$\require{mediawiki-texvc}$

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

Pressure type flow rate control apparatus 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • F16K-031/12
출원번호 US-0661181 (1996-06-10)
우선권정보 JP-0144722 (1995-06-12)
발명자 / 주소
  • Nishino Koji (Osaka JPX) Ikeda Nobukazu (Osaka JPX) Morimoto Akihiro (Osaka JPX) Minami Yukio (Osaka JPX) Kawada Koji (Osaka JPX) Dohi Ryosuke (Osaka JPX) Fukuda Hiroyuki (Osaka JPX)
출원인 / 주소
  • Fujikin Incorporated (Osaka JPX 03)
인용정보 피인용 횟수 : 49  인용 특허 : 0

초록

A pressure type flow rate control apparatus (1) for controlling flow rate of a fluid maintains an upstream side pressure P1 of an orifice at more than about twice a downstream side pressure P2. In addition to an orifice-forming member (5) the apparatus includes a control valve (2) provided at the up

대표청구항

A pressure type flow rate control apparatus for controlling flow rate of a fluid comprising: means for forming an orifice; means for maintaining a pressure P1 upstream of the orifice at more than twice a pressure p2 downstream of the orifice and for maintaining the pressure P2 downstream of the orif

이 특허를 인용한 특허 (49)

  1. Gagnon, Frederic, Air mass flow controller valve.
  2. MacGibbon Bruce S. ; Wolochuk Mark C. ; Wolochuk Lee I. ; Sirovy Christopher P. ; LeBaron James F. ; Yarroll Jeffrey W., Airflow control valve for a clean room.
  3. Kitayama Hirofumi,JPX ; Kurono Yoichi ; Ikeda Nobukazu,JPX ; Masuda Naoya,JPX, Apparatus for feeding gases for use in semiconductor manufacturing.
  4. Cimberio, Roberto; Guidetti, Tiziano, Conditioning plant.
  5. Cimberio, Roberto; Guidetti, Tiziano, Conditioning plant.
  6. Sugiyama, Kazuhiko; Ikeda, Nobukazu; Nishino, Kouji; Dohi, Ryousuke; Uenoyama, Toyomi, Device and method for supplying gas while dividing to chamber from gas supplying facility equipped with flow controller.
  7. Sugiyama, Kazuhiko; Ikeda, Nobukazu; Nishino, Kouji; Dohi, Ryousuke; Uenoyama, Toyomi, Device and method for supplying gas while dividing to chamber from gas supplying facility equipped with flow controller.
  8. Mudd, Daniel T.; Mudd, Patti J., Flow control system, method, and apparatus.
  9. Hirose, Takashi; Yamaji, Michio; Yoshida, Toshihide; Shigyou, Kohei, Flow control valve for flow controller.
  10. Komiya Isamu,JPX ; Nambu Masahiro,JPX, Flow control valve utilizing sonic nozzle.
  11. Ohmi, Tadahiro; Saito, Masahito; Hino, Shoichi; Shimazu, Tsuyoshi; Miura, Kazuyuki; Nishino, Kouji; Nagase, Masaaki; Sugita, Katsuyuki; Hirata, Kaoru; Dohi, Ryousuke; Hirose, Takashi; Shinohara, Tsutomu; Ikeda, Nobukazu; Imai, Tomokazu; Yoshida, Toshihide; Tanaka, Hisashi, Flow rate range variable type flow rate control apparatus.
  12. Ohmi, Tadahiro; Saito, Masahito; Hino, Shoichi; Shimazu, Tsuyoshi; Miura, Kazuyuki; Nishino, Kouji; Nagase, Masaaki; Sugita, Katsuyuki; Hirata, Kaoru; Dohi, Ryousuke; Hirose, Takashi; Shinohara, Tsutomu; Ikeda, Nobukazu; Imai, Tomokazu; Yoshida, Toshihide; Tanaka, Hisashi, Flow rate range variable type flow rate control apparatus.
  13. Ohmi, Tadahiro; Saito, Masahito; Hino, Shoichi; Shimazu, Tsuyoshi; Miura, Kazuyuki; Nishino, Kouji; Nagase, Masaaki; Sugita, Katsuyuki; Hirata, Kaoru; Dohi, Ryousuke; Hirose, Takashi; Shinohara, Tsutomu; Ikeda, Nobukazu; Imai, Tomokazu; Yoshida, Toshihide; Tanaka, Hisashi, Flow rate range variable type flow rate control apparatus.
  14. Ohmi, Tadahiro; Saito, Masahito; Hino, Shoichi; Shimazu, Tsuyoshi; Miura, Kazuyuki; Nishino, Kouji; Nagase, Masaaki; Sugita, Katsuyuki; Hirata, Kaoru; Dohi, Ryousuke; Hirose, Takashi; Shinohara, Tsutomu; Ikeda, Nobukazu; Imai, Tomokazu; Yoshida, Toshihide; Tanaka, Hisashi, Flow rate range variable type flow rate control apparatus.
  15. Ohmi Tadahiro,JPX ; Kagazume Tetu,JPX ; Sugiyama Kazuhiko,JPX ; Dohi Ryousuke,JPX ; Minami Yukio,JPX ; Nishino Kouji,JPX ; Kawata Kouji,JPX ; Ikeda Nobukazu,JPX ; Yamaji Michio,JPX, Fluid supply apparatus.
  16. Ono, Kumiko; Tsujimoto, Hiroshi; Sawachi, Atsushi; Amikura, Norihiko; Sasaki, Norikazu; Kawaguchi, Yoshitaka, Gas supply control method.
  17. Ohmi Tadahiro,JPX ; Kagatsume Satoshi,JPX ; Ikeda Nobukazu,JPX ; Nishino Kouji,JPX ; Yoshikawa Kazuhiro,JPX ; Ideta Eiji,JPX ; Dohi Ryousuke,JPX ; Uno Tomio,JPX ; Yamaji Michio,JPX, Gas supply system equipped with pressure-type flow rate control unit.
  18. Ohmi, Tadahiro; Nishino, Kouji; Dohi, Ryousuke; Ikeda, Nobukazu; Nagase, Masaaki; Hirata, Kaoru; Sugita, Katsuyuki; Shinohara, Tsutomu; Hirose, Takashi; Imai, Tomokazu; Yoshida, Toshihide; Tanaka, Hisashi, Gasket type orifice and pressure type flow rate control apparatus for which the orifice is employed.
  19. Takamoto Masaki,JPX ; Nakao Shinichi,JPX ; Ishibashi Masahiro,JPX ; Ina Yoshitaka,JPX ; Yokoi Yoshikazu,JPX ; Hayakawa Masao,JPX, Mass flow control method and device utilizing a sonic nozzle.
  20. Tinsley,Kenneth E.; Tariq,Faisal, Method and system for a mass flow controller with reduced pressure sensitivity.
  21. McDonald, R. Mike, Method and system for operating a mass flow controller.
  22. Nagase, Masaaki; Dohi, Ryousuke; Ikeda, Nobukazu; Nishino, Kouji; Hirata, Kaoru; Sugita, Katsuyuki; Matsumoto, Atsushi, Method for detecting malfunction of valve on the downstream side of throttle mechanism of pressure type flow control apparatus.
  23. Lull, John Michael; Wang, Chiun; Saggio, Jr., Joseph A., Methods and apparatus for pressure compensation in a mass flow controller.
  24. Lull,John Michael; Wang,Chiun; Saggio, Jr.,Joseph A., Methods and apparatus for pressure compensation in a mass flow controller.
  25. Lull,John Michael; Wang,Chiun; Saggio, Jr.,Joseph A., Methods and apparatus for pressure compensation in a mass flow controller.
  26. Lull,John Michael; Wang,Chiun; Saggio, Jr.,Joseph A., Methods and apparatus for pressure compensation in a mass flow controller.
  27. Ohmi, Tadahiro; Kagatsume, Satoshi; Sugiyama, Kazuhiko; Minami, Yukio; Nishino, Kouji; Dohi, Ryousuke; Yonehana, Katsunori; Ikeda, Nobukazu; Yamaji, Michio; Hirose, Jun; Fukazawa, Kazuo; Koizumi, Hir, Parallel divided flow-type fluid supply apparatus, and fluid-switchable pressure-type flow control method and fluid-switchable pressure-type flow control system for the same fluid supply apparatus.
  28. Ohmi, Tadahiro; Kagatsume, Satoshi; Sugiyama, Kazuhiko; Minami, Yukio; Nishino, Kouji; Dohi, Ryousuke; Yonehana, Katsunori; Ikeda, Nobukazu; Yamaji, Michio; Hirose, Jun; Fukazawa, Kazuo; Koizumi, Hir, Parallel divided flow-type fluid supply apparatus, and fluid-switchable pressure-type flow control method and fluid-switchable pressure-type flow control system for the same fluid supply apparatus.
  29. Yasumoto, Naofumi; Dohi, Ryousuke; Nishino, Kouji; Ikeda, Nobukazu; Shigyou, Kohei, Piezoelectric linear actuator, piezoelectrically driven valve, and flow rate control device.
  30. Hidaka, Atsushi; Hirata, Kaoru; Nagase, Masaaki; Ikeda, Nobukazu; Dohi, Ryousuke; Nishino, Kouji, Piezoelectrically driven valve and piezoelectrically driven flow rate control device.
  31. Sugita, Katsuyuki; Ikeda, Nobukazu; Nishino, Kouji; Dohi, Ryousuke; Hirata, Kaoru; Nakatani, Takatoshi, Pressure control valve driving circuit for pressure type flow rate control device with flow rate self-diagnosis function.
  32. Hirata, Kaoru; Dohi, Ryousuke; Nishino, Kouji; Ikeda, Nobukazu; Sugita, Katsuyuki, Pressure type flow control system with flow monitoring.
  33. Hirata, Kaoru; Dohi, Ryousuke; Nishino, Kouji; Ikeda, Nobukazu; Sugita, Katsuyuki, Pressure type flow control system with flow monitoring.
  34. Hirata, Kaoru; Dohi, Ryousuke; Nishino, Kouji; Ikeda, Nobukazu; Sugita, Katsuyuki, Pressure type flow control system with flow monitoring, and method for detecting anomaly in fluid supply system and handling method at abnormal monitoring flow rate using the same.
  35. Hidaka, Atsushi; Nagase, Masaaki; Dohi, Ryousuke; Ikeda, Nobukazu; Nishino, Kouji, Pressure type flow rate control device.
  36. Nagase, Masaaki; Hirata, Kaoru; Dohi, Ryousuke; Nishino, Kouji; Ikeda, Nobukazu, Pressure-type flow rate control device.
  37. Nagase, Masaaki; Hidaka, Atsushi; Hirata, Kaoru; Dohi, Ryousuke; Nishino, Kouji; Ikeda, Nobukazu, Raw material gas supply apparatus for semiconductor manufacturing equipment.
  38. Nagase, Masaaki; Hirata, Kaoru; Hidaka, Atushi; Nishino, Kouji; Ikeda, Nobukazu; Nakamura, Takeshi, Raw material vaporizing and supplying apparatus equipped with raw material concentration.
  39. Somani, Bhushan, Real time diagnostics for flow controller systems and methods.
  40. Catron, Frederick W., Sound pressure level feedback control.
  41. Catron, Frederick Wayne, Sound pressure level feedback control.
  42. Lull, John M.; Wang, Chiun; Valentine, William S.; Saggio, Jr., Joseph A., System and method for a mass flow controller.
  43. Lull,John M.; Wang,Chiun; Valentine,William S.; Saggio, Jr.,Joseph A., System and method for a mass flow controller.
  44. Lull,John M; Wang,Chiun; Valentine,William S; Saggio, Jr.,Joseph A, System and method for a mass flow controller.
  45. Lull,John M; Wang,Chiun; Valentine,William S; Saggio, Jr.,Joseph A, System and method for a mass flow controller.
  46. Ishii, Mamoru, Thermal mass-flow meter and mass-flow control device using same.
  47. Maginnis,Thomas Owen; Vu,Kim Ngoc, Ultrasonic flow sensor having reflecting interface.
  48. Urdaneta,Nelson; Tint,Aaron S; Duan,Hao; Redemann,Eric J; Wacinski,Christopher Andrew, Ultrasonic liquid flow controller.
  49. Dohi, Ryousuke; Nishino, Kouji; Sawada, Yohei; Ikeda, Nobukazu, Variable orifice type pressure-controlled flow controller.
섹션별 컨텐츠 바로가기

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

AI-Helper 아이콘
AI-Helper
안녕하세요, AI-Helper입니다. 좌측 "선택된 텍스트"에서 텍스트를 선택하여 요약, 번역, 용어설명을 실행하세요.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.

선택된 텍스트

맨위로