[특허]Method and apparatus for determining the thickness and elemental composition of a thin film using radioisotopic X-ray fl

Method and apparatus for determining the thickness and elemental composition of a thin film using radioisotopic X-ray fl 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	G01N-023/223
출원번호	US-0541876 (1995-10-10)
발명자 / 주소	Hossain Tim Z. (Austin TX) Lowell John K. (Round Rock TX)
출원인 / 주소	Advanced Micro Devices, Inc. (Sunnyvale CA 02)
인용정보	피인용 횟수 : 19 인용 특허 : 0

초록 ▼

A method and apparatus is presented which applies X-ray fluorescence spectrometry techniques to the problem of determining the elemental composition and thickness of multi-layer structures formed upon a semiconductor substrate. The resulting method and apparatus allows fast, accurate, non-contact, non-destructive, single-measurement determination of the compositions and thicknesses of each thin film on a surface of a measurement sample. Primary X-ray photons emitted by two radioisotopic X-ray sources following defined X-ray paths are incident upon a measurement sample. If the primary X-ray photons have sufficient energy, atoms in the exposed surface of the measurement sample will absorb the energies of the incident primary X-ray photons and emit secondary X-ray photons with characteristic energy levels. Secondary X-ray photons following paths within a defined detection space will reach a sensing face of a lithium-drifted silicon detector and will be detected and counted by a measurement system. The elemental composition of a thin film on an exposed surface of a measurement sample may be determined from the characteristic energy levels of the secondary X-ray photons emitted by the atoms in the thin film. The areas under all corresponding peaks in a graph of the number of secondary X-ray photons detected in predetermined energy ranges (i.e., counts) versus the predetermined energy ranges are directly proportional to the thickness of the thin film.

대표청구항 ▼

An apparatus for measuring the elemental composition and thin film thickness of a multi-layer sample comprising: a plurality of radioisotopic X-ray sources held by a plurality of source holders for producing primary X-ray photons; a baffle plate adjacent to the sample positioned between said X-ray sources and said sample, wherein said baffle plate comprises an aperture through which a portion of said primary X-ray photons must travel to become incident upon the sample and through which a portion of secondary X-ray photons emitted from said sample must travel to reach an X-ray detector; wherein said aperture is configured to limit the area of said sample which is exposed to said portion of primary X-ray photons; wherein said X-ray detector has a sensing face oriented toward said sample and is configured to receive said portion of secondary X-ray photons; and a clamp configured to hold said sample and configured to move said sample relative to said aperture so as to adjust the area and location of said sample which is exposed to said portion of primary X-ray photons.

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Lee, Shing M., Film thickness measurement using electron-beam induced x-ray microanalysis.
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Yoneda Eiji,JPX ; Asano Yasuhisa,JPX, X-ray fluorescence inspection apparatus.
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IPC	Description
A	생활필수품
A62	인명구조; 소방(사다리 E06C)
A62B	인명구조용의 기구, 장치 또는 방법(특히 의료용에 사용되는 밸브 A61M 39/00; 특히 물에서 쓰이는 인명구조 장치 또는 방법 B63C 9/00; 잠수장비 B63C 11/00; 특히 항공기에 쓰는 것, 예. 낙하산, 투출좌석 B64D; 특히 광산에서 쓰이는 구조장치 E21F 11/00)
A62B-1/08	.. 윈치 또는 풀리에 제동기구가 있는 것

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연합인증

Method and apparatus for determining the thickness and elemental composition of a thin film using radioisotopic X-ray fl 원문보기

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Method and apparatus for determining the thickness and elemental composition of a thin film using radioisotopic X-ray fl 원문보기

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