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Combustion chemical vapor deposition of films and coatings 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G23C-016/00
출원번호 US-0416435 (1995-04-03)
발명자 / 주소
  • Hunt Andrew T. (Atlanta GA) Cochran Joe K. (Marietta GA) Carter William Brent (Atlanta GA)
출원인 / 주소
  • Georgia Tech Research Corp. (Atlanta GA 02)
인용정보 피인용 횟수 : 45  인용 특허 : 14

초록

A method for applying coatings to substrates using combustion chemical vapor deposition by mixing together a reagent and a carrier solution to form a reagent mixture, igniting the reagent mixture to create a flame, or flowing the reagent mixture through a plasma torch, in which the reagent is at lea

대표청구항

A method for applying a coating selected from the group consisting of a metal, metal oxide, nitride, carbide, fluoride, boride and carbonate to substrates using chemical vapor deposition comprising the steps of: (a) providing a substrate having at least one surface to be coated; (b) selecting a reag

이 특허에 인용된 특허 (14)

  1. Rabalais John W. (Houston TX) Kasi Srinandan R. (Houston TX), Chemically bonded diamond films and method for producing same.
  2. Murayam Motohide (Aichi JPX) Kojima Shinji (Aichi JPX) Ohsawa Katsuyuki (Aichi JPX) Noda Shoji (Aichi JPX) Uchida Kiyoshi (Aichi JPX), Combustion flame method for forming diamond films.
  3. Snail Keith A. (Silver Spring MD), Flame or plasma synthesis of diamond under turbulent and transition flow conditions.
  4. Baney Ronald H. (Midland MI) Bergstrom Debora F. (Midland MI) Justice Bruce H. (Dearborn MI), Method for forming ceramic materials, including superconductors.
  5. Fukui Keitaro (Kamakura JPX) Nakamura Osamu (Tokyo JPX) Okayama Yasushi (Tokyo JPX) Tsunoda Atsushi (Kamifukuoka JPX), Method for forming oxide superconducting films with an ultrasonic wave sprayer.
  6. Sato Yoichiro (Tsukuba JPX) Kamo Mutsukazu (Tsukuba JPX) Hata Chiemi (Tachikawa JPX), Method for preparing needle-like, fibrous or porous diamond, or an aggregate thereof.
  7. Aida Hiroshi (Kyoto JPX), Method for producing diamond films.
  8. Shioya Jun (Osaka JPX) Yamaguchi Yoichi (Osaka JPX) Mizoguchi Akira (Osaka JPX) Yoshida Noriyuki (Osaka JPX) Takahashi Kenichi (Osaka JPX) Miyazaki Kenji (Osaka JPX) Takano Satoshi (Osaka JPX) Hayash, Method for producing thin film of oxide superconductor.
  9. Lackey ; Jr. Walter J. (Marietta GA) Barefield E. Kent (Decatur GA) Carter William B. (Atlanta GA) Hanigofsky John A. (Smyrna GA) Hill David N. (Chamblee GA), Method for the rapid deposition with low vapor pressure reactants by chemical vapor deposition.
  10. Matsuno Shigeru (Amagasaki JPX) Kubo Yoshio (Amagasaki JPX) Yoshizaki Kiyoshi (Amagasaki JPX) Wakata Mitsunobu (Amagasaki JPX) Miyashita Syouji (Amagasaki JPX) Fujiwara Fumio (Amagasaki JPX), Plasma based method for production of superconductive oxide layers.
  11. Kimura Takafumi (Hiratsuka JPX) Yamawaki Hideki (Isehara JPX) Ikeda Kazuto (Atsugi JPX) Ihara Masaru (Chigasaki JPX), Process for chemical vapor deposition of superconductive oxide.
  12. Baney Ronald H. (Midland MI) Hirano Shin-ichi (Aichi JPX), Process for preparing ceramic superconductive substances.
  13. Kanai Masahiro (Tokyo JPX) Yamagami Atsushi (Kawasaki JPX), Process for the formation of a functional deposited film by hydrogen radical-assisted cvd method utilizing hydrogen gas.
  14. Hsu Hsyh-Min (Austin TX) Yee Ian Y. K. (Austin TX), Spray pyrolysis process for preparing superconductive films.

이 특허를 인용한 특허 (45)

  1. Bar Gadda,Ronny, Apparatus and method using a remote RF energized plasma for processing semiconductor wafers.
  2. Andrew T. Hunt ; Subramaniam Shanmugham ; William D. Danielson ; Henry A. Luten ; Tzyy Jiuan Hwang ; Girish Deshpande, Apparatus and process for controlled atmosphere chemical vapor deposition.
  3. Bi, Xiangxin; Mosso, Ronald J.; Chiruvolu, Shivkumar; Kumar, Sujeet; Gardner, James T.; Lim, Seung M.; McGovern, William E., Apparatus for coating formation by light reactive deposition.
  4. Emilsson,Tryggvi; Brumleve,Timothy R.; Varanasi,Chakrapani V., Barrier coatings and methods in discharge lamps.
  5. Bi, Xiangxin; Mosso, Ronald J.; Chiruvolu, Shivkumar; Kumar, Sujeet; Gardner, James T.; Lim, Seung M.; McGovern, William E., Coating formation by reactive deposition.
  6. Hunt Andrew Tye ; Hwang Tzyy-Jiuan ; Shao Hong, Combustion chemical vapor deposition of phosphate films and coatings.
  7. McLean, David D., Combustion deposition burner and/or related methods.
  8. Lewis, Mark A.; McLean, David D.; Frati, Maximo, Combustion deposition of metal oxide coatings deposited via infrared burners.
  9. Remington, Michael P., Combustion deposition using aqueous precursor solutions to deposit titanium dioxide coatings.
  10. Hunt Andrew Tye ; Hwang Tzyy Jiuan ; Hendrick Michelle R. ; Shao Hong ; Thomas Joseph R., Corrosion-resistant multilayer coatings.
  11. Chiruvolu,Shivkumar; Chapin,Michael Edward, Dense coating formation by reactive deposition.
  12. Hunt Andrew T. ; Lin Wen-Yi ; Shoup Shara S. ; Carpenter Richard W., Deposition of resistor materials directly on insulating substrates.
  13. Wedding, Carol Ann; Cochran, Joe K., Fabrication of silicon carbide shell.
  14. McLean, David D.; Dear, Ryan L., Flame guard and exhaust system for large area combustion deposition line, and associated methods.
  15. Hunt Andrew T. ; Hwang Tzyy Jiuan ; Hornis Helmut G. ; Lin Wen-Yi, Formation of thin film capacitors.
  16. Hunt, Andrew T.; Hwang, Tzyy Jiuan; Hornis, Helmut G.; Lin, Wen-Yi, Formation of thin film capacitors.
  17. Andrew T. Hunt ; Wen-Yi Lin ; Shara S. Shoup ; Richard W. Carpenter ; Stephen E. Bottomley ; Tzyy Jiuan Hwang ; Michelle Hendrick, Formation of thin film resistors.
  18. Bi, Xiangxin; Lopez, Herman A.; Narasimha, Prasad; Euvrard, Eric; Mosso, Ronald J., High rate deposition for the formation of high quality optical coatings.
  19. Heden,Craig R.; DePetrillo,Albert R.; McGuire,Robert M., Host and ancillary tool interface methodology for distributed processing.
  20. Petrmichl,Rudolph Hugo; Bienkiewicz,Joseph M.; Thomsen,Scott V., Hydrophilic DLC on substrate with flame pyrolysis treatment.
  21. Luten, Henry A., Hydrophobic coating including underlayer(s) deposited via flame pyrolysis.
  22. Bar-Gadda, Ronny, In situ chemical generator and method.
  23. Bar-Gadda, Ronny, Method and apparatus for generating H20 to be used in a wet oxidation process to form SiO2 on a silicon surface.
  24. Filippou, Con; Gutowski, Wojciech S; Proctor, David; Spicer, Mark, Method for surface engineering.
  25. Petrmichl, Rudolph Hugo; Remington, Jr., Michael P.; Nunez-Regueiro, Jose; Frati, Maxi; Fisher, Greg, Method of making a scratch-and etch-resistant coated glass article.
  26. Thomsen, Scott V., Method of making coated article with color suppression coating including flame pyrolysis deposited layer(s).
  27. Seth M. Kirk ; Stephen F. Wolf ; Joseph M. McGrath ; Albert I. Everaerts ; Peter A. Stark ; Terrence W. Miller, Methods of enhancing adhesion.
  28. Sutorik,Anthony C.; Laine,Richard M.; Marchal,Julien; Johns,Tyrone; Hinklin,Thomas, Mixed-metal oxide particles by liquid feed flame spray pyrolysis of oxide precursors in oxygenated solvents.
  29. DePetrillo,Albert R.; Heden,Craig R.; McGuire,Robert M., Modular ICP torch assembly.
  30. Remington, Jr., Michael P., Nano-particle loaded metal oxide matrix coatings deposited via combustion deposition.
  31. Hunt Andrew T. ; Lin Wen-Yi ; Carpenter Richard W., Nanolaminated thin film circuitry materials.
  32. Hunt, Andrew T.; Lin, Wen-Yi; Carpenter, Richard W., Nanolaminated thin film circuitry materials.
  33. Andrew T. Hunt ; Henry A. Luten, III, Nanostructure coatings.
  34. Remington, Michael P., Organosiloxane inclusive precursors having ring and/or cage-like structures for use in combustion deposition.
  35. Hunt Andrew T. ; Hwang Tzyy Jiuan ; Hornis Helmut G. ; Shao Hong ; Thomas Joe ; Lin Wen-Yi ; Shoup Shara S. ; Luten Henry A. ; McEntyre John Eric, Precursor solution compositions for electronic devices using CCVD.
  36. Horne, Craig R.; McGovern, William E.; Lynch, Robert B.; Mosso, Ronald J., Reactive deposition for electrochemical cell production.
  37. McLean, David D., Remote combustion deposition burner and/or related methods.
  38. Hunt Andrew T. ; Lin Wen-Yi ; Shoup Shara S., Resistors for electronic packaging.
  39. Thomsen, Scott V.; Petrmichl, Rudolph Hugo; Murphy, Nestor P.; Veerasamy, Vijayen S., Scratch resistant coated glass article including layer(s) resistant to fluoride-based etchant(s), and method of making article using combustion CVD.
  40. Thomsen,Scott V.; Petrmichl,Rudolph Hugo; Murphy,Nestor P.; Veerasamy,Vijayen S., Scratch resistant coated glass article including layer(s) resistant to fluoride-based etchant(s), and method of making article using combustion CVD.
  41. Fairbourn,David C., Simple chemical vapor deposition system and methods for depositing multiple-metal aluminide coatings.
  42. Fairbourn, David C., Simple chemical vapor deposition systems for depositing multiple-metal aluminide coatings.
  43. Tang, Yin; Sutorik, Anthony C.; Nguyen, Long; Hinklin, Tom; Rhodes, William H.; Scerbak, David, Sintered polycrystalline terbium aluminum garnet and use thereof in magneto-optical devices.
  44. Tang,Yin; Sutorik,Anthony C.; Nguyen,Long; Hinklin,Tom; Rhodes,William H.; Scerbak,David, Sintered polycrystalline terbium aluminum garnet and use thereof in magneto-optical devices.
  45. O'Donnell,Robert J.; Chang,Christopher C.; Daugherty,John E., Zirconia toughened ceramic components and coatings in semiconductor processing equipment and method of manufacture thereof.
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