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Ceramic electrostatic chuck with built-in heater

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H02N-013/00
출원번호 US-0603155 (1996-02-20)
우선권정보 JP-0030483 (1995-02-20)
발명자 / 주소
  • Kawada Nobuo (Annaka JPX) Nakajima Ryoji (Annaka JPX) Shindo Toshihiko (Annaka JPX) Nagao Takaaki (Annaka JPX)
출원인 / 주소
  • Shin-Etsu Chemical Co., Ltd. (Tokyo JPX 03)
인용정보 피인용 횟수 : 35  인용 특허 : 1

초록

Proposed is a ceramic-based electrostatic chuck with built-in heater used in high-temperature processing of a semiconductor silicon wafer, which is capable of exhibiting excellent electrostatic attracting force even at a temperature at which conventional ceramic-based electrostatic chucks cannot exh

대표청구항

A ceramic-based electrostatic chuck with built-in heater which comprises, as an integral body: (a) a base body of a sintered blend of boron nitride and aluminum nitride having opposite surfaces; (b) a first electroconductive layer of pyrolytic graphite formed on one of the surfaces of the base body

이 특허에 인용된 특허 (1)

  1. Kawada Nobuo (Gunma-ken JPX) Shindoh Toshihiko (Gunma-ken JPX) Nagao Takaaki (Gunma-ken JPX) Urano Kazuhiko (Gunma-ken JPX) Arami Junichi (Tokyo JPX) Ishikawa Kenji (Kanagawa-ken JPX), Ceramic electrostatic chuck with built-in heater.

이 특허를 인용한 특허 (35)

  1. Natsuhara Masuhiro,JPX ; Nakata Hirohiko,JPX ; Yushio Yasuhisa,JPX, Aluminum nitride heater.
  2. Michael H. Gilbert, Sr., Articles coated with aluminum nitride by chemical vapor deposition.
  3. Tatematsu Kazuho,JPX ; Konishi Masahiro,JPX, Ceramic heater ceramic glow plug and method of manufacturing the ceramic heater.
  4. Sogabe, Kouji; Morimoto, Naoki; Ishida, Masahiko, Cleaning method and a vacuum processing apparatus.
  5. Katsuda Yuji,JPX ; Araki Kiyoshi,JPX ; Ohashi Tsuneaki,JPX, Electrically heated substrate with multiple ceramic parts each having different volume resitivities.
  6. Katsuda Yuji,JPX ; Araki Kiyoshi,JPX ; Ohashi Tsuneaki,JPX, Electrically heated substrate with multiple ceramic parts each having different volume restivities.
  7. Shu Nakajima JP, Electrostatic chuck and method for manufacturing the same.
  8. Masuda, Shinsuke; Fujii, Kiyotoshi, Electrostatic chuck and method of manufacturing the same.
  9. Logan Joseph ; Tompkins Robert, Electrostatic chuck employing thermoelectric cooling.
  10. Hausmann Gilbert, Electrostatic chuck having a combination electrode structure for substrate chucking, heating and biasing.
  11. Zucker, Martin L.; Devine, Daniel J.; Lee, Young Jai, Electrostatic chuck system and process for radially tuning the temperature profile across the surface of a substrate.
  12. Matsunaga Tadao,JPX ; Matsushita Takaya,JPX ; Hattori Kei,JPX, Electrostatic chucking device.
  13. Mogi Hiroshi,JPX ; Kobayashi Toshimi,JPX, Electrostatic holding apparatus and method of producing the same.
  14. Hong, Richard; Tsung, James H.; Vatvedt, Gunnar; Ding, Peijun; Sundarrajan, Arvind, Enhanced cooling IMP coil support.
  15. Richard Hong ; James H. Tsung ; Gunnar Vatvedt ; Peijun Ding ; Arvind Sundarrajan, Enhanced cooling IMP coil support.
  16. Fan,Wei; Sane,Ajit; Lennartz,Jeffrey; Kim,Tae Won, Etch resistant wafer processing apparatus and method for producing the same.
  17. Lee, William Davis; Cook, Gary M.; Justesen, Perry J. I.; Purohit, Ashwin M.; Rathmell, Robert D.; Weed, Allan D., Heated annulus chuck.
  18. Justesen, Perry J. I.; Weed, Allan D.; Lee, William Davis; Purohit, Ashwin M.; Rathmell, Robert D.; Cook, Gary M., Heated electrostatic chuck including mechanical clamp capability at high temperature.
  19. Kano, Shoji; Satoh, Kenji; Ito, Kenji, Heating apparatus which has electrostatic adsorption function, and method for producing it.
  20. Greg Sexton ; Mark Allen Kennard ; Alan Schoepp, High temperature electrostatic chuck.
  21. Sexton, Greg; Kennard, Mark Allen; Schoepp, Alan, High temperature electrostatic chuck.
  22. Logan, Joseph; Miller, John R.; Naim, Mahmood; Tompkins, Robert E., Hybrid ceramic electrostatic clamp.
  23. Kerstein Denise, Method and apparatus for creating a port vector.
  24. Ellie Yieh ; Li-Qun Xia ; Srinivas Nemani, Methods and apparatus for shallow trench isolation.
  25. Kadomura Shingo,JPX ; Jozaki Tomohide,JPX ; Hirano Shinsuke,JPX ; Miyashita Kinya,JPX ; Miyata Seiichirou,JPX ; Tatsumi Yoshiaki,JPX, Static electricity chuck and wafer stage.
  26. Lafarre, Raymond Wilhelmus Louis; Donders, Sjoerd Nicolaas Lambertus; Ten Kate, Nicolaas; Dziomkina, Nina Vladimirovna; Karade, Yogesh Pramod; Rodenburg, Elisabeth Corinne, Substrate holder and method of manufacturing a substrate holder.
  27. Lafarre, Raymond Wilhelmus Louis; Donders, Sjoerd Nicolaas Lambertus; Ten Kate, Nicolaas; Dziomkina, Nina Vladimirovna; Karade, Yogesh Pramod; Rodenburg, Elisabeth Corinne, Substrate holder and method of manufacturing a substrate holder.
  28. Bex, Jan; Ten Kate, Nicolaas; Lafarre, Raymond Wilhelmus Louis; Damen, Johannes Wilhelmus; Brinkhof, Eugene Maria; Karade, Yogesh Pramod, Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder.
  29. Lafarre, Raymond Wilhelmus Louis; Donders, Sjoerd Nicolaas Lambertus; Ten Kate, Nicolaas; Dziomkina, Nina Vladimirovna; Karade, Yogesh Pramod; Rodenburg, Elisabeth Corinne, Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder.
  30. Lafarre, Raymond Wilhelmus Louis; Donders, Sjoerd Nicolaas Lambertus; Ten Kate, Nicolaas; Dziomkina, Nina Vladimirovna; Karade, Yogesh Pramod; Rodenburg, Elisabeth Corinne, Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder.
  31. Lafarre, Raymond Wilhelmus Louis; Ten Kate, Nicolaas; Dziomkina, Nina Vladimirovna; Karade, Yogesh Pramod; Tromp, Siegfried Alexander; Leijssen, Jacobus Josephus; Rodenburg, Elisabeth Corinne; Feijts, Maurice Wilhelmus Leonardus Hendricus; Huisman, Hendrik, Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder.
  32. Lafarre, Raymond Wilhelmus Louis; Ten Kate, Nicolaas; Dziomkina, Nina Vladimirovna; Karade, Yogesh Pramod; Tromp, Siegfried Alexander; Leijssen, Jacobus Josephus; Rodenburg, Elisabeth Corinne; Feijts, Maurice Wilhelmus Leonardus Hendricus; Huisman, Hendrik, Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder.
  33. Lee, Cheng-Tsin; Mercer, Randel F., Transition metal oxide doped alumina and methods of making and using.
  34. Kuibira, Akira; Nakata, Hirohiko; Higaki, Kenjiro; Natsuhara, Masuhiro; Ishii, Takashi; Matsui, Yasuyuki, Wafer holder for semiconductor manufacturing apparatus, and method of manufacturing the wafer holder.
  35. Kuibira, Akira; Nakata, Hirohiko; Higaki, Kenjiro; Natsuhara, Masuhiro; Ishii, Takashi; Matsui, Yasuyuki, Wafer holder for semiconductor manufacturing apparatus, method of manufacturing wafer holder, and semiconductor manufacturing apparatus.
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