초록 ▼

An efficient RF coil for inductively coupled plasmas provides either capacitive or inductive coupling to the plasma. The coil has a layered structure including at least one RF coil, an insulator having a low dielectric constant and a second RF magnetic structure. The second RF magnetic structure may

An efficient RF coil for inductively coupled plasmas provides either capacitive or inductive coupling to the plasma. The coil has a layered structure including at least one RF coil, an insulator having a low dielectric constant and a second RF magnetic structure. The second RF magnetic structure may be either a second RF coil or a Faraday shield. In a two coil structure, the first RF coil has a first magnetic sense upon energization by an RF source, and the second RF coil has a second magnetic sense opposite the first magnetic sense. An RF source is connected to the high voltage ends of the two RF coil. Uniform capacitive coupling is achieved by the use of a Faraday shield located between the RF coil and the plasma.

대표청구항 ▼

An apparatus for producing an inductive plasma used for plasma processing of a workpiece, comprising: a vacuum chamber including means within said chamber to receive a workpiece to be processed by a plasma; an RF induction coil structure formed of at least first and second layers separated by an ins

An apparatus for producing an inductive plasma used for plasma processing of a workpiece, comprising: a vacuum chamber including means within said chamber to receive a workpiece to be processed by a plasma; an RF induction coil structure formed of at least first and second layers separated by an insulator of sufficient thickness to prevent electrical breakdown within the coil structure; an RF source connected to said first layer of said RF induction coil structure, said RF induction coil structure generating an inductive plasma within said vacuum chamber when energized by said RF source; and a reactive impedance connected to said second layer of said RF induction coil structure and isolating the RF induction coil structure from ground, said reactive impedance controlling the amount of RF voltage on the layer closest to the plasma.