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Method and apparatus for CO2 cleaning with mitigated ESD 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B08B-005/00
출원번호 US-0521495 (1995-08-30)
발명자 / 주소
  • Jon Min-Chung (Princeton Junction NJ) Nicholl Hugh (Berthoud CO) Read Peter Hartpence (Morrisville PA)
출원인 / 주소
  • Lucent Technologies Inc. (Murray Hill NJ 02)
인용정보 피인용 횟수 : 37  인용 특허 : 16

초록

An object (12) may be cleaned by CO2 reduced ESD by directing a first water mist (23) at a surface (14) of the object while imparting a relative motion between the object board and the mist to form a film of water on the object surface. As the relative motion is imparted between the board and the fi

대표청구항

A method of cleaning an object, comprising the steps of: directing a first mist of water at the object at a first position while simultaneously imparting a first relative motion between the first water mist and the object so that the first water mist forms a substantially continuous film of water ac

이 특허에 인용된 특허 (16)

  1. Pustilnik Cecil S. (Albuquerque NM) Shannon George E. (Albuquerque NM), A process for removing corrosive by-products from a circuit assembly.
  2. Shukla Rahul B. (Piscataway NJ) Shipman Douglas L. (Piscataway NJ), Anti-static process for abrasive jet machining.
  3. Clark Gerald F. (Peterborough NH) Attalla Gary J. (Hooksett NH), Apparatus for cleaning mechanical devices using terpene compounds.
  4. Hayashi Chikara (Chigasaki JPX), Apparatus for removing covering film.
  5. McDermott Wayne T. (Allentown PA) Wu Jin J. (Ossining NY) Ockovic Richard C. (Northampton PA), Apparatus to clean solid surfaces using a cryogenic aerosol.
  6. Gao Guilian (Novi MI) Goenka Lakhi N. (Ann Arbor MI), Carbon dioxide-based fluxing media for non-VOC, no-clean soldering.
  7. Moore David E. (Loveland OH), Cleaning method and apparatus.
  8. Krone-Schmidt Wilfried (Fullerton CA) Di Milia Edward S. (Gardena CA) Slattery Michael J. (Gardena CA), Electrostatic discharge control during jet spray.
  9. Gallant Ben J. (Portland TX), Equipment and method for delivering an abrasive-laden gas stream.
  10. Tada Masuo (Yao JPX) Fukumoto Takaaki (Itami JPX) Ohmori Toshiaki (Itami JPX), Ice particle forming and blasting device.
  11. Sneed John D. (Long Beach CA) Krone-Schmidt Wilfried (Fullerton CA) Slattery Michael J. (Gardena CA) Bowen Howard S. (Los Angeles CA), Method for cleaning surface by heating and a stream of snow.
  12. Heyns Garrett J. (Boulder CO) McClure Terry R. (Kersey CO) Nicholl Hugh (Berthoud CO) Read Peter H. (Morrisville PA) Schulte Steven M. (Westminster CO) Tabrizi Mohammad F. (Westminster CO), Probemat cleaning system using CO2 pellets.
  13. Hayashi Chikara (Chigasaki JPX), Process for removing covering film and apparatus therefor.
  14. Kneisel Lawrence L. (Novi MI) Baker Jay D. (Dearborn MI) Goenka Lakhi N. (Ann Arbor MI), Silicon micromachined CO2 cleaning nozzle and method.
  15. Wilcher Fiona P. (Des Plaines IL) Chao Tai-Hsiang (Mt. Prospect IL), Solid phosphoric acid catalyst.
  16. Levi Mark W. (Utica NY), Wafer cleaning method.

이 특허를 인용한 특허 (37)

  1. Fishkin Boris ; Brown Kyle A., Aerosol substrate cleaner.
  2. Furusawa Masami,JPX ; Harano Riichiro,JPX, Apparatus and method for cleaning substrate.
  3. Lewis, Paul E.; Ahmadi, Goodarz; Tannous, Adel George; Makhamreh, Khalid; Compton, Keith H., Apparatus for cleaning surfaces substantially free of contaminants.
  4. Goenka Lakhi Nandlal, CO.sub.2 cleaning system and method.
  5. Luo Jih-Shiuan (Sam), Capacitor coupled chuck for carbon dioxide snow cleaning system.
  6. Suh, Song-Moon; Guo, Yuanhong; Xuan, Guangchi; Agarwal, Pulkit, Cleaning of chamber components with solid carbon dioxide particles.
  7. Ben Kim, Cleaning with liquified gas and megasonics.
  8. Bowers Charles W., Electrostatic discharge protection of static sensitive devices cleaned with carbon dioxide spray.
  9. Han, Yong-Pil; Sawin, Herbert H., HF vapor phase wafer cleaning and oxide etching.
  10. Jurgen Lohmuller DE, Method and apparatus for cleaning substrates.
  11. Yamamoto,Ryoichi, Method and apparatus for manufacturing liquid drop ejecting head.
  12. Unagami,Masaki, Method and assembly for static elimination of cleaning object in clearing apparatus.
  13. Walter Jaeger DE, Method for discharging cutting products from a metal-cutting machining process.
  14. Moore, Scott E.; Doan, Trung Tri, Method of cleaning a substrate surface using a frozen material.
  15. Goenka Lakhi Nandlal, Method of mitigating electrostatic charge during cleaning of electronic circuit boards.
  16. Ahmadi, Goodarz; Lewis, Paul E.; Tannous, Adel George; Makhamreh, Khalid; Compton, Keith H., Methods for cleaning surfaces substantially free of contaminants.
  17. Ahmadi, Goodarz; Lewis, Paul E.; Tannous, Adel George; Makhamreh, Khalid, Methods for cleaning utilizing multi-stage filtered carbon dioxide.
  18. Boumerzoug,Mohamed; Tannous,Adel George, Methods for residue removal and corrosion prevention in a post-metal etch process.
  19. Boumerzoug, Mohamed; Tannous, Adel George; Makhamreh, Khalid, Methods for resist stripping and cleaning surfaces substantially free of contaminants.
  20. Boumerzoug,Mohamed; Tannous,Adel George; Makhamreh,Khalid, Methods for resist stripping and cleaning surfaces substantially free of contaminants.
  21. Tannous,Adel George; Makhamreh,Khalid, Methods for resist stripping and other processes for cleaning surfaces substantially free of contaminants.
  22. Tannous,Adel George; Makhamreh,Khalid, Methods for resist stripping and other processes for cleaning surfaces substantially free of contaminants.
  23. Tannous,Adel George; Makhamreh,Khalid, Methods for resist stripping and other processes for cleaning surfaces substantially free of contaminants.
  24. Moore, Scott E.; Doan, Trung Tri, Methods of treating surfaces of substrates.
  25. Moore, Scott E.; Doan, Trung Tri, Methods of treating surfaces of substrates.
  26. Moore, Scott E.; Doan, Trung Tri, Methods of treating surfaces of substrates.
  27. Moore,Scott E.; Doan,Trung Tri, Methods of treating surfaces of substrates.
  28. Kazuyoshi Namba JP, Processing apparatus and processing method.
  29. Roth,Richard F.; George,Joseph J.; Kiani,Sepehr; Lehman,John A.; Vitello,Mark G., Protective covers for fiber optic connector to modular protective covers for fiber optic connector assembly.
  30. Sinha, Nishant, Rheological fluids for particle removal.
  31. Sinha, Nishant, Rheological fluids for particle removal.
  32. Sinha, Nishant, Rheological fluids for particle removal.
  33. Richard I. Palmisano, System for cleaning contamination from magnetic recording media rows.
  34. Kim, Se-Ho, System for forming aerosols and cooling device incorporated therein.
  35. Kim,Se Ho, System for forming aerosols and cooling device incorporated therein.
  36. Kazuki Kobayashi JP; Toshiaki Muratani JP; Hiroto Yoshioka JP, Ultrasound cleaning device and resist-stripping device.
  37. Bowers Charles W., Use of electrostatic bias to clean non-electrostatically sensitive components with a carbon dioxide spray.

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