이 특허를 인용한 특허 (270)

1. So,Woo Young; Yoo,Kyung Jin; Park,Sang Il, Active matrix display device and manufacturing method thereof.

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2. Yamazaki Shunpei,JPX ; Kusumoto Naoto,JPX ; Tanaka Koichiro,JPX, Active matrix display device with TFTs of different refractive index.

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3. Hirakata, Yoshiharu, Active matrix type display device.

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4. Hirakata, Yoshiharu, Active matrix type display device.

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5. Hirakata, Yoshiharu, Active matrix type display device.

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6. Hirakata,Yoshiharu, Active matrix type display device.

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7. Hirakata,Yoshiharu, Active matrix type display device.

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8. Ohtani Hisashi,JPX ; Ogata Yasushi,JPX, Active matrix type display device and method of manufacturing the same.

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9. Ohtani, Hisashi; Ogata, Yasushi, Active matrix type display device and method of manufacturing the same.

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10. Tanaka, Yukio; Nagao, Shou, Active matrix type semicondcutor display device.

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11. Tanaka,Yukio; Nagao,Shou, Active matrix type semiconductor display device.

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12. Yukio Tanaka JP; Shou Nagao JP, Active matrix type semiconductor display device.

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13. Satake,Rumo; Hirakata,Yoshiharu; Nishi,Takeshi; Yamazaki,Shunpei, Camera and personal computer having a reflection type liquid crystal device with particular dielectric multi-layer film and interlayer insulating films.

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14. Tanaka, Yukio, D/A conversion circuit and semiconductor device.

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15. Tanaka, Yukio, D/A conversion circuit and semiconductor device.

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16. Tanaka, Yukio, D/A conversion circuit and semiconductor device.

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17. Tanaka, Yukio, D/A conversion circuit and semiconductor device.

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18. Tanaka,Yukio, D/A conversion circuit and semiconductor device.

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19. Azami, Munehiro; Osame, Mitsuaki; Shionoiri, Yutaka; Nagao, Shou, Digital analog converter and electronic device using the same.

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20. Koyama, Jun; Hayashi, Keisuke, Display device.

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21. Yamazaki, Shunpei; Koyama, Jun, Display device.

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22. Yamazaki,Shunpei; Koyama,Jun, Display device.

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23. Zhang, Hongyong; Takemura, Yasuhiko; Konuma, Toshimitsu; Ohnuma, Hideto; Yamaguchi, Naoaki; Suzawa, Hideomi; Uochi, Hideki, Display device.

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24. Yamazaki Shunpei,JPX ; Koyama Jun,JPX ; Shionoiri Yutaka,JPX, Display device and drive circuit therefor.

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25. Yamazaki, Shunpei; Koyama, Jun; Shionoiri, Yutaka, Display device and drive circuit therefor.

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26. Koyama, Jun; Yamazaki, Shunpei, Driving circuit of a semiconductor display device and the semiconductor display device.

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27. Koyama, Jun; Yamazaki, Shunpei, Driving circuit of a semiconductor display device and the semiconductor display device.

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28. Koyama, Jun; Yamazaki, Shunpei, Driving circuit of a semiconductor display device and the semiconductor display device.

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29. Koyama, Jun; Yamazaki, Shunpei, Driving circuit of a semiconductor display device and the semiconductor display device.

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30. Koyama,Jun; Yamazaki,Shunpei, Driving circuit of a semiconductor display device and the semiconductor display device.

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31. Koyama,Jun; Yamazaki,Shunpei, Driving circuit of a semiconductor display device and the semiconductor display device.

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32. Shunpei Yamazaki JP; Yoshiharu Hirakata JP, ELECTROOPTICAL DISPLAY DEVICE USING AN ACTIVE MATRIX DISPLAY IN WHICH A LIGHT REFLECTION FILM HAVING A FLAT SURFACE OVER THE PIXEL ELECTRODE AND THE TEXTURED BODY, AND THE PIXEL ELECTRODE HAVING A FL.

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33. Yamazaki, Shunpei; Takemura, Yasuhiko, Electro-optical device and method for manufacturing the same.

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34. Yamazaki, Shunpei; Takemura, Yasuhiko, Electro-optical device and method for manufacturing the same.

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35. Yamazaki, Shunpei; Takemura, Yasuhiko, Electro-optical device and method for manufacturing the same.

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36. Ohtani Hisashi,JPX ; Koyama Jun,JPX ; Yamazaki Shunpei,JPX, Electro-optical device and semiconductor circuit.

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37. Ohtani,Hisashi; Koyama,Jun; Yamazaki,Shunpei, Electro-optical device and semiconductor circuit.

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38. Ohtani,Hisashi; Koyama,Jun; Yamazaki,Shunpei, Electro-optical device and semiconductor circuit.

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39. Ohtani, Hisashi; Koyama, Jun; Yamazaki, Shunpei, Electro-optical device and semiconductor device.

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40. Satake, Rumo; Hirakata, Yoshiharu; Nishi, Takeshi; Yamazaki, Shunpei, Electronic device and method of manufacturing the same.

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41. Rumo Satake JP; Yoshiharu Hirakata JP; Takeshi Nishi JP; Shunpei Yamazaki JP, Electronic device and method of manufacturing the same having dielectric multi-layers on the pixel electrode.

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42. Yamazaki, Shunpei; Koyama, Jun, Electronic equipment including LED backlight.

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43. Higuchi, Masayuki; Murakami, Satoshi; Nakazawa, Misako, Electrooptical device, method of manufacturing the same, and electronic equipment.

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44. Higuchi,Masayuki; Murakami,Satoshi; Nakazawa,Misako, Electrooptical device, method of manufacturing the same, and electronic equipment.

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45. Yamazaki, Shunpei; Hirakata, Yoshiharu, Electrooptical display device having textured body on flat surface of pixel electrode.

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46. Shunpei Yamazaki JP; Hideomi Suzawa JP; Kunihiko Fukuchi JP, Fabrication method of a semiconductor device.

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47. Yamazaki,Shunpei; Suzawa,Hideomi; Fukuchi,Kunihiko, Fabrication method of a semiconductor device.

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48. Yamazaki,Shunpei; Suzawa,Hideomi; Fukuchi,Kunihiko, Fabrication method of a semiconductor device.

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49. Yamazaki, Shunpei; Koyama, Jun, Field sequential liquid crystal display device and driving method thereof, and head mounted display.

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50. Yamazaki, Shunpei; Koyama, Jun, Field sequential liquid crystal display device and driving method thereof, and head mounted display.

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51. Yamazaki,Shunpei; Koyama,Jun, Field sequential liquid crystal display device and driving method thereof, and head mounted display.

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52. Dairiki, Koji; Yamazaki, Shunpei, Heat treatment apparatus and method of manufacturing a semiconductor device.

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53. Dairiki,Koji; Yamazaki,Shunpei, Heat treatment apparatus and method of manufacturing a semiconductor device.

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54. Yamazaki, Shunpei, Heat treatment apparatus and method of manufacturing a semiconductor device.

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55. Shunpei Yamazaki JP; Hisashi Ohtani JP, Heating treatment device, heating treatment method and fabrication method of semiconductor device.

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56. Yamazaki,Shunpei; Ohtani,Hisashi, Heating treatment device, heating treatment method and fabrication method of semiconductor device.

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57. Yamazaki,Shunpei; Ohtani,Hisashi, Heating treatment device, heating treatment method and fabrication method of semiconductor device.

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58. Kroll, Bo; Missbach, Robert; Schwerdtner, Alexander, Holographic display.

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59. Kroll, Bo; Missbach, Robert; Schwerdtner, Alexander, Holographic display.

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60. Kroll, Bo; Missbach, Robert; Schwerdtner, Alexander, Holographic display with a variable beam deflection.

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61. Kroll, Bo; Missbach, Robert; Schwerdtner, Alexander, Holographic display with communications.

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62. Shunpei Yamazaki JP; Hisashi Ohtani JP, Introducing catalytic and gettering elements with a single mask when manufacturing a thin film semiconductor device.

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63. Prall Kirk ; Reinberg Alan R., Ion implantation with programmable energy, angle, and beam current.

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64. Prall Kirk ; Reinberg Alan R., Ion implantation with programmable energy, angle, and beam current.

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65. Koichiro Tanaka JP, Laser irradiation apparatus, laser irradiation method, beam homogenizer, semiconductor device, and method of manufacturing the semiconductor device.

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66. Ishihara Hiroaki,JPX ; Nakashita Kazuhisa,JPX ; Ohnuma Hideto,JPX ; Tanaka Nobuhiro,JPX ; Adachi Hiroki,JPX, Laser processing apparatus and laser processing process.

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67. Ishihara, Hiroaki; Nakashita, Kazuhisa; Ohnuma, Hideto; Tanaka, Nobuhiro; Adachi, Hiroki, Laser processing apparatus and laser processing process.

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68. Ohnuma, Hideto; Tanaka, Nobuhiro; Adachi, Hiroki, Laser processing apparatus and laser processing process.

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69. Ohnuma,Hideto; Tanaka,Nobuhiro; Adachi,Hiroki, Laser processing apparatus and laser processing process.

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70. Yamazaki, Shunpei; Koyama, Jun, Liquid crystal display device.

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71. Yamazaki, Shunpei; Koyama, Jun, Liquid crystal display device.

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72. Yamazaki, Shunpei; Koyama, Jun, Liquid crystal display device.

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73. Yamazaki, Shunpei; Koyama, Jun, Liquid crystal display device.

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74. Yamazaki, Shunpei; Koyama, Jun, Liquid crystal display device.

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75. Yamazaki, Shunpei; Koyama, Jun, Liquid crystal display device.

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76. Yamazaki, Shunpei; Koyama, Jun, Liquid crystal display device.

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77. Yamazaki, Shunpei; Koyama, Jun, Liquid crystal display device.

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78. Yamazaki,Shunpei; Koyama,Jun, Liquid crystal display device.

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79. Yamazaki,Shunpei; Koyama,Jun, Liquid crystal display device.

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80. Yamazaki, Shunpei; Takayama, Toru; Maruyama, Junya; Goto, Yuugo; Ohno, Yumiko; Endo, Akio; Arai, Yasuyuki, Liquid crystal display device and manufacturing method of liquid crystal display device.

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81. Yamazaki, Shunpei; Takayama, Toru; Maruyama, Junya; Goto, Yuugo; Ohno, Yumiko; Endo, Akio; Arai, Yasuyuki, Liquid crystal display device and manufacturing method of liquid crystal display device.

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82. Yamazaki, Shunpei; Takayama, Toru; Maruyama, Junya; Goto, Yuugo; Ohno, Yumiko; Endo, Akio; Arai, Yasuyuki, Liquid crystal display device and manufacturing method of liquid crystal display device.

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83. Shunpei Yamazaki JP; Jun Koyama JP, Liquid crystal electrooptical device.

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84. Yamazaki, Shunpei; Koyama, Jun, Liquid crystal electrooptical device.

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85. Yamazaki, Shunpei; Koyama, Jun, Liquid crystal electrooptical device.

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86. Yamazaki,Shunpei; Koyama,Jun, Liquid crystal electrooptical device.

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87. Yamazaki Shunpei,JPX ; Hirakata Yoshiharu,JPX ; Nishi Takeshi,JPX ; Naka Shunichi,JPX ; Tuchimoto Shuhei,JPX ; Hamada Hiroshi,JPX ; Mizuguchi Yoshihiro,JPX, Liquid crystal projector.

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88. Yamazaki, Shunpei; Hirakata, Yoshiharu; Nishi, Takeshi; Naka, Shunichi; Tuchimoto, Shuhei; Hamada, Hiroshi; Mizuguchi, Yoshihiro, Liquid crystal projector.

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89. Tokunaga, Hajime, Manufacturing method of semiconductor device.

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90. Tokunaga, Hajime, Manufacturing method of semiconductor device.

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91. Tokunaga, Hajime, Manufacturing method of semiconductor device.

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92. Tokunaga, Hajime, Manufacturing method of semiconductor device.

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93. Basker, Veeraraghavan S.; Cartier, Eduard; Deligianni, Hariklia; Jammy, Rajarao; Paruchuri, Vamsi K., Method and apparatus for electroplating on SOI and bulk semiconductor wafers.

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94. Basker, Veeraraghavan S.; Cartier, Eduard; Deligianni, Hariklia; Jammy, Rajarao; Paruchuri, Vamsi K., Method and apparatus for electroplating on soi and bulk semiconductor wafers.

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95. Yamazaki,Shunpei; Miyanaga,Akiharu; Mitsuki,Toru; Ohtani,Hisashi, Method for forming a semiconductor device using crystals of crystal growth.

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96. Yong Sun Sohn KR, Method for forming ultra-shallow junctions using laser annealing.

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97. Chang Chun Yen,TWX ; Shih Po-Sheng,TWX ; Chang Ting-Chang,TWX ; Lin Hsiao-Yi,TWX, Method for manufacturing a transistor having a low leakage current.

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98. Moriwaka, Tomoaki, Method for manufacturing semiconductor device.

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99. Moriwaka, Tomoaki, Method for manufacturing semiconductor device.

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100. Yamaguchi, Mayumi; Isobe, Atsuo; Saito, Satoru, Method for manufacturing semiconductor device including hat-shaped electrode.

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101. Ohtani, Hisashi; Nakazawa, Misako; Murakami, Satoshi, Method for producing a semiconductor device by etch back process.

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102. Kusumoto Naoto,JPX ; Yamazaki Shunpei,JPX, Method for producing insulated gate thin film semiconductor device.

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103. Kusumoto Naoto,JPX ; Yamazaki Shunpei,JPX, Method for producing insulated gate thin film semiconductor device.

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104. Kusumoto, Naoto; Yamazaki, Shunpei, Method for producing insulated gate thin film semiconductor device.

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105. Kusumoto, Naoto; Yamazaki, Shunpei, Method for producing insulated gate thin film semiconductor device.

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106. Kusumoto, Naoto; Yamazaki, Shunpei, Method for producing insulated gate thin film semiconductor device.

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107. Kusumoto,Naoto; Yamazaki,Shunpei, Method for producing insulated gate thin film semiconductor device.

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108. Shunpei Yamazaki JP, Method of crystallizing a semiconductor layer in a MIS transistor.

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109. Yamazaki, Shunpei, Method of fabricating a MIS transistor.

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110. Yamazaki,Shunpei, Method of fabricating a MIS transistor.

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111. Ohtani, Hisashi; Nakazawa, Misako, Method of fabricating a liquid crystal display device having an improved storage capacitance.

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112. Yamazaki, Shunpei; Ohtani, Hisashi, Method of fabricating a semiconductor device.

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113. Yamazaki, Shunpei; Ohtani, Hisashi, Method of fabricating a semiconductor device.

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114. Yamazaki, Shunpei; Ohtani, Hisashi, Method of fabricating a semiconductor device.

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115. Yamazaki, Shunpei; Ohtani, Hisashi, Method of fabricating a semiconductor device.

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116. Yamazaki, Shunpei; Ohtani, Hisashi, Method of fabricating a semiconductor device.

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117. Yamazaki, Shunpei; Ohtani, Hisashi, Method of fabricating a semiconductor device.

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118. Choi, Dong-Wook, Method of fabricating a thin film transistor.

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119. Tanaka, Koichiro, Method of fabricating semiconductor device.

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120. Ohnuma, Hideto, Method of manufacturing a semiconductor device.

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121. Yamazaki, Shunpei, Method of manufacturing a semiconductor device.

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122. Yamazaki, Shunpei, Method of manufacturing a semiconductor device.

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123. Yamazaki, Shunpei, Method of manufacturing a semiconductor device.

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124. Yamazaki, Shunpei, Method of manufacturing a semiconductor device.

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125. Yamazaki, Shunpei, Method of manufacturing a semiconductor device.

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126. Yamazaki, Shunpei; Ohtani, Hisashi, Method of manufacturing a semiconductor device.

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127. Yamazaki,Shunpei; Ohtani,Hisashi, Method of manufacturing a semiconductor device.

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128. Yamazaki, Shunpei, Method of manufacturing a semiconductor device having a gate electrode formed over a silicon oxide insulating layer.

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129. Yamazaki, Shunpei, Method of manufacturing a semiconductor device including thermal oxidation to form an insulating film.

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130. Hideto Ohnuma JP, Method of manufacturing a semiconductor device using a crystalline semiconductor film.

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131. Gyoo Chul Jo KR, Method of manufacturing a substrate for an electronic device by using etchant and electronic device having the substrate.

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132. Jo,Gyoo Chul, Method of manufacturing a substrate for an electronic device by using etchant and electronic device having the substrate.

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133. Tanaka, Yukio; Nagao, Shou, Method of manufacturing an active matrix type semiconductor display device.

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134. Ohnuma,Hideto, Method of manufacturing semiconductor device.

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135. Ohnuma,Hideto, Method of manufacturing semiconductor device.

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136. Yamazaki, Shunpei, Method of manufacturing semiconductor device having island-like single crystal semiconductor layer.

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137. Shimada,Hiroyuki, Method of manufacturing semiconductor device including etching a conductive layer by using a gas including SiCland NF.

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138. Yamazaki, Shunpei; Ohtani, Hisashi, Method of manufacturing semiconductor device including thin film transistor over thermal oxidation film over a glass substrate having distortion point of not lower than 750° C.

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139. Yamazaki, Shunpei; Ohtani, Hisashi, Method of manufacturing semiconductor device over glass substrate having heat resistance.

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140. Yamazaki Shunpei,JPX ; Kusumoto Naoto,JPX ; Tanaka Koichiro,JPX, Method of producing a semiconductor device with overlapped scanned linear lasers.

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141. Bin Yu, Method of providing a gate conductor with high dopant activation.

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142. Nistler John L. ; Hause Frederick N. ; Etter Phillip J., Modifying a design layer of an integrated circuit using overlying and underlying design layers.

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143. Yamazaki Shunpei,JPX ; Koyama Jun,JPX, Non-volatile memory and semiconductor device.

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144. Yamazaki, Shunpei; Koyama, Jun, Non-volatile memory and semiconductor device.

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145. Yamazaki, Shunpei; Koyama, Jun, Non-volatile memory and semiconductor device.

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146. Yamazaki,Shunpei; Koyama,Jun, Non-volatile memory and semiconductor device.

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147. Yamazaki, Shunpei; Ohtani, Hisashi; Koyama, Jun; Fukunaga, Takeshi, Nonvolatile memory and electronic apparatus.

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148. Shunpei Yamazaki JP; Jun Koyama JP; Keisuke Hayashi JP, Nonvolatile memory and manufacturing method thereof.

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149. Yamazaki, Shunpei; Koyama, Jun; Hayashi, Keisuke, Nonvolatile memory and manufacturing method thereof.

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150. Yamazaki, Shunpei; Koyama, Jun; Hayashi, Keisuke, Nonvolatile memory and manufacturing method thereof.

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151. Yamazaki, Shunpei; Koyama, Jun; Hayashi, Keisuke, Nonvolatile memory and manufacturing method thereof.

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152. Yamazaki,Shunpei; Koyama,Jun; Hayashi,Keisuke, Nonvolatile memory and manufacturing method thereof.

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153. Yamazaki,Shunpei; Koyama,Jun; Hayashi,Keisuke, Nonvolatile memory and manufacturing method thereof.

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154. Yamazaki, Shunpei; Koyama, Jun, Optically compensated birefringence mode liquid crystal display device.

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155. Hwang, Han-Wook, Poly-crystalline thin film transistor and fabrication method thereof.

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156. Hwang,Han Wook, Poly-crystalline thin film transistor and fabrication method thereof.

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157. Takei Michiko,JPX ; Ohori Tatsuya,JPX ; Zhang Hongyong,JPX ; Uochi Hideki,JPX, Process for fabricating liquid crystal electro-optical device comprising complementary thin film field effect transistor.

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158. Shunpei Yamazaki JP; Hisashi Ohtani JP, Process for producing semiconductor thin film devices using group 14 element and high temperature oxidizing treatment to achieve a crystalline silicon film.

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159. Fukunaga, Takeshi, Process for production of SOI substrate and process for production of semiconductor device.

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160. Fukunaga, Takeshi, Process for production of SOI substrate and process for production of semiconductor device including the selective forming of porous layer.

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161. Wu Hong-Woei,TWX ; Chen Yeong-E,TWX ; Lin Gwo-Long,TWX, Process to manufacture LDD TFT.

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162. Ramamurthy, Sundar; Hegedus, Andreas G.; Thakur, Randhir, Processing multilayer semiconductors with multiple heat sources.

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163. Yamazaki,Shunpei; Ohtani,Hisashi; Hayakawa,Masahiko, Projection television set.

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164. Sorabji, Khurshed; Ranish, Joseph Michael; Aderhold, Wolfgang; Hunter, Aaron Muir; Lerner, Alexander N., Rapid thermal processing chamber with shower head.

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165. Koyama, Jun, Semiconductor device.

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166. Koyama, Jun, Semiconductor device.

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167. Koyama, Jun, Semiconductor device.

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168. Koyama, Jun, Semiconductor device.

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169. Koyama, Jun; Kato, Kiyoshi, Semiconductor device.

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170. Koyama, Jun; Kato, Kiyoshi, Semiconductor device.

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171. Koyama,Jun, Semiconductor device.

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172. Koyama,Jun; Kato,Kiyoshi, Semiconductor device.

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173. Ohtani,Hisashi; Nakazawa,Misako; Murakami,Satoshi, Semiconductor device.

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174. Yamazaki Shunpei,JPX ; Miyanaga Akiharu,JPX ; Mitsuki Toru,JPX ; Ohtani Hisashi,JPX, Semiconductor device.

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175. Yamazaki, Shunpei, Semiconductor device.

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176. Yamazaki,Shunpei; Miyanaga,Akiharu; Mitsuki,Toru; Ohtani,Hisashi, Semiconductor device.

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177. Ohtani Hisashi,JPX ; Nakazawa Misako,JPX, Semiconductor device and a method of manufacturing the same.

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178. Zhang, Hongyong; Yamaguchi, Naoaki; Takemura, Yasuhiko, Semiconductor device and a semiconductor integrated circuit.

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179. Yamazaki, Shunpei; Teramoto, Satoshi, Semiconductor device and fabrication method thereof.

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180. Shunpei Yamazaki JP, Semiconductor device and its manufacturing method.

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181. Yamazaki Shunpei,JPX, Semiconductor device and its manufacturing method.

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182. Maruyama, Hotaka; Akimoto, Kengo, Semiconductor device and manufacturing method thereof.

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183. Yamazaki Shunpei,JPX, Semiconductor device and manufacturing method thereof.

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184. Yamazaki, Shunpei, Semiconductor device and manufacturing method thereof.

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185. Yamazaki,Shunpei; Zhang,Hongyong, Semiconductor device and method for forming the same.

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186. Yamazaki,Shunpei; Zhang,Hongyong, Semiconductor device and method for forming the same.

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187. Yamazaki, Shunpei; Fukunaga, Takeshi, Semiconductor device and method for manufacturing same.

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188. Yamazaki, Shunpei; Fukunaga, Takeshi, Semiconductor device and method for manufacturing same.

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189. Yamazaki,Shunpei; Fukunaga,Takeshi, Semiconductor device and method for manufacturing same.

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190. Konuma, Toshimitsu; Sugawara, Akira; Uehara, Yukiko; Zhang, Hongyong; Suzuki, Atsunori; Ohnuma, Hideto; Yamaguchi, Naoaki; Suzawa, Hideomi; Uochi, Hideki; Takemura, Yasuhiko, Semiconductor device and method for manufacturing the same.

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191. Konuma, Toshimitsu; Sugawara, Akira; Uehara, Yukiko; Zhang, Hongyong; Suzuki, Atsunori; Ohnuma, Hideto; Yamaguchi, Naoaki; Suzawa, Hideomi; Uochi, Hideki; Takemura, Yasuhiko, Semiconductor device and method for manufacturing the same.

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192. Konuma,Toshimitsu; Sugawara,Akira; Uehara,Yukiko; Zhang,Hongyong; Suzuki,Atsunori; Ohnuma,Hideto; Yamaguchi,Naoaki; Suzawa,Hideomi; Uochi,Hideki; Takemura,Yasuhiko, Semiconductor device and method for manufacturing the same.

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193. Yamazaki, Shunpei; Kusumoto, Naoto; Tanaka, Koichiro, Semiconductor device and method for producing the same.

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194. Yamazaki, Shunpei; Ohnuma, Hideto; Takano, Tamae; Ohtani, Hisashi, Semiconductor device and method of fabricating the same.

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195. Yamazaki, Shunpei; Ohnuma, Hideto; Takano, Tamae; Ohtani, Hisashi, Semiconductor device and method of fabricating the same.

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196. Zhang, Hongyong; Takemura, Yasuhiko; Konuma, Toshimitsu; Ohnuma, Hideto; Yamaguchi, Naoaki; Suzawa, Hideomi; Uochi, Hideki, Semiconductor device and method of manufacture thereof.

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197. Zhang,Hongyong; Takemura,Yasuhiko; Konuma,Toshimitsu; Ohnuma,Hideto; Yamaguchi,Naoaki; Suzawa,Hideomi; Uochi,Hideki, Semiconductor device and method of manufacture thereof.

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198. Ohtani, Hisashi; Nakazawa, Misako, Semiconductor device and method of manufacturing the same.

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199. Ohtani, Hisashi; Takano, Tamae; Yamazaki, Shunpei, Semiconductor device and method of manufacturing the same.

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200. Okamoto, Satoru; Sekiguchi, Keiichi, Semiconductor device and method of manufacturing the same.

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201. Yamazaki, Shunpei; Hayakawa, Masahiko, Semiconductor device and method of manufacturing the same.

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202. Yamazaki, Shunpei; Ohtani, Hisashi; Koyama, Jun; Fukunaga, Takeshi, Semiconductor device and method of manufacturing the same.

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203. Yamazaki,Shunpei, Semiconductor device and method of manufacturing the same.

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204. Yamazaki Shunpei,JPX ; Miyanaga Akiharu,JPX ; Mitsuki Toru,JPX ; Ohtani Hisashi,JPX, Semiconductor device and process for producing same.

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205. Ohtani,Hisashi; Nakazawa,Misako; Murakami,Satoshi, Semiconductor device and process for producing the same.

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206. Shunpei Yamazaki JP; Jun Koyama JP, Semiconductor device and semiconductor display device.

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207. Yamazaki, Shunpei; Koyama, Jun, Semiconductor device and semiconductor display device.

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208. Yamazaki, Shunpei; Koyama, Jun, Semiconductor device and semiconductor display device.

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209. Yamazaki, Shunpei; Koyama, Jun, Semiconductor device and semiconductor display device.

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210. Yamazaki, Shunpei; Koyama, Jun, Semiconductor device and semiconductor display device.

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211. Yamazaki, Shunpei; Koyama, Jun, Semiconductor device and semiconductor display device.

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212. Yamazaki, Shunpei; Ohtani, Hisashi; Koyama, Jun; Fukunaga, Takeshi, Semiconductor device having buried oxide film.

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213. Yamazaki Shunpei,JPX ; Kusumoto Naoto,JPX ; Tanaka Koichiro,JPX, Semiconductor device having channel refractive index in first and second directions.

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214. Ohtani, Hisashi; Nakazawa, Misako; Murakami, Satoshi; Fujimoto, Etsuko, Semiconductor device having multi-layer wiring.

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215. Yamazaki, Shunpei; Teramoto, Satoshi, Semiconductor device having parallel thin film transistors.

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216. Konuma, Toshimitsu; Sugawara, Akira; Uehara, Yukiko; Zhang, Hongyong; Suzuki, Atsunori; Ohnuma, Hideto; Yamaguchi, Naoaki; Suzawa, Hideomi; Uochi, Hideki; Takemura, Yasuhiko, Semiconductor device having pixel electrode and peripheral circuit.

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217. Koyama,Jun; Ohnuma,Hideto; Shionoiri,Yutaka; Nagao,Shou, Semiconductor device having pixels.

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218. Yamazaki, Shunpei; Teramoto, Satoshi, Semiconductor device having thin film transistor.

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219. Konuma, Toshimitsu; Sugawara, Akira; Uehara, Yukiko; Zhang, Hongyong; Suzuki, Atsunori; Ohnuma, Hideto; Yamaguchi, Naoaki; Suzawa, Hideomi; Uochi, Hideki; Takemura, Yasuhiko, Semiconductor device including transistors with silicided impurity regions.

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220. Konuma, Toshimitsu; Sugawara, Akira; Uehara, Yukiko; Zhang, Hongyong; Suzuki, Atsunori; Ohnuma, Hideto; Yamaguchi, Naoaki; Suzawa, Hideomi; Uochi, Hideki; Takemura, Yasuhiko, Semiconductor device including transistors with silicided impurity regions.

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221. Dairiki, Koji, Semiconductor device manufacturing method, heat treatment apparatus, and heat treatment method.

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222. Dairiki, Koji, Semiconductor device manufacturing method, heat treatment apparatus, and heat treatment method.

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223. Kimura, Hajime, Semiconductor device wherein a property of a first semiconductor layer is different from a property of a second semiconductor layer.

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224. Yamazaki, Shunpei; Miyanaga, Akiharu; Mitsuki, Toru; Ohtani, Hisashi, Semiconductor device with a semiconductor layer over a surface having a recess pitch no smaller than 0.3 microns.

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225. Hiroki Adachi JP; Shunpei Yamazaki JP, Semiconductor device with metal-oxide conductors.

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226. Yamazaki, Shunpei; Miyanaga, Akiharu; Mitsuki, Toru; Ohtani, Hisashi, Semiconductor device with rod like crystals and a recessed insulation layer.

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227. Shunpei Yamazaki JP; Hiroki Adachi JP, Semiconductor device, active matrix substrate, method of manufacturing the semiconductor device and method of manufacturing the active matrix substrate.

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228. Yamazaki, Shunpei; Tanaka, Koichiro, Semiconductor device, and method of forming the same.

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229. Yamazaki, Shunpei; Tanaka, Koichiro, Semiconductor device, and method of forming the same.

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230. Yamazaki, Shunpei; Tanaka, Koichiro, Semiconductor device, and method of forming the same.

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231. Shunpei Yamazaki JP, Semiconductor display device.

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232. Shunpei Yamazaki JP; Jun Koyama JP, Semiconductor display device and driving circuit therefor.

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233. Yamazaki, Shunpei; Koyama, Jun, Semiconductor display device and driving circuit therefor.

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234. Yamazaki, Shunpei; Koyama, Jun, Semiconductor display device and driving circuit therefor.

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235. Koyama, Jun; Osame, Mitsuaki; Azami, Munehiro, Semiconductor display device and method of driving the same.

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236. Shunpei Yamazaki JP; Jun Koyama JP, Semiconductor display device correcting system and correcting method of semiconductor display device.

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237. Yamazaki, Shunpei; Koyama, Jun, Semiconductor display device correcting system and correcting method of semiconductor display device.

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238. Koga, Masayuki, Semiconductor memory device.

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239. Yamazaki, Shunpei; Koyama, Jun; Miyanaga, Akiharu; Fukunaga, Takeshi, Semiconductor thin film and method of manufacturing the same and semiconductor device and method of manufacturing the same.

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240. Hisashi Ohtani JP; Shunpei Yamazaki JP; Jun Koyama JP; Yasushi Ogata JP; Akiharu Miyanaga JP, Semiconductor thin film and semiconductor device.

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241. Ohtani Hisashi,JPX ; Yamazaki Shunpei,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Miyanaga Akiharu,JPX, Semiconductor thin film and semiconductor device.

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242. Ohtani, Hisashi; Yamazaki, Shunpei; Koyama, Jun; Ogata, Yasushi; Miyanaga, Akiharu, Semiconductor thin film and semiconductor device.

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243. Yamazaki,Shunpei; Koyama,Jun; Miyanaga,Akiharu; Fukunaga,Takeshi, Semiconductor thin film, semiconductor device and manufacturing method thereof.

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244. Yamazaki,Shunpei; Koyama,Jun; Miyanaga,Akiharu; Fukunaga,Takeshi, Semiconductor thin film, semiconductor device and manufacturing method thereof.

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245. Azami, Munehiro; Osame, Mitsuaki; Shionoiri, Yutaka; Nagao, Shou, Serial-to-parallel conversion circuit, and semiconductor display device employing the same.

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246. Azami, Munehiro; Osame, Mitsuaki; Shionoiri, Yutaka; Nagao, Shou, Serial-to-parallel conversion circuit, and semiconductor display device employing the same.

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247. Azami,Munehiro; Osame,Mitsuaki; Shionoiri,Yutaka; Nagao,Shou, Serial-to-parallel conversion circuit, and semiconductor display device employing the same.

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248. Azami,Munehiro; Osame,Mitsuaki; Shionoiri,Yutaka; Nagao,Shou, Serial-to-parallel conversion circuit, and semiconductor display device employing the same.

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249. Koyama, Jun; Osame, Mitsuaki; Ogata, Yasushi, Signal dividing circuit and semiconductor device.

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250. Koyama,Jun; Osame,Mitsuaki; Ogata,Yasushi, Signal dividing circuit and semiconductor device.

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251. Ramachandran,Balasubramanian; Ranish,Joseph Michael; Jallepally,Ravi; Ramamurthy,Sundar; Achutharaman,Raman; Haas,Brian; Hunter,Aaron, Tailored temperature uniformity.

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252. Sorabji, Khurshed; Lerner, Alexander; Ranish, Joseph; Hunter, Aaron; Adams, Bruce; Behdjat, Mehran; Ramanujam, Rajesh, Temperature measurement and control of wafer support in thermal processing chamber.

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253. Yamaguchi,Tetsuji; Isobe,Atsuo; Saito,Satoru, Thin film integrated circuit and method for manufacturing the same, CPU, memory, electronic card and electronic device.

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254. Yamazaki, Shunpei; Miyanaga, Akiharu; Koyama, Jun; Fukunaga, Takeshi, Thin film semiconductor device and its manufacturing method.

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255. Takahashi, Mitsuasa, Thin film semiconductor device and method for manufacturing same.

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256. Takahashi,Mitsuasa, Thin film semiconductor device and method for manufacturing same.

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257. Hata Akihiro,JPX ; Adachi Masahiro,JPX, Thin film transistor and fabrication process of the same.

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258. Xie, Zhenyu, Thin film transistor and method for manufacturing the same, array substrate including the thin film transistor and display device including the array substrate.

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259. Yamazaki, Shunpei; Koyama, Jun; Hayashi, Keisuke, Thin film transistor and method of manufacturing the same.

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260. Yamazaki, Shunpei; Koyama, Jun, Thin film transistor circuit and a semiconductor display device using the same.

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261. Yamazaki,Shunpei; Koyama,Jun, Thin film transistor display device with integral control circuitry.

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262. So, Woo Young; Yoo, Kyung Jin; Park, Sang Il, Thin film transistors with dual layered source/drain electrodes and manufacturing method thereof, and active matrix display device and manufacturing method thereof.

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263. Yamazaki, Shunpei; Koyama, Jun, Thin-film transistor circuit and a semiconductor display using the same.

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264. Yamazaki,Shunpei; Koyama,Jun, Thin-film transistor circuit and a semiconductor display using the same.

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265. Yamazaki,Shunpei; Koyama,Jun, Time and voltage gradation driven display device.

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266. Yamazaki, Shunpei; Miyanaga, Akiharu; Mitsuki, Toru; Ohtani, Hisashi, Uniform thin film semiconductor device.

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267. Ohtani, Hisashi; Yamazaki, Shunpei, Wiring line and manufacture process thereof and semiconductor device and manufacturing process thereof.

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268. Ohtani, Hisashi; Yamazaki, Shunpei, Wiring line and manufacture process thereof, and semiconductor device and manufacturing process thereof.

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269. Ohtani,Hisashi; Yamazaki,Shunpei, Wiring line and manufacture process thereof, and semiconductor device and manufacturing process thereof.

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270. Takayama, Toru; Sato, Keiji; Yamazaki, Shunpei, Wiring material, semiconductor device provided with a wiring using the wiring material and method of manufacturing thereof.

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