; Tanaka,Koichiro, Laser irradiation apparatus, laser irradiation method, and method for manufacturing a semiconductor device.

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25. Shimomura,Akihisa; Shoji,Hironobu, Laser irradiation apparatus, laser irradiation method, and method for manufacturing semiconductor device.

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26. Tanaka, Koichiro, Laser irradiation apparatus, laser irradiation method, and method for manufacturing semiconductor device.

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27. Tanaka,Koichiro, Laser irradiation apparatus, laser irradiation method, and method for manufacturing semiconductor device.

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28. Tanaka,Koichiro; Yamazaki,Shunpei; Kawasaki,Ritsuko, Laser irradiation apparatus, laser irradiation method, semiconductor device, and method of manufacturing a semiconductor device.

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29. Tanaka, Koichiro; Yamamoto, Yoshiaki, Laser irradiation method and laser irradiation apparatus.

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30. Tanaka, Koichiro; Yamamoto, Yoshiaki, Laser irradiation method, laser irradiation apparatus, and method for fabricating semiconductor device.

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31. Tanaka, Koichiro; Yamazaki, Shunpei, Laser irradiation method, laser irradiation apparatus, and method for manufacturing semiconductor device.

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32. Ishihara, Hiroaki; Nakashita, Kazuhisa; Ohnuma, Hideto; Tanaka, Nobuhiro; Adachi, Hiroki, Laser processing apparatus and laser processing process.

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33. Ohnuma, Hideto; Tanaka, Nobuhiro; Adachi, Hiroki, Laser processing apparatus and laser processing process.

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34. Ohnuma,Hideto; Tanaka,Nobuhiro; Adachi,Hiroki, Laser processing apparatus and laser processing process.

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35. Nakamae, Kazuo; Kakui, Motoki; Tamaoki, Shinobu, Laser processing method and laser processing apparatus.

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36. Yamazaki, Shunpei; Teramoto, Satoshi; Kusumoto, Naoto; Fukunaga, Takeshi; Nakajima, Setsuo; Miyamoto, Tadayoshi; Yoshinouchi, Atsushi, Laser-irradiation method and laser-irradiation device.

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37. Yamazaki, Shunpei; Teramoto, Satoshi; Kusumoto, Naoto; Fukunaga, Takeshi; Nakajima, Setsuo; Miyamoto, Tadayoshi; Yoshinouchi, Atsushi, Laser-irradiation method and laser-irradiation device.

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38. Haas Edwin G. ; Christina Vincent A. ; Hartley ; Jr. Richard A. ; Abel Bruce D. ; Todd Alan M. M., Method and apparatus for adjustably supporting a light source for use in photolithography.

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39. Otsu, Yasuhide; Eda, Tatsuo, Method and apparatus for processing brittle material.

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40. Gutowski Robert M. ; Calia Vincent ; Todd Alan M., Method and apparatus for producing extreme ultra-violet light for use in photolithography.

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41. Im, James S., Method and system for facilitating bi-directional growth.

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42. Otsu,Yasuhide; Eda,Tatsuo, Method and system for machining fragile material.

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43. Joo Seungki,KRX ; Kim Taekyung,KRX, Method for crystallizing amorphous silicon thin-film for use in thin-film transistors and thermal annealing apparatus therefor.

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44. Joo, Seungki; Kim, Taekyung, Method for crystallizing amorphous silicon thin-film for use in thin-film transistors and thermal annealing apparatus therefor.

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45. Arao, Tatsuya; Yamazaki, Shunpei, Method for fabricating semiconductor film and semiconductor device and laser processing apparatus.

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46. Arao,Tatsuya; Yamazaki,Shunpei, Method for fabricating semiconductor film and semiconductor device and laser processing apparatus.

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47. Chang,Shih Chang; Deng,De Hua; Tsai,Yaw Ming, Method for making thin film transistors with lightly doped regions.

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48. Tanaka, Koichiro; Oishi, Hirotada; Yamazaki, Shunpei, Method for manufacturing a semiconductor device and laser irradiation method and laser irradiation apparatus.

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49. Yamazaki, Shunpei; Nakamura, Osamu; Shoji, Hironobu; Tanaka, Koichiro, Method for manufacturing a semiconductor device that includes adding noble gas to a semiconductor film and then irradiating the semiconductor film with laser light in the presence of a magnetic field.

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50. Yamazaki,Shunpei; Nakamura,Osamu; Shoji,Hironobu; Tanaka,Koichiro, Method for manufacturing a semiconductor device that includes adding noble gas to a semiconductor film and then irradiating the semiconductor film with laser light in the presence of a magnetic field.

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51. Yamazaki, Shunpei; Takayama, Toru; Maruyama, Junya; Ohno, Yumiko; Tanaka, Koichiro, Method for manufacturing semiconductor apparatus, and semiconductor apparatus and electric appliance.

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52. Yamazaki,Shunpei; Takayama,Toru; Maruyama,Junya; Ohno,Yumiko; Tanaka,Koichiro, Method for manufacturing semiconductor apparatus, and semiconductor apparatus and electric appliance.

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53. Yamazaki, Shunpei; Ohnuma, Hideto; Kakehata, Tetsuya, Method for manufacturing semiconductor device.

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54. Yamazaki, Shunpei; Nakamura, Osamu; Shoji, Hironobu, Method for manufacturing semiconductor device, semiconductor device, and laser irradiation apparatus.

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55. Yamazaki,Shunpei; Nakamura,Osamu; Shoji,Hironobu, Method for manufacturing semiconductor device, semiconductor device, and laser irradiation apparatus.

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56. Yamazaki, Shunpei; Shimada, Hiroyuki; Takenouchi, Akira; Takemura, Yasuhiko, Method for processing semiconductor device apparatus for processing a semiconductor and apparatus for processing semiconductor device.

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57. Yamazaki Shunpei,JPX ; Shimada Hiroyuki,JPX ; Takenouchi Akira,JPX ; Takemura Yasuhiko,JPX, Method for processing semiconductor device, apparatus for processing a semiconductor and apparatus for processing semiconductor device.

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58. Kusumoto Naoto,JPX ; Yamazaki Shunpei,JPX, Method for producing insulated gate thin film semiconductor device.

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59. Kusumoto Naoto,JPX ; Yamazaki Shunpei,JPX, Method for producing insulated gate thin film semiconductor device.

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60. Kusumoto, Naoto; Yamazaki, Shunpei, Method for producing insulated gate thin film semiconductor device.

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61. Kusumoto, Naoto; Yamazaki, Shunpei, Method for producing insulated gate thin film semiconductor device.

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62. Kusumoto, Naoto; Yamazaki, Shunpei, Method for producing insulated gate thin film semiconductor device.

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63. Kusumoto,Naoto; Yamazaki,Shunpei, Method for producing insulated gate thin film semiconductor device.

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64. Im, James S., Method for providing a continuous motion sequential lateral solidification for reducing or eliminating artifacts in edge regions, and a mask for facilitating such artifact reduction/elimination.

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65. Kasahara, Kenji; Kawasaki, Ritsuko; Ohtani, Hisashi; Yamazaki, Shunpei, Method of crystallizing a semiconductor layer by applying laser irradiation that vary in energy to its top and bottom surfaces.

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66. Shunpei Yamazaki JP, Method of crystallizing a semiconductor layer in a MIS transistor.

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67. Lee Kyung-Eon,KRX ; Choi Jae-Beom,KRX, Method of crystallizing a silicon film and a method of manufacturing a liquid crystal display apparatus.

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68. Yamazaki, Shunpei, Method of fabricating a MIS transistor.

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69. Yamazaki,Shunpei, Method of fabricating a MIS transistor.

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70. Tanaka, Koichiro, Method of fabricating semiconductor device.

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71. Tanaka,Koichiro; Miyairi,Hidekazu; Shoji,Hironobu, Method of fabricating semiconductor device utilizing laser irradiation.

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72. Yamazaki, Shunpei; Tanaka, Koichiro, Method of irradiating laser, laser irradiation system, and manufacturing method of semiconductor device.

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73. Haas Edwin G. ; Gutowski Robert M. ; Calia Vincent S., Method of manufacturing very small diameter deep passages.

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74. Markle David A. ; Talwar Somit ; Hawryluk Andrew M., Methods for determining wavelength and pulse length of radiant energy used for annealing.

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75. Im, James S.; van der Wilt, Paul Christiaan, Processes and systems for laser crystallization processing of film regions on a substrate utilizing a line-type beam, and structures of such film regions.

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76. Im, James S.; van der Wilt, Paul Christiaan, Processes and systems for laser crystallization processing of film regions on a substrate utilizing a line-type beam, and structures of such film regions.

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77. Yamazaki, Shunpei; Isobe, Atsuo; Godo, Hiromichi; Okazaki, Yutaka, Semiconductor device.

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78. Yamazaki, Shunpei; Isobe, Atsuo; Godo, Hiromichi; Okazaki, Yutaka, Semiconductor device.

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79. Yamazaki, Shunpei; Isobe, Atsuo; Godo, Hiromichi; Okazaki, Yutaka, Semiconductor device.

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80. Tanaka, Koichiro; Isobe, Atsuo; Yamamoto, Yoshiaki, Semiconductor device and its manufacturing method.

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81. Yamazaki, Shunpei; Koyama, Jun, Semiconductor device and manufacturing method thereof.

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82. Yamazaki,Shunpei; Koyama,Jun, Semiconductor device and manufacturing method thereof.

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83. Yoshimoto,Satoshi, Semiconductor device and method of manufacturing the same.

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84. Yoshimoto,Satoshi, Semiconductor device and method of manufacturing the same.

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85. Kasahara,Kenji; Kawasaki,Ritsuko; Ohtani,Hisashi; Yamazaki,Shunpei, Semiconductor device, manufacturing method thereof, and electronic device.

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86. Yamazaki,Shunpei; Koyama,Jun; Suzawa,Hideomi; Ono,Koji; Arao,Tatsuya, Semiconductor display device and manufacturing method thereof.

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87. Yamazaki,Shunpei; Koyama,Jun; Suzawa,Hideomi; Ono,Koji; Arao,Tatsuya, Semiconductor display device and manufacturing method thereof.

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88. Shunpei Yamazaki JP; Akiharu Miyanaga JP; Jun Koyama JP; Takeshi Fukunaga JP, Semiconductor thin film and its manufacturing method and semiconductor device and its manufacturing method.

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89. Yamazaki, Shunpei; Miyanaga, Akiharu; Koyama, Jun; Fukunaga, Takeshi, Semiconductor thin film and its manufacturing method and semiconductor device and its manufacturing method.

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90. Yamazaki, Shunpei; Miyanaga, Akiharu; Koyama, Jun; Fukunaga, Takeshi, Semiconductor thin film and its manufacturing method and semiconductor device and its manufacturing method.

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91. Yamazaki,Shunpei; Miyanaga,Akiharu; Koyama,Jun; Fukunaga,Takeshi, Static random access memory using thin film transistors.

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92. Yamagishi Shinji,JPX ; Fujimori Koichi,JPX, Thermostat.

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93. Yamazaki, Shunpei; Miyanaga, Akiharu; Koyama, Jun; Fukunaga, Takeshi, Thin film semiconductor device and its manufacturing method.

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94. Im, James S.; Sposili, Robert S.; Crowder, Mark A., Uniform large-grained and gain boundary location manipulated polycrystalline thin film semiconductors formed using sequential lateral solidification and devices formed thereon.

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95. Im, James S.; Sposili, Robert S.; Crowder, Mark A., Uniform large-grained and grain boundary location manipulated polycrystalline thin film semiconductors formed using sequential lateral solidification and devices formed thereon.

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