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Method for manufacturing a semiconductor device 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-021/228
출원번호 US-0329644 (1994-10-25)
우선권정보 JP-0294633 (1993-10-29); JP-0303436 (1993-11-09); JP-0307206 (1993-11-12); JP-0162705 (1994-06-20)
발명자 / 주소
  • Ohtani Hisashi (Kanagawa JPX) Miyanaga Akiharu (Kanagawa JPX) Fukunaga Takeshi (Kanagawa JPX) Zhang Hongyong (Kanagawa JPX)
출원인 / 주소
  • Semiconductor Energy Laboratory Co., Ltd. (Kanagawa-ken JPX 03)
인용정보 피인용 횟수 : 1302  인용 특허 : 0

초록

A process for fabricating a highly stable and reliable semiconductor, comprising: coating the surface of an amorphous silicon film with a solution containing a catalyst element capable of accelerating the crystallization of the amorphous silicon film, and heat treating the amorphous silicon film the

대표청구항

A method for manufacturing a semiconductor device comprising the steps of: disposing a crystallization promoting solution in contact with at least a portion of an amorphous silicon film on a substrate, said solution containing an element selected from the group consisting nickel (Ni), palladium (Pd)

이 특허를 인용한 특허 (1302)

  1. Ohtani Hisashi,JPX ; Miyanaga Akiharu,JPX ; Fukunaga Takeshi,JPX ; Zhang Hongyong,JPX, Active Matry Display.
  2. Yamazaki,Shunpei, Active matrix EL device with sealing structure housing the device.
  3. Yamazaki, Shunpei, Active matrix EL device with sealing structure housing the device and the peripheral driving circuits.
  4. Ishikawa, Akira, Active matrix display device.
  5. Kato, Kiyoshi; Ozaki, Tadafumi; Mutaguchi, Kohei, Active matrix display device and manufacturing method thereof.
  6. Kato, Kiyoshi; Ozaki, Tadafumi; Mutaguchi, Kohei, Active matrix display device and manufacturing method thereof.
  7. Kokubo, Chiho; Yamagata, Hirokazu; Yamazaki, Shunpei, Active matrix display device having a column-like spacer.
  8. Koyama, Jun; Ohtani, Hisashi; Ogata, Yasushi; Yamazaki, Shunpei, Active matrix display device having wiring layers which are connected over multiple contact parts.
  9. Yamazaki, Shunpei; Koyama, Jun; Yamamoto, Kunitaka; Konuma, Toshimitsu, Active matrix display device with improved operating performance.
  10. Yamazaki, Shunpei; Arai, Yasuyuki; Koyama, Jun, Active matrix display in which LDD regions in the driver circuit and the storage capacitor in the pixel section have the same dopant concentration.
  11. Yamazaki, Shunpei, Active matrix electroluminescent device within resin sealed housing.
  12. Yamazaki, Shunpei, Active matrix electroluminescent device within resin sealed housing.
  13. Hirakata, Yoshiharu, Active matrix type display device.
  14. Hirakata, Yoshiharu, Active matrix type display device.
  15. Hirakata, Yoshiharu, Active matrix type display device.
  16. Hirakata,Yoshiharu, Active matrix type display device.
  17. Hirakata,Yoshiharu, Active matrix type display device.
  18. Tanaka, Yukio; Nagao, Shou, Active matrix type semicondcutor display device.
  19. Tanaka,Yukio; Nagao,Shou, Active matrix type semiconductor display device.
  20. Yukio Tanaka JP; Shou Nagao JP, Active matrix type semiconductor display device.
  21. Takayama, Toru; Maruyama, Junya; Goto, Yuugo; Ohno, Yumiko; Akiba, Mai, Article having display device.
  22. Tanaka,Koichiro, Beam homogenizer laser irradiation, apparatus, semiconductor device, and method of fabricating the semiconductor device.
  23. Tanaka Koichiro,JPX, Beam homogenizer, laser irradiation apparatus, laser irradiation method, and method of manufacturing semiconductor device.
  24. Tanaka, Koichiro, Beam homogenizer, laser irradiation apparatus, laser irradiation method, and method of manufacturing semiconductor device.
  25. Tanaka, Koichiro, Beam homogenizer, laser irradiation apparatus, semiconductor device, and method of fabricating the semiconductor device.
  26. Zhang, Hongyong; Igarashi, Makoto; Yanai, Kenichi; Hori, Tetsuro; Takizawa, Yutaka, CMOS-type semiconductor device and method of fabricating the same.
  27. Zhang, Hongyong; Igarashi, Makoto, CMOS-type thin film semiconductor device and method of fabricating the same.
  28. Satake,Rumo; Hirakata,Yoshiharu; Nishi,Takeshi; Yamazaki,Shunpei, Camera and personal computer having a reflection type liquid crystal device with particular dielectric multi-layer film and interlayer insulating films.
  29. Murakami, Satoshi; Hirakata, Yoshiharu; Fujimoto, Etsuko; Yamazaki, Yu; Yamazaki, Shunpei, Capacitor, semiconductor device and manufacturing method thereof.
  30. Yamazaki Shunpei,JPX ; Koyama Jun,JPX ; Fukunaga Takeshi,JPX, Channel etch type bottom gate semiconductor device.
  31. Tateishi, Fuminori, Chemical solution application apparatus and chemical solution application method.
  32. Azami, Munehiro, Color image display device, method of driving the same, and electronic equipment.
  33. Azami,Munehiro, Color image display device, method of driving the same, and electronic equipment.
  34. Azami,Munehiro, Color image display device, method of driving the same, and electronic equipment.
  35. Nakamura,Osamu; Kuwabara,Hideaki; Shibata,Noriko, Conductive film as the connector for thin film display device.
  36. Nakazawa, Misako; Hamatani, Toshiji; Makita, Naoki, Crystalline semiconductor film, method of manufacturing the same, and semiconductor device.
  37. Nakazawa,Misako; Hamatani,Toshiji; Makita,Naoki, Crystalline semiconductor film, method of manufacturing the same, and semiconductor device.
  38. Moriwaka, Tomoaki, Crystalline semiconductor film, semiconductor device, and method for manufacturing thereof.
  39. Yamazaki,Shunpei; Ohtani,Hisashi; Takano,Tamae, Crystalline semiconductor thin film, method of fabricating the same, semiconductor device and method of fabricating the same.
  40. Yamazaki, Shunpei; Ohtani, Hisashi; Takano, Tamae, Crystalline semiconductor thin film, method of fabricating the same, semiconductor device, and method of fabricating the same.
  41. Yamazaki, Shunpei; Ohtani, Hisashi; Takano, Tamae, Crystalline semiconductor thin film, method of fabricating the same, semiconductor device, and method of fabricating the same.
  42. Yamazaki, Shunpei; Ohtani, Hisashi; Takano, Tamae, Crystalline semiconductor thin film, method of fabricating the same, semiconductor device, and method of fabricating the same.
  43. Yamazaki, Shunpei; Ohtani, Hisashi; Takano, Tamae, Crystalline semiconductor thin film, method of fabricating the same, semiconductor device, and method of fabricating the same.
  44. Yamazaki, Shunpei; Ohtani, Hisashi; Takano, Tamae, Crystalline semiconductor thin film, method of fabricating the same, semiconductor device, and method of fabricating the same.
  45. Yamazaki, Shunpei; Ohtani, Hisashi; Takano, Tamae, Crystalline semiconductor thin film, method of fabricating the same, semiconductor device, and method of fabricating the same.
  46. Yamazaki,Shunpei; Ohtani,Hisashi; Takano,Tamae, Crystalline semiconductor thin film, method of fabricating the same, semiconductor device, and method of fabricating the same.
  47. Yamazaki,Shunpei; Ohtani,Hisashi; Takano,Tamae, Crystalline semiconductor thin film, method of fabricating the same, semiconductor device, and method of fabricating the same.
  48. Yamazaki,Shunpei; Ohtani,Hisashi; Takano,Tamae, Crystalline semiconductor thin film, method of fabricating the same, semiconductor device, and method of fabricating the same.
  49. Yamazaki,Shunpei; Ohtani,Hisashi; Takano,Tamae, Crystalline semiconductor thin film, method of fabricating the same, semiconductor device, and method of fabricating the same.
  50. Tanaka, Yukio, D/A conversion circuit and semiconductor device.
  51. Tanaka, Yukio, D/A conversion circuit and semiconductor device.
  52. Tanaka, Yukio, D/A conversion circuit and semiconductor device.
  53. Tanaka, Yukio, D/A conversion circuit and semiconductor device.
  54. Tanaka,Yukio, D/A conversion circuit and semiconductor device.
  55. Yukio Tanaka JP, D/A conversion circuit and semiconductor device.
  56. Yukio Tanaka JP, D/A conversion circuit having n switches, n capacitors and a coupling capacitor.
  57. Tanaka, Yukio; Azami, Munehiko, D/A converter circuit and semiconductor device.
  58. Tanaka, Yukio, D/A converter having capacitances, tone voltage lines, first switches, second switches and third switches.
  59. Hiroki, Masaaki, Defective pixel compensation system and display device using the system.
  60. Hiroki, Masaaki, Defective pixel compensation system and display device using the system.
  61. Hiroki,Masaaki, Defective pixel compensation system and display device using the system.
  62. Yamazaki, Shunpei, Device comprising EL element electrically connected to P-channel transistor.
  63. Azami, Munehiro; Osame, Mitsuaki; Shionoiri, Yutaka; Nagao, Shou, Digital analog converter and electronic device using the same.
  64. Munehiro Azami JP; Mitsuaki Osame JP; Yutaka Shionoiri JP; Shou Nagao JP, Digital analog converter and electronic device using the same.
  65. Koyama, Jun; Shionoiri, Yutaka, Digital driver and display device.
  66. Koyama,Jun; Shionoiri,Yutaka, Digital driver and display device.
  67. Koyama,Jun; Shionoiri,Yutaka, Digital driver and display device.
  68. Koyama,Jun; Shionoiri,Yutaka, Digital driver and display device.
  69. Adachi, Hiroki, Display device.
  70. Koyama, Jun; Hayashi, Keisuke, Display device.
  71. Koyama, Jun; Hayashi, Keisuke, Display device.
  72. Ohtani, Hisashi; Tanaka, Yukio; Shibata, Hiroshi; Ishikawa, Akira, Display device.
  73. Tanaka, Yukio, Display device.
  74. Tanaka, Yukio, Display device.
  75. Tanaka,Yukio, Display device.
  76. Tanaka,Yukio, Display device.
  77. Yamazaki, Shunpei; Koyama, Jun, Display device.
  78. Yamazaki, Shunpei; Koyama, Jun; Yamagata, Hirokazu, Display device.
  79. Yamazaki, Shunpei; Koyama, Jun; Yamagata, Hirokazu, Display device.
  80. Yamazaki, Shunpei; Koyama, Jun; Yamagata, Hirokazu, Display device.
  81. Yamazaki, Shunpei; Koyama, Jun; Yamagata, Hirokazu, Display device.
  82. Yamazaki, Shunpei; Koyama, Jun; Yamagata, Hirokazu, Display device.
  83. Yamazaki, Shunpei; Koyama, Jun; Yamagata, Hirokazu, Display device.
  84. Yamazaki, Shunpei; Koyama, Jun; Yamamoto, Kunitaka; Konuma, Toshimitsu, Display device.
  85. Yamazaki, Shunpei; Koyoma, Jun; Yamamoto, Kunitaka; Konuma, Toshimitsu, Display device.
  86. Yamazaki, Shunpei; Mizukami, Mayumi; Konuma, Toshimitsu, Display device.
  87. Yamazaki,Shunpei; Koyama,Jun, Display device.
  88. Yamazaki,Shunpei; Koyama,Jun; Yamagata,Hirokazu, Display device.
  89. Tanaka, Yukio, Display device and a driver circuit thereof.
  90. Tanaka,Yukio, Display device and a driver circuit thereof.
  91. Yukio Tanaka JP, Display device and a driver circuit thereof.
  92. Yamazaki Shunpei,JPX ; Koyama Jun,JPX ; Shionoiri Yutaka,JPX, Display device and drive circuit therefor.
  93. Yamazaki, Shunpei; Koyama, Jun; Shionoiri, Yutaka, Display device and drive circuit therefor.
  94. Yamazaki, Shunpei; Koyama, Jun, Display device and electronic apparatus.
  95. Yamazaki, Shunpei; Koyama, Jun, Display device and electronic apparatus.
  96. Yamazaki, Shunpei; Koyama, Jun, Display device and electronic apparatus.
  97. Yamazaki,Shunpei; Koyama,Jun, Display device and electronic apparatus.
  98. Yamazaki,Shunpei; Koyama,Jun, Display device and electronic apparatus having a wiring connected to a counter electrode via an opening portion in an insulating layer that surrounds a pixel electrode.
  99. Koyama,Jun; Isobe,Atsuo; Shibata,Hiroshi; Yamazaki,Shunpei, Display device and electronic device using the same.
  100. Koyama, Masaki, Display device and manufacturing method thereof.
  101. Koyama,Masaki, Display device and manufacturing method thereof.
  102. Koyama, Jun, Display device and method for fabricating the same.
  103. Koyama, Jun, Display device and method for fabricating the same.
  104. Koyama, Jun, Display device and method for fabricating the same.
  105. Koyama, Jun, Display device and method for fabricating the same.
  106. Miyagi, Noriko; Sakakura, Masayuki; Arao, Tatsuya; Nagao, Ritsuko; Tanada, Yoshifumi, Display device and method for manufacturing the same.
  107. Miyagi, Noriko; Sakakura, Masayuki; Arao, Tatsuya; Nagao, Ritsuko; Tanada, Yoshifumi, Display device and method for manufacturing the same.
  108. Miyagi, Noriko; Sakakura, Masayuki; Arao, Tatsuya; Nagao, Ritsuko; Tanada, Yoshifumi, Display device and method for manufacturing the same.
  109. Miyagi,Noriko; Sakakura,Masayuki; Arao,Tatsuya; Nagao,Ritsuko; Tanada,Yoshifumi, Display device and method for manufacturing the same.
  110. Yamazaki, Shunpei; Koyama, Jun; Hiroki, Masaaki; Azami, Munehiro; Osame, Mitsuaki; Shionoiri, Yutaka; Nagao, Shou, Display device and method for operating the same.
  111. Yamazaki, Shunpei; Koyama, Jun; Hiroki, Masaaki; Azami, Munehiro; Osame, Mitsuaki; Shionoiri, Yutaka; Nagao, Shou, Display device and method for operating the same.
  112. Hiroki, Masaaki, Display device and method of driving the same.
  113. Hiroki,Masaaki, Display device and method of driving the same.
  114. Adachi, Hiroki, Display device comprising at least dual transistor electrically connected to dual parallel wiring.
  115. Adachi, Hiroki, Display device comprising dual transistor with LDD regions overlapping the gate electrodes and one of a source electrode and a drain electrode of first transistor is electrically connected to the second gate electrode.
  116. Hamada, Takashi; Arai, Yasuyuki, Display device having driver TFTs and pixel TFTs formed on the same substrate.
  117. Yamazaki, Shunpei, Display device having light emitting elements with red color filters.
  118. Yamazaki, Shunpei; Kuwabara, Hideaki, Display device including a color filter or color filters over a pixel portion and a driving circuit for driving the pixel portion.
  119. Yamazaki, Shunpei; Arai, Yasuyuki, Display device including pixel comprising first transistor second transistor and light-emitting element.
  120. Yamazaki,Shunpei, Display device with anode contacting input-output wiring through opening in insulating film.
  121. Yamazaki,Shunpei; Murakami,Satoshi; Koyama,Jun; Tanaka,Yukio; Kitakado,Hidehito; Ohnumo,Hideto, Display including casing and display unit.
  122. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Hayakawa Masahiko,JPX ; Osame Mitsuaki,JPX, Display switch with double layered gate insulation and resinous interlayer dielectric.
  123. Koezuka,Junichi; Suzuki,Naoki, Doping method and method of manufacturing field effect transistor.
  124. Nakamura, Osamu, Doping method, doping apparatus, and control system for doping apparatus.
  125. Nakamura,Osamu, Doping method, doping apparatus, and control system for doping apparatus.
  126. Koyama, Jun; Yamazaki, Shunpei, Driving circuit of a semiconductor display device and the semiconductor display device.
  127. Koyama, Jun; Yamazaki, Shunpei, Driving circuit of a semiconductor display device and the semiconductor display device.
  128. Koyama, Jun; Yamazaki, Shunpei, Driving circuit of a semiconductor display device and the semiconductor display device.
  129. Koyama, Jun; Yamazaki, Shunpei, Driving circuit of a semiconductor display device and the semiconductor display device.
  130. Koyama,Jun; Yamazaki,Shunpei, Driving circuit of a semiconductor display device and the semiconductor display device.
  131. Koyama,Jun; Yamazaki,Shunpei, Driving circuit of a semiconductor display device and the semiconductor display device.
  132. Nishi, Takeshi; Ishimaru, Noriko, EL display device.
  133. Nishi, Takeshi; Ishimaru, Noriko, EL display device.
  134. Shunpei Yamazaki JP; Mayumi Mizukami JP; Toshimitsu Konuma JP, EL display device.
  135. Yamazaki, Shunpei; Mizukami, Mayumi; Konuma, Toshimitsu, EL display device.
  136. Yamazaki, Shunpei; Mizukami, Mayumi; Konuma, Toshimitsu, EL display device.
  137. Yamazaki, Shunpei; Mizukami, Mayumi; Konuma, Toshimitsu, EL display device.
  138. Yamazaki, Shunpei; Mizutami, Mayumi; Konuma, Toshimitsu, EL display device.
  139. Yamazaki, Shunpei; Yamamoto, Kunitaka; Hiroki, Masaaki; Fukunaga, Takeshi, EL display device and a method of manufacturing the same.
  140. Yamazaki, Shunpei; Yamamoto, Kunitaka; Hiroki, Masaaki; Fukunaga, Takeshi, EL display device and a method of manufacturing the same.
  141. Yamazaki, Shunpei; Yamamoto, Kunitaka; Hiroki, Masaaki; Fukunaga, Takeshi, EL display device and a method of manufacturing the same.
  142. Yamazaki, Shunpei; Yamamoto, Kunitaka; Hiroki, Masaaki; Fukunaga, Takeshi, EL display device and a method of manufacturing the same.
  143. Yamazaki, Shunpei; Yamamoto, Kunitaka; Hiroki, Masaaki; Fukunaga, Takeshi, EL display device and a method of manufacturing the same.
  144. Yamazaki,Shunpei; Yamamoto,Kunitaka; Hiroki,Masaaki; Fukunaga,Takeshi, EL display device and a method of manufacturing the same.
  145. Yamazaki,Shunpei; Yamamoto,Kunitaka; Hiroki,Masaaki; Fukunaga,Takeshi, EL display device and a method of manufacturing the same.
  146. Koyama, Jun, EL display device and electronic device.
  147. Koyama, Jun, EL display device and electronic device.
  148. Shunpei Yamazaki JP, EL display device and manufacturing method thereof.
  149. Yamazaki, Shunpei, EL display device and manufacturing method thereof.
  150. Yamazaki, Shunpei, EL display device and manufacturing method thereof.
  151. Yamazaki, Shunpei, EL display device and manufacturing method thereof.
  152. Yamazaki, Shunpei; Mizukami, Mayumi; Konuma, Toshimitsu, EL display device and method for manufacturing the same.
  153. Yamazaki, Shunpei; Mizukami, Mayumi; Konuma, Toshimitsu, EL display device and method for manufacturing the same.
  154. Yamazaki, Shunpei; Yamamoto, Kunitaka; Hiroki, Masaaki; Fukunaga, Takeshi, EL display device and method of manufacturing the same.
  155. Kawasaki, Ritsuko; Kitakado, Hidehito; Kasahara, Kenji; Yamazaki, Shunpei, EL display device having a pixel portion and a driver circuit.
  156. Kawasaki, Ritsuko; Kitakado, Hidehito; Kasahara, Kenji; Yamazaki, Shunpei, EL display device having a pixel portion and a driver circuit.
  157. Yamazaki, Shunpei, EL display device having pixel electrode with projecting portions and manufacturing method thereof.
  158. Yamazaki, Shunpei; Mizukami, Mayumi; Konuma, Toshimitsu, EL display device including color filter and light shielding film.
  159. Kawasaki, Ritsuko; Kasahara, Kenji; Ohtani, Hisashi, EL display device with a TFT.
  160. Shunpei Yamazaki JP; Yoshiharu Hirakata JP, ELECTROOPTICAL DISPLAY DEVICE USING AN ACTIVE MATRIX DISPLAY IN WHICH A LIGHT REFLECTION FILM HAVING A FLAT SURFACE OVER THE PIXEL ELECTRODE AND THE TEXTURED BODY, AND THE PIXEL ELECTRODE HAVING A FL.
  161. Yamazaki, Shunpei; Koyama, Jun; Yamamoto, Kunitaka; Konuma, Toshimitsu, Electro-optical device and electronic device.
  162. Yamazaki, Shunpei; Koyama, Jun; Yamamoto, Kunitaka; Konuma, Toshimitsu, Electro-optical device and electronic device.
  163. Yamazaki, Shunpei; Koyama, Jun; Yamamoto, Kunitaka; Konuma, Toshimitsu, Electro-optical device and electronic device.
  164. Yamazaki, Shunpei; Koyama, Jun; Yamamoto, Kunitaka; Konuma, Toshimitsu, Electro-optical device and electronic device.
  165. Yamazaki, Shunpei; Koyama, Jun; Yamamoto, Kunitaka; Konuma, Toshimitsu, Electro-optical device and electronic device.
  166. Yamazaki, Shunpei; Koyama, Jun; Yamamoto, Kunitaka; Konuma, Toshimitsu, Electro-optical device and electronic device.
  167. Yamazaki, Shunpei; Koyama, Jun; Yamamoto, Kunitaka; Konuma, Toshimitsu, Electro-optical device and electronic device.
  168. Yamazaki, Shunpei; Koyama, Jun; Yamamoto, Kunitaka; Konuma, Toshimitsu, Electro-optical device and electronic device.
  169. Yamazaki, Shunpei; Koyama, Jun; Yamamoto, Kunitaka; Konuma, Toshimitsu, Electro-optical device and electronic device.
  170. Yamazaki, Shunpei; Koyama, Jun; Yamamoto, Kunitaka; Konuma, Toshimitsu, Electro-optical device and electronic device.
  171. Yamazaki, Shunpei; Koyama, Jun; Yamamoto, Kunitaka; Konuma, Toshimitsu, Electro-optical device and electronic device.
  172. Yamazaki, Shunpei; Koyama, Jun; Yamamoto, Kunitaka; Konuma, Toshimitsu, Electro-optical device and electronic device.
  173. Shunpei Yamazaki JP; Hidehito Kitakado JP; Takeshi Fukunaga JP, Electro-optical device and electronic equipment.
  174. Yamazaki, Shunpei; Kitakado, Hidehito; Fukunaga, Takeshi, Electro-optical device and electronic equipment.
  175. Yamazaki, Shunpei, Electro-optical device and manufacturing method thereof.
  176. Yamazaki, Shunpei, Electro-optical device and manufacturing method thereof.
  177. Yamazaki, Shunpei; Ohtani, Hisashi; Nakajima, Setsuo, Electro-optical device and manufacturing method thereof.
  178. Yamazaki, Shunpei; Ohtani, Hisashi; Nakajima, Setsuo, Electro-optical device and manufacturing method thereof.
  179. Yamazaki, Shunpei; Yamamoto, Kunitaka; Arai, Yasuyuki, Electro-optical device and manufacturing method thereof.
  180. Yamazaki,Shunpei, Electro-optical device and manufacturing method thereof.
  181. Yamazaki,Shunpei, Electro-optical device and manufacturing method thereof.
  182. Yamazaki,Shunpei; Ohtani,Hisashi; Nakajima,Setsuo, Electro-optical device and manufacturing method thereof.
  183. Yamazaki,Shunpei; Ohtani,Hisashi; Nakajima,Setsuo, Electro-optical device and manufacturing method thereof.
  184. Ohtani Hisashi,JPX ; Koyama Jun,JPX ; Yamazaki Shunpei,JPX, Electro-optical device and semiconductor circuit.
  185. Ohtani,Hisashi; Koyama,Jun; Yamazaki,Shunpei, Electro-optical device and semiconductor circuit.
  186. Ohtani,Hisashi; Koyama,Jun; Yamazaki,Shunpei, Electro-optical device and semiconductor circuit.
  187. Ohtani, Hisashi; Koyama, Jun; Yamazaki, Shunpei, Electro-optical device and semiconductor device.
  188. Yamazaki, Shunpei; Yamamoto, Kunitaka; Arai, Yasuyuki, Electro-optical device having an EL layer over a plurality of pixels.
  189. Yamazaki, Shunpei; Goto, Yuugo; Katsura, Hideki, Electro-optical device with light shielding portion comprising laminated colored layers, electrical equipment having the same, portable telephone having the same.
  190. Ono, Koji; Suzawa, Hideomi; Arao, Tatsuya, Electroluminescence display device.
  191. Ono, Koji; Suzawa, Hideomi; Arao, Tatsuya, Electroluminescence display device.
  192. Ono, Koji; Suzawa, Hideomi; Arao, Tatsuya, Electroluminescence display device.
  193. Ono, Koji; Suzawa, Hideomi; Arao, Tatsuya, Electroluminescence display device.
  194. Yamazaki,Shunpei; Koyama,Jun; Yamamoto,Kunitaka; Konuma,Toshimitsu, Electroluminescence display device and method of manufacturing the same.
  195. Yamazaki, Shunpei; Koyama, Jun; Suzawa, Hideomi; Ono, Koji; Arao, Tatsuya, Electronic appliance including transistor having LDD region.
  196. Yamazaki,Shunpei; Koyama,Jun; Suzawa,Hideomi; Ono,Koji; Arao,Tatsuya, Electronic appliance including transistor having LDD region.
  197. Shunpei Yamazaki JP; Toshimitsu Konuma JP; Jun Koyama JP; Kazutaka Inukai JP; Mayumi Mizukami JP, Electronic device.
  198. Yamazaki, Shunpei; Konuma, Toshimitsu; Koyama, Jun; Inukai, Kazutaka; Mizukami, Mayumi, Electronic device.
  199. Yamazaki, Shunpei; Koyama, Jun; Inukai, Kazutaka, Electronic device.
  200. Yamazaki,Shunpei; Konuma,Toshimitsu; Koyama,Jun; Inukai,Kazutaka; Mizukami,Mayumi, Electronic device.
  201. Yamauchi, Yukio; Fukunaga, Takeshi, Electronic device and electronic apparatus.
  202. Yamauchi, Yukio; Fukunaga, Takeshi, Electronic device and electronic apparatus.
  203. Yamauchi, Yukio; Fukunaga, Takeshi, Electronic device and electronic apparatus.
  204. Yamauchi, Yukio; Fukunaga, Takeshi, Electronic device and electronic apparatus.
  205. Yamauchi, Yukio; Fukunaga, Takeshi, Electronic device and electronic apparatus.
  206. Yamauchi, Yukio; Fukunaga, Takeshi, Electronic device and electronic apparatus.
  207. Yamauchi,Yukio; Fukunaga,Takeshi, Electronic device and electronic apparatus.
  208. Satake, Rumo; Hirakata, Yoshiharu; Nishi, Takeshi; Yamazaki, Shunpei, Electronic device and method of manufacturing the same.
  209. Rumo Satake JP; Yoshiharu Hirakata JP; Takeshi Nishi JP; Shunpei Yamazaki JP, Electronic device and method of manufacturing the same having dielectric multi-layers on the pixel electrode.
  210. Yamazaki, Shunpei; Koyama, Jun; Inukai, Kazutaka, Electronic device having a light-emitting element.
  211. Yamazaki, Shunpei; Koyama, Jun; Inukai, Kazutaka, Electronic device with light emission for a display.
  212. Yamazaki, Shunpei; Koyama, Jun, Electronic equipment including LED backlight.
  213. Ikeda, Takayuki; Yamazaki, Shunpei, Electrooptical device and a method of manufacturing the same.
  214. Ikeda,Takayuki; Yamazaki,Shunpei, Electrooptical device and a method of manufacturing the same.
  215. Higuchi, Masayuki; Murakami, Satoshi; Nakazawa, Misako, Electrooptical device, method of manufacturing the same, and electronic equipment.
  216. Higuchi,Masayuki; Murakami,Satoshi; Nakazawa,Misako, Electrooptical device, method of manufacturing the same, and electronic equipment.
  217. Yamazaki, Shunpei; Hirakata, Yoshiharu, Electrooptical display device having textured body on flat surface of pixel electrode.
  218. Stephen J. Fonash ; Ali Kaan Kalkan ; Robert H. Detig, Electrostatic printing of a metallic toner applied to solid phase crystallization and silicidation.
  219. Fonash Stephen J. ; Kalkan Ali Kaan ; Detig Robert H., Electrostatic printing of a metallic toner to produce a polycrystalline semiconductor from an amorphous semiconductor.
  220. Asano,Etsuko; Nakamura,Osamu; Sakakura,Masayuki, Evaluation method using a TEG, a method of manufacturing a semiconductor device having a TEG, an element substrate and a panel having the TEG, a program for controlling dosage and a computer-readable recording medium recoding the program.
  221. Asano, Etsuko; Nakamura, Osamu; Sakakura, Masayuki, Evaluation method using a TEG, a method of manufacturing a semiconductor device having the TEG, an element substrate and a panel having the TEG, a program for controlling dosage and a computer-readable recording medium recording the program.
  222. Adachi, Hiroki, Exposure device, exposure method and method of manufacturing semiconductor device.
  223. Adachi,Hiroki, Exposure device, exposure method and method of manufacturing semiconductor device.
  224. Adachi,Hiroki, Exposure device, exposure method and method of manufacturing semiconductor device.
  225. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki, Fabrication method of semiconductor device.
  226. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki, Fabrication method of semiconductor device.
  227. Yamazaki,Shunpei; Adachi,Hiroki, Ferroelectric liquid crystal and goggle type display devices.
  228. Yamazaki, Shunpei; Adachi, Hiroki, Ferroelectric liquid crystal display device comprising gate-overlapped lightly doped drain structure.
  229. Ohnuma,Hideto; Nemoto,Yukie, Field emission device and manufacturing method thereof.
  230. Ohnuma,Hideto; Nemoto,Yukie, Field emission device and manufacturing method thereof.
  231. Yamazaki, Shunpei; Koyama, Jun, Field sequential liquid crystal display device and driving method thereof, and head mounted display.
  232. Yamazaki, Shunpei; Koyama, Jun, Field sequential liquid crystal display device and driving method thereof, and head mounted display.
  233. Yamazaki,Shunpei; Koyama,Jun, Field sequential liquid crystal display device and driving method thereof, and head mounted display.
  234. Yamazaki, Shunpei; Yamazaki, Yu; Hayashi, Keisuke, Goggle type display device.
  235. Dairiki, Koji; Yamazaki, Shunpei, Heat treatment apparatus and method of manufacturing a semiconductor device.
  236. Dairiki,Koji; Yamazaki,Shunpei, Heat treatment apparatus and method of manufacturing a semiconductor device.
  237. Yamazaki, Shunpei, Heat treatment apparatus and method of manufacturing a semiconductor device.
  238. Shunpei Yamazaki JP; Hisashi Ohtani JP, Heating treatment device, heating treatment method and fabrication method of semiconductor device.
  239. Yamazaki,Shunpei; Ohtani,Hisashi, Heating treatment device, heating treatment method and fabrication method of semiconductor device.
  240. Yamazaki,Shunpei; Ohtani,Hisashi, Heating treatment device, heating treatment method and fabrication method of semiconductor device.
  241. Takashi Noguchi JP; Rafael Reif ; Julie Tsai ; Andrew J. Tang, High performance poly-si1-xgex thin film transistor and a method of fabricating such a thin film transistor.
  242. Kroll, Bo; Missbach, Robert; Schwerdtner, Alexander, Holographic display.
  243. Kroll, Bo; Missbach, Robert; Schwerdtner, Alexander, Holographic display.
  244. Kroll, Bo; Missbach, Robert; Schwerdtner, Alexander, Holographic display with a variable beam deflection.
  245. Kroll, Bo; Missbach, Robert; Schwerdtner, Alexander, Holographic display with communications.
  246. Yokoi, Tomokazu; Yoshitomi, Shuhei; Yoshizumi, Kensuke, Hydrogen generating element, hydrogen generation device, power generation device, and driving device.
  247. Yamazaki, Shunpei, IC card.
  248. Yamazaki, Shunpei, IC card.
  249. Yamazaki, Shunpei, IC card.
  250. Yamazaki, Shunpei; Takayama, Toru; Maruyama, Junya; Goto, Yuugo; Ohno, Yumiko; Akiba, Mai, IC card and booking account system using the IC card.
  251. Takayama, Toru; Maruyama, Junya; Goto, Yuugo; Ohno, Yumiko; Akiba, Mai, IC card and booking-account system using the IC card.
  252. Takayama, Toru; Maruyama, Junya; Goto, Yuugo; Ohno, Yumiko; Akiba, Mai, IC card and booking-account system using the IC card.
  253. Takayama, Toru; Maruyama, Junya; Goto, Yuugo; Ohno, Yumiko; Akiba, Mai, IC card and booking-account system using the IC card.
  254. Takayama, Toru; Maruyama, Junya; Goto, Yuugo; Ohno, Yumiko; Akiba, Mai, IC card and booking-account system using the IC card.
  255. Kimura, Hajime; Satake, Rumo, Illumination apparatus.
  256. Kimura, Hajime; Satake, Rumo, Illumination apparatus.
  257. Kimura, Hajime; Satake, Rumo, Illumination apparatus.
  258. Kimura, Hajime; Satake, Rumo, Illumination apparatus.
  259. Kimura, Hajime; Satake, Rumo, Illumination apparatus.
  260. Kimura,Hajime; Satake,Rumo, Illumination apparatus.
  261. Azami, Munehiro, Image display device and driving method thereof.
  262. Azami, Munehiro, Image display device and driving method thereof.
  263. Azami, Munehiro, Image display device and driving method thereof.
  264. Azami, Munehiro, Image display device and driving method thereof.
  265. Azami,Munehiro, Image display device and driving method thereof.
  266. Tanaka, Yukio; Azami, Munehiro; Kubota, Yasushi; Washio, Hajime, Image display device and driving method thereof.
  267. Tanaka, Yukio; Azami, Munehiro; Kubota, Yasushi; Washio, Hajime, Image display device and driving method thereof.
  268. Koyama, Jun; Azami, Munehiro; Kubota, Yasushi; Washio, Hajime, Image display device, method of driving thereof, and electronic equipment.
  269. Yamazaki,Shunpei; Hirakata,Yoshiharu; Murakami,Satoshi, In-plane switching display device having common electrode overlapping channel forming region, and double gate TFT.
  270. Yamazaki, Shunpei; Hirakata, Yoshiharu; Murakami, Satoshi, In-plane switching display device having electrode and pixel electrode in contact with an upper surface of an organic resin film.
  271. Yamazaki, Shunpei; Hirakata, Yoshiharu; Nishi, Takeshi; Kuwabara, Hideaki, Information processing device.
  272. Yamazaki, Shunpei; Koyama, Jun; Hirakata, Yoshiharu, Information processing device.
  273. Yamazaki,Shunpei; Koyama,Jun; Hirakata,Yoshiharu, Information processing device.
  274. Shunpei Yamazaki JP; Hisashi Ohtani JP, Introducing catalytic and gettering elements with a single mask when manufacturing a thin film semiconductor device.
  275. Yamazaki,Shunpei; Kokubo,Chiho; Shiga,Aiko; Tanaka,Koichiro; Miyairi,Hidekazu; Dairiki,Koji, Irradiation method of laser beam.
  276. Miyairi, Hidekazu; Shiga, Aiko; Nomura, Katsumi; Makita, Naoki; Matsuo, Takuya, Irregular semiconductor film, having ridges of convex portion.
  277. Yamazaki, Shunpei; Ohtani, Hisashi; Hiroki, Masaaki; Tanaka, Koichiro; Shiga, Aiko; Akiba, Mai, LASER APPARATUS, LASER IRRADIATION METHOD, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE, PRODUCTION SYSTEM FOR SEMICONDUCTOR DEVICE USING THE LASER APPARATUS, AND ELECTRONIC EQ.
  278. Yamazaki, Shunpei; Tanaka, Koichiro; Hiroki, Masaaki, Laser annealing apparatus and semiconductor device manufacturing method.
  279. Yamazaki, Shunpei; Tanaka, Koichiro; Hiroki, Masaaki, Laser annealing apparatus and semiconductor device manufacturing method.
  280. Yamazaki, Shunpei; Ohtani, Hisashi; Hiroki, Masaaki; Tanaka, Koichiro; Shiga, Aiko; Akiba, Mai, Laser apparatus, laser irradiation method, manufacturing method for semiconductor device, semiconductor device, production system for semiconductor device using the laser apparatus, and electronic equipment.
  281. Tanaka, Koichiro, Laser beam irradiating apparatus, laser beam irradiating method, and method of manufacturing a semiconductor device.
  282. Tanaka,Koichiro, Laser beam irradiating apparatus, laser beam irradiating method, and method of manufacturing a semiconductor device.
  283. Yamazaki,Shunpei; Tanaka,Koichiro, Laser irradiating apparatus and method of manufacturing semiconductor apparatus.
  284. Tanaka, Koichiro, Laser irradiating device, laser irradiating method and manufacturing method of semiconductor device.
  285. Tanaka, Koichiro, Laser irradiating device, laser irradiating method and manufacturing method of semiconductor device.
  286. Tanaka, Koichiro, Laser irradiating device, laser irradiating method and manufacturing method of semiconductor device.
  287. Koichiro Tanaka JP, Laser irradiation apparatus.
  288. Miyairi, Hidekazu, Laser irradiation apparatus.
  289. Tanaka, Koichiro, Laser irradiation apparatus.
  290. Tanaka,Koichiro, Laser irradiation apparatus.
  291. Yamazaki, Shunpei; Ohtani, Hisashi; Hiroki, Masaaki; Tanaka, Koichiro; Shiga, Aiko; Murakami, Satoshi; Akiba, Mai, Laser irradiation apparatus.
  292. Yamazaki,Shunpei; Ohtani,Hisashi; Hiroki,Masaaki; Tanaka,Koichiro; Shiga,Aiko; Murakami,Satoshi; Akiba,Mai, Laser irradiation apparatus.
  293. Tanaka, Koichiro; Yamamoto, Yoshiaki, Laser irradiation apparatus and method for manufacturing semiconductor device.
  294. Tanaka, Koichiro; Nakaya, Tomoko, Laser irradiation apparatus and method of fabricating a semiconductor device.
  295. Tanaka, Koichiro; Nakaya, Tomoko, Laser irradiation apparatus and method of fabricating a semiconductor device.
  296. Tanaka, Koichiro, Laser irradiation apparatus, laser irradiation method, and method for manufacturing a semiconductor device.
  297. Tanaka,Koichiro, Laser irradiation apparatus, laser irradiation method, and method for manufacturing a semiconductor device.
  298. Yamazaki,Shunpei; Tanaka,Koichiro, Laser irradiation apparatus, laser irradiation method, and method for manufacturing a semiconductor device.
  299. Tanaka, Koichiro, Laser irradiation apparatus, laser irradiation method, and method for manufacturing semiconductor device.
  300. Tanaka,Koichiro, Laser irradiation apparatus, laser irradiation method, and method for manufacturing semiconductor device.
  301. Tanaka, Koichiro, Laser irradiation apparatus, laser irradiation method, and method of manufacturing a semiconductor device.
  302. Tanaka,Koichiro, Laser irradiation apparatus, laser irradiation method, and method of manufacturing a semiconductor device.
  303. Tanaka, Koichiro, Laser irradiation device.
  304. Tanaka,Koichiro, Laser irradiation device.
  305. Yamazaki,Shunpei; Tanaka,Koichiro, Laser irradiation method and laser irradiation apparatus, and method for fabricating semiconductor device.
  306. Tanaka, Koichiro; Miyairi, Hidekazu; Shiga, Aiko; Shimomura, Akihisa; Isobe, Atsuo, Laser irradiation method and laser irradiation device and method of manufacturing semiconductor device.
  307. Tanaka, Koichiro; Miyairi, Hidekazu; Shiga, Aiko; Shimomura, Akihisa; Isobe, Atsuo, Laser irradiation method and laser irradiation device and method of manufacturing semiconductor device.
  308. Tanaka,Koichiro; Miyairi,Hidekazu; Shiga,Aiko; Shimomura,Akihisa; Isobe,Atsuo, Laser irradiation method and laser irradiation device and method of manufacturing semiconductor device.
  309. Kawasaki,Ritsuko; Nakajima,Setsuo, Laser irradiation method and method of manufacturing a semiconductor device.
  310. Yamazaki, Shunpei; Shibata, Hiroshi; Tanaka, Koichiro; Hiroki, Masaaki; Akiba, Mai, Laser irradiation method and method of manufacturing a semiconductor device.
  311. Tanaka, Koichiro; Yamamoto, Yoshiaki, Laser irradiation method, laser irradiation apparatus and method for manufacturing semiconductor device.
  312. Yamazaki, Shunpei; Tanaka, Koichiro, Laser irradiation method, laser irradiation apparatus, and semiconductor device.
  313. Yamazaki, Shunpei; Tanaka, Koichiro, Laser irradiation method, laser irradiation apparatus, and semiconductor device.
  314. Yamazaki, Shunpei; Tanaka, Koichiro, Laser irradiation method, laser irradiation apparatus, and semiconductor device.
  315. Yamazaki,Shunpei; Tanaka,Koichiro, Laser irradiation method, laser irradiation apparatus, and semiconductor device.
  316. Yamazaki,Shunpei; Tanaka,Koichiro, Laser irradiation method, laser irradiation apparatus, and semiconductor device.
  317. Tanaka,Koichiro, Laser irradiation method, method for manufacturing a semiconductor device, and a semiconductor device.
  318. Tanaka, Koichiro, Laser irradiation stage, laser irradiation optical system, laser irradiation apparatus, laser irradiation method, and method of manufacturing a semiconductor device.
  319. Tanaka, Koichiro, Laser irradiation stage, laser irradiation optical system, laser irradiation apparatus, laser irradiation method, and method of manufacturing a semiconductor device.
  320. Yamazaki, Shunpei; Tanaka, Koichiro, Laser processing method.
  321. Yamazaki,Shunpei; Fukunaga,Takeshi, Light emitting apparatus and method of manufacturing the same.
  322. Azami, Munehiro; Tanada, Yoshifumi, Light emitting device.
  323. Azami, Munehiro; Tanada, Yoshifumi, Light emitting device.
  324. Yamazaki, Shunpei; Fukunaga, Takeshi; Koyama, Jun; Inukai, Kazutaka, Light emitting device.
  325. Yamazaki, Shunpei; Fukunaga, Takeshi; Koyama, Jun; Inukai, Kazutaka, Light emitting device.
  326. Yamazaki, Shunpei; Koyama, Jun, Light emitting device.
  327. Yamazaki, Shunpei; Koyama, Jun, Light emitting device.
  328. Yamazaki, Shunpei; Koyama, Jun, Light emitting device.
  329. Yamazaki,Shunpei; Koyama,Jun, Light emitting device.
  330. Yamazaki,Shunpei; Koyama,Jun, Light emitting device.
  331. Yamazaki, Shunpei; Fukunaga, Takeshi; Koyama, Jun; Inukai, Kazutaka, Light emitting device and fabricating method thereof.
  332. Yamazaki,Shunpei; Fukunaga,Takeshi; Koyama,Jun; Inukai,Kazutaka, Light emitting device and fabrication method thereof.
  333. Yamazaki, Shunpei; Fukunaga, Takeshi; Koyama, Jun; Inukai, Kazutaka, Light emitting device and manufacturing method thereof.
  334. Yamazaki, Shunpei; Fukunaga, Takeshi; Koyama, Jun; Inukai, Kazutaka, Light emitting device and manufacturing method thereof.
  335. Yamazaki, Shunpei; Nagao, Ritsuko; Nakamura, Yasuo, Light emitting device and method for fabricating light emitting device.
  336. Yamazaki, Shunpei; Nagao, Ritsuko; Nakamura, Yasuo, Light emitting device and method for fabricating light emitting device.
  337. Yamazaki,Shunpei; Nagao,Ritsuko; Nakamura,Yasuo, Light emitting device and method for fabricating light emitting device.
  338. Takayama,Toru; Yamagata,Hirokazu; Koura,Akihiko; Yamazaki,Shunpei, Light emitting device and method of fabricating the same.
  339. Yamazaki, Shunpei; Koyama, Jun; Osada, Mai, Light emitting device and method of manufacturing the same.
  340. Yamazaki, Shunpei; Koyama, Jun; Osada, Mai, Light emitting device and method of manufacturing the same.
  341. Yamazaki, Shunpei; Koyama, Jun; Osada, Mai, Light emitting device and method of manufacturing the same.
  342. Yamazaki, Shunpei; Koyama, Jun; Osada, Mai, Light emitting device and method of manufacturing the same.
  343. Yamazaki, Shunpei; Koyama, Jun; Osada, Mai, Light emitting device and method of manufacturing the same.
  344. Yamazaki, Shunpei; Koyama, Jun; Osada, Mai, Light emitting device and method of manufacturing the same.
  345. Yamazaki, Shunpei; Koyama, Jun; Osada, Mai, Light-emitting device.
  346. Yamazaki, Shunpei; Koyama, Jun; Osada, Mai, Light-emitting device.
  347. Yamazaki, Shunpei; Koyama, Jun; Osada, Mai, Light-emitting device.
  348. Yamazaki, Shunpei; Koyama, Jun; Osada, Mai, Light-emitting device.
  349. Yamazaki, Shunpei; Koyama, Jun; Osada, Mai, Light-emitting device.
  350. Yamazaki, Shunpei; Koyama, Jun; Osada, Mai, Light-emitting device.
  351. Yamazaki, Shunpei; Koyama, Jun; Osada, Mai, Light-emitting device.
  352. Yamazaki, Shunpei; Koyama, Jun; Osada, Mai, Light-emitting device.
  353. Yamazaki, Shunpei; Koyama, Jun; Osada, Mai, Light-emitting device.
  354. Yamazaki, Shunpei; Koyama, Jun; Osada, Mai, Light-emitting device.
  355. Yamazaki,Shunpei; Koyama,Jun; Osada,Mai, Light-emitting device.
  356. Yamazaki, Shunpei; Koyama, Jun; Takayama, Toru, Light-emitting device and electric appliance.
  357. Yamazaki, Shunpei; Koyama, Jun; Takayama, Toru, Light-emitting device and electric appliance.
  358. Yamazaki, Shunpei; Koyama, Jun; Takayama, Toru, Light-emitting device and electric appliance.
  359. Yamazaki, Shunpei, Light-emitting device having a triple-layer wiring structure.
  360. Yamazaki,Shunpei, Light-emitting device, method of manufacturing a light-emitting device, and electronic equipment.
  361. Yamazaki,Shunpei, Light-emitting device, method of manufacturing a light-emitting device, and electronic equipment.
  362. Yamazaki,Shunpei, Light-emitting device, method of manufacturing a light-emitting device, and electronic equipment.
  363. Sato, Masahiko; Odaka, Masakazu; Mase, Akira; Takayama, Toru; Tabata, Kaoru; Ishigaki, Chizuru; Kobayashi, Ippei; Konuma, Toshimitsu; Yamaguchi, Toshiharu; Watanabe, Toshio; Aoyagi, Osamu; Sakayori, , Liquid crystal device and method for manufacturing same with spacers formed by photolithography.
  364. Yamazaki, Shunpei, Liquid crystal display device.
  365. Yamazaki, Shunpei; Koyama, Jun, Liquid crystal display device.
  366. Yamazaki, Shunpei; Koyama, Jun, Liquid crystal display device.
  367. Yamazaki, Shunpei; Koyama, Jun, Liquid crystal display device.
  368. Yamazaki, Shunpei; Koyama, Jun, Liquid crystal display device.
  369. Yamazaki, Shunpei; Koyama, Jun, Liquid crystal display device.
  370. Yamazaki, Shunpei; Koyama, Jun, Liquid crystal display device.
  371. Yamazaki, Shunpei; Koyama, Jun, Liquid crystal display device.
  372. Yamazaki, Shunpei; Koyama, Jun, Liquid crystal display device.
  373. Yamazaki,Shunpei; Koyama,Jun, Liquid crystal display device.
  374. Yamazaki,Shunpei; Koyama,Jun, Liquid crystal display device.
  375. Yamazaki, Shunpei; Takayama, Toru; Maruyama, Junya; Goto, Yuugo; Ohno, Yumiko; Endo, Akio; Arai, Yasuyuki, Liquid crystal display device and manufacturing method of liquid crystal display device.
  376. Yamazaki, Shunpei; Takayama, Toru; Maruyama, Junya; Goto, Yuugo; Ohno, Yumiko; Endo, Akio; Arai, Yasuyuki, Liquid crystal display device and manufacturing method of liquid crystal display device.
  377. Yamazaki, Shunpei; Takayama, Toru; Maruyama, Junya; Goto, Yuugo; Ohno, Yumiko; Endo, Akio; Arai, Yasuyuki, Liquid crystal display device and manufacturing method of liquid crystal display device.
  378. Nakajima, Setsuo; Makita, Naoki, Liquid crystal display device and manufacturing method thereof.
  379. Satake,Rumo, Liquid crystal display device and method of driving the same.
  380. Hidehito Kitakado JP; Ritsuko Kawasaki JP; Kenji Kasahara JP, Liquid crystal display device having a pixel TFT formed in a display region and a drive circuit formed in the periphery of the display region on the same substrate.
  381. Yamazaki, Shunpei, Liquid crystal display device in which a black display is performed by a reset signal during one sub-frame.
  382. Hiroki, Masaaki, Liquid crystal display device, and method of driving the same.
  383. Yamazaki,Shunpei; Koyama,Jun; Tamai,Kazuhiko; Takafuji,Yutaka, Liquid crystal panel and liquid crystal projector.
  384. Yamazaki Shunpei,JPX ; Hirakata Yoshiharu,JPX ; Nishi Takeshi,JPX ; Naka Shunichi,JPX ; Tuchimoto Shuhei,JPX ; Hamada Hiroshi,JPX ; Mizuguchi Yoshihiro,JPX, Liquid crystal projector.
  385. Yamazaki, Shunpei; Hirakata, Yoshiharu; Nishi, Takeshi; Naka, Shunichi; Tuchimoto, Shuhei; Hamada, Hiroshi; Mizuguchi, Yoshihiro, Liquid crystal projector.
  386. Yamazaki, Shunpei; Koyama, Jun, Liquid-crystal display device and method of fabricating the same.
  387. Ichijo,Mitsuhiro; Asami,Taketomi; Suzuki,Noriyoshi, Manufacturing a semiconductor device.
  388. Yamazaki, Shunpei; Shimomura, Akihisa; Ohtani, Hisashi; Hiroki, Masaaki; Tanaka, Koichiro; Shiga, Aiko; Akiba, Mai; Kasahara, Kenji, Manufacturing method for a semiconductor device using a marker on an amorphous semiconductor film to selectively crystallize a region with a laser light.
  389. Yamazaki,Shunpei; Shimomura,Akihisa; Ohtani,Hisashi; Hiroki,Masaaki; Tanaka,Koichiro; Shiga,Aiko; Akiba,Mai; Kasahara,Kenji, Manufacturing method for a thin film transistor that uses a pulse oscillation laser crystallize an amorphous semiconductor film.
  390. Yamazaki, Shunpei; Arai, Yasuyuki, Manufacturing method for top-gate type and bottom-gate type thin film transistors.
  391. Ohnuma, Hideto; Momo, Junpei; Yamazaki, Shunpei, Manufacturing method of SOI substrate and manufacturing method of semiconductor device.
  392. Ohtani Hisashi,JPX, Manufacturing method of semiconductor and manufacturing method of semiconductor device.
  393. Ohtani, Hisashi, Manufacturing method of semiconductor and manufacturing method of semiconductor device.
  394. Ohtani,Hisashi, Manufacturing method of semiconductor and manufacturing method of semiconductor device.
  395. Maekawa, Shinji; Miyairi, Hidekazu, Manufacturing method of semiconductor device.
  396. Maekawa, Shinji; Miyairi, Hidekazu, Manufacturing method of semiconductor device.
  397. Maekawa,Shinji; Miyairi,Hidekazu, Manufacturing method of semiconductor device.
  398. Miyairi, Hidekazu, Manufacturing method of semiconductor device.
  399. Miyairi, Hidekazu; Kokubo, Chiho; Inoue, Koki, Manufacturing method of semiconductor device.
  400. Moriwaka, Tomoaki, Manufacturing method of semiconductor device.
  401. Tanaka,Koichiro, Manufacturing method of semiconductor device.
  402. Yamazaki, Shunpei; Shimomura, Akihisa; Ohtani, Hisashi; Hiroki, Masaaki; Tanaka, Koichiro; Shiga, Aiko; Akiba, Mai; Kasahara, Kenji, Manufacturing method of semiconductor device.
  403. Yamazaki, Shunpei; Shimomura, Akihisa; Ohtani, Hisashi; Hiroki, Masaaki; Tanaka, Koichiro; Shiga, Aiko; Akiba, Mai; Kasahara, Kenji, Manufacturing method of semiconductor device.
  404. Yamazaki,Shunpei; Shimomura,Akihisa; Ohtani,Hisashi; Hiroki,Masaaki; Tanaka,Koichiro; Shiga,Aiko; Akiba,Mai; Kasahara,Kenji, Manufacturing method of semiconductor device.
  405. Tanaka, Koichiro, Manufacturing method of semiconductor substrate.
  406. Ono, Koji; Suzawa, Hideomi, Metal wiring and method of manufacturing the same, and metal wiring substrate and method of manufacturing the same.
  407. Ono, Koji; Suzawa, Hideomi, Metal wiring and method of manufacturing the same, and metal wiring substrate and method of manufacturing the same.
  408. Ono, Koji; Suzawa, Hideomi, Metal wiring and method of manufacturing the same, and metal wiring substrate and method of manufacturing the same.
  409. Ono,Koji; Suzawa,Hideomi, Metal wiring and method of manufacturing the same, and metal wiring substrate and method of manufacturing the same.
  410. Ohtani, Hisashi, Metal-gettering method used in the manufacture of crystalline-Si TFT.
  411. Tanaka,Koichiro, Method and apparatus for laser irradiation and manufacturing method of semiconductor device.
  412. Yamazaki,Shunpei; Zhang,Hongyong; Kusumoto,Naoto; Takemura,Yasuhiko, Method for crystallizing semiconductor material.
  413. Shunpei Yamazaki JP; Hongyong Zhang JP; Naoto Kusumoto JP; Yasuhiko Takemura JP, Method for crystallizing semiconductor material without exposing it to air.
  414. Yamazaki, Shunpei; Zhang, Hongyong; Kusumoto, Naoto; Takemura, Yasuhiko, Method for crystallizing semiconductor material without exposing it to air.
  415. Tateishi, Fuminori, Method for discharging chemical solution.
  416. Yamazaki,Shunpei, Method for driving liquid crystal display device.
  417. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Hayakawa Masahiko,JPX ; Osame Mitsuaki,JPX, Method for fabricating a semiconductor device.
  418. Yamazaki, Shunpei; Arai, Yasuyuki, Method for fabricating a semiconductor device.
  419. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki, Method for fabricating a semiconductor device.
  420. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki, Method for fabricating a semiconductor device.
  421. Shunpei Yamazaki JP; Satoshi Teramoto JP; Jun Koyama JP; Yasushi Ogata JP; Masahiko Hayakawa JP; Mitsuaki Osame JP, Method for fabricating a semiconductor device using a metal catalyst and high temperature crystallization.
  422. Maekawa,Shinji; Akimoto,Kengo, Method for fabricating thin film transistor.
  423. Funai Takashi,JPX ; Makita Naoki,JPX ; Yamamoto Yoshitaka,JPX ; Miyamoto Tadayoshi,JPX ; Kousai Takamasa,JPX ; Maekawa Masashi,JPX, Method for fabricating thin film transistors.
  424. Zhang Hongyong,JPX ; Uochi Hideki,JPX ; Takayama Toru,JPX ; Fukunaga Takeshi,JPX ; Takemura Yasuhiko,JPX, Method for forming a semiconductor device.
  425. Yamazaki,Shunpei; Miyanaga,Akiharu; Mitsuki,Toru; Ohtani,Hisashi, Method for forming a semiconductor device using crystals of crystal growth.
  426. Hamatani,Toshiji; Nakazawa,Misako; Makita,Naoki, Method for forming crystalline semiconductor film and apparatus for forming the same.
  427. Hiroshi Okumura JP; Kenji Sera JP, Method for forming polycrystalline silicon film.
  428. Yamazaki Shunpei,JPX ; Komaya Jun,JPX ; Miyanaga Akiharu,JPX ; Fukunaga Takeshi,JPX, Method for forming semiconductor thin film.
  429. Ohnuma, Hideto; Shingu, Takashi; Kakehata, Tetsuya; Kuriki, Kazutaka; Yamazaki, Shunpei, Method for manufacturing SOI substrate.
  430. Shimomura, Akihisa; Ohnuma, Hideto; Momo, Junpei; Yamazaki, Shunpei, Method for manufacturing SOI substrate.
  431. Yamazaki, Shunpei; Tanaka, Koichiro, Method for manufacturing a display device including irradiating overlapping regions.
  432. Yamazaki,Shunpei; Tanaka,Koichiro, Method for manufacturing a display device including irradiating overlapping regions.
  433. Yamazaki,Shunpei; Tanaka,Koichiro, Method for manufacturing a display device including irradiating overlapping regions.
  434. Hisashi Ohtani JP; Hiroki Adachi JP; Akiharu Miyanaga JP; Toru Takayama JP, Method for manufacturing a semiconductor device.
  435. Kawasaki, Ritsuko; Kasahara, Kenji; Yamazaki, Shunpei, Method for manufacturing a semiconductor device.
  436. Nakajima, Setsuo, Method for manufacturing a semiconductor device.
  437. Nakajima, Setsuo, Method for manufacturing a semiconductor device.
  438. Ohtani Hisashi,JPX ; Miyanaga Akiharu,JPX ; Fukunaga Takeshi,JPX ; Zhang Hongyong,JPX, Method for manufacturing a semiconductor device.
  439. Ohtani, Hisashi; Miyanaga, Akiharu; Fukunaga, Takeshi; Zhang, Hongyong, Method for manufacturing a semiconductor device.
  440. Ohtani,Hisashi; Adachi,Hiroki; Miyanaga,Akiharu; Takayama,Toru, Method for manufacturing a semiconductor device.
  441. Ohtani,Hisashi; Miyanaga,Akiharu; Fukunaga,Takeshi; Zhang,Hongyong, Method for manufacturing a semiconductor device.
  442. Ritsuko Kawasaki JP; Kenji Kasahara JP; Shunpei Yamazaki JP, Method for manufacturing a semiconductor device.
  443. Yamazaki, Shunpei; Ohnuma, Hideto; Takano, Tamae; Mitsuki, Toru, Method for manufacturing a semiconductor device.
  444. Yamazaki,Shunpei; Yamaguchi,Naoaki; Nakajima,Setsuo, Method for manufacturing a semiconductor device.
  445. Yasuhiko Takemura JP, Method for manufacturing a semiconductor device.
  446. Tanaka, Koichiro; Oishi, Hirotada; Yamazaki, Shunpei, Method for manufacturing a semiconductor device and laser irradiation method and laser irradiation apparatus.
  447. Yamazaki,Shunpei; Ohnuma,Hideto; Takano,Tamae; Mitsuki,Toru, Method for manufacturing a semiconductor device including top gate thin film transistor and method for manufacturing an active matrix device including top gate thin film transistor.
  448. Kawasaki, Ritsuko; Kasahara, Kenji; Yamazaki, Shunpei, Method for manufacturing a semiconductor device using laser light.
  449. Nakajima, Setsuo, Method for manufacturing a semiconductor device with a crystallized semiconductor film leveled by radiating with laser beams.
  450. Miyairi, Hidekazu, Method for manufacturing a semiconductor device with irradiation of single crystal semiconductor layer in an inert atmosphere.
  451. Zhang, Hongyong; Uochi, Hideki; Takayama, Toru; Fukunaga, Takeshi; Takemura, Yasuhiko, Method for manufacturing a thin film transistor device.
  452. Yamazaki, Shunpei; Koyama, Jun; Yamamoto, Kunitaka; Konuma, Toshimitsu, Method for manufacturing an electro-optical device.
  453. Yamazaki, Shunpei; Koyama, Jun; Yamamoto, Kunitaka; Konuma, Toshimitsu, Method for manufacturing an electro-optical device.
  454. Yamazaki,Shunpei; Koyama,Jun; Yamamoto,Kunitaka; Konuma,Toshimitsu, Method for manufacturing an electro-optical device.
  455. Yamazaki,Shunpei; Koyama,Jun; Yamamoto,Kunitaka; Konuma,Toshimitsu, Method for manufacturing an electro-optical device.
  456. Yamazaki,Shunpei; Koyama,Jun; Yamamoto,Kunitaka; Konuma,Toshimitsu, Method for manufacturing an electro-optical device.
  457. Yamazaki, Shunpei; Koyama, Jun; Yamamoto, Kunitaka; Konuma, Toshimitsu, Method for manufacturing an electro-optical device or electroluminescence display device.
  458. Yamazaki, Shunpei; Koyama, Jun, Method for manufacturing an electrooptical device.
  459. Moriwaka, Tomoaki; Tanaka, Koichiro, Method for manufacturing crystalline semiconductor film.
  460. Moriwaka, Tomoaki; Tanaka, Koichiro, Method for manufacturing crystalline semiconductor film and semiconductor device.
  461. Ohtani Hisashi,JPX ; Takano Tamae,JPX ; Asami Taketomi,JPX ; Fujimoto Etsuko,JPX, Method for manufacturing semiconductor and method for manufacturing semiconductor device.
  462. Ohtani, Hisashi; Takano, Tamae; Asami, Taketomi; Fujimoto, Etsuko, Method for manufacturing semiconductor and method for manufacturing semiconductor device.
  463. Kokubo,Chiho; Yamazaki,Shunpei; Takano,Tamae; Irie,Hiroaki, Method for manufacturing semiconductor device.
  464. Ohara Junji,JPX ; Yoshihara Shinji,JPX ; Kano Kazuhiko,JPX ; Ohya Nobuyuki,JPX, Method for manufacturing semiconductor device.
  465. Ohtani, Hisashi; Miyanaga, Akiharu; Teramoto, Satoshi; Yamazaki, Shunpei, Method for manufacturing semiconductor device.
  466. Ohtani, Hisashi; Miyanaga, Akiharu; Teramoto, Satoshi; Yamazaki, Shunpei, Method for manufacturing semiconductor device.
  467. Ohtani, Hisashi; Miyanaga, Akiharu; Zhang, Hongyong; Yamaguchi, Naoaki, Method for manufacturing semiconductor device.
  468. Ohtani, Hisashi; Miyanaga, Akiharu; Zhang, Hongyong; Yamaguchi, Naoaki, Method for manufacturing semiconductor device with crystallization of amorphous silicon.
  469. Tanaka, Koichiro; Ohnuma, Hideto, Method for manufacturing transistor semiconductor devices with step of annealing to getter metal with phosphorous.
  470. Yamazaki,Shunpei; Yamamoto,Kunitaka; Hiroki,Masaaki; Fukunaga,Takeshi, Method for precisely forming light emitting layers in a semiconductor device.
  471. Ohtani Hisashi,JPX, Method for producing a semiconductor device.
  472. Ohtani, Hisashi; Nakazawa, Misako; Murakami, Satoshi, Method for producing a semiconductor device by etch back process.
  473. Hongyong Zhang JP; Yasuhiko Takemura JP; Toru Takayama JP, Method for producing semiconductor device.
  474. Ohtani Hisashi,JPX ; Fukunaga Takeshi,JPX ; Miyanaga Akiharu,JPX, Method for producing semiconductor device.
  475. Yamazaki Shunpei,JPX ; Ohtani Hisashi,JPX ; Ohnuma Hideto,JPX, Method for producing semiconductor device.
  476. Yamazaki, Shunpei; Ohtani, Hisashi; Ohnuma, Hideto, Method for producing semiconductor device.
  477. Zhang Hongyong,JPX ; Takayama Toru,JPX ; Takemura Yasuhiko,JPX, Method for producing semiconductor device.
  478. Zhang, Hongyong; Takemura, Yasuhiko; Takayama, Toru, Method for producing semiconductor device.
  479. Tanaka,Koichiro; Nakaya,Tomoko, Method of crystallizing a semiconductor film using laser irradiation.
  480. Yamazaki,Yu; Fukumoto,Ryota; Tanada,Yoshifumi; Iwabuchi,Tomoyuki; Seo,Satoshi; Yamazaki,Shunpei, Method of driving a light emitting device and electronic equipment.
  481. Satake,Rumo, Method of driving liquid crystal display device.
  482. Shunpei Yamazaki JP; Hisashi Ohtani JP, Method of fabricating a high reliable SOI substrate.
  483. Kenji Kasahara JP, Method of fabricating a semiconductor device.
  484. Sakama, Mitsunori; Ishimaru, Noriko; Asami, Taketomi; Yamazaki, Shunpei, Method of fabricating a semiconductor device.
  485. Yamazaki, Shunpei, Method of fabricating a semiconductor device.
  486. Yamazaki, Shunpei, Method of fabricating a semiconductor device.
  487. Yamazaki, Shunpei, Method of fabricating a semiconductor device.
  488. Yamazaki, Shunpei; Ohtani, Hisashi, Method of fabricating a semiconductor device.
  489. Yamazaki, Shunpei; Ohtani, Hisashi, Method of fabricating a semiconductor device.
  490. Yamazaki, Shunpei; Ohtani, Hisashi, Method of fabricating a semiconductor device.
  491. Yamazaki, Shunpei; Ohtani, Hisashi, Method of fabricating a semiconductor device.
  492. Yamazaki, Shunpei; Ohtani, Hisashi, Method of fabricating a semiconductor device.
  493. Yamazaki, Shunpei; Ohtani, Hisashi, Method of fabricating a semiconductor device.
  494. Yamazaki, Shunpei; Ohtani, Hisashi, Method of fabricating a semiconductor device.
  495. Yamazaki, Shunpei; Takano, Tamae; Dairiki, Koji, Method of fabricating a semiconductor device.
  496. Yamazaki,Shunpei; Ohtani,Hisashi, Method of fabricating a semiconductor device.
  497. Yamazaki,Shunpei; Ohtani,Hisashi, Method of fabricating a semiconductor device.
  498. Yamazaki,Shunpei; Ohtani,Hisashi, Method of fabricating a semiconductor device.
  499. Yamazaki,Shunpei; Takano,Tamae; Dairiki,Koji, Method of fabricating a semiconductor device.
  500. Yasuhiko Takemura JP, Method of fabricating a semiconductor device.
  501. Yamazaki,Shunpei, Method of fabricating a semiconductor device by doping impurity element into a semiconductor layer through a gate electrode.
  502. Tanaka,Koichiro, Method of fabricating a semiconductor device incorporating crystallizing by laser irradiation.
  503. Fukunaga,Takeshi; Ohtani,Hisashi; Miyanaga,Akiharu, Method of fabricating a semiconductor device utilizing a catalyst material solution.
  504. Yang, Tae-Hoon; Lee, Ki-Yong; Seo, Jin-Wook; Park, Byoung-Keon; Lee, Kil-Won, Method of fabricating polycrystalline silicon, TFT fabricated using the same, method of fabricating the TFT, and organic light emitting diode display device including the TFT.
  505. Yang, Tae-Hoon; Lee, Ki-Yong; Seo, Jin-Wook; Park, Byoung-Keon; Lee, Kil-Won, Method of fabricating polycrystalline silicon, TFT fabricated using the same, method of fabricating the TFT, and organic light emitting diode display device including the TFT.
  506. Arakawa,Etsuko; Kato,Kiyoshi; Kurokawa,Yoshiyuki, Method of fabricating semiconductor device.
  507. Miyairi, Hidekazu; Isobe, Atsuo; Moriwaka, Tomoaki; Shimomura, Akihisa, Method of fabricating semiconductor device.
  508. Miyairi, Hidekazu; Isobe, Atsuo; Moriwaka, Tomoaki; Shimomura, Akihisa, Method of fabricating semiconductor device.
  509. Miyairi,Hidekazu; Isobe,Atsuo; Moriwaka,Tomoaki; Shimomura,Akihisa, Method of fabricating semiconductor device.
  510. Nakajima,Setsuo; Ohtani,Hisashi, Method of fabricating semiconductor device.
  511. Tanaka, Koichiro, Method of fabricating semiconductor device.
  512. Yamazaki Shunpei,JPX ; Kusumoto Naoto,JPX ; Teramoto Satoshi,JPX, Method of fabricating semiconductor device.
  513. Yamazaki, Shunpei; Takano, Tamae; Dairiki, Koji, Method of fabricating semiconductor device.
  514. Arakawa, Etsuko; Kato, Kiyoshi; Kurokawa, Yoshiyuki, Method of fabricating semiconductor device by exposing resist mask.
  515. Tanaka,Koichiro; Miyairi,Hidekazu; Shoji,Hironobu, Method of fabricating semiconductor device utilizing laser irradiation.
  516. Yamazaki,Shunpei; Tanaka,Koichiro, Method of flattening a crystallized semiconductor film surface by using a plate.
  517. Yamazaki, Shunpei; Ohtani, Hisashi; Suzawa, Hideomi; Takayama, Toru, Method of forming a semiconductor device.
  518. Nakajima, Setsuo; Ohtani, Hisashi, Method of forming a semiconductor device using a group XV element for gettering by means of infrared light.
  519. Ohtani, Hisashi, Method of forming crystalline silicon film.
  520. Suzawa,Hideomi; Ono,Koji; Ohnuma,Hideto; Yamagata,Hirokazu; Yamazaki,Shunpei, Method of forming thin film transistors having tapered gate electrode and curved insulating film.
  521. Shunpei Yamazaki JP; Hisashi Ohtani JP, Method of gettering a metal element for accelerating crystallization of silicon by phosphorous.
  522. Tanaka,Koichiro, Method of irradiating a laser beam, and method of fabricating semiconductor devices.
  523. Tanaka,Koichiro, Method of irradiating a laser beam, apparatus for irradiating a laser beam and method of fabricating semiconductor devices.
  524. Yamazaki, Shunpei; Murakami, Satoshi; Ohnuma, Hideto; Nakamura, Osamu; Tanaka, Koichiro; Arai, Yasuyuki, Method of making a thin film transistor using laser annealing.
  525. Shunpei Yamazaki JP; Mitsunori Sakama JP; Yasuhiko Takemura JP, Method of making crystal silicon semiconductor and thin film transistor.
  526. Tanada,Yoshifumi; Isobe,Atsuo; Shibata,Hiroshi; Yamazaki,Shunpei, Method of manufacturing.
  527. Nakajima, Setsuo; Ohnuma, Hideto; Makita, Naoki; Matsuo, Takuya, Method of manufacturing a TFT using a catalytic element to promote crystallization of a semiconductor film and gettering the catalytic element.
  528. Shunpei Yamazaki JP, Method of manufacturing a TFT with Ge seeded amorphous Si layer.
  529. Zhang,Hongyong; Ohnuma,Hideto; Yamaguchi,Naoaki; Takemura,Yasuhiko, Method of manufacturing a TFT with laser irradiation.
  530. Yamazaki Shunpei,JPX ; Ohtani Hisashi,JPX, Method of manufacturing a crystalline semiconductor.
  531. Nakazawa, Misako; Hamatani, Toshiji; Makita, Naoki, Method of manufacturing a crystalline semiconductor film.
  532. Asami, Taketomi; Ichijo, Mitsuhiro; Toriumi, Satoshi, Method of manufacturing a semiconductor device.
  533. Asami, Taketomi; Ichijo, Mitsuhiro; Toriumi, Satoshi, Method of manufacturing a semiconductor device.
  534. Asami, Taketomi; Ichijo, Mitsuhiro; Toriumi, Satoshi, Method of manufacturing a semiconductor device.
  535. Hamada, Takashi; Arai, Yasuyuki, Method of manufacturing a semiconductor device.
  536. Hamada, Takashi; Arai, Yasuyuki, Method of manufacturing a semiconductor device.
  537. Hisashi Ohtani JP; Akiharu Miyanaga JP; Junichi Takeyama JP, Method of manufacturing a semiconductor device.
  538. Ichijo, Mitsuhiro; Asami, Taketomi; Suzuki, Noriyoshi, Method of manufacturing a semiconductor device.
  539. Ichijo,Mitsuhiro; Asami,Taketomi; Suzuki,Noriyoshi, Method of manufacturing a semiconductor device.
  540. Isobe,Atsuo; Arao,Tatsuya, Method of manufacturing a semiconductor device.
  541. Ohnuma, Hideto, Method of manufacturing a semiconductor device.
  542. Ohnuma, Hideto; Yamazaki, Shunpei; Nakajima, Setsuo; Ohtani, Hisashi, Method of manufacturing a semiconductor device.
  543. Satoshi Yoshimoto JP, Method of manufacturing a semiconductor device.
  544. Tanaka, Koichiro, Method of manufacturing a semiconductor device.
  545. Tanaka,Koichiro, Method of manufacturing a semiconductor device.
  546. Tanaka,Koichiro, Method of manufacturing a semiconductor device.
  547. Yamazaki Shunpei,JPX, Method of manufacturing a semiconductor device.
  548. Yamazaki Shunpei,JPX ; Ohtani Hisashi,JPX ; Hamatani Toshiji,JPX, Method of manufacturing a semiconductor device.
  549. Yamazaki, Shunpei, Method of manufacturing a semiconductor device.
  550. Yamazaki, Shunpei, Method of manufacturing a semiconductor device.
  551. Yamazaki, Shunpei, Method of manufacturing a semiconductor device.
  552. Yamazaki, Shunpei, Method of manufacturing a semiconductor device.
  553. Yamazaki, Shunpei, Method of manufacturing a semiconductor device.
  554. Yamazaki, Shunpei; Mitsuki, Toru; Takano, Tamae, Method of manufacturing a semiconductor device.
  555. Yamazaki, Shunpei; Mitsuki, Toru; Takano, Tamae, Method of manufacturing a semiconductor device.
  556. Yamazaki, Shunpei; Nakajima, Setsuo; Miyairi, Hidekazu, Method of manufacturing a semiconductor device.
  557. Yamazaki, Shunpei; Nakajima, Setsuo; Miyairi, Hidekazu, Method of manufacturing a semiconductor device.
  558. Yamazaki, Shunpei; Nakamura, Osama; Kajiwara, Masayuki; Koezuka, Junichi; Dairiki, Koji; Mitsuki, Toru; Takayama, Toru; Ohnuma, Hideto; Asami, Taketomi; Ichijo, Mitsuhiro, Method of manufacturing a semiconductor device.
  559. Yamazaki, Shunpei; Nakamura, Osamu; Kajiwara, Masayuki; Koezuka, Junichi; Dairiki, Koji; Mitsuki, Toru; Takayama, Toru; Ohnuma, Hideto; Asami, Taketomi; Ichijo, Mitsuhiro, Method of manufacturing a semiconductor device.
  560. Yamazaki, Shunpei; Ohtani, Hisashi, Method of manufacturing a semiconductor device.
  561. Yamazaki, Shunpei; Ohtani, Hisashi; Hiroki, Masaaki; Tanaka, Koichiro; Shiga, Aiko; Shimomura, Akihisa; Akiba, Mai, Method of manufacturing a semiconductor device.
  562. Yamazaki,Shunpei; Asami,Taketomi; Ichijo,Mitsuhiro; Mitsuki,Toru; Kanakubo,Yoko, Method of manufacturing a semiconductor device.
  563. Yamazaki,Shunpei; Nakajima,Setsuo; Miyairi,Hidekazu, Method of manufacturing a semiconductor device.
  564. Yamazaki,Shunpei; Nakajima,Setsuo; Miyairi,Hidekazu, Method of manufacturing a semiconductor device.
  565. Yamazaki,Shunpei; Nakamura,Osamu; Kajiwara,Masayuki; Koezuka,Junichi; Dairiki,Koji; Mitsuki,Toru; Takayama,Toru; Ohnuma,Hideto; Asami,Taketomi; Ichijo,Mitsuhiro, Method of manufacturing a semiconductor device.
  566. Yamazaki,Shunpei; Nakamura,Osamu; Kajiwara,Masayuki; Koezuka,Junichi; Dairiki,Koji; Mitsuki,Toru; Takayama,Toru; Ohnuma,Hideto; Asami,Taketomi; Ichijo,Mitsuhiro, Method of manufacturing a semiconductor device.
  567. Yamazaki,Shunpei; Ohtani,Hisashi, Method of manufacturing a semiconductor device.
  568. Yamazaki,Shunpei; Ohtani,Hisashi; Hamatani,Toshiji, Method of manufacturing a semiconductor device.
  569. Yamazaki,Shunpei; Ohtani,Hisashi; Ohnuma,Hideto, Method of manufacturing a semiconductor device.
  570. Yamazaki,Shunpei; Ohtani,Hisashi; Ohnuma,Hideto, Method of manufacturing a semiconductor device.
  571. Nakajima,Setsuo; Shiga,Aiko; Makita,Naoki; Matsuo,Takuya, Method of manufacturing a semiconductor device and semiconductor manufacturing apparatus.
  572. Nakajima,Setsuo; Shiga,Aiko; Makita,Naoki; Matsuo,Takuya, Method of manufacturing a semiconductor device by irradiating with a laser beam.
  573. Hamada,Takashi; Murakami,Satoshi; Yamazaki,Shunpei; Nakamura,Osamu; Kajiwara,Masayuki; Koezuka,Junichi; Takayama,Toru, Method of manufacturing a semiconductor device comprising doping steps using gate electrodes and resists as masks.
  574. Ohtani,Hisashi; Koyama,Jun; Ogata,Yasushi; Yamazaki,Shunpei, Method of manufacturing a semiconductor device having TFTs with uniform characteristics.
  575. Yamazaki, Shunpei; Asami, Taketomi; Ichijo, Mitsuhiro; Mitsuki, Toru; Kanakubo, Yoko, Method of manufacturing a semiconductor device having a crystallized amorphous silicon film.
  576. Mitsuki, Toru; Shichi, Takeshi; Maekawa, Shinji; Shibata, Hiroshi; Miyanaga, Akiharu, Method of manufacturing a semiconductor device having a crystallized semiconductor film.
  577. Yamazaki, Shunpei, Method of manufacturing a semiconductor device having a gate electrode formed over a silicon oxide insulating layer.
  578. Yamazaki,Shunpei, Method of manufacturing a semiconductor device having a gate electrode with a three layer structure.
  579. Yamazaki, Shunpei; Ikeda, Takayuki; Fukunaga, Takeshi, Method of manufacturing a semiconductor device having thin film transistor and capacitor.
  580. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Hayakawa Masahiko,JPX ; Osame Mitsuaki,JPX, Method of manufacturing a semiconductor device including reduction of a catalyst.
  581. Yamazaki, Shunpei, Method of manufacturing a semiconductor device including thermal oxidation to form an insulating film.
  582. Nakazawa,Misako; Makita,Naoki, Method of manufacturing a semiconductor device that includes gettering regions.
  583. Yamazaki,Shunpei; Shibata,Hiroshi; Tanaka,Koichiro; Hiroki,Masaaki; Akiba,Mai, Method of manufacturing a semiconductor device that includes patterning sub-islands.
  584. Hideto Ohnuma JP, Method of manufacturing a semiconductor device using a crystalline semiconductor film.
  585. Ritsuko Kawasaki JP; Kenji Kasahara JP; Hisashi Ohtani JP, Method of manufacturing a semiconductor device with TFT.
  586. Asami,Taketomi; Ichijo,Mitsuhiro; Toriumi,Satoshi, Method of manufacturing a semiconductor device with a fluorine concentration.
  587. Asami, Taketomi; Ichijo, Mitsuhiro; Toriumi, Satoshi, Method of manufacturing a semiconductor device with fluorine concentration.
  588. Isobe, Atsuo; Arao, Tatsuya, Method of manufacturing a semiconductor device, utilizing a laser beam for crystallization.
  589. Shunpei Yamazaki JP, Method of manufacturing a semiconductor film and method of manufacturing a semiconductor device.
  590. Yamazaki, Shunpei, Method of manufacturing a semiconductor film and method of manufacturing a semiconductor device.
  591. Yamazaki,Shunpei, Method of manufacturing a semiconductor film and method of manufacturing a semiconductor device by transferring crystallization promoting material in the first semiconductor film to the second semico.
  592. Ichijo,Mitsuhiro; Asami,Taketomi; Suzuki,Noriyoshi; Yamazaki,Shunpei, Method of manufacturing a semiconductor film by plasma CVD using a noble gas and nitrogen.
  593. Yamazaki,Shunpei; Mitsuki,Toru; Takano,Tamae, Method of manufacturing a semiconductor film with little warp.
  594. Tanada, Yoshifumi; Nakajima, Kazuya, Method of manufacturing a thin film transistor.
  595. Tanada,Yoshifumi; Nakajima,Kazuya, Method of manufacturing a thin film transistor.
  596. Zhang, Hongyong; Uochi, Hideki; Takayama, Toru; Fukunaga, Takeshi; Takemura, Yasuhiko, Method of manufacturing a thin film transistor device.
  597. Ohtani Hisashi,JPX, Method of manufacturing a thin film transistor involving laser treatment.
  598. Murley, Darren T.; Trainor, Michael J., Method of manufacturing a transistor.
  599. Yamazaki, Shunpei; Koyama, Jun; Ogata, Yasushi, Method of manufacturing an active matrix display.
  600. Koyama, Jun; Ohtani, Hisashi; Ogata, Yasushi; Yamazaki, Shunpei, Method of manufacturing an active matrix display device.
  601. Tanaka, Yukio; Nagao, Shou, Method of manufacturing an active matrix type semiconductor display device.
  602. Shunpei Yamazaki JP; Mayumi Mizukami JP; Toshimitsu Konuma JP, Method of manufacturing an electro-optical device.
  603. Yamazaki, Shunpei; Mizukami, Mayumi; Konuma, Toshimitsu, Method of manufacturing an electro-optical device.
  604. Yamazaki,Shunpei; Mizukami,Mayumi; Konuma,Toshimitsu, Method of manufacturing an electro-optical device.
  605. Ono, Koji; Suzawa, Hideomi, Method of manufacturing metal wiring and method of manufacturing semiconductor device.
  606. Arai, Yasuyuki; Maekawa, Shinji, Method of manufacturing semiconductor device.
  607. Maekawa,Shinji, Method of manufacturing semiconductor device.
  608. Nakamura, Osamu; Yamazaki, Shunpei; Dairiki, Koji; Kajiwara, Masayuki; Koezuka, Junichi; Murakami, Satoshi, Method of manufacturing semiconductor device.
  609. Nakamura, Osamu; Yamazaki, Shunpei; Dairiki, Koji; Kajiwara, Masayuki; Koezuka, Junichi; Murakami, Satoshi, Method of manufacturing semiconductor device.
  610. Nakamura,Osamu; Yamazaki,Shunpei; Dairiki,Koji; Kajiwara,Masayuki; Koezuka,Junichi; Murakami,Satoshi, Method of manufacturing semiconductor device.
  611. Ohnuma,Hideto, Method of manufacturing semiconductor device.
  612. Ohnuma,Hideto, Method of manufacturing semiconductor device.
  613. Ohtani Hisashi,JPX, Method of manufacturing semiconductor device.
  614. Ono,Koji; Suzawa,Hideomi; Arao,Tatsuya, Method of manufacturing semiconductor device.
  615. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Miyanaga Akiharu,JPX, Method of manufacturing semiconductor device.
  616. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Miyanaga Akiharu,JPX, Method of manufacturing semiconductor device.
  617. Yamazaki, Shunpei; Ohtani, Hisashi, Method of manufacturing semiconductor device.
  618. Yamazaki,Shunpei; Mitsuki,Toru, Method of manufacturing semiconductor device.
  619. Yamazaki,Shunpei; Murakami,Satoshi; Ohnuma,Hideto; Nakamura,Osamu; Tanaka,Koichiro; Arai,Yasuyuki, Method of manufacturing semiconductor device.
  620. Yamazaki,Shunpei; Ohtani,Hisashi, Method of manufacturing semiconductor device.
  621. Yamazaki, Shunpei; Nakamura, Osamu; Kajiwara, Masayuki; Koezuka, Junichi, Method of manufacturing semiconductor device and semiconductor device.
  622. Arai,Yasuyuki; Maekawa,Shinji, Method of manufacturing semiconductor device having a circuit including thin film transistors.
  623. Yamazaki,Shunpei; Suzawa,Hideomi; Yamagata,Hirokazu, Method of manufacturing semiconductor device having first and second insulating films.
  624. Yamazaki, Shunpei, Method of manufacturing semiconductor device having island-like single crystal semiconductor layer.
  625. Arai, Yasuyuki; Maekawa, Shinji, Method of manufacturing semiconductor device having uniform crystal grains in a crystalline semiconductor film.
  626. Yamazaki, Shunpei; Ohtani, Hisashi, Method of manufacturing semiconductor device including thin film transistor over thermal oxidation film over a glass substrate having distortion point of not lower than 750° C.
  627. Yamazaki, Shunpei; Ohtani, Hisashi, Method of manufacturing semiconductor device over glass substrate having heat resistance.
  628. Yamazaki,Shunpei; Nakamura,Osamu; Kajiwara,Masayuki; Koezuka,Junichi, Method of manufacturing semiconductor device that includes selectively adding a noble gas element.
  629. Yamazaki,Shunpei; Ohtani,Hisashi; Hiroki,Masaaki; Tanaka,Koichiro; Shiga,Aiko; Akiba,Mai, Method of manufacturing semiconductor device using a laser irradiation process.
  630. Nakajima, Setsuo; Ohtani, Hisashi; Yamazaki, Shunpei, Method of manufacturing semiconductor devices.
  631. Nakajima,Setsuo; Ohtani,Hisashi; Yamazaki,Shunpei, Method of manufacturing semiconductor devices.
  632. Nakajima,Setsuo; Ohtani,Hisashi; Yamazaki,Shunpei, Method of manufacturing semiconductor devices.
  633. Ohtani, Hisashi, Method of manufacturing thin film transistor.
  634. Ohtani, Hisashi, Method of manufacturing thin film transistor.
  635. Ohtani, Hisashi, Method of manufacturing thin film transistor.
  636. Ohtani, Hisashi, Method of manufacturing thin film transistor.
  637. Yamazaki,Shunpei; Ohtani,Hisashi, Method of manufacturing transistors.
  638. Yamazaki Shunpei,JPX ; Arai Yasuyuki,JPX, Microcrystal silicon film and its manufacturing method, and photoelectric conversion device and its manufacturing method.
  639. Yamaguchi, Mayumi; Izumi, Konami, Microstructure and manufacturing method of the same.
  640. Fonash Stephen J. ; Kalkan A. Kaan, Nanostructure tailoring of material properties using controlled crystallization.
  641. Kato, Kiyoshi; Kurokawa, Yoshiyuki, Non-volatile memory and method of manufacturing the same.
  642. Kato, Kiyoshi; Kurokawa, Yoshiyuki, Non-volatile memory and method of manufacturing the same.
  643. Yamazaki Shunpei,JPX ; Koyama Jun,JPX, Non-volatile memory and semiconductor device.
  644. Yamazaki, Shunpei; Koyama, Jun, Non-volatile memory and semiconductor device.
  645. Yamazaki, Shunpei; Koyama, Jun, Non-volatile memory and semiconductor device.
  646. Yamazaki,Shunpei; Koyama,Jun, Non-volatile memory and semiconductor device.
  647. Yamazaki, Shunpei, Nonvolatile memory and electronic apparatus.
  648. Yamazaki, Shunpei, Nonvolatile memory and electronic apparatus.
  649. Yamazaki, Shunpei; Ohtani, Hisashi; Koyama, Jun; Fukunaga, Takeshi, Nonvolatile memory and electronic apparatus.
  650. Shunpei Yamazaki JP; Jun Koyama JP; Keisuke Hayashi JP, Nonvolatile memory and manufacturing method thereof.
  651. Yamazaki, Shunpei; Koyama, Jun; Hayashi, Keisuke, Nonvolatile memory and manufacturing method thereof.
  652. Yamazaki, Shunpei; Koyama, Jun; Hayashi, Keisuke, Nonvolatile memory and manufacturing method thereof.
  653. Yamazaki, Shunpei; Koyama, Jun; Hayashi, Keisuke, Nonvolatile memory and manufacturing method thereof.
  654. Yamazaki,Shunpei; Koyama,Jun; Hayashi,Keisuke, Nonvolatile memory and manufacturing method thereof.
  655. Yamazaki,Shunpei; Koyama,Jun; Hayashi,Keisuke, Nonvolatile memory and manufacturing method thereof.
  656. Yamazaki, Shunpei; Koyama, Jun, Optically compensated birefringence mode liquid crystal display device.
  657. Hidehito Kitakado JP; Masahiko Hayakawa JP; Shunpei Yamazaki JP; Taketomi Asami JP, Oxynitride laminate "blocking layer" for thin film semiconductor devices.
  658. Yamazaki, Shunpei; Akiba, Mai, Packing material, tag, certificate, paper money, and securities.
  659. Yamazaki,Shunpei; Akiba,Mai, Packing material, tag, certificate, paper money, and securities.
  660. Kato, Kiyoshi; Ozaki, Tadafumi; Mutaguchi, Kohei, Passive matrix display device.
  661. Kato,Kiyoshi; Ozaki,Tadafumi; Mutaguchi,Kohei, Passive matrix display device.
  662. Yamazaki Shunpei,JPX, Photoelectric conversion device and method manufacturing same.
  663. Yamazaki Shunpei,JPX ; Koyama Jun,JPX ; Shibata Hiroshi,JPX ; Fukunaga Takeshi,JPX, Pixel TFT and driver TFT having different gate insulation width.
  664. Kuo Yue, Polysilicon thin film transistors with laser-induced solid phase crystallized polysilicon channel.
  665. Takeuchi, Toshihiko; Takahashi, Minoru; Osada, Takeshi; Oguni, Teppei; Tanemura, Kazuki, Power storage device.
  666. Yamazaki, Shunpei, Power storage device and method for manufacturing the same.
  667. Yamazaki, Shunpei; Moriwaka, Tamae; Kuriki, Kazutaka; Yukawa, Mikio, Power storage system and manufacturing method thereof and secondary battery and capacitor.
  668. Ohtani Hisashi,JPX ; Adachi Hiroki,JPX, Process for crystallizing an amorphous silicon film and apparatus for fabricating the same.
  669. Zhang Hongyong,JPX ; Uochi Hideki,JPX ; Takayama Toru,JPX ; Yamazaki Shunpei,JPX ; Takemura Yasuhiko,JPX, Process for fabricating a thin film transistor semiconductor device.
  670. Yamazaki,Shunpei; Ohtani,Hisashi; Mitsuki,Toru; Ohnuma,Hideto; Takano,Tamae; Kasahara,Kenji; Dairiki,Koji, Process for manufacturing a semiconductor device.
  671. Yamazaki,Shunpei; Ohtani,Hisashi; Mitsuki,Toru; Ohnuma,Hideto; Takano,Tamae; Kasahara,Kenji; Dairiki,Koji, Process for manufacturing a semiconductor device.
  672. Yamazaki,Shunpei; Arai,Yasuyuki, Process for producing a photoelectric conversion device that includes using a gettering process.
  673. Shunpei Yamazaki JP; Hisashi Ohtani JP, Process for producing semiconductor thin film devices using group 14 element and high temperature oxidizing treatment to achieve a crystalline silicon film.
  674. Fukunaga, Takeshi, Process for production of SOI substrate and process for production of semiconductor device.
  675. Fukunaga, Takeshi, Process for production of SOI substrate and process for production of semiconductor device including the selective forming of porous layer.
  676. Yamazaki Shunpei,JPX ; Koyama Jun,JPX ; Kitakado Hidehito,JPX, Process of fabricating a semiconductor device.
  677. Yamazaki, Shunpei; Koyama, Jun; Kitakado, Hidehito, Process of fabricating a semiconductor device.
  678. Yamazaki,Shunpei; Koyama,Jun; Kitakado,Hidehito, Process of fabricating a semiconductor device.
  679. Miyanaga, Akiharu; Mukao, Kyouichi, Program for controlling laser apparatus and recording medium for recording program for controlling laser apparatus and capable of being read out by computer.
  680. Miyanaga, Akiharu; Mukao, Kyouichi, Program for controlling laser apparatus and recording medium for recording program for controlling laser apparatus and capable of being read out by computer.
  681. Miyanaga,Akiharu; Mukao,Kyouichi, Program for controlling laser apparatus and recording medium for recording program for controlling laser apparatus and capable of being read out by computer.
  682. Yamazaki,Shunpei; Ohtani,Hisashi; Hayakawa,Masahiko, Projection television set.
  683. Azami, Munehiro; Nagao, Shou; Tanada, Yoshifumi, Pulse output circuit, shift register and display device.
  684. Azami, Munehiro; Nagao, Shou; Tanada, Yoshifumi, Pulse output circuit, shift register and display device.
  685. Azami, Munehiro; Nagao, Shou; Tanada, Yoshifumi, Pulse output circuit, shift register and display device.
  686. Azami, Munehiro; Nagao, Shou; Tanada, Yoshifumi, Pulse output circuit, shift register and display device.
  687. Azami, Munehiro; Nagao, Shou; Tanada, Yoshifumi, Pulse output circuit, shift register and display device.
  688. Azami, Munehiro; Nagao, Shou; Tanada, Yoshifumi, Pulse output circuit, shift register and display device.
  689. Azami, Munehiro; Nagao, Shou; Tanada, Yoshifumi, Pulse output circuit, shift register and display device.
  690. Azami, Munehiro; Nagao, Shou; Tanada, Yoshifumi, Pulse output circuit, shift register and display device.
  691. Nagao, Shou; Azami, Munehiro; Tanada, Yoshifumi, Pulse output circuit, shift register, and display device.
  692. Nagao, Shou; Azami, Munehiro; Tanada, Yoshifumi, Pulse output circuit, shift register, and display device.
  693. Nagao, Shou; Azami, Munehiro; Tanada, Yoshifumi, Pulse output circuit, shift register, and display device.
  694. Nagao, Shou; Azami, Munehiro; Tanada, Yoshifumi, Pulse output circuit, shift register, and display device.
  695. Nagao,Shou; Azami,Munehiro; Tanada,Yoshifumi, Pulse output circuit, shift register, and display device.
  696. Nagao,Shou; Azami,Munehiro; Tanada,Yoshifumi, Pulse output circuit, shift register, and display device.
  697. Shunpei Yamazaki JP, Removing a crystallization catalyst from a semiconductor film during semiconductor device fabrication.
  698. Ohnuma, Hideto; Higa, Eiji, SOI substrate and method for manufacturing the same.
  699. Maekawa Masashi ; Nakata Yukihiko, Selected site, metal-induced, continuous crystallization method.
  700. Maekawa Masashi, Selective silicide thin-film transistor and method for same.
  701. Maekawa Masashi, Selective silicide thin-film transistor having polysilicon active layers with crystallizing metal agent introduced only in the source/drain regions.
  702. Koyama, Jun; Inukai, Kazutaka, Self-luminous device and electric machine using the same.
  703. Koyama,Jun; Inukai,Kazutaka, Self-luminous device and electric machine using the same.
  704. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki; Ohtani, Hisashi; Hamatani, Toshiji, Semiconductor active region of TFTs having radial crystal grains through the whole area of the region.
  705. Hongyong Zhang JP; Hideki Uochi JP; Toru Takayama JP; Shunpei Yamazaki JP; Yasuhiko Takemura JP, Semiconductor and process for fabricating the same.
  706. Zhang Hongyong,JPX ; Uochi Hideki,JPX ; Takayama Toru,JPX ; Yamazaki Shunpei,JPX ; Takemura Yasuhiko,JPX, Semiconductor and process for fabricating the same.
  707. Kato, Kiyoshi; Atsumi, Tomoaki; Isobe, Atsuo, Semiconductor circuit and method of fabricating the same.
  708. Kato, Kiyoshi; Atsumi, Tomoaki; Isobe, Atsuo, Semiconductor circuit and method of fabricating the same.
  709. Kato,Kiyoshi; Atsumi,Tomoaki; Isobe,Atsuo, Semiconductor circuit and method of fabricating the same.
  710. Zhang, Hongyong; Takayama, Toru; Takemura, Yasuhiko, Semiconductor circuit and method of fabricating the same.
  711. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX, Semiconductor circuit for electro-optical device and method of manufacturing the same.
  712. Kokubo, Chiho; Yamagata, Hirokazu; Yamazaki, Shunpei, Semiconductor comprising a TFT provided on a substrate having an insulating surface and method of fabricating the same.
  713. Azami, Munehiro; Nagao, Shou; Tanada, Yoshifumi, Semiconductor device.
  714. Azami, Munehiro; Nagao, Shou; Tanada, Yoshifumi, Semiconductor device.
  715. Azami, Munehiro; Nagao, Shou; Tanada, Yoshifumi, Semiconductor device.
  716. Azami, Munehiro; Nagao, Shou; Tanada, Yoshifumi, Semiconductor device.
  717. Azami, Munehiro; Nagao, Shou; Tanada, Yoshifumi, Semiconductor device.
  718. Ishikawa, Akira, Semiconductor device.
  719. Isobe,Atsuo; Dairiki,Koji; Shibata,Hiroshi; Kokubo,Chiho; Arao,Tatsuya; Hayakawa,Masahiko; Miyairi,Hidekazu; Shimomura,Akihisa; Tanaka,Koichiro; Yamazaki,Shunpei; Akiba,Mai, Semiconductor device.
  720. Jun Koyama JP; Hidehito Kitakado JP; Masataka Itoh JP; Hiroyuki Ogawa JP, Semiconductor device.
  721. Kato, Kiyoshi; Ozaki, Tadafumi; Mutaguchi, Kohei, Semiconductor device.
  722. Kato,Kiyoshi; Ozaki,Tadafumi; Mutaguchi,Kohei, Semiconductor device.
  723. Kimura, Hajime; Satake, Rumo, Semiconductor device.
  724. Kimura,Hajime, Semiconductor device.
  725. Koyama, Jun, Semiconductor device.
  726. Koyama, Jun, Semiconductor device.
  727. Koyama, Jun, Semiconductor device.
  728. Koyama, Jun, Semiconductor device.
  729. Koyama, Jun; Kato, Kiyoshi, Semiconductor device.
  730. Koyama, Jun; Kato, Kiyoshi, Semiconductor device.
  731. Koyama, Jun; Kitakado, Hidehito; Itoh, Masataka; Ogawa, Hiroyuki, Semiconductor device.
  732. Koyama,Jun, Semiconductor device.
  733. Koyama,Jun; Kato,Kiyoshi, Semiconductor device.
  734. Miyake, Hiroyuki, Semiconductor device.
  735. Miyake, Hiroyuki; Shionoiri, Yutaka, Semiconductor device.
  736. Miyake, Hiroyuki; Shionoiri, Yutaka, Semiconductor device.
  737. Miyake, Hiroyuki; Shionoiri, Yutaka, Semiconductor device.
  738. Miyake, Hiroyuki; Shionoiri, Yutaka, Semiconductor device.
  739. Miyake,Hiroyuki, Semiconductor device.
  740. Miyake,Hiroyuki; Shionoiri,Yutaka, Semiconductor device.
  741. Miyake,Hiroyuki; Shionoiri,Yutaka, Semiconductor device.
  742. Murakami,Satoshi; Hirakata,Yoshiharu; Fujimoto,Etsuko; Yamazaki,Yu; Yamazaki,Shunpei, Semiconductor device.
  743. Ohtani,Hisashi; Nakazawa,Misako; Murakami,Satoshi, Semiconductor device.
  744. Ono, Koji; Suzawa, Hideomi; Arao, Tatsuya, Semiconductor device.
  745. Sakama, Mitsunori; Ishimaru, Noriko; Asami, Taketomi; Yamazaki, Shunpei, Semiconductor device.
  746. Shionoiri,Yutaka; Atsumi,Tomoaki; Kato,Kiyoshi, Semiconductor device.
  747. Shunpei Yamazaki JP, Semiconductor device.
  748. Yamazaki Shunpei,JPX ; Miyanaga Akiharu,JPX ; Mitsuki Toru,JPX ; Ohtani Hisashi,JPX, Semiconductor device.
  749. Yamazaki, Shunpei, Semiconductor device.
  750. Yamazaki, Shunpei, Semiconductor device.
  751. Yamazaki, Shunpei, Semiconductor device.
  752. Yamazaki, Shunpei; Koyama, Jun; Suzawa, Hideomi; Ono, Koji; Arao, Tatsuya, Semiconductor device.
  753. Yamazaki, Shunpei; Mitsuki, Toru; Kasahara, Kenji; Asami, Taketomi; Takano, Tamae; Shichi, Takeshi; Kokubo, Chiho, Semiconductor device.
  754. Yamazaki, Shunpei; Mitsuki, Toru; Kasahara, Kenji; Asami, Taketomi; Takano, Tamae; Shichi, Takeshi; Kokubo, Chiho, Semiconductor device.
  755. Yamazaki, Shunpei; Mitsuki, Toru; Kasahara, Kenji; Asami, Taketomi; Takano, Tamae; Shichi, Takeshi; Kokubo, Chiho, Semiconductor device.
  756. Yamazaki, Shunpei; Ohtani, Hisashi; Nakajima, Setsuo, Semiconductor device.
  757. Yamazaki, Shunpei; Yamaguchi, Naoaki; Nakajima, Setsuo, Semiconductor device.
  758. Yamazaki,Shunpei; Miyanaga,Akiharu; Mitsuki,Toru; Ohtani,Hisashi, Semiconductor device.
  759. Takemura, Yasuhiko; Teramoto, Satoshi, Semiconductor device and a method for manufacturing the same.
  760. Takemura, Yasuhiko; Teramoto, Satoshi, Semiconductor device and a method for manufacturing the same.
  761. Takemura, Yasuhiko; Teramoto, Satoshi, Semiconductor device and a method for manufacturing the same.
  762. Kawasaki, Ritsuko; Kasahara, Kenji; Ohtani, Hisashi, Semiconductor device and a method of manufacturing the same.
  763. Kawasaki,Ritsuko; Kasahara,Kenji; Ohtani,Hisashi, Semiconductor device and a method of manufacturing the same.
  764. Yamazaki Shunpei,JPX ; Miyanaga Akiharu,JPX ; Teramoto Satoshi,JPX, Semiconductor device and a method of manufacturing the same.
  765. Azami,Munehiro, Semiconductor device and display device.
  766. Azami,Munehiro, Semiconductor device and display device.
  767. Hiroki, Masaaki, Semiconductor device and driving method thereof.
  768. Hisashi Ohtani JP; Tamae Takano JP; Chiho Kokubo JP, Semiconductor device and fabricating method thereof.
  769. Yamazaki,Shunpei; Mitsuki,Toru; Kasahara,Kenji; Asami,Taketomi; Takano,Tamae; Shichi,Takeshi; Kokubo,Chiho, Semiconductor device and fabrication method therefor.
  770. Shunpei Yamazaki JP; Jun Koyama JP; Yurika Satou JP, Semiconductor device and fabrication method thereof.
  771. Yamazaki Shunpei,JPX ; Koyama Jun,JPX ; Satou Yurika,JPX, Semiconductor device and fabrication method thereof.
  772. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Hayakawa Masahiko,JPX ; Osame Mitsuaki,JPX, Semiconductor device and fabrication method thereof.
  773. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Hayakawa Masahiko,JPX ; Osame Mitsuaki,JPX, Semiconductor device and fabrication method thereof.
  774. Yamazaki, Shunpei; Arai, Yasuyuki; Koyama, Jun, Semiconductor device and fabrication method thereof.
  775. Yamazaki, Shunpei; Arai, Yasuyuki; Koyama, Jun, Semiconductor device and fabrication method thereof.
  776. Yamazaki, Shunpei; Arai, Yasuyuki; Koyama, Jun, Semiconductor device and fabrication method thereof.
  777. Yamazaki, Shunpei; Arai, Yasuyuki; Koyama, Jun, Semiconductor device and fabrication method thereof.
  778. Yamazaki, Shunpei; Arai, Yasuyuki; Koyama, Jun, Semiconductor device and fabrication method thereof.
  779. Yamazaki, Shunpei; Koyama, Jun; Satou, Yurika, Semiconductor device and fabrication method thereof.
  780. Yamazaki, Shunpei; Murakami, Satoshi; Koyama, Jun; Tanaka, Yukio; Kitakado, Hidehito; Ohnuma, Hideto, Semiconductor device and fabrication method thereof.
  781. Yamazaki, Shunpei; Murakami, Satoshi; Koyama, Jun; Tanaka, Yukio; Kitakado, Hidehito; Ohnuma, Hideto, Semiconductor device and fabrication method thereof.
  782. Yamazaki, Shunpei; Murakami, Satoshi; Koyama, Jun; Tanaka, Yukio; Kitakado, Hidehito; Ohnuma, Hideto, Semiconductor device and fabrication method thereof.
  783. Yamazaki, Shunpei; Murakami, Satoshi; Koyama, Jun; Tanaka, Yukio; Kitakado, Hidehito; Ohnuma, Hideto, Semiconductor device and fabrication method thereof.
  784. Yamazaki, Shunpei; Murakami, Satoshi; Koyama, Jun; Tanaka, Yukio; Kitakado, Hidehito; Ohnuma, Hideto, Semiconductor device and fabrication method thereof.
  785. Yamazaki, Shunpei; Murakami, Satoshi; Koyama, Jun; Tanaka, Yukio; Kitakado, Hidehito; Ohnuma, Hideto, Semiconductor device and fabrication method thereof.
  786. Yamazaki, Shunpei; Murakami, Satoshi; Koyama, Jun; Tanaka, Yukio; Kitakado, Hidehito; Ohnuma, Hideto, Semiconductor device and fabrication method thereof.
  787. Yamazaki, Shunpei; Murakami, Satoshi; Koyama, Jun; Tanaka, Yukio; Kitakado, Hidehito; Ohnuma, Hideto, Semiconductor device and fabrication method thereof.
  788. Yamazaki, Shunpei; Murakami, Satoshi; Koyama, Jun; Tanaka, Yukio; Kitakado, Hidehito; Ohnuma, Hideto, Semiconductor device and fabrication method thereof.
  789. Yamazaki, Shunpei; Murakami, Satoshi; Koyama, Jun; Tanaka, Yukio; Kitakado, Hidehito; Ohnuma, Hideto, Semiconductor device and fabrication method thereof.
  790. Yamazaki, Shunpei; Suzawa, Hideomi; Ono, Koji; Kusuyama, Yoshihiro, Semiconductor device and fabrication method thereof.
  791. Yamazaki, Shunpei; Suzawa, Hideomi; Ono, Koji; Kusuyama, Yoshihiro, Semiconductor device and fabrication method thereof.
  792. Yamazaki, Shunpei; Suzawa, Hideomi; Ono, Koji; Kusuyama, Yoshihiro, Semiconductor device and fabrication method thereof.
  793. Yamazaki, Shunpei; Suzawa, Hideomi; Ono, Koji; Kusuyama, Yoshihiro, Semiconductor device and fabrication method thereof.
  794. Yamazaki, Shunpei; Suzawa, Hideomi; Ono, Koji; Kusuyama, Yoshihiro, Semiconductor device and fabrication method thereof.
  795. Yamazaki, Shunpei; Suzawa, Hideomi; Ono, Koji; Kusuyama, Yoshihiro, Semiconductor device and fabrication method thereof.
  796. Yamazaki, Shunpei; Teramoto, Satoshi, Semiconductor device and fabrication method thereof.
  797. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki, Semiconductor device and fabrication method thereof.
  798. Yamazaki,Shunpei; Murakami,Satoshi; Koyama,Jun; Tanaka,Yukio; Kitakado,Hidehito; Ohnumo,Hideto, Semiconductor device and fabrication method thereof.
  799. Yamazaki,Shunpei; Suzawa,Hideomi; Ono,Koji; Kusuyama,Yoshihiro, Semiconductor device and fabrication method thereof.
  800. Yamazaki,Shunpei; Suzawa,Hideomi; Ono,Koji; Kusuyama,Yoshihiro, Semiconductor device and fabrication method thereof.
  801. Yamazaki,Shunpei; Kimura,Hajime, Semiconductor device and integral image recognition/display apparatus.
  802. Shunpei Yamazaki JP, Semiconductor device and its manufacturing method.
  803. Shunpei Yamazaki JP; Satoshi Teramoto JP; Jun Koyama JP; Yasushi Ogata JP; Masahiko Hayakawa JP; Mitsuaki Osame JP; Hisashi Ohtani JP; Toshiji Hamatani JP, Semiconductor device and its manufacturing method.
  804. Yamazaki Shunpei,JPX, Semiconductor device and its manufacturing method.
  805. Yamazaki, Shunpei, Semiconductor device and its manufacturing method.
  806. Yamazaki, Shunpei, Semiconductor device and its manufacturing method.
  807. Yamazaki, Shunpei, Semiconductor device and its manufacturing method.
  808. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki; Ohtani, Hisashi; Hamatani, Toshiji, Semiconductor device and its manufacturing method.
  809. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki; Ohtani, Hisashi; Hamatani, Toshiji, Semiconductor device and its manufacturing method.
  810. Yamazaki,Shunpei, Semiconductor device and its manufacturing method.
  811. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki; Ohtani,Hisashi; Hamatani,Toshiji, Semiconductor device and its manufacturing method.
  812. Nakamura, Osamu; Kajiwara, Masayuki; Yamazaki, Shunpei; Ohnuma, Hideto, Semiconductor device and manufacturing method of the same.
  813. Nakamura,Osamu; Kajiwara,Masayuki; Yamazaki,Shunpei; Ohnuma,Hideto, Semiconductor device and manufacturing method of the same.
  814. Yamazaki Shunpei,JPX ; Ohtani Hisashi,JPX ; Hamatani Toshiji,JPX, Semiconductor device and manufacturing method therefor.
  815. Yamazaki, Shunpei; Isobe, Atsuo; Takano, Tamae; Miyairi, Hidekazu, Semiconductor device and manufacturing method therefor.
  816. Yamazaki, Shunpei; Ohtani, Hisashi; Hamatani, Toshiji, Semiconductor device and manufacturing method therefor.
  817. Yamazaki, Shunpei; Ohtani, Hisashi; Hamatani, Toshiji, Semiconductor device and manufacturing method therefor.
  818. Yamazaki, Shunpei; Ohtani, Hisashi; Hamatani, Toshiji, Semiconductor device and manufacturing method therefor.
  819. Yamazaki,Shunpei; Isobe,Atsuo; Takano,Tamae; Miyairi,Hidekazu, Semiconductor device and manufacturing method therefor.
  820. Yamazaki,Shunpei; Ohtani,Hisashi; Hamatani,Toshiji, Semiconductor device and manufacturing method therefor.
  821. Akiharu Miyanaga JP; Toru Mitsuki JP, Semiconductor device and manufacturing method thereof.
  822. Hideomi Suzawa JP; Yoshihiro Kusuyama JP, Semiconductor device and manufacturing method thereof.
  823. Ishikawa, Akira, Semiconductor device and manufacturing method thereof.
  824. Ishikawa,Akira, Semiconductor device and manufacturing method thereof.
  825. Ishikawa,Akira, Semiconductor device and manufacturing method thereof.
  826. Kitakado, Hidehito; Hayakawa, Masahiko; Yamazaki, Shunpei; Asami, Taketomi, Semiconductor device and manufacturing method thereof.
  827. Kitakado, Hidehito; Hayakawa, Masahiko; Yamazaki, Shunpei; Asami, Taketomi, Semiconductor device and manufacturing method thereof.
  828. Kitakado, Hidehito; Kawasaki, Ritsuko; Kasahara, Kenji, Semiconductor device and manufacturing method thereof.
  829. Kitakado, Hidehito; Kawasaki, Ritsuko; Kasahara, Kenji, Semiconductor device and manufacturing method thereof.
  830. Kitakado, Hidehito; Kawasaki, Ritsuko; Kasahara, Kenji, Semiconductor device and manufacturing method thereof.
  831. Kitakado, Hidehito; Kawasaki, Ritsuko; Kasahara, Kenji, Semiconductor device and manufacturing method thereof.
  832. Kitakado,Hideto; Kawasaki,Ritsuko; Kasahara,Kenji, Semiconductor device and manufacturing method thereof.
  833. Koyama, Jun; Ohtani, Hisashi; Ogata, Yasushi; Yamazaki, Shunpei, Semiconductor device and manufacturing method thereof.
  834. Koyama, Jun; Ohtani, Hisashi; Ogata, Yasushi; Yamazaki, Shunpei, Semiconductor device and manufacturing method thereof.
  835. Moriwaka, Tomoaki, Semiconductor device and manufacturing method thereof.
  836. Moriwaka, Tomoaki, Semiconductor device and manufacturing method thereof.
  837. Nakajima, Setsuo, Semiconductor device and manufacturing method thereof.
  838. Nakajima,Setsuo, Semiconductor device and manufacturing method thereof.
  839. Nakamura, Osamu, Semiconductor device and manufacturing method thereof.
  840. Nakazawa, Misako; Makita, Naoki, Semiconductor device and manufacturing method thereof.
  841. Ohnuma, Hideto; Kokubo, Chiho; Tanaka, Koichiro; Makita, Naoki; Tsuchimoto, Shuhei, Semiconductor device and manufacturing method thereof.
  842. Ono, Koji; Suzawa, Hideomi; Arao, Tatsuya, Semiconductor device and manufacturing method thereof.
  843. Shunpei Yamazaki JP; Hisashi Ohtani JP; Hideto Ohnuma JP; Satoshi Teramoto JP, Semiconductor device and manufacturing method thereof.
  844. Suzawa, Hideomi; Kusuyama, Yoshihiro, Semiconductor device and manufacturing method thereof.
  845. Suzawa, Hideomi; Kusuyama, Yoshihiro, Semiconductor device and manufacturing method thereof.
  846. Suzawa, Hideomi; Kusuyama, Yoshihiro, Semiconductor device and manufacturing method thereof.
  847. Suzawa, Hideomi; Kusuyama, Yoshihiro, Semiconductor device and manufacturing method thereof.
  848. Suzawa, Hideomi; Ono, Koji; Arai, Yasuyuki, Semiconductor device and manufacturing method thereof.
  849. Suzawa, Hideomi; Ono, Koji; Takayama, Toru; Arao, Tatsuya; Yamazaki, Shunpei, Semiconductor device and manufacturing method thereof.
  850. Suzawa,Hideomi; Ono,Koji; Takayama,Toru; Arao,Tatsuya; Yamazaki,Shunpei, Semiconductor device and manufacturing method thereof.
  851. Suzawa,Hideomi; Ono,Koji; Takayama,Toru; Arao,Tatsuya; Yamazaki,Shunpei, Semiconductor device and manufacturing method thereof.
  852. Tanaka, Koichiro; Ohnuma, Hideto, Semiconductor device and manufacturing method thereof.
  853. Tanaka, Koichiro; Ohnuma, Hideto; Kokubo, Chiho, Semiconductor device and manufacturing method thereof.
  854. Tanaka,Koichiro; Ohnuma,Hideto; Kokubo,Chiho, Semiconductor device and manufacturing method thereof.
  855. Tanaka,Koichiro; Ohnuma,Hideto; Kokubo,Chiho, Semiconductor device and manufacturing method thereof.
  856. Yamazaki Shunpei,JPX, Semiconductor device and manufacturing method thereof.
  857. Yamazaki, Shunpei, Semiconductor device and manufacturing method thereof.
  858. Yamazaki, Shunpei, Semiconductor device and manufacturing method thereof.
  859. Yamazaki, Shunpei, Semiconductor device and manufacturing method thereof.
  860. Yamazaki, Shunpei, Semiconductor device and manufacturing method thereof.
  861. Yamazaki, Shunpei, Semiconductor device and manufacturing method thereof.
  862. Yamazaki, Shunpei, Semiconductor device and manufacturing method thereof.
  863. Yamazaki, Shunpei, Semiconductor device and manufacturing method thereof.
  864. Yamazaki, Shunpei, Semiconductor device and manufacturing method thereof.
  865. Yamazaki, Shunpei, Semiconductor device and manufacturing method thereof.
  866. Yamazaki, Shunpei, Semiconductor device and manufacturing method thereof.
  867. Yamazaki, Shunpei, Semiconductor device and manufacturing method thereof.
  868. Yamazaki, Shunpei; Arai, Yasuyuki; Koyama, Jun, Semiconductor device and manufacturing method thereof.
  869. Yamazaki, Shunpei; Arai, Yasuyuki; Koyama, Jun, Semiconductor device and manufacturing method thereof.
  870. Yamazaki, Shunpei; Arai, Yasuyuki; Koyama, Jun, Semiconductor device and manufacturing method thereof.
  871. Yamazaki, Shunpei; Koyama, Jun, Semiconductor device and manufacturing method thereof.
  872. Yamazaki, Shunpei; Koyama, Jun, Semiconductor device and manufacturing method thereof.
  873. Yamazaki, Shunpei; Koyama, Jun, Semiconductor device and manufacturing method thereof.
  874. Yamazaki, Shunpei; Koyama, Jun, Semiconductor device and manufacturing method thereof.
  875. Yamazaki, Shunpei; Koyama, Jun; Akiba, Mai, Semiconductor device and manufacturing method thereof.
  876. Yamazaki, Shunpei; Koyama, Jun; Akiba, Mai, Semiconductor device and manufacturing method thereof.
  877. Yamazaki, Shunpei; Koyama, Jun; Shibata, Hiroshi; Fukunaga, Takeshi, Semiconductor device and manufacturing method thereof.
  878. Yamazaki, Shunpei; Koyama, Jun; Suzawa, Hideomi; Ono, Koji; Arao, Tatsuya, Semiconductor device and manufacturing method thereof.
  879. Yamazaki, Shunpei; Koyama, Jun; Suzawa, Hideomi; Ono, Koji; Arao, Tatsuya, Semiconductor device and manufacturing method thereof.
  880. Yamazaki, Shunpei; Kuwabara, Hideaki, Semiconductor device and manufacturing method thereof.
  881. Yamazaki, Shunpei; Suzawa, Hideomi; Ono, Koji; Arai, Yasuyuki, Semiconductor device and manufacturing method thereof.
  882. Yamazaki, Shunpei; Suzawa, Hideomi; Ono, Koji; Arai, Yasuyuki, Semiconductor device and manufacturing method thereof.
  883. Yamazaki, Shunpei; Suzawa, Hideomi; Ono, Koji; Arai, Yasuyuki, Semiconductor device and manufacturing method thereof.
  884. Yamazaki, Shunpei; Suzawa, Hideomi; Ono, Koji; Arai, Yasuyuki, Semiconductor device and manufacturing method thereof.
  885. Yamazaki, Shunpei; Suzawa, Hideomi; Yamagata, Hirokazu, Semiconductor device and manufacturing method thereof.
  886. Yamazaki,Shunpei, Semiconductor device and manufacturing method thereof.
  887. Yamazaki,Shunpei, Semiconductor device and manufacturing method thereof.
  888. Yamazaki,Shunpei; Arai,Yasuyuki; Koyama,Jun, Semiconductor device and manufacturing method thereof.
  889. Yamazaki,Shunpei; Arai,Yasuyuki; Koyama,Jun, Semiconductor device and manufacturing method thereof.
  890. Yamazaki,Shunpei; Ohtani,Hisashi; Hamatani,Toshiji, Semiconductor device and manufacturing method thereof.
  891. Yamazaki,Shunpei; Suzawa,Hideomi; Ono,Koji; Arai,Yasuyuki, Semiconductor device and manufacturing method thereof.
  892. Yamazaki,Shunpei; Suzawa,Hideomi; Ono,Koji; Arai,Yasuyuki, Semiconductor device and manufacturing method thereof.
  893. Zhang, Hongyong, Semiconductor device and manufacturing method thereof.
  894. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Hayakawa Masahiko,JPX ; Osame Mitsuaki,JPX ; Ohtani Hisashi,JPX ; Hamatani Toshiji,JPX, Semiconductor device and method for fabricating the same.
  895. Yamazaki, Shunpei; Koyama, Jun; Takayama, Toru; Hamatani, Toshiji, Semiconductor device and method for fabricating the same.
  896. Yamazaki, Shunpei; Koyama, Jun; Takayama, Toru; Hamatani, Toshiji, Semiconductor device and method for fabricating the same.
  897. Yamazaki, Shunpei; Koyama, Jun; Takayama, Toru; Hamatani, Toshiji, Semiconductor device and method for fabricating the same.
  898. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki; Ohtani, Hisashi; Hamatani, Toshiji, Semiconductor device and method for fabricating the same.
  899. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki; Ohtani, Hisashi; Hamatani, Toshiji, Semiconductor device and method for fabricating the same.
  900. Yamazaki,Shunpei; Koyama,Jun; Takayama,Toru; Hamatani,Toshiji, Semiconductor device and method for fabricating the same.
  901. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki; Ohtani,Hisashi; Hamatani,Toshiji, Semiconductor device and method for fabricating the same.
  902. Zhang, Hongyong; Ohnuma, Hideto; Yamaguchi, Naoaki; Takemura, Yasuhiko, Semiconductor device and method for fabricating the same.
  903. Yamazaki Shunpei,JPX ; Zhang Hongyong,JPX, Semiconductor device and method for forming the same.
  904. Yamazaki,Shunpei; Zhang,Hongyong, Semiconductor device and method for forming the same.
  905. Yamazaki,Shunpei; Zhang,Hongyong, Semiconductor device and method for forming the same.
  906. Suzawa, Hideomi; Ono, Koji; Takayama, Toru, Semiconductor device and method for manufacturing same.
  907. Suzawa, Hideomi; Ono, Koji; Takayama, Toru, Semiconductor device and method for manufacturing same.
  908. Yamazaki, Shunpei; Fukunaga, Takeshi, Semiconductor device and method for manufacturing same.
  909. Yamazaki, Shunpei; Fukunaga, Takeshi, Semiconductor device and method for manufacturing same.
  910. Yamazaki, Shunpei; Mitsuki, Toru; Kasahara, Kenji, Semiconductor device and method for manufacturing same.
  911. Yamazaki,Shunpei; Fukunaga,Takeshi, Semiconductor device and method for manufacturing same.
  912. Adachi Hiroki,JPX ; Takenouchi Akira,JPX ; Fukada Takeshi,JPX ; Uehara Hiroshi,JPX ; Takemura Yasuhiko,JPX, Semiconductor device and method for manufacturing the same.
  913. Adachi Hiroki,JPX ; Takenouchi Akira,JPX ; Fukada Takeshi,JPX ; Uehara Hiroshi,JPX ; Takemura Yasuhiko,JPX, Semiconductor device and method for manufacturing the same.
  914. Hayakawa, Masahiko; Sakama, Mitsunori; Toriumi, Satoshi, Semiconductor device and method for manufacturing the same.
  915. Hayakawa, Masahiko; Sakama, Mitsunori; Toriumi, Satoshi, Semiconductor device and method for manufacturing the same.
  916. Hayakawa, Masahiko; Sakama, Mitsunori; Toriumi, Satoshi, Semiconductor device and method for manufacturing the same.
  917. Hayakawa, Masahiko; Sakama, Mitsunori; Toriumi, Satoshi, Semiconductor device and method for manufacturing the same.
  918. Hayakawa, Masahiko; Sakama, Mitsunori; Toriumi, Satoshi, Semiconductor device and method for manufacturing the same.
  919. Hayakawa, Masahiko; Sakama, Mitsunori; Toriumi, Satoshi, Semiconductor device and method for manufacturing the same.
  920. Hayakawa,Masahiko; Sakama,Mitsunori; Toriumi,Satoshi, Semiconductor device and method for manufacturing the same.
  921. Hayakawa,Masahiko; Sakama,Mitsunori; Toriumi,Satoshi, Semiconductor device and method for manufacturing the same.
  922. Hiroki Adachi JP; Akira Takenouchi JP; Takeshi Fukada JP; Hiroshi Uehara JP; Yasuhiko Takemura JP, Semiconductor device and method for manufacturing the same.
  923. Hongyong Zhang JP; Hideki Uochi JP; Toru Takayama JP; Takeshi Fukunaga JP; Yasuhiko Takemura JP, Semiconductor device and method for manufacturing the same.
  924. Miyanaga, Akiharu; Ohtani, Hisashi; Takemura, Yasuhiko, Semiconductor device and method for manufacturing the same.
  925. Miyanaga, Akiharu; Ohtani, Hisashi; Takemura, Yasuhiko, Semiconductor device and method for manufacturing the same.
  926. Miyanaga,Akiharu; Ohtani,Hisashi; Takemura,Yasuhiko, Semiconductor device and method for manufacturing the same.
  927. Nakamura,Osamu; Kajiwara,Masayuki; Koezuka,Junichi; Yamazaki,Shunpei; Kuwabara,Hideaki, Semiconductor device and method for manufacturing the same.
  928. Suzawa, Hideomi; Ono, Koji; Takayama, Toru, Semiconductor device and method for manufacturing the same.
  929. Takemura Yasuhiko,JPX, Semiconductor device and method for manufacturing the same.
  930. Takemura, Yasuhiko, Semiconductor device and method for manufacturing the same.
  931. Takemura, Yasuhiko, Semiconductor device and method for manufacturing the same.
  932. Takemura,Yasuhiko, Semiconductor device and method for manufacturing the same.
  933. Takemura,Yasuhiro, Semiconductor device and method for manufacturing the same.
  934. Tsunoda,Akira; Yamazaki,Shunpei; Koyama,Jun, Semiconductor device and method for manufacturing the same.
  935. Tsunoda,Akira; Yamazaki,Shunpei; Koyama,Jun, Semiconductor device and method for manufacturing the same.
  936. Zhang Hongyong,JPX ; Uochi Hideki,JPX ; Takayama Toru,JPX ; Fukunaga Takeshi,JPX ; Takemura Yasuhiko,JPX, Semiconductor device and method for manufacturing the same.
  937. Zhang, Hongyong; Uochi, Hideki; Takayama, Toru; Fukunaga, Takeshi; Takemura, Yasuhiko, Semiconductor device and method for manufacturing the same.
  938. Zhang, Hongyong; Uochi, Hideki; Takayama, Toru; Fukunaga, Takeshi; Takemura, Yasuhiko, Semiconductor device and method for manufacturing the same.
  939. Shunpei Yamazaki JP; Jun Koyama JP; Takeshi Fukunaga JP, Semiconductor device and method for producing it.
  940. Yamazaki, Shunpei; Yamaguchi, Naoaki; Nakajima, Setsuo, Semiconductor device and method for producing it.
  941. Yamazaki Shunpei,JPX ; Ohtani Hisashi,JPX ; Miyanaga Akiharu,JPX ; Teramoto Satoshi,JPX, Semiconductor device and method for producing the same.
  942. Yamazaki Shunpei,JPX ; Ohtani Hisashi,JPX ; Miyanaga Akiharu,JPX ; Teramoto Satoshi,JPX, Semiconductor device and method for producing the same.
  943. Onoya, Shigeru, Semiconductor device and method of driving semiconductor device.
  944. Yamazaki Shunpei,JPX, Semiconductor device and method of fabricating same.
  945. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki; Ohtani, Hisashi; Hamatani, Toshiji, Semiconductor device and method of fabricating same.
  946. Yamazaki,Shunpei, Semiconductor device and method of fabricating same.
  947. Yamazaki,Shunpei, Semiconductor device and method of fabricating same.
  948. Yamazaki,Shunpei, Semiconductor device and method of fabricating same.
  949. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki; Ohtani,Hisashi; Hamatani,Toshiji, Semiconductor device and method of fabricating same.
  950. Hayakawa, Masahiko, Semiconductor device and method of fabricating the same.
  951. Hayakawa, Masahiko, Semiconductor device and method of fabricating the same.
  952. Hayakawa,Masahiko, Semiconductor device and method of fabricating the same.
  953. Hirakata, Yoshiharu; Goto, Yuugo; Kobayashi, Yuko; Yamazaki, Shunpei, Semiconductor device and method of fabricating the same.
  954. Hirakata, Yoshiharu; Goto, Yuugo; Kobayashi, Yuko; Yamazaki, Shunpei, Semiconductor device and method of fabricating the same.
  955. Hirakata, Yoshiharu; Goto, Yuugo; Kobayashi, Yuko; Yamazaki, Shunpei, Semiconductor device and method of fabricating the same.
  956. Hirakata, Yoshiharu; Goto, Yuugo; Kobayashi, Yuko; Yamazaki, Shunpei, Semiconductor device and method of fabricating the same.
  957. Hirakata, Yoshiharu; Goto, Yuugo; Kobayashi, Yuko; Yamazaki, Shunpei, Semiconductor device and method of fabricating the same.
  958. Hirakata, Yoshiharu; Goto, Yuugo; Kobayashi, Yuko; Yamazaki, Shunpei, Semiconductor device and method of fabricating the same.
  959. Hirakata, Yoshiharu; Goto, Yuugo; Kobayashi, Yuko; Yamazaki, Shunpei, Semiconductor device and method of fabricating the same.
  960. Hirakata,Yoshiharu; Goto,Yuugo; Kobayashi,Yuko; Yamazaki,Shunpei, Semiconductor device and method of fabricating the same.
  961. Kawasaki, Ritsuko; Kasahara, Kenji; Ohtani, Hisashi, Semiconductor device and method of fabricating the same.
  962. Kawasaki,Ritsuko; Kasahara,Kenji; Ohtani,Hisashi, Semiconductor device and method of fabricating the same.
  963. Kokubo, Chiho; Yamagata, Hirokazu; Yamazaki, Shunpei, Semiconductor device and method of fabricating the same.
  964. Kokubo, Chiho; Yamagata, Hirokazu; Yamazaki, Shunpei, Semiconductor device and method of fabricating the same.
  965. Shunpei Yamazaki JP; Jun Koyama JP, Semiconductor device and method of fabricating the same.
  966. Shunpei Yamazaki JP; Taketomi Asami JP; Toru Takayama JP; Ritsuko Kawasaki JP; Hiroki Adachi JP; Naoya Sakamoto JP; Masahiko Hayakawa JP; Hiroshi Shibata JP; Yasuyuki Arai JP, Semiconductor device and method of fabricating the same.
  967. Takemura, Yasuhiko, Semiconductor device and method of fabricating the same.
  968. Takemura,Yasuhiko, Semiconductor device and method of fabricating the same.
  969. Yamazaki, Shunpei, Semiconductor device and method of fabricating the same.
  970. Yamazaki, Shunpei; Arai, Yasuyuki, Semiconductor device and method of fabricating the same.
  971. Yamazaki, Shunpei; Arai, Yasuyuki, Semiconductor device and method of fabricating the same.
  972. Yamazaki, Shunpei; Arai, Yasuyuki, Semiconductor device and method of fabricating the same.
  973. Yamazaki, Shunpei; Arai, Yasuyuki, Semiconductor device and method of fabricating the same.
  974. Yamazaki, Shunpei; Arai, Yasuyuki, Semiconductor device and method of fabricating the same.
  975. Yamazaki, Shunpei; Arai, Yasuyuki, Semiconductor device and method of fabricating the same.
  976. Yamazaki, Shunpei; Asami, Taketomi; Takayama, Toru; Kawasaki, Ritsuko; Adachi, Hiroki; Sakamoto, Naoya; Hayakawa, Masahiko; Shibata, Hiroshi; Arai, Yasuyuki, Semiconductor device and method of fabricating the same.
  977. Yamazaki, Shunpei; Koyama, Jun, Semiconductor device and method of fabricating the same.
  978. Yamazaki, Shunpei; Koyama, Jun, Semiconductor device and method of fabricating the same.
  979. Yamazaki, Shunpei; Koyama, Jun, Semiconductor device and method of fabricating the same.
  980. Yamazaki, Shunpei; Koyama, Jun, Semiconductor device and method of fabricating the same.
  981. Yamazaki, Shunpei; Koyama, Jun, Semiconductor device and method of fabricating the same.
  982. Yamazaki, Shunpei; Koyama, Jun, Semiconductor device and method of fabricating the same.
  983. Yamazaki, Shunpei; Koyama, Jun; Shibata, Hiroshi; Fukunaga, Takeshi, Semiconductor device and method of fabricating the same.
  984. Yamazaki, Shunpei; Ohnuma, Hideto; Takano, Tamae; Ohtani, Hisashi, Semiconductor device and method of fabricating the same.
  985. Yamazaki, Shunpei; Ohnuma, Hideto; Takano, Tamae; Ohtani, Hisashi, Semiconductor device and method of fabricating the same.
  986. Yamazaki,Shunpei, Semiconductor device and method of fabricating the same.
  987. Yamazaki,Shunpei; Asami,Taketomi; Takayama,Toru; Kawasaki,Ritsuko; Adachi,Hiroki; Sakamoto,Naoya; Hayakawa,Masahiko; Shibata,Hiroshi; Arai,Yasuyuki, Semiconductor device and method of fabricating the same.
  988. Yamazaki,Shunpei; Asami,Taketomi; Takayama,Toru; Kawasaki,Ritsuko; Adachi,Hiroki; Sakamoto,Naoya; Hayakawa,Masahiko; Shibata,Hiroshi; Arai,Yasuyuki, Semiconductor device and method of fabricating the same.
  989. Yamazaki,Shunpei; Asami,Taketomi; Takayama,Toru; Kawasaki,Ritsuko; Adachi,Hiroki; Sakamoto,Naoya; Hayakawa,Masahiko; Shibata,Hiroshi; Arai,Yasuyuki, Semiconductor device and method of fabricating the same.
  990. Yamazaki,Shunpei; Koyama,Jun, Semiconductor device and method of fabricating the same.
  991. Yamazaki,Shunpei; Ohtani,Hisashi; Suzawa,Hideomi; Takayama,Toru, Semiconductor device and method of fabricating the same.
  992. Kasahara,Kenji; Kawasaki,Ritsuko; Ohtani,Hisashi, Semiconductor device and method of fabricating thereof.
  993. Kasahara,Kenji; Kawasaki,Ritsuko; Ohtani,Hisashi, Semiconductor device and method of fabricating thereof.
  994. Fujimoto, Etsuko; Murakami, Satoshi; Yamazaki, Shunpei; Eguchi, Shingo, Semiconductor device and method of manufacturing same.
  995. Fujimoto, Etsuko; Murakami, Satoshi; Yamazaki, Shunpei; Eguchi, Shingo, Semiconductor device and method of manufacturing same.
  996. Fujimoto, Etsuko; Murakami, Satoshi; Yamazaki, Shunpei; Eguchi, Shingo, Semiconductor device and method of manufacturing same.
  997. Fujimoto,Etsuko; Murakami,Satoshi; Yamazaki,Shunpei; Eguchi,Shingo, Semiconductor device and method of manufacturing same.
  998. Asami, Taketomi; Ichijo, Mitsuhiro; Toriumi, Satoshi; Ohtsuki, Takashi; Mitsuki, Toru; Kasahara, Kenji; Takano, Tamae; Kokubo, Chiho; Yamazaki, Shunpei; Shichi, Takeshi, Semiconductor device and method of manufacturing the same.
  999. Asami,Taketomi; Ichijo,Mitsuhiro; Toriumi,Satoshi; Ohtsuki,Takashi; Mitsuki,Toru; Kasahara,Kenji; Takano,Tamae; Kokubo,Chiho; Yamazaki,Shunpei; Shichi,Takeshi, Semiconductor device and method of manufacturing the same.
  1000. Asami,Taketomi; Ichijo,Mitsuhiro; Toriumi,Satoshi; Ohtsuki,Takashi; Mitsuki,Toru; Kasahara,Kenji; Takano,Tamae; Kokubo,Chiho; Yamazaki,Shunpei; Shichi,Takeshi, Semiconductor device and method of manufacturing the same.
  1001. Fujimoto, Etsuko; Murakami, Satoshi; Yamazaki, Shunpei; Eguchi, Shingo, Semiconductor device and method of manufacturing the same.
  1002. Fujimoto,Etsuko; Murakami,Satoshi; Yamazaki,Shunpei; Eguchi,Shingo, Semiconductor device and method of manufacturing the same.
  1003. Hamada, Takashi; Murakami, Satoshi; Yamazaki, Shunpei; Nakamura, Osamu; Kajiwara, Masayuki; Koezuka, Junichi; Takayama, Toru, Semiconductor device and method of manufacturing the same.
  1004. Hamada,Takashi; Murakami,Satoshi; Yamazaki,Shunpei; Nakamura,Osamu; Kajiwara,Masayuki; Koezuka,Junichi; Takayama,Toru, Semiconductor device and method of manufacturing the same.
  1005. Isobe, Atsuo; Yamazaki, Shunpei; Kokubo, Chiho; Tanaka, Koichiro; Shimomura, Akihisa; Arao, Tatsuya; Miyairi, Hidekazu, Semiconductor device and method of manufacturing the same.
  1006. Isobe, Atsuo; Yamazaki, Shunpei; Kokubo, Chiho; Tanaka, Koichiro; Shimomura, Akihisa; Arao, Tatsuya; Miyairi, Hidekazu; Akiba, Mai, Semiconductor device and method of manufacturing the same.
  1007. Isobe,Atsuo; Yamazaki,Shunpei; Kokubo,Chiho; Tanaka,Koichiro; Shimomura,Akihisa; Arao,Tatsuya; Miyairi,Hidekazu, Semiconductor device and method of manufacturing the same.
  1008. Isobe,Atsuo; Yamazaki,Shunpei; Kokubo,Chiho; Tanaka,Koichiro; Shimomura,Akihisa; Arao,Tatsuya; Miyairi,Hidekazu; Akiba,Mai, Semiconductor device and method of manufacturing the same.
  1009. Kasahara, Kenji; Yamazaki, Shunpei, Semiconductor device and method of manufacturing the same.
  1010. Kawasaki,Ritsuko; Kitakado,Hidehito; Kasahara,Kenji; Yamazaki,Shunpei, Semiconductor device and method of manufacturing the same.
  1011. Kokubo,Chiho; Shiga,Aiko; Yamazaki,Shunpei; Miyairi,Hidekazu; Dairiki,Koji; Tanaka,Koichiro, Semiconductor device and method of manufacturing the same.
  1012. Makita, Naoki; Nakazawa, Misako; Ohnuma, Hideto; Matsuo, Takuya, Semiconductor device and method of manufacturing the same.
  1013. Miyanaga, Akiharu; Kubo, Nobuo, Semiconductor device and method of manufacturing the same.
  1014. Miyanaga, Akiharu; Ohtani, Hisashi; Takemura, Yasuhiko, Semiconductor device and method of manufacturing the same.
  1015. Murakami, Satoshi; Yamazaki, Shunpei; Koyama, Jun; Osame, Mitsuaki; Tanaka, Yukio; Hirakata, Yoshiharu, Semiconductor device and method of manufacturing the same.
  1016. Murakami, Satoshi; Yamazaki, Shunpei; Koyama, Jun; Osame, Mitsuaki; Tanaka, Yukio; Hirakata, Yoshiharu, Semiconductor device and method of manufacturing the same.
  1017. Murakami, Satoshi; Yamazaki, Shunpei; Koyama, Jun; Osamè, Mitsuaki; Tanaka, Yukio; Hirakata, Yoshiharu, Semiconductor device and method of manufacturing the same.
  1018. Ohtani, Hisashi; Takano, Tamae; Yamazaki, Shunpei, Semiconductor device and method of manufacturing the same.
  1019. Ohtani, Hisashi; Takano, Tamae; Yamazaki, Shunpei, Semiconductor device and method of manufacturing the same.
  1020. Ohtani, Hisashi; Yamazaki, Shunpei; Itoh, Masataka, Semiconductor device and method of manufacturing the same.
  1021. Ohtani,Hisashi; Takano,Tamae; Yamazaki,Shunpei, Semiconductor device and method of manufacturing the same.
  1022. Sakama, Mitsunori; Ishimaru, Noriko; Miwa, Masahiko; Iwai, Mitinori, Semiconductor device and method of manufacturing the same.
  1023. Sakama, Mitsunori; Ishimaru, Noriko; Miwa, Masahiko; Iwai, Mitinori, Semiconductor device and method of manufacturing the same.
  1024. Shunpei Yamazaki JP, Semiconductor device and method of manufacturing the same.
  1025. Yamazaki, Shunpei, Semiconductor device and method of manufacturing the same.
  1026. Yamazaki, Shunpei; Adachi, Hiroki, Semiconductor device and method of manufacturing the same.
  1027. Yamazaki, Shunpei; Adachi, Hiroki, Semiconductor device and method of manufacturing the same.
  1028. Yamazaki, Shunpei; Hayakawa, Masahiko, Semiconductor device and method of manufacturing the same.
  1029. Yamazaki, Shunpei; Koyama, Jun, Semiconductor device and method of manufacturing the same.
  1030. Yamazaki, Shunpei; Koyama, Jun, Semiconductor device and method of manufacturing the same.
  1031. Yamazaki, Shunpei; Koyama, Jun, Semiconductor device and method of manufacturing the same.
  1032. Yamazaki, Shunpei; Koyama, Jun, Semiconductor device and method of manufacturing the same.
  1033. Yamazaki, Shunpei; Koyama, Jun, Semiconductor device and method of manufacturing the same.
  1034. Yamazaki, Shunpei; Koyama, Jun, Semiconductor device and method of manufacturing the same.
  1035. Yamazaki, Shunpei; Koyama, Jun, Semiconductor device and method of manufacturing the same.
  1036. Yamazaki, Shunpei; Koyama, Jun; Fukunaga, Takeshi, Semiconductor device and method of manufacturing the same.
  1037. Yamazaki, Shunpei; Koyama, Jun; Fukunaga, Takeshi, Semiconductor device and method of manufacturing the same.
  1038. Yamazaki, Shunpei; Nakamura, Osamu; Hamada, Takashi; Murakami, Satoshi, Semiconductor device and method of manufacturing the same.
  1039. Yamazaki, Shunpei; Ohtani, Hisashi, Semiconductor device and method of manufacturing the same.
  1040. Yamazaki, Shunpei; Ohtani, Hisashi, Semiconductor device and method of manufacturing the same.
  1041. Yamazaki,Shunpei; Adachi,Hiroki, Semiconductor device and method of manufacturing the same.
  1042. Yamazaki,Shunpei; Koyama,Jun, Semiconductor device and method of manufacturing the same.
  1043. Yamazaki,Shunpei; Koyama,Jun, Semiconductor device and method of manufacturing the same.
  1044. Yoshimoto,Satoshi, Semiconductor device and method of manufacturing the same.
  1045. Yoshimoto,Satoshi, Semiconductor device and method of manufacturing the same.
  1046. Zhang Hongyong,JPX, Semiconductor device and method of manufacturing the same.
  1047. Zhang Hongyong,JPX, Semiconductor device and method of manufacturing the same.
  1048. Zhang, Hongyong, Semiconductor device and method of manufacturing the same.
  1049. Zhang,Hongyong, Semiconductor device and method of manufacturing the same.
  1050. Arao, Tatsuya; Suzawa, Hideomi, Semiconductor device and method of manufacturing the semiconductor device.
  1051. Arao,Tatsuya; Suzawa,Hideomi, Semiconductor device and method of manufacturing the semiconductor device.
  1052. Yamazaki, Shunpei; Murakami, Satoshi; Koyama, Jun; Tanaka, Yukio; Kitakado, Hidehito, Semiconductor device and method of manufacturing therefor.
  1053. Yamazaki, Shunpei, Semiconductor device and method of manufacturing thereof.
  1054. Sakama, Mitsunori; Ishimaru, Noriko; Miwa, Masahiko; Iwai, Michinori, Semiconductor device and method of producing the same.
  1055. Yamazaki Shunpei,JPX ; Miyanaga Akiharu,JPX ; Mitsuki Toru,JPX ; Ohtani Hisashi,JPX, Semiconductor device and process for producing same.
  1056. Miyanaga, Akiharu; Kubo, Nobuo, Semiconductor device and process for producing the same.
  1057. Ohtani,Hisashi; Nakazawa,Misako; Murakami,Satoshi, Semiconductor device and process for producing the same.
  1058. Nakajima, Setsuo, Semiconductor device and process for production thereof.
  1059. Yamazaki, Shunpei; Koyama, Jun; Shibata, Hiroshi; Fukunaga, Takeshi, Semiconductor device and process for production thereof.
  1060. Yamazaki, Shunpei; Koyama, Jun; Shibata, Hiroshi; Fukunaga, Takeshi, Semiconductor device and process for production thereof.
  1061. Yamazaki, Shunpei; Koyama, Jun; Shibata, Hiroshi; Fukunaga, Takeshi, Semiconductor device and process for production thereof.
  1062. Yamazaki,Shunpei; Koyama,Jun; Shibata,Hiroshi; Fukunaga,Takeshi, Semiconductor device and process for production thereof.
  1063. Yamazaki,Shunpei; Koyama,Jun; Shibata,Hiroshi; Fukunaga,Takeshi, Semiconductor device and process for production thereof.
  1064. Isobe, Atsuo; Dairiki, Koji; Shibata, Hiroshi; Kokubo, Chiho; Arao, Tatsuya; Hayakawa, Masahiko; Miyairi, Hidekazu; Shimomura, Akihisa; Tanaka, Koichiro; Yamazaki, Shunpei; Akiba, Mai, Semiconductor device and semiconductor device producing system.
  1065. Isobe,Atsuo; Dairiki,Koji; Shibata,Hiroshi; Kokubo,Chiho; Arao,Tatsuya; Hayakawa,Masahiko; Miyairi,Hidekazu; Shimomura,Akihisa; Tanaka,Koichiro; Yamazaki,Shunpei; Akiba,Mai, Semiconductor device and semiconductor device producing system.
  1066. Isobe, Atsuo; Dairiki, Koji; Shibata, Hiroshi; Kokubo, Chiho; Arao, Tatsuya; Hayakawa, Masahiko; Miyairi, Hidekazu; Shimomura, Akihisa; Tanaka, Koichiro; Yamazaki, Shunpei; Akiba, Mai, Semiconductor device and semiconductor device production system.
  1067. Isobe, Atsuo; Yamazaki, Shunpei; Dairiki, Koji; Shibata, Hiroshi; Kokubo, Chiho; Arao, Tatsuya; Hayakawa, Masahiko; Miyairi, Hidekazu; Shimomura, Akihisa; Tanaka, Koichiro; Akiba, Mai, Semiconductor device and semiconductor device production system.
  1068. Isobe, Atsuo; Yamazaki, Shunpei; Dairiki, Koji; Shibata, Hiroshi; Kokubo, Chiho; Arao, Tatsuya; Hayakawa, Masahiko; Miyairi, Hidekazu; Shimomura, Akihisa; Tanaka, Koichiro; Akiba, Mai, Semiconductor device and semiconductor device production system.
  1069. Isobe, Atsuo; Yamazaki, Shunpei; Dairiki, Koji; Shibata, Hiroshi; Kokubo, Chiho; Arao, Tatsuya; Hayakawa, Masahiko; Miyairi, Hidekazu; Shimomura, Akihisa; Tanaka, Koichiro; Akiba, Mai, Semiconductor device and semiconductor device production system.
  1070. Shunpei Yamazaki JP; Jun Koyama JP, Semiconductor device and semiconductor display device.
  1071. Yamazaki, Shunpei; Koyama, Jun, Semiconductor device and semiconductor display device.
  1072. Yamazaki, Shunpei; Koyama, Jun, Semiconductor device and semiconductor display device.
  1073. Yamazaki, Shunpei; Koyama, Jun, Semiconductor device and semiconductor display device.
  1074. Yamazaki, Shunpei; Koyama, Jun, Semiconductor device and semiconductor display device.
  1075. Yamazaki, Shunpei; Koyama, Jun, Semiconductor device and semiconductor display device.
  1076. Kokubo, Chiho; Yamagata, Hirokazu; Yamazaki, Shunpei, Semiconductor device applying to the crystalline semiconductor film.
  1077. Shunpei Yamazaki JP; Naoaki Yamaguchi JP; Setsuo Nakajima JP, Semiconductor device comprising a bottom gate type thin film transistor.
  1078. Yamazaki, Shunpei; Arai, Yasuyuki; Koyama, Jun, Semiconductor device comprising a pixel unit including an auxiliary capacitor.
  1079. Yamazaki, Shunpei; Murakami, Satoshi; Koyama, Jun; Tanaka, Yukio; Kitakado, Hidehito, Semiconductor device comprising a second organic film over a third insulating film wherein the second organic film overlaps with a channel formation region and a second conductive film.
  1080. Yamazaki, Shunpei; Murakami, Satoshi; Koyama, Jun; Tanaka, Yukio; Kitakado, Hidehito, Semiconductor device comprising a second organic film over a third insulating film wherein the second organic film overlaps with a channel formation region and a second conductive film.
  1081. Yamazaki, Shunpei; Murakami, Satoshi; Koyama, Jun; Tanaka, Yukio; Kitakado, Hidehito, Semiconductor device comprising a spacer wherein the spacer has an opening through which a pixel electrode is connected to a first transistor.
  1082. Murakami, Satoshi; Yamazaki, Shunpei; Koyama, Jun; Osame, Mitsuaki; Tanaka, Yukio; Hirakata, Yoshiharu, Semiconductor device comprising a thin film transistor comprising a semiconductor thin film and method of manufacturing the same.
  1083. Ohtani, Hisashi; Adachi, Hiroki; Miyanaga, Akiharu; Takayama, Toru, Semiconductor device comprising first insulating film, second insulating film comprising organic resin on the first insulating film, and pixel electrode over the second insulating film.
  1084. Suzawa,Hideomi; Ono,Koji; Ohnuma,Hideto; Yamagata,Hirokazu; Yamazaki,Shunpei, Semiconductor device comprising thin film transistor.
  1085. Yamazaki,Shunpei, Semiconductor device comprising thin film transistor comprising conductive film having tapered edge.
  1086. Hongyong Zhang JP; Toru Takayama JP; Yasuhiko Takemura JP; Akiharu Miyanaga JP; Hisashi Ohtani JP, Semiconductor device forming method.
  1087. Zhang Hongyong,JPX ; Takayama Toru,JPX ; Takemura Yasuhiko,JPX ; Miyanaga Akiharu,JPX ; Ohtani Hisashi,JPX, Semiconductor device forming method.
  1088. Zhang,Hongyong; Takayama,Toru; Takemura,Yasuhiko; Miyanaga,Akiharu; Ohtani,Hisashi, Semiconductor device forming method.
  1089. Yamazaki,Shunpei, Semiconductor device having El layer and sealing material.
  1090. Yamazaki, Shunpei, Semiconductor device having LDD regions.
  1091. Yamazaki Shunpei,JPX ; Takemura Yasuhiko,JPX ; Zhang Hongyong,JPX ; Takayama Toru,JPX ; Uochi Hideki,JPX, Semiconductor device having a catalyst enhanced crystallized layer.
  1092. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki; Ohtani,Hisashi; Hamatani,Toshiji, Semiconductor device having a crystalline semiconductor film.
  1093. Yamazaki, Shunpei; Suzawa, Hideomi; Ono, Koji; Arai, Yasuyuki, Semiconductor device having a gate insulting film with thick portions aligned with a tapered gate electrode.
  1094. Yamazaki, Shunpei; Yamazaki, Yu; Koyama, Jun; Ikeda, Takayuki; Shibata, Hiroshi; Kitakado, Hidehito; Fukunaga, Takeshi, Semiconductor device having a pixel matrix circuit that includes a pixel TFT and a storage capacitor.
  1095. Yamazaki, Shunpei; Yamazaki, Yu; Koyama, Jun; Ikeda, Takayuki; Shibata, Hiroshi; Kitakado, Hidehito; Fukunaga, Takeshi, Semiconductor device having a pixel matrix circuit that includes a pixel TFT and a storage capacitor.
  1096. Yamazaki,Shunpei; Yamazaki,Yu; Koyama,Jun; Ikeda,Takayuki; Shibata,Hiroshi; Kitakado,Hidehito; Fukunaga,Takeshi, Semiconductor device having a pixel matrix circuit that includes a pixel TFT and a storage capacitor.
  1097. Yamazaki, Shunpei; Koyama, Jun, Semiconductor device having a tapered gate and method of manufacturing the same.
  1098. Makita,Naoki; Nakazawa,Misako; Ohnuma,Hideto; Matsuo,Takuya, Semiconductor device having an efficient gettering region.
  1099. Yamazaki,Shunpei; Ohtani,Hisashi; Hamatani,Toshiji, Semiconductor device having an impurity gradient in the impurity regions and method of manufacture.
  1100. Setsuo Nakajima JP, Semiconductor device having an impurity region overlapping a gate electrode.
  1101. Yamazaki, Shunpei; Tanaka, Yukio; Koyama, Jun; Osame, Mitsuaki; Murakami, Satoshi; Ohnuma, Hideto; Fujimoto, Etsuko; Kitakado, Hidehito, Semiconductor device having at least a pixel unit and a driver circuit unit over a same substrate.
  1102. Yamazaki, Shunpei; Ohtani, Hisashi; Koyama, Jun; Fukunaga, Takeshi, Semiconductor device having buried oxide film.
  1103. Zhang, Hongyong; Takayama, Toru, Semiconductor device having channel formation region comprising silicon and containing a group IV element.
  1104. Ohtani, Hisashi, Semiconductor device having driver circuit and pixel section provided over same substrate.
  1105. Yamazaki, Shunpei; Suzawa, Hideomi; Yamagata, Hirokazu, Semiconductor device having first and second insulating films.
  1106. Zhang Hongyong,JPX, Semiconductor device having improved crystal orientation.
  1107. Zhang Hongyong,JPX, Semiconductor device having improved crystal orientation.
  1108. Miyanaga, Akiharu; Kubo, Nobuo, Semiconductor device having impurity region.
  1109. Kitakado,Hidehito; Hayakawa,Masahiko; Yamazaki,Shunpei; Asami,Taketomi, Semiconductor device having insulating film.
  1110. Ohtani, Hisashi; Nakazawa, Misako; Murakami, Satoshi; Fujimoto, Etsuko, Semiconductor device having multi-layer wiring.
  1111. Kokubo, Chiho; Shiga, Aiko; Yamazaki, Shunpei; Miyairi, Hidekazu; Dairiki, Koji; Tanaka, Koichiro, Semiconductor device having multichannel transistor.
  1112. Ohtani Hisashi,JPX ; Yamazaki Shunpei,JPX ; Itoh Masataka,JPX, Semiconductor device having multilayered gate electrode and impurity regions overlapping therewith.
  1113. Yamazaki, Shunpei; Teramoto, Satoshi, Semiconductor device having parallel thin film transistors.
  1114. Koyama,Jun; Ohnuma,Hideto; Shionoiri,Yutaka; Nagao,Shou, Semiconductor device having pixels.
  1115. Yamazaki, Shunpei; Adachi, Hiroki; Kuwabara, Hideaki, Semiconductor device having semiconductor circuit comprising semiconductor element, and method for manufacturing same.
  1116. Shunpei Yamazaki JP; Yasuyuki Arai JP, Semiconductor device having single crystal grains with hydrogen and tapered gate insulation layer.
  1117. Suzawa, Hideomi; Ono, Koji; Ohnuma, Hideto; Yamagata, Hirokazu; Yamazaki, Shunpei, Semiconductor device having tapered gate insulating film.
  1118. Yamazaki, Shunpei; Teramoto, Satoshi, Semiconductor device having thin film transistor.
  1119. Yamazaki,Shunpei; Tanaka,Yukio; Koyama,Jun; Osame,Mitsuaki; Murakami,Satoshi; Ohnuma,Hideto; Fujimoto,Etsuko; Kitakado,Hidehito, Semiconductor device having thin film transistor and light-shielding film.
  1120. Isobe,Atsuo; Yamazaki,Shunpei; Dairiki,Koji; Shibata,Hiroshi; Kokubo,Chiho; Arao,Tatsuya; Hayakawa,Masahiko; Miyairi,Hidekazu; Shimomura,Akihisa; Tanaka,Koichiro; Akiba,Mai, Semiconductor device having thin film transistor with position controlled channel formation region.
  1121. Yamazaki, Shunpei; Ikeda, Takayuki; Fukunaga, Takeshi, Semiconductor device having thin film transistors.
  1122. Hamada, Takashi; Arai, Yasuyuki, Semiconductor device including a conductive film having a tapered shape.
  1123. Yamazaki,Shunpei; Koyama,Jun; Shibata,Hiroshi; Fukunaga,Takeshi, Semiconductor device including a thin film transistor and a storage capacitor.
  1124. Yamazaki Shunpei,JPX ; Koyama Jun,JPX ; Teramoto Satoshi,JPX, Semiconductor device including nickel formed on a crystalline silicon substrate.
  1125. Yamazaki, Shunpei, Semiconductor device including semiconductor circuit made from semiconductor element and manufacturing method thereof.
  1126. Nakajima,Setsuo, Semiconductor device including two transistors and capacitive part.
  1127. Dairiki, Koji, Semiconductor device manufacturing method, heat treatment apparatus, and heat treatment method.
  1128. Ohtani, Hisashi; Takano, Tamae; Kokubo, Chiho, Semiconductor device method of manufacturing.
  1129. Zhang,Hongyong; Takayama,Toru; Takemura,Yasuhiko; Miyanaga,Akiharu; Ohtani,Hisashi, Semiconductor device structure.
  1130. Suzawa,Hideomi; Ono,Koji; Takayama,Toru, Semiconductor device that includes a gate insulating layer with three different thicknesses.
  1131. Yamazaki, Shunpei; Miyanaga, Akiharu; Mitsuki, Toru; Ohtani, Hisashi, Semiconductor device with a semiconductor layer over a surface having a recess pitch no smaller than 0.3 microns.
  1132. Yamazaki, Shunpei; Hirakata, Yoshiharu; Murakami, Satoshi, Semiconductor device with capacitor formed around contact hole.
  1133. Yamazaki, Shunpei; Hirakata, Yoshiharu; Murakami, Satoshi, Semiconductor device with capacitor formed around contact hole.
  1134. Yamazaki Shunpei,JPX ; Koyama Jun,JPX ; Teramoto Satoshi,JPX, Semiconductor device with catalyst addition and removal.
  1135. Yamazaki,Shunpei; Mitsuki,Toru; Kasahara,Kenji, Semiconductor device with enhanced orientation ratio and method of manufacturing same.
  1136. Yamazaki, Shunpei, Semiconductor device with heat-resistant gate.
  1137. Yamazaki, Shunpei, Semiconductor device with light emitting elements and an adhesive layer holding color filters.
  1138. Hiroki Adachi JP; Shunpei Yamazaki JP, Semiconductor device with metal-oxide conductors.
  1139. Nakamura,Osamu; Kuwabara,Hideaki; Shibata,Noriko, Semiconductor device with organic compound layer.
  1140. Ohtani,Hisashi; Miyanaga,Akiharu; Zhang,Hongyong; Yamaguchi,Naoaki, Semiconductor device with residual nickel from crystallization of semiconductor film.
  1141. Yamazaki, Shunpei; Miyanaga, Akiharu; Mitsuki, Toru; Ohtani, Hisashi, Semiconductor device with rod like crystals and a recessed insulation layer.
  1142. Shunpei Yamazaki JP; Etsuko Fujimoto JP; Atsuo Isobe JP; Toru Takayama JP; Kunihiko Fukuchi JP, Semiconductor device with semiconductor circuit comprising semiconductor units, and method for fabricating it.
  1143. Yamazaki,Shunpei; Fujimoto,Etsuko; Isobe,Atsuo; Takayama,Toru; Fukuchi,Kunihiko, Semiconductor device with semiconductor circuit comprising semiconductor units, and method for fabricating it.
  1144. Yamazaki, Shunpei; Fujimoto, Etsuko; Isobe, Atsuo; Takayama, Toru; Fukuchi, Kunihiko, Semiconductor device with semiconductor circuit comprising semiconductor units, and method of fabricating it.
  1145. Ono, Koji; Suzawa, Hideomi; Arao, Tatsuya, Semiconductor device with tapered gate and insulating film.
  1146. Yamazaki, Shunpei, Semiconductor device with tapered gates.
  1147. Yamazaki,Shunpei, Semiconductor device, RFID tag and label-like object.
  1148. Kimura, Hajime; Shionoiri, Yutaka, Semiconductor device, and display device and electronic device utilizing the same.
  1149. Kimura, Hajime; Shionoiri, Yutaka, Semiconductor device, and display device and electronic device utilizing the same.
  1150. Kimura, Hajime; Shionoiri, Yutaka, Semiconductor device, and display device and electronic device utilizing the same.
  1151. Kimura, Hajime; Shionoiri, Yutaka, Semiconductor device, and display device and electronic device utilizing the same.
  1152. Kimura, Hajime; Shionoiri, Yutaka, Semiconductor device, and display device and electronic device utilizing the same.
  1153. Kimura, Hajime; Shionoiri, Yutaka, Semiconductor device, and display device and electronic device utilizing the same.
  1154. Kimura, Hajime; Shionoiri, Yutaka, Semiconductor device, and display device and electronic device utilizing the same.
  1155. Kimura, Hajime; Shionoiri, Yutaka, Semiconductor device, and display device and electronic device utilizing the same.
  1156. Kimura, Hajime; Shionoiri, Yutaka, Semiconductor device, and display device and electronic device utilizing the same.
  1157. Kimura,Hajime; Shionoiri,Yutaka, Semiconductor device, and display device and electronic device utilizing the same.
  1158. Yamazaki, Shunpei; Koyama, Jun; Kuwabara, Hideaki; Fujikawa, Saishi, Semiconductor device, and manufacturing method thereof.
  1159. Yamazaki, Shunpei; Koyama, Jun; Kuwabara, Hideaki; Fujikawa, Saishi, Semiconductor device, and manufacturing method thereof.
  1160. Yamazaki, Shunpei; Koyama, Jun; Kuwabara, Hideaki; Fujikawa, Saishi, Semiconductor device, and manufacturing method thereof.
  1161. Yamazaki, Shunpei; Koyama, Jun; Kuwabara, Hideaki; Fujikawa, Saishi, Semiconductor device, and manufacturing method thereof.
  1162. Yamazaki,Shunpei; Koyama,Jun; Kuwabara,Hideaki; Fujikawa,Saishi, Semiconductor device, and manufacturing method thereof.
  1163. Sakama,Mitsunori; Ishimaru,Noriko; Asami,Taketomi; Yamazaki,Shunpei, Semiconductor device, and method of fabricating the same.
  1164. Sakama,Mitsunori; Ishimaru,Noriko; Asami,Taketomi; Yamazaki,Shunpei, Semiconductor device, and method of fabricating the same.
  1165. Yamazaki, Shunpei; Tanaka, Koichiro, Semiconductor device, and method of forming the same.
  1166. Yamazaki, Shunpei; Tanaka, Koichiro, Semiconductor device, and method of forming the same.
  1167. Yamazaki, Shunpei; Tanaka, Koichiro, Semiconductor device, and method of forming the same.
  1168. Kato, Kiyoshi; Saito, Toshihiko; Isobe, Atsuo; Takayama, Toru; Maruyama, Junya; Goto, Yuugo; Ohno, Yumiko, Semiconductor device, method of manufacturing the same, and method of designing the same.
  1169. Kato, Kiyoshi; Saito, Toshihiko; Isobe, Atsuo; Takayama, Toru; Maruyama, Junya; Goto, Yuugo; Ohno, Yumiko, Semiconductor device, method of manufacturing the same, and method of designing the same.
  1170. Kato,Kiyoshi; Saito,Toshihiko; Isobe,Atsuo; Takayama,Toru; Maruyama,Junya; Goto,Yuugo; Ohno,Yumiko, Semiconductor device, method of manufacturing the same, and method of designing the same.
  1171. Nakajima, Setsuo; Ohtani, Hisashi; Yamazaki, Shunpei, Semiconductor devices.
  1172. Shunpei Yamazaki JP, Semiconductor display device.
  1173. Yamazaki, Shunpei, Semiconductor display device.
  1174. Shunpei Yamazaki JP; Jun Koyama JP, Semiconductor display device and driving circuit therefor.
  1175. Yamazaki, Shunpei; Koyama, Jun, Semiconductor display device and driving circuit therefor.
  1176. Yamazaki, Shunpei; Koyama, Jun, Semiconductor display device and driving circuit therefor.
  1177. Mukao, Kyouichi, Semiconductor display device and electronic equipment.
  1178. Ohnuma, Hideto, Semiconductor display device and manufacturing method thereof.
  1179. Yamazaki,Shunpei; Koyama,Jun; Suzawa,Hideomi; Ono,Koji; Arao,Tatsuya, Semiconductor display device and manufacturing method thereof.
  1180. Yamazaki,Shunpei; Koyama,Jun; Suzawa,Hideomi; Ono,Koji; Arao,Tatsuya, Semiconductor display device and manufacturing method thereof.
  1181. Hiroki, Masaaki; Sato, Eiji; Onoya, Shigeru; Inoue, Noboru, Semiconductor display device and method of driving a semiconductor display device.
  1182. Hiroki,Masaaki; Sato,Eiji; Onoya,Shigeru; Inoue,Noboru, Semiconductor display device and method of driving a semiconductor display device.
  1183. Onoya,Shigeru, Semiconductor display device and method of driving semiconductor display device.
  1184. Koyama, Jun; Osame, Mitsuaki; Azami, Munehiro, Semiconductor display device and method of driving the same.
  1185. Osame, Mitsuaki; Tanaka, Yukio, Semiconductor display device and method of driving the same.
  1186. Osame,Mitsuaki; Tanaka,Yukio, Semiconductor display device and method of driving the same.
  1187. Yamazaki, Shunpei, Semiconductor display device and method of manufacturing the same.
  1188. Yamazaki, Shunpei; Murakami, Satoshi; Koyama, Jun; Tanaka, Yukio; Kitakado, Hidehito, Semiconductor display device and method of manufacturing therefor.
  1189. Shunpei Yamazaki JP; Jun Koyama JP, Semiconductor display device correcting system and correcting method of semiconductor display device.
  1190. Yamazaki, Shunpei; Koyama, Jun, Semiconductor display device correcting system and correcting method of semiconductor display device.
  1191. Ishikawa, Akira, Semiconductor element, semiconductor device and methods for manufacturing thereof.
  1192. Ishikawa, Akira, Semiconductor element, semiconductor device and methods for manufacturing thereof.
  1193. Ishikawa,Akira, Semiconductor element, semiconductor device and methods for manufacturing thereof.
  1194. Yamazaki,Shunpei; Kato,Kiyoshi; Isobe,Atsuo; Miyairi,Hidekazu; Suzawa,Hideomi; Shionoiri,Yutaka; Miyake,Hiroyuki, Semiconductor element, semiconductor device, electronic device, TV set and digital camera.
  1195. Yamazaki,Shunpei; Ohtani,Hisashi; Hiroki,Masaaki; Tanaka,Koichiro; Shiga,Aiko; Akiba,Mai, Semiconductor fabricating apparatus.
  1196. Shunpei Yamazaki JP; Hisashi Ohtani JP; Hideto Ohnuma JP, Semiconductor film manufacturing with selective introduction of crystallization promoting material.
  1197. Yokoi, Tomokazu; Inoue, Takayuki; Furuno, Makoto, Semiconductor film, method for manufacturing the same, and power storage device.
  1198. Yokoi, Tomokazu; Inoue, Takayuki; Furuno, Makoto, Semiconductor film, method for manufacturing the same, and power storage device.
  1199. Takayama,Toru; Akimoto,Kengo, Semiconductor film, semiconductor device and method for manufacturing same.
  1200. Asami, Taketomi; Ichijo, Mitsuhiro; Suzuki, Noriyoshi; Ohnuma, Hideto; Yonezawa, Masato, Semiconductor film, semiconductor device and method of their production.
  1201. Asami,Taketomi; Ichijo,Mitsuhiro; Suzuki,Noriyoshi; Ohnuma,Hideto; Yonezawa,Masato, Semiconductor film, semiconductor device and method of their production.
  1202. Miyairi,Hidekazu; Shiga,Aiko; Nomura,Katsumi; Makita,Naoki; Matsuo,Takuya, Semiconductor film, semiconductor device, and method of manufacturing the same including adding metallic element to the amorphous semiconductor film and introducing oxygen after crystallization.
  1203. Kato, Kiyoshi, Semiconductor memory element, semiconductor memory device and method of fabricating the same.
  1204. Kato,Kiyoshi, Semiconductor memory element, semiconductor memory device and method of fabricating the same.
  1205. Yamazaki, Shunpei; Miyanaga, Akiharu; Koyama, Jun; Fukunaga, Takeshi, Semiconductor thin film and its manufacturing method and semiconductor device and its manufacturing method.
  1206. Yamazaki, Shunpei; Koyama, Jun; Miyanaga, Akiharu; Fukunaga, Takeshi, Semiconductor thin film and method of manufacturing the same and semiconductor device and method of manufacturing the same.
  1207. Yamazaki, Shunpei; Koyama, Jun; Miyanaga, Akiharu; Fukunaga, Takeshi, Semiconductor thin film and method of manufacturing the same and semiconductor device and method of manufacturing the same.
  1208. Yamazaki,Shunpei; Koyama,Jun; Miyanaga,Akiharu; Fukunaga,Takeshi, Semiconductor thin film and method of manufacturing the same and semiconductor device and method of manufacturing the same.
  1209. Hisashi Ohtani JP; Shunpei Yamazaki JP; Jun Koyama JP; Yasushi Ogata JP; Akiharu Miyanaga JP, Semiconductor thin film and semiconductor device.
  1210. Ohtani Hisashi,JPX ; Yamazaki Shunpei,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Miyanaga Akiharu,JPX, Semiconductor thin film and semiconductor device.
  1211. Ohtani, Hisashi; Yamazaki, Shunpei; Koyama, Jun; Ogata, Yasushi; Miyanaga, Akiharu, Semiconductor thin film and semiconductor device.
  1212. Shunpei Yamazaki JP; Hisashi Ohtani JP; Toru Mitsuki JP; Akiharu Miyanaga JP; Yasushi Ogata JP, Semiconductor thin film and semiconductor device.
  1213. Yamazaki Shunpei,JPX ; Ohtani Hisashi,JPX ; Mitsuki Toru,JPX ; Miyanaga Akiharu,JPX ; Ogata Yasushi,JPX, Semiconductor thin film and semiconductor device.
  1214. Yamazaki, Shunpei; Ohtani, Hisashi; Mitsuki, Toru; Miyanaga, Akiharu; Ogata, Yasushi, Semiconductor thin film and semiconductor device.
  1215. Yamazaki, Shunpei; Ohtani, Hisashi; Mitsuki, Toru; Miyanaga, Akiharu; Ogata, Yasushi, Semiconductor thin film and semiconductor device.
  1216. Yamazaki, Shunpei; Ohtani, Hisashi; Mitsuki, Toru; Miyanaga, Akiharu; Ogata, Yasushi, Semiconductor thin film and semiconductor device.
  1217. Yamazaki,Shunpei; Ohtani,Hisashi; Mitsuki,Toru; Miyanaga,Akiharu; Ogata,Yasushi, Semiconductor thin film and semiconductor device.
  1218. Isobe, Atsuo; Dairiki, Koji; Shibata, Hiroshi; Kokubo, Chiho; Arao, Tatsuya; Hayakawa, Masahiko; Miyairi, Hidekazu; Shimomura, Akihisa; Tanaka, Koichiro; Yamazaki, Shunpei; Akiba, Mai, Semiconductor thin film device.
  1219. Hisashi Ohtani JP; Akiharu Miyanaga JP; Takeshi Fukunaga JP; Hongyong Zhang JP, Semiconductor thin film transistor with crystal orientation.
  1220. Yamazaki Shunpei,JPX ; Koyama Jun,JPX ; Miyanaga Akiharu,JPX ; Fukunaga Takeshi,JPX, Semiconductor thin film, semiconductor device and manufacturing method thereof.
  1221. Yamazaki,Shunpei; Koyama,Jun; Miyanaga,Akiharu; Fukunaga,Takeshi, Semiconductor thin film, semiconductor device and manufacturing method thereof.
  1222. Yamazaki,Shunpei; Koyama,Jun; Miyanaga,Akiharu; Fukunaga,Takeshi, Semiconductor thin film, semiconductor device and manufacturing method thereof.
  1223. Yamazaki Shunpei,JPX ; Takemura Yasuhiko,JPX ; Zhang Hongyong,JPX ; Takayama Toru,JPX ; Uochi Hideki,JPX, Semiconductor, semiconductor device, and method for fabricating the same.
  1224. Yamazaki Shunpei,JPX ; Takemura Yasuhiko,JPX ; Zhang Hongyong,JPX ; Takayama Toru,JPX ; Uochi Hideki,JPX, Semiconductor, semiconductor device, and method for fabricating the same.
  1225. Yamazaki,Shunpei; Takemura,Yasuhiko; Zhang,Hongyong; Takayama,Toru; Uochi,Hideki, Semiconductor, semiconductor device, and method for fabricating the same.
  1226. Yamazaki,Shunpei; Ohtani,Hisashi; Hiroki,Masaaki; Tanaka,Koichiro; Shiga,Aiko; Akiba,Mai, Semiconductror fabricating apparatus.
  1227. Shionoiri, Yutaka; Kato, Kiyoshi; Azami, Munehiro, Sense amplifier and electronic apparatus using the same.
  1228. Shionoiri, Yutaka; Kato, Kiyoshi; Azami, Munehiro, Sense amplifier and electronic apparatus using the same.
  1229. Shionoiri, Yutaka; Kato, Kiyoshi; Azami, Munehiro, Sense amplifier and electronic apparatus using the same.
  1230. Shionoiri, Yutaka; Kato, Kiyoshi; Azami, Munehiro, Sense amplifier and electronic apparatus using the same.
  1231. Shionoiri, Yutaka; Kato, Kiyoshi; Azami, Munehiro, Sense amplifier and electronic apparatus using the same.
  1232. Shionoiri, Yutaka; Kato, Kiyoshi; Azami, Munehiro, Sense amplifier and electronic apparatus using the same.
  1233. Shionoiri, Yutaka; Kato, Kiyoshi; Azami, Munehiro, Sense amplifier and electronic apparatus using the same.
  1234. Shionoiri,Yutaka; Kato,Kiyoshi; Azami,Munehiro, Sense amplifier and electronic apparatus using the same.
  1235. Azami, Munehiro; Osame, Mitsuaki; Shionoiri, Yutaka; Nagao, Shou, Serial-to-parallel conversion circuit, and semiconductor display device employing the same.
  1236. Azami, Munehiro; Osame, Mitsuaki; Shionoiri, Yutaka; Nagao, Shou, Serial-to-parallel conversion circuit, and semiconductor display device employing the same.
  1237. Azami,Munehiro; Osame,Mitsuaki; Shionoiri,Yutaka; Nagao,Shou, Serial-to-parallel conversion circuit, and semiconductor display device employing the same.
  1238. Azami,Munehiro; Osame,Mitsuaki; Shionoiri,Yutaka; Nagao,Shou, Serial-to-parallel conversion circuit, and semiconductor display device employing the same.
  1239. Tanaka,Yukio; Hayashi,Keisuke, Shift register circuit, driving circuit of display device and display device using the driving circuit.
  1240. Tanaka, Yukio; Hayashi, Keisuke, Shift register circuit, driving circuit of display device, and display device using the driving circuit.
  1241. Tanaka, Yukio; Hayashi, Keisuke, Shift register circuit, driving circuit of display device, and display device using the driving circuit.
  1242. Tanaka, Yukio; Hayashi, Keisuke, Shift register circuit, driving circuit of display device, and display device using the driving circuit.
  1243. Umezaki, Atsushi, Shift register, semiconductor device, display device, and electronic device.
  1244. Umezaki, Atsushi, Shift register, semiconductor device, display device, and electronic device.
  1245. Koyama, Jun; Osame, Mitsuaki; Ogata, Yasushi, Signal dividing circuit and semiconductor device.
  1246. Koyama,Jun; Osame,Mitsuaki; Ogata,Yasushi, Signal dividing circuit and semiconductor device.
  1247. Habuka Hitoshi,JPX ; Otsuka Toru,JPX, Silicon semiconductor crystal and a method for manufacturing it.
  1248. Yamazaki,Shunpei; Miyanaga,Akiharu; Koyama,Jun; Fukunaga,Takeshi, Static random access memory using thin film transistors.
  1249. Nakamura, Osamu; Akiba, Mai, Test element group, method of manufacturing a test element group, method of testing a semiconductor device, and semiconductor device.
  1250. Nakamura, Osamu; Akiba, Mai, Test element group, method of manufacturing a test element group, method of testing a semiconductor device, and semiconductor device.
  1251. Hiroki,Masaaki; Shibata,Noriko; Yamazaki,Shunpei, Thin film formation apparatus and method of manufacturing self-light-emitting device using thin film formation apparatus.
  1252. Yamazaki,Shunpei; Yamamoto,Kunitaka; Hiroki,Masaaki; Fukunaga,Takeshi, Thin film forming apparatus.
  1253. Yamazaki Shunpei,JPX ; Miyanaga Akiharu,JPX ; Koyama Jun,JPX ; Fukunaga Takeshi,JPX, Thin film semiconductor and method for manufacturing the same, semiconductor device and method for manufacturing the sa.
  1254. Shunpei Yamazaki JP; Akiharu Miyanaga JP; Jun Koyama JP; Takeshi Fukunaga JP, Thin film semiconductor and method for manufacturing the same, semiconductor device and method for manufacturing the same.
  1255. Yamazaki, Shunpei; Miyanaga, Akiharu; Koyama, Jun; Fukunaga, Takeshi, Thin film semiconductor device and its manufacturing method.
  1256. Yang, Tae-Hoon; Lee, Ki-Yong; Seo, Jin-Wook; Park, Byoung-Keon, Thin film transistor.
  1257. Kazufumi Ogawa JP; Kazuyasu Adachi JP, Thin film transistor and liquid crystal display unit.
  1258. Lee,Keun Soo; Park,Byoung Keon, Thin film transistor and method of fabricating the same.
  1259. Yamazaki, Shunpei; Koyama, Jun, Thin film transistor circuit and a semiconductor display device using the same.
  1260. Yamazaki,Shunpei; Koyama,Jun, Thin film transistor display device with integral control circuitry.
  1261. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Hayakawa Masahiko,JPX ; Osame Mitsuaki,JPX ; Ohtani Hisashi,JPX ; Hamatani Toshiji,JPX, Thin film transistor having grain boundaries with segregated oxygen and halogen elements.
  1262. Shunpei Yamazaki JP, Thin film transistor having lightly doped regions.
  1263. Masashi Maekawa ; Yukihiko Nakata, Thin film transistor in metal-induced crystallized region formed around a transition metal nucleus site.
  1264. Yamazaki, Shunpei; Kato, Kiyoshi; Isobe, Atsuo; Miyairi, Hidekazu; Suzawa, Hideomi, Thin film transistor with channel region in recess.
  1265. Yamazaki, Shunpei; Mitsuki, Toru; Kasahara, Kenji; Asami, Taketomi; Takano, Tamae; Shichi, Takeshi; Kokubo, Chiho; Arai, Yasuyuki, Thin film transistors and semiconductor device.
  1266. Yamazaki,Shunpei; Mitsuki,Toru; Kasahara,Kenji; Asami,Taketomi; Takano,Tamae; Shichi,Takeshi; Kokubo,Chiho; Arai,Yasuyuki, Thin film transistors and semiconductor device.
  1267. Kawasaki Ritsuko,JPX ; Kitakado Hidehito,JPX ; Kasahara Kenji,JPX ; Yamazaki Shunpei,JPX, Thin film transistors having ldd regions.
  1268. Suzawa, Hideomi; Ono, Koji; Ohnuma, Hideto; Yamagata, Hirokazu; Yamazaki, Shunpei, Thin film transistors having tapered gate electrode and taped insulating film.
  1269. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX, Thin film type monolithic semiconductor device.
  1270. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX, Thin film type monolithic semiconductor device.
  1271. Yamazaki, Shunpei; Teramoto, Satoshi, Thin film type monolithic semiconductor device.
  1272. Zhang Hongyong,JPX ; Takayama Toru,JPX ; Takemura Yasuhiko,JPX, Thin-film transistor and fabrication method for same.
  1273. Ohnuma Hideto,JPX ; Yamazaki Shunpei,JPX, Thin-film transistor and semiconductor device using thin-film transistors.
  1274. Ohnuma, Hideto; Yamazaki, Shunpei, Thin-film transistor and semiconductor device using thin-film transistors.
  1275. Yamazaki, Shunpei; Koyama, Jun, Thin-film transistor circuit and a semiconductor display using the same.
  1276. Yamazaki,Shunpei; Koyama,Jun, Thin-film transistor circuit and a semiconductor display using the same.
  1277. Maekawa Masashi, Thin-film transistor polycrystalline film formation by nickel induced, rapid thermal annealing method.
  1278. Yamazaki,Shunpei; Koyama,Jun, Time and voltage gradation driven display device.
  1279. Zhang Hongyong,JPX ; Takayama Toru,JPX ; Takemura Yasuhiko,JPX ; Miyanaga Akiharu,JPX ; Ohtani Hisashi,JPX, Transistor and semiconductor device having columnar crystals.
  1280. Zhang, Hongyong; Takayama, Toru; Takemura, Yasuhiko; Miyanaga, Akiharu; Ohtani, Hisashi, Transistor and semiconductor device having columnar crystals.
  1281. Yamazaki, Shunpei, Transistor having source/drain with graded germanium concentration.
  1282. Tsunoda, Akira; Yamazaki, Shunpei; Koyama, Jun; Osada, Mai, Transistor provided with first and second gate electrodes with channel region therebetween.
  1283. Inukai, Kazutaka, Transmission circuit and semiconductor device.
  1284. Kazutaka Inukai JP, Transmission circuit and semiconductor device.
  1285. Yamazaki, Shunpei; Miyanaga, Akiharu; Mitsuki, Toru; Ohtani, Hisashi, Uniform thin film semiconductor device.
  1286. Suzawa, Hideomi; Ono, Koji, Wiring and manufacturing method thereof, semiconductor device comprising said wiring, and dry etching method.
  1287. Suzawa, Hideomi; Ono, Koji, Wiring and manufacturing method thereof, semiconductor device comprising said wiring, and dry etching method.
  1288. Suzawa, Hideomi; Ono, Koji, Wiring and manufacturing method thereof, semiconductor device comprising said wiring, and dry etching method.
  1289. Ohtani, Hisashi; Yamazaki, Shunpei, Wiring line and manufacture process thereof and semiconductor device and manufacturing process thereof.
  1290. Ohtani, Hisashi; Yamazaki, Shunpei, Wiring line and manufacture process thereof, and semiconductor device and manufacturing process thereof.
  1291. Ohtani,Hisashi; Yamazaki,Shunpei, Wiring line and manufacture process thereof, and semiconductor device and manufacturing process thereof.
  1292. Yamazaki, Shunpei; Takayama, Toru, Wiring material and a semiconductor device having a wiring using the material, and the manufacturing method thereof.
  1293. Yamazaki,Shunpei; Takayama,Toru, Wiring material and a semiconductor device having a wiring using the material, and the manufacturing method thereof.
  1294. Yamazaki,Shunpei; Takayama,Toru, Wiring material and a semiconductor device having a wiring using the material, and the manufacturing method thereof.
  1295. Yamazaki, Shunpei; Takayama, Toru, Wiring material and a semiconductor device having wiring using the material, and the manufacturing method.
  1296. Takayama, Toru; Sato, Keiji; Yamazaki, Shunpei, Wiring material semiconductor device provided with a wiring using the wiring material and method of manufacturing thereof.
  1297. Takayama, Toru; Sato, Keiji; Yamazaki, Shunpei, Wiring material, semiconductor device provided with a wiring using the wiring material and method of manufacturing thereof.
  1298. Takayama, Toru; Sato, Keiji; Yamazaki, Shunpei, Wiring material, semiconductor device provided with a wiring using the wiring material and method of manufacturing thereof.
  1299. Takayama, Toru; Sato, Keiji; Yamazaki, Shunpei, Wiring material, semiconductor device provided with a wiring using the wiring material and method of manufacturing thereof.
  1300. Takayama,Toru; Sato,Keiji; Yamazaki,Shunpei, Wiring material, semiconductor device provided with a wiring using the wiring material and method of manufacturing thereof.
  1301. Takayama,Toru; Sato,Keiji; Yamazaki,Shunpei, Wiring material, semiconductor device provided with a wiring using the wiring material and method of manufacturing thereof.
  1302. Nanba Norihiro,JPX, Zoom lens and optical apparatus having the same.
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