초록 ▼

A temperature control apparatus for single wafer etching tools comprising a cathode electrode, an isolation layer, and chuck means, respectfully, which are vertically stacked to support a wafer to be etched. A layer of thermoelectric elements is disposed between the isolation layer and the chuck mea

A temperature control apparatus for single wafer etching tools comprising a cathode electrode, an isolation layer, and chuck means, respectfully, which are vertically stacked to support a wafer to be etched. A layer of thermoelectric elements is disposed between the isolation layer and the chuck means. The layer of thermoelectric elements comprises a center area closed loop of connected Peltier elements and an outer area closed loop of connected Peltier elements. The center area closed loop is coupled to a power source and is arranged to correspond to the center area of the wafer. The outer area closed loop is coupled to a power source and is arranged to correspond to the outer area of the wafer. Accordingly, the temperatures associated with each of the specific areas of the wafer are individually controlled by one of the closed loops.

대표청구항 ▼

In a temperature control apparatus for single wafer etching tool of the type having a cathode electrode and chuck means for holding a wafer, the chuck means being disposed on the cathode electrode, wherein the chuck means supports the wafer at a given temperature, the improvement comprising: a therm

In a temperature control apparatus for single wafer etching tool of the type having a cathode electrode and chuck means for holding a wafer, the chuck means being disposed on the cathode electrode, wherein the chuck means supports the wafer at a given temperature, the improvement comprising: a thermoelectric layer including a plurality of thermoelectric elements, said thermoelectric layer disposed between the cathode electrode and the chuck means, said thermoelectric layer comprising a plurality of closed loops, each of said closed loops connecting an amount of said plurality of thermoelectric elements, wherein each of said closed loops being arranged to correspond to a specific area of said wafer; and means coupled to each of said closed loops for providing a control voltage to each of said closed loops indicative of a given temperature; wherein a temperature associated with each of said specific areas of said wafer being controlled by one of said closed loops.