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Process gas distribution system and method with automatic transducer zero calibration

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01F-025/00
  • G01G-023/01
출원번호 US-0632708 (1996-04-15)
발명자 / 주소
  • Sierk Dennis A. (Huntsville AL) DuRoss Ronald R. (Huntsville AL) Geist Stephen G. (Union Grove AL) Hayes Gregory L. (Fayetteville TN)
출원인 / 주소
  • SCI Systems, Inc. (Huntsville AL 02)
인용정보 피인용 횟수 : 49  인용 특허 : 0

초록

A system including a plurality of gas flow control units in cabinets which are connected to distribute process gas, on demand, to a plurality of utilization locations known as “tool”locations in a semi-conductor manufacturing plant. Transducers are used in the system to measure pressures and other c

대표청구항

In or for a process gas distribution control unit which handles hazardous gases, said control unit having at least one gas pressure measurement transducer for measuring the pressure of gas handled by said control unit and outputting a measured output correlated to the pressure wherein there is an id

이 특허를 인용한 특허 (49)

  1. Ohkawa,Kiichi; Adachi,Kazunori, Adaptor; controller and plug receptacle for electronic device.
  2. Paik,Young J., Adjusting manufacturing process control parameter using updated process threshold derived from uncontrollable error.
  3. Schwarm,Alexander T., Automated design and execution of experiments with integrated model creation for semiconductor manufacturing tools.
  4. Shock, Robert F., Computer controlled apparatus and method of filling cylinders with gas.
  5. Arackaparambil,John F.; Chi,Tom; Chow,Billy; D'Souza,Patrick M.; Hawkins,Parris; Huang,Charles; Jensen,Jett; Krishnamurthy,Badri N.; Kulkarni,Pradeep M.; Kulkarni,Prakash M.; Lin,Wen Fong; Mohan,Shan, Computer integrated manufacturing techniques.
  6. Arackaparambil,John F.; Chi,Tom; Chow,Billy; D'Souza,Patrick M.; Hawkins,Parris; Huang,Charles; Jensen,Jett; Krishnamurthy,Badri N.; Kulkarni,Pradeep M.; Kulkarni,Prakash M.; Lin,Wen Fong; Mohan,Shan, Computer integrated manufacturing techniques.
  7. Paik, Young Joseph, Control of chemical mechanical polishing pad conditioner directional velocity to improve pad life.
  8. Paik,Young Joseph, Control of chemical mechanical polishing pad conditioner directional velocity to improve pad life.
  9. Shanmugasundram, Arulkumar; Parikh, Suketu A., Copper wiring module control.
  10. Shanmugasundram, Arulkumar P.; Schwarm, Alexander T., Dynamic metrology schemes and sampling schemes for advanced process control in semiconductor processing.
  11. Shanmugasundram, Arulkumar P.; Schwarm, Alexander T., Dynamic metrology schemes and sampling schemes for advanced process control in semiconductor processing.
  12. Shanmugasundram, Arulkumar P.; Schwarm, Alexander T., Dynamic metrology schemes and sampling schemes for advanced process control in semiconductor processing.
  13. Paik, Young Jeen, Dynamic offset and feedback threshold.
  14. Chi, Yueh-Shian; Hawkins, Parris C M; Huang, Charles Q., Dynamic subject information generation in message services of distributed object systems.
  15. Chi,Yueh shian T.; Hawkins,Parris C. M.; Huang,Charles Q., Dynamic subject information generation in message services of distributed object systems in a semiconductor assembly line facility.
  16. Krishnamurthy,Badri N.; Hawkins,Parris C. M., Experiment management system, method and medium.
  17. Shanmugasundram, Arulkumar P.; Schwarm, Alexander T.; Prabhu, Gopalakrishna B., Feedback control of a chemical mechanical polishing device providing manipulation of removal rate profiles.
  18. Shanmugasundram,Arulkumar P.; Schwarm,Alexander T.; Prabhu,Gopalakrishna B., Feedback control of a chemical mechanical polishing device providing manipulation of removal rate profiles.
  19. Shanmugasundram, Arulkumar P.; Schwarm, Alexander T.; Iliopoulos, Ilias; Parkhomovsky, Alexander; Seamons, Martin J., Feedback control of plasma-enhanced chemical vapor deposition processes.
  20. Paik,Young Joseph, Feedforward and feedback control for conditioning of chemical mechanical polishing pad.
  21. Jacobson, James D.; Bui, Tuan; Garchow, Stephen R.; Yardimci, Atif; Slepicka, James S., Fluid delivery system and flow control therefor.
  22. Jacobson, James D.; Bui, Tuan; Garchow, Stephen R.; Yardimci, Atif; Slepicka, James S., Fluid delivery system and flow control therefor.
  23. Jacobson, James D.; Bui, Tuan; Garchow, Stephen R.; Yardimci, Atif; Slepicka, James S., Fluid delivery system and flow control therefor.
  24. Wodjenski, Michael J.; Dietz, James, Gas delivery system with integrated valve manifold functionality for sub-atmospheric and super-atmospheric pressure applications.
  25. Wodjenski,Michael J.; Dietz,James, Gas delivery system with integrated valve manifold functionality for sub-atmospheric and super-atmospheric pressure applications.
  26. Wodjenski,Michael J.; Dietz,James A., Gas delivery system with integrated valve manifold functionality for sub-atmospheric and super-atmospheric pressure applications.
  27. Chi, Yuehshian T.; Hawkins, Parris C. M.; Jin, Qiaolin, Generic interface builder.
  28. Balazs, Attila; Whitefield, Bruce; Mizuno, Hiroshi; Whaley, Russell; Szasz, Paul; Reder, Steven, Integrated process tool monitoring system for semiconductor fabrication.
  29. Shanmugasundram,Arulkumar P.; Schwarm,Alexander T., Integrating tool, module, and fab level control.
  30. Reiss,Terry P.; Shanmugasundram,Arulkumar P.; Schwarm,Alexander T., Integration of fault detection with run-to-run control.
  31. Kenney, Donald P.; Simmons, Walt, Method and apparatus for continuously monitoring interstitial regions in gasoline storage facilities and pipelines.
  32. Kenney, Donald P.; Simmons, Walt, Method and apparatus for continuously monitoring interstitial regions in gasoline storage facilities and pipelines.
  33. Kenney,Donald P.; Simmons,Walt, Method and apparatus for continuously monitoring interstitial regions in gasoline storage facilities and pipelines.
  34. Kenney,Donald P.; Simmons,Walt, Method and apparatus for continuously monitoring interstitial regions in gasoline storage facilities and pipelines.
  35. Funk,Merritt; Tozawa,Masaki, Method and apparatus for monitoring tool performance.
  36. Schwarm,Alexander T.; Shanmugasundram,Arulkumar P.; Pan,Rong; Hernandez,Manuel; Mohammad,Amna, Method of feedback control of sub-atmospheric chemical vapor deposition processes.
  37. Kokotov,Yuri; Entin,Efim; Seror,Jacques; Fisher,Yossi; Sarel,Shalomo; Shanmugasundram,Arulkumar P.; Schwarm,Alexander T.; Paik,Young Jeen, Method, system and medium for controlling manufacture process having multivariate input parameters.
  38. Al Bayati,Amir; Adibi,Babak; Foad,Majeed; Somekh,Sasson, Method, system and medium for controlling semiconductor wafer processes using critical dimension measurements.
  39. Shanmugasundram,Arulkumar P.; Armer,Helen; Schwarm,Alexander T., Method, system and medium for process control for the matching of tools, chambers and/or other semiconductor-related entities.
  40. Schwarm,Alexander T.; Shanmugasundram,Arulkumar P.; Seror,Jacques; Kokotov,Yuri; Entin,Efim, Method, system, and medium for handling misrepresentative metrology data within an advanced process control system.
  41. Somekh, Sasson; Grunes, Howard E., Multi-tool control system, method and medium.
  42. Olander, W. Karl; Donatucci, Matthew B.; Wang, Luping; Wodjenski, Michael J., Pressure-based gas delivery system and method for reducing risks associated with storage and delivery of high pressure gases.
  43. Olander, W. Karl; Donatucci, Matthew B.; Wang, Luping; Wodjenski, Michael J., Pressure-based gas delivery system and method for reducing risks associated with storage and delivery of high pressure gases.
  44. Paik,Young J., Process control by distinguishing a white noise component of a process variance.
  45. Paik,Young Jeen, Process control by distinguishing a white noise component of a process variance.
  46. Padhi,Deenesh; Gandikota,Srinivas; Naik,Mehul; Parikh,Suketu A.; Dixit,Girish A., Selective metal encapsulation schemes.
  47. Schwarm,Alexander T., System, method, and medium for monitoring performance of an advanced process control system.
  48. Nulman, Jaim, Systems and methods for calibrating integrated inspection tools.
  49. Surana,Rahul; Zutshi,Ajoy, Technique for process-qualifying a semiconductor manufacturing tool using metrology data.
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