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Preparation of mono-substituted fluorinated oxetane prepolymers 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C08G-065/22
  • C07C-043/12
출원번호 US-0539555 (1995-10-05)
발명자 / 주소
  • Malik Aslam A. (Cameron Park CA) Manser Gerald E. (El Dorado Hills CA) Archibald Thomas G. (Fair Oaks CA)
출원인 / 주소
  • Aerojet-General Corporation (Sacramento CA 02)
인용정보 피인용 횟수 : 83  인용 특허 : 18

초록

This application is directed to novel fluorinated polymers and prepolymers derived from mono-substituted oxetane monomers having fluorinated alkoxymethylene side-chains and the method of making these compositions. The mono-substituted fluorinated oxetane monomers having fluorinated alkoxymethylene s

대표청구항

A method of using a mono-substituted fluorinated oxetane (FOX) monomer to make a FOX homo-prepolymer and FOX coprepolymer, said monomer having the structure: [Figure] wherein: n is 1 to 3, R is methyl or ethyl, and Rf is linear or branched chain perfluorinated alkyl or isoalkyl having from 1 to 20 c

이 특허에 인용된 특허 (18)

  1. Manser Gerald E. (Cupertino CA), Cationic polymerization.
  2. Wardle Robert B. (Logan UT) Hinshaw Jerald C. (Logan UT), Cationic polymerization of cyclic ethers.
  3. Manser Gerald E. (Cupertino CA), Energetic copolymers and method of making same.
  4. Falk Robert A. (New City NY) Jacobson Michael (Haworth NJ) Clark Kirtland P. (Bethel CT), Heteroatom containing 3,3-bis-perfluoroalkyl oxetanes and polyethers therefrom.
  5. Falk Robert A. (New City NY) Clark Kirtland P. (Bethel CT) Karydas Athanasios (Brooklyn NY), Heteroatom containing perfluoroalkyl terminated neopentyl glycols and compositions therefrom.
  6. Falk Robert A. (New City NY) Clark Kirtland P. (Bethel CT) Karydas Athanasios (Brooklyn NY) Jacobson Michael (Stratford CT), Heteroatom containing perfluoroalkyl terminated neopentyl glycols and compositions therefrom.
  7. Vandenberg Edwin J. (Fountain Hills AZ) Mullis Jeffrey C. (Tempe AZ), High molecular weight polymers and copolymers of 3-hydroxyoxetane and derivatives thereof.
  8. Manser Gerald E. (Folsom CA) Shaw Graham C. (Garland UT) Shaw ; III Graham C. (Garland UT), Internally-plasticized polyethers from substituted oxetanes.
  9. Ohsaka Yohnosuke (16-5 ; Shirakawa 1-chome Ibaraki-shi ; Osaka-fu JPX) Kohno Satoru (Urbanland Aikawa No. 403 ; 1-1-43 Itakano ; Higashi Yodogawa-ku ; Osaka-shi ; Osaka-fu JPX), Monohalogenotrifluorooxetane and its preparation.
  10. Manser Gerald E. (Folsom CA) Fletcher Richard W. (Fair Oaks CA), Nitramine oxetanes and polyethers formed therefrom.
  11. Lagow Richard J. (6204 Shadow Mountain Austin TX 78731) Persico Daniel F. (141 Edgewood Rd. Westwood MA 02090), Perfluorinated polyether fluids.
  12. Lagow Richard J. (Georgetown TX) Bierschenk Thomas R. (Roundrock TX) Juhlke Timothy J. (Roundrock TX), Perfluoropolyethers.
  13. Schuchardt Jonathan L. (Exton PA), Preparation of oxetane polyether polyols using a bleaching earth catalyst.
  14. Nappa Mario J. (Newark DE), Process for preparing fluorocarbon polyethers.
  15. Marchionni Giuseppe (Milan ITX) De Patto Ugo (Cogliate ITX), Process for the production of perfluoropolyethers substantially constituted by perfluorooxyethylene and perfluorooxyprop.
  16. Poulsen ; Freddy ; Poulsen ; Robert Edvin, Slot machine.
  17. Berkowitz Phillip T. (Woodbridge CT) Baum Kurt (Pasadena CA) Grakauskas Vytautas (Arcadia CA), Synthesis and polymerization of 3-azidooxetane.
  18. Wardle Robert B. (Logan UT) Hinshaw Jerald C. (Logan UT), Synthesis of tetrafunctional polyethers and compositions formed therefrom.

이 특허를 인용한 특허 (83)

  1. Yamamoto, Akinori, 3-fluoroalkoxymethyl-3-alkyloxetanes.
  2. Hasegawa, Koji; Ohashi, Masaki; Kinsho, Takeshi; Nishi, Tsunehiro; Sagehashi, Masayoshi, Acetal compounds and their preparation, polymers, resist compositions and patterning process.
  3. Malik, Aslam A.; Archibald, Thomas G.; Carlson, Roland P.; Wynne, Kenneth J.; Kresge, Edward N., Amorphous polyether glycols based on bis-substituted oxetane and tetrahydrofuran monomers.
  4. Malik,Aslam A.; Archibald,Thomas G.; Carlson,Roland P.; Wynne,Kenneth J.; Kresge,Edward N., Amorphous polyether glycols based on bis-substituted oxetane and tetrahydrofuran monomers.
  5. Malik,Aslam A.; Archibald,Thomas G.; Carlson,Roland P.; Wynne,Kenneth J.; Kresge,Edward N., Amorphous polyether glycols based on bis-substituted oxetane monomers.
  6. Guillermina C. Garcia ; Raymond J. Weinert, Anionic waterborne polyurethane dispersions containing polyfluorooxetanes.
  7. Guillermina C. Garcia ; Raymond J. Weinert ; Pamela L. Cadile ; Rodney Cuevas, Anionic waterborne polyurethane dispersions containing polyfluorooxetanes.
  8. Shinachi, Satoshi; Nishi, Tsunehiro; Hasegawa, Koji; Kinsho, Takeshi; Tachibana, Seiichiro; Watanabe, Takeru, Carboxyl-containing lactone compound, polymer, resist composition, and patterning process.
  9. Buhlmann, Philippe; Boswell, Paul G., Chemical sensor.
  10. Tanaka, Akinobu; Takeda, Takanobu; Watanabe, Satoshi, Chemically amplified positive resist composition and resist patterning process.
  11. Ohsawa, Youichi; Ohashi, Masaki; Sasami, Takeshi; Hatakeyama, Jun, Chemically amplified positive resist composition for ArF immersion lithography and pattern forming process.
  12. Takeda, Takanobu; Watanabe, Satoshi; Ohsawa, Youichi; Ohashi, Masaki; Kinsho, Takeshi, Chemically-amplified positive resist composition and patterning process thereof.
  13. Weinert, Raymond J.; Garcia, Guillermina C.; Robbins, James E.; Fay, Martin J., Coating derived from polyesters crosslinked with melamine formaldehyde.
  14. Weinert, Raymond J.; Garcia, Guillermina C.; Robbins, James E.; Fay, Martin J., Coatings derived from polyester crosslinked with melamine formaldehyde.
  15. Weinert, Raymond J.; Medsker, Robert E.; Woodland, Daniel D.; Kresge, Edward N.; Gottschalk, Daniel C.; Wright, Joe A., Cured polyesters containing fluorinated side chains.
  16. Weinert, Raymond J.; Medsker, Robert E.; Woodland, Daniel D.; Kresge, Edward N.; Gottschalk, Daniel C.; Wright, Joe A., Cured polyesters containing fluorinated side chains.
  17. Takemura, Katsuya; Nishi, Tsunehiro; Hatakeyama, Jun; Ohashi, Masaki; Kinsho, Takeshi, Double patterning process.
  18. Marten S. Callicott ; David L. Hyde ; Charles M. Kausch ; Anthony Verrocchi ; Joe A. Wright ; Raymond J. Weinert ; Robert E. Medsker ; Daniel D. Woodland ; Daniel C. Gottschalk, Easily cleanable polymer laminates.
  19. Wijdenes Jacob,NLX, Electromotor.
  20. Sagehashi, Masayoshi; Hasegawa, Koji; Sasami, Takeshi, Fluorinated monomer, polymer, resist composition, and patterning process.
  21. Sagehashi, Masayoshi; Hasegawa, Koji; Sasami, Takeshi, Fluorinated monomer, polymer, resist composition, and patterning process.
  22. Wright,Joe A.; Woodland,Daniel D.; Weinert, Jr.,Raymond J.; Robbins,James E.; Medsker,Robert E.; Kresge,Edward N.; Gottschalk,Daniel C.; Garcia,Guillermina C.; Fay,Martin J., Fluorinated polymer and amine resin compositions and products formed therefrom.
  23. Thomas, Richard R.; Medsker, Robert E.; Kausch, Charles M.; Woodland, Daniel D.; Jialanella, Gary L.; Weinert, Raymond J.; Leising, Jane E.; Robbins, James E.; Cartwright, Brian T., Fluorinated short carbon atom side chain and polar group containing polymer, and flow, or leveling, or wetting agents thereof.
  24. Shaffer,Timothy Daniel; Chung,David Yen Lung, Halogenated polymers with new sequence distributions.
  25. Callicott, Marten S.; Hyde, David L.; Kausch, Charles M.; Verrocchi, Anthony; Wright, Joe A.; Weinert, Raymond J.; Medsker, Robert E.; Woodland, Daniel D.; Gottschalk, Daniel C.; Kresge, Edward N., Method of making an easily cleanable polymer laminate.
  26. Baran, Jr., Jimmie R.; Terrazas, Michael S.; Dams, Rudolf J.; Moore, George G. I., Methods for treating hydrocarbon-bearing formations with fluorinated polymer compositions.
  27. Medsker, Robert; Jialanella, Gary L.; Weinert, Raymond J.; Garcia, Guillermina C.; Malik, Aslam; Carlson, Roland, Monohydric polyfluorooxetane oligomers, polymers, and copolymers and coating containing the same.
  28. Medsker, Robert; Jialanella, Gary L.; Weinert, Raymond J.; Garcia, Guillermina C.; Malik, Aslam; Carlson, Roland, Monohydric polyfluorooxetane oligomers, polymers, and copolymers and coatings containing the same.
  29. Raymond J. Weinert ; Guillermina C. Garcia ; Aslam Malik ; Roland Carlson ; Robert E. Medsker, Monohydric polyfluorooxetane polymer and radiation curable coatings containing a monofunctional polyfluorooxetane polymer.
  30. Weinert, Raymond J.; Garcia, Guillermina C.; Malik, Aslam; Carlson, Roland; Medsker, Robert E., Monohydric polyfluorooxetane polymer and radiation curable coatings containing a monofunctional polyfluorooxetane polymer.
  31. Weinert, Raymond J.; Garcia, Guillermina C.; Malik, Aslam; Carlson, Roland; Medsker, Robert E., Monohydric polyfluorooxetane polymer and radiation curable coatings containing a monofunctional polyfluorooxetane polymer.
  32. Ohashi, Masaki; Kinsho, Takeshi; Noda, Kazumi; Tachibana, Seiichiro, Near-infrared absorbing dye, near-infrared absorptive film-forming composition, and near-infrared absorptive film.
  33. Ohashi, Masaki; Tachibana, Seiichiro; Noda, Kazumi; Shirai, Shozo; Kinsho, Takeshi; Huang, Wu-Song; Goldfarb, Dario L.; Li, Wai-Kin; Glodde, Martin, Near-infrared absorptive layer-forming composition and multilayer film.
  34. Tachibana, Seiichiro; Noda, Kazumi; Ohashi, Masaki; Kinsho, Takeshi; Huang, Wu-Song; Goldfarb, Dario L.; Li, Wai-Kin; Glodde, Martin, Near-infrared absorptive layer-forming composition and multilayer film comprising near-infrared absorptive layer.
  35. Ohashi, Masaki; Hatakeyama, Jun; Fukushima, Masahiro, Onium salt compound, resist composition, and pattern forming process.
  36. Ohashi, Masaki; Hatakeyama, Jun, Pattern forming process and resist compostion.
  37. Ohashi, Masaki; Fukushima, Masahiro; Kobayashi, Tomohiro; Katayama, Kazuhiro; Lin, Chuanwen, Patterning process and resist composition.
  38. Watanabe, Takeru; Kobayashi, Tomohiro; Hatakeyama, Jun; Katayama, Kazuhiro; Kinsho, Takeshi, Patterning process, resist composition, polymer, and polymerizable ester compound.
  39. Ohashi, Masaki; Fukushima, Masahiro; Oikawa, Kenichi; Hasegawa, Koji, Photo acid generator, chemically amplified resist composition, and patterning process.
  40. Ohashi, Masaki; Fukushima, Masahiro, Photoacid generator, chemically amplified resist composition, and patterning process.
  41. Ohashi, Masaki; Ohsawa, Youichi; Kinsho, Takeshi; Watanabe, Takeru, Photoacid generator, resist composition, and patterning process.
  42. Ohashi, Masaki; Ohsawa, Youichi; Kinsho, Takeshi; Watanabe, Takeru, Photoacid generator, resist composition, and patterning process.
  43. Ohashi, Masaki; Ohsawa, Youichi; Watanabe, Takeru; Kinsho, Takeshi, Photoacid generator, resist composition, and patterning process.
  44. Raymond J. Weinert ; Edward N. Kresge ; Robert E. Medsker ; Daniel D. Woodland, Polyester with partially fluorinated side chains.
  45. Sagehashi, Masayoshi; Ohsawa, Youichi; Hasegawa, Koji; Kobayashi, Tomohiro, Polymer, chemically amplified resist composition, and patterning process using said chemically amplified resist composition.
  46. Ohashi, Masaki; Kobayashi, Tomohiro, Polymer, making method, resist composition, and patterning process.
  47. Ohashi, Masaki; Hatakeyama, Jun, Polymer, resist composition and patterning process.
  48. Medsker, Robert E.; Thomas, Richard R.; Kausch, Charles M.; Weinert, Raymond J., Polymeric blocks of an oxetane oligomer, polymer or copolymer, containing ether side chains terminated by fluorinated aliphatic groups, and hydrocarbon polymers or copolymers.
  49. Medsker,Robert E., Polymeric surfactants derived from cyclic monomers having pendant fluorinated carbon groups.
  50. Medsker,Robert E.; Thomas,Richard R.; Kausch,Charles M.; Woodland,Daniel D.; Weinert,Raymond J.; Leising,Jane E.; Kim,Yongsin, Polymeric surfactants derived from cyclic monomers having pendant fluorinated carbon groups.
  51. Ohashi, Masaki; Kinsho, Takeshi; Ohsawa, Youichi; Hatakeyama, Jun; Tachibana, Seiichiro, Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process.
  52. Ohashi, Masaki; Ohsawa, Youichi; Kinsho, Takeshi; Hatakeyama, Jun; Tachibana, Seiichiro, Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process.
  53. McDonald,Michael Francis; Milner,Scott Thomas; Shaffer,Timothy Daniel; Webb,Robert Norman, Polymerization processes.
  54. McDonald,Michael Francis; Milner,Scott Thomas; Shaffer,Timothy Daniel; Webb,Robert Norman, Polymerization processes.
  55. Milner, Scott Thomas; Matturro, Michael Gerard; Shaffer, Timothy Daniel; Webb, Robert Norman; Chung, David Yen-Lung; McDonald, Michael Francis, Polymerization processes.
  56. Shaffer,Timothy Daniel; Milner,Scott Thomas; Matturro,Michael Gerard; Chung,David Yen Lung; McDonald,Michael Francis; Webb,Robert Norman, Polymerization processes.
  57. Milner, Scott Thomas; Shaffer, Timothy Daniel; Chung, David Yen Lung, Polymers substantially free of long chain branching.
  58. Chung,David Yen Lung; Shaffer,Timothy Daniel, Polymers with new sequence distributions.
  59. Shaffer,Timothy Daniel; Chung,David Yen Lung, Polymers with new sequence distributions.
  60. Shaffer,Timothy Daniel; Chung,David Yen Lung, Polymers with new sequence distributions.
  61. Nishi, Tsunehiro; Kinsho, Takeshi; Ohashi, Masaki; Hasegawa, Koji; Iio, Masashi, Positive resist composition and patterning process.
  62. Takemura, Katsuya; Masunaga, Keiichi; Domon, Daisuke; Sagehashi, Masayoshi, Positive resist composition and patterning process.
  63. Ohashi, Masaki; Kobayashi, Tomohiro; Sagehashi, Masayoshi, Preparation of polymer, resulting polymer, resist composition, and patterning process.
  64. Yamamoto, Akinori, Process for preparing 3-fluoroalkoxymethyl-3-alkyloxetanes.
  65. Weinert, Raymond J.; Garcia, Guillermina C.; Robbins, James E.; Malik, Aslam, Radiation curable coating containing polyfuorooxetane.
  66. Watanabe, Satoshi; Tanaka, Akinobu; Watanabe, Takeru; Kinsho, Takeshi, Resist composition and patterning process.
  67. Watanabe, Satoshi; Tanaka, Akinobu; Watanabe, Takeru; Kinsho, Takeshi, Resist composition and patterning process.
  68. Watanabe, Satoshi; Tanaka, Akinobu; Watanabe, Takeru; Kinsho, Takeshi, Resist composition and patterning process.
  69. Ohsawa, Youichi; Hatakeyama, Jun; Watanabe, Takeru; Kinsho, Takeshi, Resist lower-layer composition containing thermal acid generator, resist lower layer film-formed substrate, and patterning process.
  70. Ohashi, Masaki; Kinsho, Takeshi; Ohsawa, Youichi, Sulfonate and its derivative, photosensitive acid generator, and resist composition and patterning process using the same.
  71. Ohashi, Masaki; Kinsho, Takeshi; Watanabe, Satoshi; Ohsawa, Youichi, Sulfonium salt, acid generator, resist composition, photomask blank, and patterning process.
  72. Ohashi, Masaki; Fukushima, Masahiro; Kobayashi, Tomohiro; Taniguchi, Ryosuke, Sulfonium salt, chemically amplified resist composition, and pattern forming process.
  73. Domon, Daisuke; Masunaga, Keiichi; Watanabe, Satoshi, Sulfonium salt, polymer, chemically amplified resist composition using said polymer, and resist patterning process.
  74. Ohashi, Masaki; Watanabe, Satoshi; Ohsawa, Youichi; Masunaga, Keiichi; Kinsho, Takeshi, Sulfonium salt, polymer, method for producing the polymer, resist composition and patterning process.
  75. Ohashi, Masaki; Hatakeyama, Jun; Adachi, Teppei; Fukushima, Masahiro, Sulfonium salt, polymer, polymer making method, resist composition, and patterning process.
  76. Fukushima, Masahiro; Hatakeyama, Jun; Ohashi, Masaki; Adachi, Teppei, Sulfonium salt, polymer, resist composition, and patterning process.
  77. Ohashi, Masaki; Hatakeyama, Jun, Sulfonium salt, polymer, resist composition, and patterning process.
  78. Ohashi, Masaki; Kobayashi, Tomohiro; Seki, Akihiro; Sagehashi, Masayoshi; Fukushima, Masahiro, Sulfonium salt, resist composition and patterning process.
  79. Ohashi, Masaki; Kobayashi, Tomohiro; Seki, Akihiro; Sagehashi, Masayoshi; Fukushima, Masahiro, Sulfonium salt, resist composition, and patterning process.
  80. Ohsawa, Youichi; Ohashi, Masaki, Sulfonium salt, resist composition, and patterning process.
  81. Ohsawa, Youichi; Hatakeyama, Jun; Tachibana, Seiichiro; Kinsho, Takeshi, Sulfonium salt-containing polymer, resist composition, and patterning process.
  82. Ohsawa, Youichi; Ohashi, Masaki; Tachibana, Seiichiro; Hatakeyama, Jun, Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method.
  83. Ohsawa, Youichi; Ohashi, Masaki; Tachibana, Seiichiro; Hatakeyama, Jun, Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method.
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